公开(公告)号：US20140097341A1

公开(公告)日：2014-04-10

申请号：US13975809

申请日：2013-08-26

Applicant: FEI Company

Inventor： Lubomír Tuma ,  Petr Hlavenka ,  Petr Sytar ,  Radek Ceska ,  Bohuslav Sed'a

IPC: H01J37/244 ,  H01J37/26

CPC classification number: H01J37/26 ,  H01J37/145 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/04926 ,  H01J2237/2443 ,  H01J2237/24465

Abstract: The invention relates to an in-column back-scattered electron detector, the detector placed in a combined electrostatic/magnetic objective lens for a SEM. The detector is formed as a charged particle sensitive surface, preferably a scintillator disk that acts as one of the electrode faces forming the electrostatic focusing field. The photons generated in the scintillator are detected by a photon detector, such as a photo-diode or a multi-pixel photon detector. The objective lens may be equipped with another electron detector for detecting secondary electrons that are kept closer to the axis. A light guide may be used to offer electrical insulation between the photon detector and the scintillator.

Abstract translation: 本发明涉及一种柱内反向散射电子检测器，该探测器放置在用于SEM的组合静电/磁性物镜中。 检测器形成为带电粒子敏感表面，优选地形成作为形成静电聚焦场的电极面之一的闪烁体盘。 在闪烁体中产生的光子被光子检测器（例如光电二极管或多像素光子检测器）检测。 物镜可以配备有用于检测保持靠近轴线的二次电子的另一电子检测器。 可以使用光导来在光子检测器和闪烁体之间提供电绝缘。

公开(公告)号：US20210296088A1

公开(公告)日：2021-09-23

申请号：US17191022

申请日：2021-03-03

Applicant: FEI Company

Inventor： Pavel Stejskal ,  Bohuslav Sed'a ,  Petr Hlavenka ,  Libor Novák ,  Jan Stopka

IPC: H01J37/28 ,  H01J37/20 ,  H01J37/244 ,  H01J37/26

Abstract: The invention relates to system and method of inspecting a specimen with a plurality of charged particle beamlets. The method comprises the steps of providing a specimen, providing a plurality of charged particle beamlets and focusing said plurality of charged particle beamlets onto said specimen, and detecting a flux of radiation emanating from the specimen in response to said irradiation by said plurality of charged particle beamlets.

公开(公告)号：US20200312610A1

公开(公告)日：2020-10-01

申请号：US16825827

申请日：2020-03-20

Applicant: FEI Company

Inventor： Petr Hlavenka ,  Bohuslav Sed'a

IPC: H01J37/244 ,  H01J37/20 ,  H01J37/28 ,  H01J37/147

Abstract: The invention relates to a charged particle beam device for inspection of a specimen with a plurality of charged particle beamlets. The charged particle beam device comprises a specimen holder for holding a specimen, a source for producing a beam of charged particles, and an illuminator for converting said beam of charged particles into a plurality of charged particle beamlets and focusing said plurality of charged particle beamlets onto said specimen. Furthermore, a detector assembly for detecting a flux of radiation emanating from the specimen in response to said irradiation by said plurality of charged particle beamlets is provided. As defined herein, the charged particle beam device is arranged for directing said plurality of charged particle beamlets onto said specimen in an essentially 1D pattern, wherein said essentially 1D pattern forms part of an edge of an essentially 2D geometric shape. Furthermore, the detector assembly comprises a plurality of detector units arranged in a corresponding essentially 1D pattern.

公开(公告)号：US10790113B2

公开(公告)日：2020-09-29

申请号：US16451319

申请日：2019-06-25

Applicant: FEI Company

Inventor： Bohuslav Sed'a ,  Ali Mohammadi-Gheidari ,  Marek Un{hacek over (c)}ovský

IPC: H01J37/09 ,  H01J37/10 ,  H01J37/147 ,  H01J37/20 ,  H01J37/04

Abstract: A charged particle imaging apparatus comprising: A specimen holder, for holding a specimen; A particle-optical column, for: Producing a plurality of charged particle beams, by directing a progenitor charged particle beam onto an aperture plate having a corresponding plurality of apertures within a footprint of the progenitor beam; Directing said beams toward said specimen, wherein: Said aperture plate comprises a plurality of different zones, which comprise mutually different aperture patterns, arranged within said progenitor beam footprint; The particle-optical column comprises a selector device, located downstream of said aperture plate, for selecting a beam array from a chosen one of said zones to be directed onto the specimen.

