公开(公告)号：US20050047927A1

公开(公告)日：2005-03-03

申请号：US10820447

申请日：2004-04-07

Applicant: Chung Lee ,  Oanh Nguyen ,  Wei Lee ,  Michael Solomensky ,  Atul Kumar ,  James Chung Chang ,  Binh Nguyen

Inventor： Chung Lee ,  Oanh Nguyen ,  Wei Lee ,  Michael Solomensky ,  Atul Kumar ,  James Chung Chang ,  Binh Nguyen

IPC: B05D1/00 ,  B05D3/06 ,  B05D7/24 ,  C23C16/452 ,  H01L21/312 ,  F04B1/00

CPC classification number: B05D1/60 ,  B05D1/007 ,  B05D3/062 ,  C23C16/452 ,  H01L21/02118 ,  H01L21/02205 ,  H01L21/02271 ,  H01L21/02348 ,  H01L21/312 ,  H01L21/3127

Abstract: A Process Module (“PM”) is designed to facilitate Transport Polymerization (“TP”) of precursors that are useful for preparations of low Dielectric Constant (“∈”) films. The PM consists primarily of a Material Delivery System (“MDS”) with a high temperature Vapor Phase Controller (“VFC”), a TP Reactor, a Treatment Chamber, a Deposition Chamber and a Pumping System. The PM is designed to facilitate TP for new precursors and for film deposition and stabilization processes.

Abstract translation: 工艺模块（“PM”）被设计用于促进可用于制备低介电常数（“ε”）薄膜的前体的传输聚合（“TP”）。 PM主要由具有高温气相控制器（“VFC”），TP反应器，处理室，沉积室和泵送系统的物料输送系统（“MDS”）组成。 PM被设计为促进TP的新前体和薄膜沉积和稳定过程。

公开(公告)号：US20050000434A1

公开(公告)日：2005-01-06

申请号：US10897797

申请日：2004-07-22

Applicant: Chung Lee ,  Atul Kumar ,  Chieh Chen

Inventor： Chung Lee ,  Atul Kumar ,  Chieh Chen

IPC: B01J19/12 ,  B01J19/18 ,  B05D1/00 ,  B05D3/02 ,  B05D3/06 ,  B05D7/24 ,  B29C71/02 ,  C08G61/02 ,  C08J5/18 ,  C08L65/00 ,  C08L65/04 ,  C23C16/452 ,  F28D17/00 ,  H01L21/312 ,  H01L21/768 ,  H01L23/532 ,  C23C16/00

CPC classification number: H01L23/5329 ,  B01J19/123 ,  B01J19/1887 ,  B01J2219/00153 ,  B01J2219/00159 ,  B01J2219/0879 ,  B05D1/007 ,  B05D1/60 ,  B05D3/0254 ,  B05D3/061 ,  B05D3/062 ,  B29C71/02 ,  B29C2071/022 ,  B29C2071/025 ,  B29C2071/027 ,  C08G61/02 ,  C08G61/025 ,  C08G2261/3424 ,  C08J5/18 ,  C08J2365/04 ,  C08L65/00 ,  C08L65/04 ,  C23C16/452 ,  F28D17/005 ,  H01L21/0212 ,  H01L21/02263 ,  H01L21/312 ,  H01L21/3127 ,  H01L23/53238 ,  H01L2924/0002 ,  H01L2924/09701 ,  H01L2924/00

Abstract: A reactor for forming a reactive intermediate from a precursor having a general formula of Xm—Ar—(CZ′Z″Y)n is disclosed, wherein X and Y are leaving groups, wherein Ar is an aromatic moiety and wherein the reactive intermediate has at least two free radicals. The reactor includes an inlet for admitting a flow of the precursor into the reactor, an interior having a surface at least partially formed from a material M that reacts with at least one of X and Y to remove at least one of X and Y from the precursor and to form at least one of a compound MaYb and a compound McXd, an outlet for admitting a flow of the reactive intermediate out of the reactor.

Abstract translation: 公开了一种用于由具有通式Xm-Ar-（CZ'Z'Y）n的前体形成反应性中间体的反应器，其中X和Y是离去基团，其中Ar是芳族部分，其中反应性中间体 至少有两个自由基。 所述反应器包括用于允许前体流入反应器的入口，内部具有至少部分地由材料M形成的表面，所述材料M与X和Y中的至少一个反应以将X和Y中的至少一个从 前体，并形成化合物MaYb和化合物McXd中的至少一种，用于将反应性中间体流从反应器中引入的出口。

