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    MAGNETIC WRITE POLE FABRICATION
    15.
    发明申请
    MAGNETIC WRITE POLE FABRICATION 有权
    磁性写字槽制造

    公开(公告)号：US20090154015A1

    公开(公告)日：2009-06-18

    申请号：US11957481

    申请日：2007-12-16

    申请人： Amanda Baer ,  Jeffrey S. Lille ,  Aron Pentek

    发明人： Amanda Baer ,  Jeffrey S. Lille ,  Aron Pentek

    IPC分类号： G11B5/127

    CPC分类号： G11B5/3116 ,  G11B5/1278 ,  G11B5/3163 ,  Y10T29/49032 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

    摘要： Write elements and methods of fabricating magnetic write poles are described. For one method, a vertical mask structure is formed on a magnetic layer in locations of a pole tip and a yoke of a write pole. The vertical mask structure may be formed by coating vertical surfaces of resists with an atomic layer deposition (ALD) process or a similar process. A removal process is then performed around the vertical mask structure to define the pole tip and part of the yoke of the write pole, and the vertical mask structure is removed. A lower portion of the pole tip is them masked while the upper portion of the pole tip and the part of the yoke is exposed. The upper portion of the pole tip and the part of the yoke are then expanded with magnetic material, such as with a plating process.

    摘要翻译： 描述制造磁性写入极的写入元件和方法。 对于一种方法，在写入极的极尖和磁轭的位置的磁性层上形成垂直掩模结构。 垂直掩模结构可以通过用原子层沉积（ALD）工艺或类似工艺涂覆抗蚀剂的垂直表面而形成。 然后围绕垂直掩模结构执行去除处理以限定磁极尖端和写极的磁轭的一部分，并且去除垂直掩模结构。 极尖的下部被掩蔽，而极尖的上部和轭的一部分露出。 然后用磁性材料例如电镀工艺使磁极尖端的上部和磁轭的一部分膨胀。

    OPTICAL LAPPING GUIDE FOR USE IN THE MANUFACTURE OF PERPENDICULAR MAGNETIC WRITE HEADS
    16.
    发明申请
    OPTICAL LAPPING GUIDE FOR USE IN THE MANUFACTURE OF PERPENDICULAR MAGNETIC WRITE HEADS 失效
    光学写入头制造中使用的光学引导指南

    公开(公告)号：US20080141522A1

    公开(公告)日：2008-06-19

    申请号：US11611829

    申请日：2006-12-15

    申请人： Amanda Baer ,  Vladimir Nikitin ,  Aron Pentek ,  Neil Leslie Robertson

    发明人： Amanda Baer ,  Vladimir Nikitin ,  Aron Pentek ,  Neil Leslie Robertson

    IPC分类号： G11B5/127 ,  B05D5/12 ,  H04R31/00

    CPC分类号： G11B5/3166 ,  G11B5/102 ,  G11B5/1278 ,  G11B5/3146 ,  G11B5/3169 ,  G11B5/3173 ,  Y10T29/49032 ,  Y10T29/49041 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

    摘要： An optical lapping guide for determining an amount of lapping performed on a row of sliders in a process for manufacturing sliders for magnetic data recording. The optical lapping guide is constructed with a front edge that is at an angle with respect to an air bearing surface plane ABS plane, such that a portion of the lapping guides is in front of the ABS and portion of the lapping guide is behind the ABS. As lapping progresses, an increasing amount of the lapping guide will be exposed at the ABS and visible for inspection. Therefore, after a lapping process has been performed, the optical lapping guide can be inspected to determine the amount of material removed by lapping. The greater the amount of the lapping guide that is exposed and visible, the greater the amount of material removed by lapping.