公开(公告)号：US20200013581A1

公开(公告)日：2020-01-09

申请号：US16119017

申请日：2018-08-31

Applicant: FEI Company

Inventor： Tomá{hacek over (s)} Vystavel ,  Bohuslav Sed'a ,  Anna Prokhodtseva

IPC: H01J37/22 ,  H01J37/20 ,  H01J37/244 ,  H01J37/06 ,  H01J37/28

Abstract: The invention relates to a method 3D defect characterization of crystalline samples in a scanning type electron microscope. The method comprises Irradiating a sample provided on a stage, selecting one set of crystal lattice planes of the sample and orienting said set to a first Bragg condition with respect to a primary electron beam impinging on said sample, and obtaining Electron Channeling Contrast Image for an area of interest on the sample. The method is characterized by performing, at least once, the steps of orienting said selected set of crystal lattice planes to a further Bragg condition by at least tilting the sample stage with the sample by a user-selected angle about a first tilt axis, and obtaining by Electron Channeling Contrast Image for a further area of interest.

公开(公告)号：US09741525B1

公开(公告)日：2017-08-22

申请号：US15218643

申请日：2016-07-25

Applicant: FEI Company

Inventor： Bohuslav Sed'a ,  Lubomir Tuma ,  Alexander Henstra

IPC: H01J37/12 ,  H01J37/28 ,  H01J37/20 ,  H01J37/153 ,  H01J37/26 ,  H01J37/09

CPC classification number: H01J37/153 ,  H01J37/05 ,  H01J37/09 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/0451 ,  H01J2237/0453 ,  H01J2237/1532 ,  H01J2237/2826

Abstract: A method of producing a corrected beam of charged particles for use in a charged-particle microscope, comprising the following steps: Providing a non-monoenergetic input beam of charged particles; Passing said input beam through an optical module comprising a series arrangement of: A stigmator, thereby producing an astigmatism-compensated, energy-dispersed intermediate beam with a particular monoenergetic line focus direction; A beam selector, comprising a slit that is rotationally oriented so as to match a direction of the slit to said line focus direction, thereby producing an output beam comprising an energy-discriminated portion of said intermediate beam.

公开(公告)号：US20170221673A1

公开(公告)日：2017-08-03

申请号：US15218643

申请日：2016-07-25

Applicant: FEI Company

Inventor： Bohuslav Sed'a ,  Lubomir Tuma ,  Alexander Henstra

IPC: H01J37/153 ,  H01J37/09 ,  H01J37/26

CPC classification number: H01J37/153 ,  H01J37/05 ,  H01J37/09 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/0451 ,  H01J2237/0453 ,  H01J2237/1532 ,  H01J2237/2826

Abstract: A method of producing a corrected beam of charged particles for use in a charged-particle microscope, comprising the following steps: Providing a non-monoenergetic input beam of charged particles; Passing said input beam through an optical module comprising a series arrangement of: A stigmator, thereby producing an astigmatism-compensated, energy-dispersed intermediate beam with a particular monoenergetic line focus direction; A beam selector, comprising a slit that is rotationally oriented so as to match a direction of the slit to said line focus direction, thereby producing an output beam comprising an energy-discriminated portion of said intermediate beam.

公开(公告)号：US20140361165A1

公开(公告)日：2014-12-11

申请号：US14294772

申请日：2014-06-03

Applicant: FEI Company

Inventor： Bohuslav Sed'a ,  Lubomír Tùma ,  Petr Hlavenka ,  Petr Sytar

IPC: H01J37/28 ,  H01J37/20 ,  H01J37/12

CPC classification number: H01J37/12 ,  H01J37/09 ,  H01J37/3005 ,  H01J2237/12 ,  H01J2237/20207

Abstract: The invention relates to a dual beam apparatus equipped with an ion beam column and an electron beam column having an electrostatic immersion lens. When tilting the sample, the electrostatic immersion field is distorted and the symmetry round the electron optical axis is lost. As a consequence tilting introduces detrimental effects such as traverse chromatic aberration and beam displacement. Also in-column detectors, detecting either secondary electrons or backscattered electrons in the non-tilted position of the sample, will, due to the loss of the symmetry of the immersion field, show a mix of these electrons when tilting the sample.The invention shows how, by biasing the stage with respect to the grounded electrodes closest to the sample, these disadvantages are eliminated, or at least reduced.

Abstract translation: 本发明涉及一种配备有离子束柱和具有静电浸没透镜的电子束柱的双光束装置。 当倾斜样品时，静电浸没场失真，并且电子光轴周围的对称性丧失。 因此，倾斜引入有害影响，例如横向色差和光束位移。 在样品的非倾斜位置检测二次电子或后向散射电子的柱内检测器也将由于浸没场的对称性的损失而在倾斜样品时显示这些电子的混合物。 本发明示出了如何通过相对于最接近样品的接地电极偏置级来消除或至少减少这些缺点。