公开(公告)号：US20070119369A1

公开(公告)日：2007-05-31

申请号：US11642383

申请日：2006-12-19

Applicant: Chung Lee ,  Atul Kumar ,  Chieh Chen

Inventor： Chung Lee ,  Atul Kumar ,  Chieh Chen

IPC: C23C16/00

CPC classification number: H01L23/5329 ,  B01J19/123 ,  B01J19/1887 ,  B01J2219/00153 ,  B01J2219/00159 ,  B01J2219/0879 ,  B05D1/007 ,  B05D1/60 ,  B05D3/0254 ,  B05D3/061 ,  B05D3/062 ,  B29C71/02 ,  B29C2071/022 ,  B29C2071/025 ,  B29C2071/027 ,  C08G61/02 ,  C08G61/025 ,  C08G2261/3424 ,  C08J5/18 ,  C08J2365/04 ,  C08L65/00 ,  C08L65/04 ,  C23C16/452 ,  F28D17/005 ,  H01L21/0212 ,  H01L21/02263 ,  H01L21/312 ,  H01L21/3127 ,  H01L23/53238 ,  H01L2924/0002 ,  H01L2924/09701 ,  H01L2924/00

Abstract: A method of producing a reactive intermediate having at least two free radicals from a precursor having a general formula of Xm—Ar—(CZ′Z″Y)n via a reactor made at least partially of a material M that is reactive with the precursor to produce at least one of MaYb and McXd is disclosed. The method comprises heating the reactor, introducing a flow of precursor into the reactor, contacting the precursor with the material M to form the reactive intermediate and at least one of MaYb and McXd, and reducing MaYb to M and a compound comprising Y and/or reducing McXd to M and a compound comprising X after forming the reactive intermediate and the at least one of MaYb and McXd.

Abstract translation: 一种制备具有至少两个自由基的反应性中间体的方法，所述反应性中间体具有通式X a -Ar-（CZ'Z“Y”）n前体的前体经由 至少部分由材料M制成的反应器，该反应器与前体反应以产生至少一个M a，B和M c， 公开了X 。 该方法包括加热反应器，将前体流引入反应器中，将前体与材料M接触以形成反应性中间体，以及至少一种M a 并且将M和M和包含Y和/或C的化合物还原成M和包含Y和/ 或者在形成反应性中间体之后还原M和包含X的化合物，以及至少一个M a > b＆lt;＆gt;和＆lt;＆lt; C＆gt;＆lt; d＆gt;

公开(公告)号：US20050274322A1

公开(公告)日：2005-12-15

申请号：US11155209

申请日：2005-06-16

Applicant: Chung Lee ,  Atul Kumar ,  Chieh Chen

Inventor： Chung Lee ,  Atul Kumar ,  Chieh Chen

IPC: B01J19/12 ,  B01J19/18 ,  B05D1/00 ,  B05D3/02 ,  B05D3/06 ,  B05D7/24 ,  B29C71/02 ,  C08G61/02 ,  C08J5/18 ,  C08L65/00 ,  C08L65/04 ,  C23C16/452 ,  F28D17/00 ,  H01L21/312 ,  H01L21/768 ,  H01L23/532 ,  C23C16/00

CPC classification number: B01J19/123 ,  B01J19/1887 ,  B01J2219/00153 ,  B01J2219/00159 ,  B01J2219/0879 ,  B05D1/007 ,  B05D1/60 ,  B05D3/0254 ,  B05D3/061 ,  B05D3/062 ,  B29C71/02 ,  B29C2071/022 ,  B29C2071/025 ,  B29C2071/027 ,  C08G61/02 ,  C08G61/025 ,  C08G2261/3424 ,  C08J5/18 ,  C08J2365/04 ,  C08L65/00 ,  C08L65/04 ,  C23C16/452 ,  F28D17/005 ,  H01L21/0212 ,  H01L21/02271 ,  H01L21/312 ,  H01L21/3127 ,  H01L23/53238 ,  H01L23/5329 ,  H01L2924/0002 ,  H01L2924/09701 ,  H01L2924/12044 ,  H01L2924/00

Abstract: A reactor for forming a reactive intermediate for a transport polymerization process is disclosed, wherein the reactor includes an exterior unit having an inlet, an outlet, and an interior disposed between the inlet and the outlet; a heater body located in said interior, wherein the heater body is at least partially conductively insulated from said reactor; an energy source coupled outside said reactor for providing energy to said heater body via radiative heat transfer; and an interior surface located in the interior, wherein the interior surface is at least partially formed from a material M that reacts with at least one of X and Y to remove at least one of X and Y from the precursor thereby forming the reactive intermediate and at least one of a compound MaYb and a compound McXd.