    摘要翻译： 光学研磨引导件，用于确定在用于制造用于磁数据记录的滑块的过程中对一排滑块执行的研磨量。 光学研磨引导件的前边缘相对于空气轴承表面平面ABS平面成一定角度，使得研磨导轨的一部分在ABS的前面，研磨导轨的一部分在ABS后面 。 随着研磨的进行，越来越多的研磨导轨将暴露在ABS处并可见以供检查。 因此，在进行研磨处理之后，可以检查光学研磨导向件以确定通过研磨去除的材料的量。 暴露和可见的研磨导轨的量越大，通过研磨去除的材料量就越大。

    Optical lapping guide for use in the manufacture of perpendicular magnetic write heads
    17.
    发明授权
    Optical lapping guide for use in the manufacture of perpendicular magnetic write heads 失效
    用于制造垂直磁性写入头的光学研磨导轨

    公开(公告)号：US07603762B2

    公开(公告)日：2009-10-20

    申请号：US11611829

    申请日：2006-12-15

    申请人： Amanda Baer ,  Vladimir Nikitin ,  Aron Pentek ,  Neil Leslie Robertson

    发明人： Amanda Baer ,  Vladimir Nikitin ,  Aron Pentek ,  Neil Leslie Robertson

    IPC分类号： B24B49/00 ,  B24B49/10

    CPC分类号： G11B5/3166 ,  G11B5/102 ,  G11B5/1278 ,  G11B5/3146 ,  G11B5/3169 ,  G11B5/3173 ,  Y10T29/49032 ,  Y10T29/49041 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

    摘要： An optical lapping guide for determining an amount of lapping performed on a row of sliders in a process for manufacturing sliders for magnetic data recording. The optical lapping guide is constructed with a front edge that is at an angle with respect to an air bearing surface plane ABS plane, such that a portion of the lapping guides is in front of the ABS and portion of the lapping guide is behind the ABS. As lapping progresses, an increasing amount of the lapping guide will be exposed at the ABS and visible for inspection. Therefore, after a lapping process has been performed, the optical lapping guide can be inspected to determine the amount of material removed by lapping. The greater the amount of the lapping guide that is exposed and visible, the greater the amount of material removed by lapping.

    摘要翻译： 光学研磨引导件，用于确定在用于制造用于磁数据记录的滑块的过程中对一排滑块执行的研磨量。 光学研磨引导件的前边缘相对于空气轴承表面平面ABS平面成一定角度，使得研磨导轨的一部分在ABS的前面，研磨导轨的一部分在ABS后面 。 随着研磨的进行，越来越多的研磨导轨将暴露在ABS处并可见以供检查。 因此，在进行研磨处理之后，可以检查光学研磨导向件以确定通过研磨去除的材料的量。 暴露和可见的研磨导轨的量越大，通过研磨去除的材料量就越大。

    Method for fabricating a side shield for a flux guide layer for perpendicular magnetic recording
    18.
    发明授权
    Method for fabricating a side shield for a flux guide layer for perpendicular magnetic recording 失效
    用于制造用于垂直磁记录的磁通引​​导层的侧屏蔽的方法

    公开(公告)号：US07515381B2

    公开(公告)日：2009-04-07

    申请号：US11317917

    申请日：2005-12-22

    申请人： Amanda Baer ,  Daniel Wayne Bedell ,  Quang Le ,  Aron Pentek

    发明人： Amanda Baer ,  Daniel Wayne Bedell ,  Quang Le ,  Aron Pentek

    IPC分类号： G11B5/147 ,  G11B5/187

    CPC分类号： G11B5/3116 ,  G11B5/112 ,  G11B5/1278 ,  G11B5/3146 ,  G11B5/3163

    摘要： A magnetic head for use in a perpendicular recording system having a novel shield structure that provides exceptional magnetic shielding from extraneous magnetic fields such as from a write coil, shaping layer or return pole of the write head. The shield structure is constructed to have a bottom or leading surface that is generally coplanar with the bottom or leading surface of the shaping layer, but all or a portion of the shield structure is not as thick as the shaping layer so as to have a top surface that does not extend to the same elevation (in a trailing direction) as that of the shaping layer. Making the shields extend to a lower level than the shaping layer improves magnetic performance by reducing flux leakage from the write pole, and also provides manufacturing advantages, such as during the manufacturing of the write pole. These manufacturing advantages include the advantage of having the shields covered with a protective layer of, for example, alumina during the ion milling of the write pole.