Abstract translation: 公开了一种用于形成用于运输聚合方法的反应性中间体的反应器，其中所述反应器包括具有入口，出口和设置在所述入口和所述出口之间的内部的外部单元; 位于所述内部的加热器主体，其中所述加热器主体至少部分地与所述反应器导电绝缘; 耦合在所述反应器外部的能量源，用于经由辐射热传递向所述加热器主体提供能量; 以及位于所述内部的内表面，其中所述内表面至少部分地由与所述X和Y中的至少一个反应的材料M形成，以从所述前体中除去X和Y中的至少一个，从而形成所述反应性中间体， 化合物M a a B b和化合物M C x D 2中的至少一个。

公开(公告)号：US20080038986A2

公开(公告)日：2008-02-14

申请号：US11239988

申请日：2005-09-30

Applicant: Chung Lee ,  Atul Kumar ,  Chieh Chen ,  George Tzeng

Inventor： Chung Lee ,  Atul Kumar ,  Chieh Chen ,  George Tzeng

IPC: H01J9/26 ,  H01J9/32

CPC classification number: H01L51/5253

Abstract: A method of forming an organic light emitting device on a substrate is provided, wherein the method includes forming an active device structure on the substrate, adhering a mask to the substrate, wherein the mask covers an electrical contact portion of the substrate while exposing the active device structure, forming an encapsulant layer over the active device structure and the mask, forming a separation between a portion of the encapsulant layer that covers the active device structure and a portion of the encapsulant layer that covers the mask, and removing the mask from the substrate.

Abstract translation: 提供一种在衬底上形成有机发光器件的方法，其中该方法包括在衬底上形成有源器件结构，将掩模粘贴到衬底上，其中掩模覆盖衬底的电接触部分，同时暴露活性物质 在活性器件结构和掩模上形成密封剂层，在覆盖有源器件结构的封装剂层的一部分和覆盖掩模的封装剂层的一部分之间形成间隔， 基质。

公开(公告)号：US20060275547A1

公开(公告)日：2006-12-07

申请号：US11421385

申请日：2006-05-31

Applicant: Chung Lee ,  Atul Kumar ,  George Tzeng ,  Oanh Nguyen

Inventor： Chung Lee ,  Atul Kumar ,  George Tzeng ,  Oanh Nguyen

IPC: C23C16/00

CPC classification number: C23C14/50 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/68721 ,  H01L21/68778

Abstract: A system for depositing a vapor phase organic compound onto a substrate, comprising a vacuum chamber comprising a wall, a wall heater in thermal communication with the wall of the vacuum chamber, at least one of an evaporative source and a transport polymerization source configured to introduce the vapor phase organic compound into the chamber, and a substrate holder disposed within the vacuum chamber, wherein the substrate holder comprises a cooled chuck, a heat transfer gas source for introducing a heat transfer gas to a space between the cooled chuck and the substrate, and a substrate clamping mechanism comprising at least one of an electrostatic, mechanical and magnetic clamping mechanism.

Abstract translation: 一种用于将气相有机化合物沉积到基底上的系统，包括真空室，包括壁，与真空室的壁热连通的壁加热器，蒸发源和运输聚合源中的至少一个，其配置成引入 所述气相有机化合物进入所述室，以及衬底保持器，其设置在所述真空室内，其中所述衬底保持器包括冷却的卡盘，用于将传热气体引入所述冷却的卡盘和所述衬底之间的空间的传热气体源， 以及包括静电，机械和磁性夹紧机构中的至少一个的衬底夹持机构。

公开(公告)号：US20060274474A1

公开(公告)日：2006-12-07

申请号：US11421389

申请日：2006-05-31

Applicant: Chung Lee ,  Atul Kumar ,  George Tzeng ,  Oanh Nguyen

Inventor： Chung Lee ,  Atul Kumar ,  George Tzeng ,  Oanh Nguyen

IPC: H01H47/00

CPC classification number: C23C14/12 ,  C23C14/50 ,  C23C14/541 ,  H01L21/67109 ,  H01L21/68721 ,  H01L21/68778

Abstract: A substrate holder for holding and cooling a substrate during a film deposition process is disclosed, wherein the substrate holder comprises a cooled chuck, and a clamping member movably associated with the cooled chuck, wherein the clamping member is movable between an unclamped position in which a substrate is removable from the substrate holder and a clamped position in which a substrate is clamped to the substrate holder substantially adjacent the cooled chuck.

Abstract translation: 公开了一种用于在膜沉积工艺期间保持和冷却衬底的衬底保持器，其中衬底保持器包括冷却的卡盘以及与冷却卡盘可移动地相关联的夹紧构件，其中夹紧构件可在松开位置之间移动， 衬底可从衬底保持器和夹持位置移除，其中衬底被夹持到衬底保持器基本上邻近冷却的卡盘。

公开(公告)号：US20060201426A1

公开(公告)日：2006-09-14

申请号：US11419985

申请日：2006-05-23

Applicant: Chung Lee ,  Atul Kumar ,  Chang Liu ,  Michael Solomensky

Inventor： Chung Lee ,  Atul Kumar ,  Chang Liu ,  Michael Solomensky

IPC: C23C16/00

CPC classification number: F28F1/24 ,  B01J3/006 ,  B01J8/067 ,  B01J19/0066 ,  B01J2219/00038 ,  B01J2219/00132 ,  B01J2219/00135 ,  B01J2219/00153 ,  B01J2219/00768 ,  B01J2219/00772 ,  B01J2219/00777 ,  B05D1/60

Abstract: A reactor system for removing a leaving group from a gas-phase precursor to form a gas-phase radical species for transport polymerization is disclosed, wherein the reactor system comprises a reactor body, a plurality of reactor passages extending at least partially through the reactor body, and a heater body disposed in each reactor passage.

Abstract translation: 公开了一种用于从气相前体除去离去基团以形成用于运输聚合的气相自由基物质的反应器系统，其中反应器系统包括反应器主体，多个反应器通道至少部分延伸穿过反应器主体 和设置在每个反应器通道中的加热器主体。

公开(公告)号：US20050223989A1

公开(公告)日：2005-10-13

申请号：US10816179

申请日：2004-03-31

Applicant: Chung Lee ,  Atul Kumar ,  Chieh Chen ,  Yuri Pikovsky

Inventor： Chung Lee ,  Atul Kumar ,  Chieh Chen ,  Yuri Pikovsky

IPC: B05D1/18 ,  B05D3/06 ,  B05D7/00 ,  B05D7/24 ,  C23C16/00 ,  H01L21/312

CPC classification number: H01L21/0212 ,  B05D1/185 ,  B05D1/60 ,  B05D3/065 ,  B05D3/067 ,  B05D7/52 ,  H01L21/02263 ,  H01L21/02304 ,  H01L21/02337 ,  H01L21/02362 ,  H01L21/3121 ,  H01L21/3127

Abstract: A system for depositing a composite polymer dielectric film on a substrate is disclosed, wherein the composite polymer dielectric film includes a low dielectric constant polymer layer disposed between a first silane-containing layer and a second silane-containing layer. The system includes a process module having a processing chamber and a monomer delivery system configured to admit a gas-phase monomer into the processing chamber for deposition of the low dielectric constant polymer layer, a post-treatment module for annealing the composite polymer dielectric film, and a silane delivery system configured to admit a vapor flow containing a silane precursor into at least one of the process module and the post-treatment module for the formation of the first silane-containing layer and the silane-containing layer.

Abstract translation: 公开了一种用于在基板上沉积复合聚合物电介质膜的系统，其中复合聚合物电介质膜包括设置在第一含硅烷层和第二含硅烷层之间的低介电常数聚合物层。 该系统包括具有处理室和单体输送系统的处理模块，该单体输送系统构造成将气相单体进入处理室以沉积低介电常数聚合物层，用于退火复合聚合物电介质膜的后处理模块， 以及硅烷输送系统，其被构造成允许含有硅烷前体的蒸汽流进入至少一个工艺模块和后处理模块中，用于形成第一含硅烷层和含硅烷层。

公开(公告)号：US20050146267A1

公开(公告)日：2005-07-07

申请号：US11009285

申请日：2004-12-08

Applicant: Chung Lee ,  Chieh Chen ,  Atul Kumar

Inventor： Chung Lee ,  Chieh Chen ,  Atul Kumar

IPC: B05D3/02 ,  B05D7/24 ,  B29C71/02 ,  C08G61/02 ,  C08J5/18 ,  H01L21/312 ,  H05B33/00

CPC classification number: B05D1/60 ,  B05D3/0254 ,  B29C71/02 ,  B29C2071/022 ,  B29C2071/025 ,  B29C2071/027 ,  C08G61/02 ,  C08G61/025 ,  C08G2261/3424 ,  C08J5/18 ,  H01L21/0212 ,  H01L21/02271 ,  H01L21/31058 ,  H01L21/3127 ,  Y10T428/269 ,  Y10T428/3154 ,  Y10T428/31544 ,  Y10T428/31855

Abstract: A method of forming a protective barrier in an organic light emitting device is disclosed, wherein the organic light emitting device is formed on a substrate and includes a plurality of layers of materials, the plurality of layers of materials including an organic light emitting layer. The method includes forming an inorganic layer and a semi-crystalline parylene-based polymer layer over an underlying layer, wherein the semi-crystalline parylene-based polymer layer is formed via transport polymerization of a reactive intermediate species. Organic light emitting devices having barriers are also disclosed.

Abstract translation: 公开了一种在有机发光器件中形成保护屏障的方法，其中所述有机发光器件形成在衬底上，并且包括多层材料，所述多层材料包括有机发光层。 该方法包括在下层上形成无机层和半结晶聚对二甲苯基聚合物层，其中半结晶聚对二甲苯基聚合物层通过反应性中间体物质的转运聚合形成。 还公开了具有屏障的有机发光器件。