    摘要翻译： 一种用于垂直记录系统的磁头，其具有新的屏蔽结构，其提供例如来自写入磁头的写入线圈，成形层或返回磁极的外部磁场的卓越的磁屏蔽。 屏蔽结构被构造成具有与成形层的底部或前表面大致共面的底部或前表面，但是屏蔽结构的全部或一部分不像成形层那样厚，以便具有顶部 表面不延伸到与成形层相同的高度（在拖尾方向上）。 使屏蔽层延伸到比成形层更低的水平，通过减小来自写入极的磁通泄漏来提高磁性能，并且还提供制造优点，例如在写入磁极的制造期间。 这些制造优点包括在写入极的离子铣削期间使屏蔽覆盖有例如氧化铝的保护层的优点。

    Process to open connection vias on a planarized surface
    19.
    发明申请
    Process to open connection vias on a planarized surface 有权
    在平坦化表面上打开连接通孔的过程

    公开(公告)号：US20070245557A1

    公开(公告)日：2007-10-25

    申请号：US11411555

    申请日：2006-04-25

    申请人： Amanda Baer ,  Hamid Balamane ,  Michael Feldbaum ,  Ming Jiang ,  Aron Pentek

    发明人： Amanda Baer ,  Hamid Balamane ,  Michael Feldbaum ,  Ming Jiang ,  Aron Pentek

    IPC分类号： H01K3/10

    CPC分类号： G11B5/3163 ,  G11B5/1278 ,  G11B5/3116 ,  Y10T29/49021 ,  Y10T29/49032 ,  Y10T29/49044 ,  Y10T29/49126 ,  Y10T29/49139 ,  Y10T29/49153 ,  Y10T29/49155 ,  Y10T29/49165 ,  Y10T29/49169

    摘要： A method for forming a via in an alumina protective layer on a structure such as a magnetic write head for use in perpendicular magnetic recording. A substrate such as an alumina fill layer, magnetic shaping layer, etc. is formed with region having a contact pad formed therein. A structure such as a magnetic pole, and or magnetic trailing shield, is formed over the substrate and is covered with a thick layer of alumina. The alumina can be applied by a high deposition rate process that does not form voids or seams in the alumina layer. The alumina layer can then be planarized by a chemical mechanical polishing process (CMP) and then a mask structure, such as a photoresist mask, is formed over the alumina layer. The mask structure is formed with an opening disposed over the contact pad. A reactive ion mill is then performed to remove portions of the alumina layer that are exposed at the opening in the mask, thereby forming a via in the alumina layer. The mask can then be lifted off and an electrically conductive material can be deposited into the via. Forming the via by a subtractive method rather than by a liftoff process allows the alumina to be deposited in a manner that does not result in voids. The use of reactive ion milling allows the via to be well defined and formed with substantially vertical side walls rather than in a conical or outward spreading fashion as would be formed by other material removal processes such as wet etching.

    摘要翻译： 在用于垂直磁记录的诸如磁写头的结构上的氧化铝保护层中形成通孔的方法。 在其中形成有形成有接触垫的区域形成诸如氧化铝填充层，磁性成形层等的基板。 诸如磁极和/或磁性后屏蔽的结构形成在衬底之上，并被厚层氧化铝覆盖。 可以通过在氧化铝层中不形成空隙或接缝的高沉积速率工艺来施加氧化铝。 然后可以通过化学机械抛光工艺（CMP）将氧化铝层平坦化，然后在氧化铝层上形成诸如光致抗蚀剂掩模的掩模结构。 掩模结构形成有设置在接触垫上方的开口。 然后执行反应离子研磨机以除去在掩模中的开口处暴露的部分氧化铝层，从而在氧化铝层中形成通孔。 然后可以将掩模剥离，并且可以将导电材料沉积到通孔中。 通过减法法而不是通过剥离工艺形成通孔允许以不会导致空隙的方式沉积氧化铝。 使用反应离子研磨允许通孔被良好地限定并且形成有基本垂直的侧壁，而不是以其它材料去除工艺（例如湿蚀刻）形成的锥形或向外扩展方式。