公开(公告)号：US20150140482A1

公开(公告)日：2015-05-21

申请号：US14606161

申请日：2015-01-27

Applicant: FUJIFILM Corporation

Inventor： Tsukasa YAMANAKA ,  Naoya IGUCHI ,  Ryosuke UEBA ,  Kei YAMAMOTO

IPC: G03F7/20

CPC classification number: G03F7/2022 ,  G03F7/0035 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/70466

Abstract: A pattern forming method includes: (a) forming a first film on a substrate using an actinic ray-sensitive or radiation-sensitive resin composition (I) containing a resin of which solubility in a developer containing an organic solvent decreases due to polarity increased by an action of an acid; (b) exposing the first film; (c) developing the exposed first film using a developer containing an organic solvent to form a first negative pattern; (e) forming a second film on the substrate using an actinic ray-sensitive or radiation-sensitive resin composition (II) containing a resin of which solubility in a developer containing an organic solvent decreases due to polarity increased by an action of an acid; (f) exposing the second film; and (g) developing the exposed second film using a developer containing an organic solvent to form a second negative pattern in this order.

Abstract translation: 图案形成方法包括：（a）使用光化射线敏感性或辐射敏感性树脂组合物（I）在基材上形成第一膜，所述树脂组合物（I）含有在含有有机溶剂的显影剂中的溶解度由于极性增加而降低 酸的作用 （b）曝光第一片; （c）使用包含有机溶剂的显影剂显影所述暴露的第一膜以形成第一负图案; （e）使用包含其中含有有机溶剂的显影剂中的溶解度由于酸的作用引起极性增加的树脂的光化射线敏感性或辐射敏感性树脂组合物（II）在基材上形成第二膜; （f）使第二膜曝光; 和（g）使用包含有机溶剂的显影剂显影所暴露的第二膜，以依次形成第二负图案。

公开(公告)号：US20140242505A1

公开(公告)日：2014-08-28

申请号：US14272034

申请日：2014-05-07

Applicant: FUJIFILM Corporation

Inventor： Shuhei YAMAGUCHI ,  Hidenori TAKAHASHI ,  Kei YAMAMOTO ,  Fumihiro YOSHINO

IPC: G03F7/038

CPC classification number: G03F7/038 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325

Abstract: A pattern forming method including: (i) a process of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition containing a Resin (P) including a non-acid-decomposable Repeating Unit (b1) represented by a following General Formula (b1) and a repeating unit including a group capable of being decomposed by acid and generating a polar group, and a Compound (B) capable of generating an acid through irradiation of actinic rays or irradiation; (ii) a process of exposing the film using actinic rays or radiation with a wavelength of equal to or less than 200 nm; and (iii) a process of developing the exposed film using a developer including an organic solvent containing a hetero atom and carbon atoms having 7 or more carbon atoms to forming a negative tone pattern.

Abstract translation: 一种图案形成方法，包括：（i）使用含有由以下通式表示的非酸可分解重复单元（b1）的树脂（P）的光化射线敏感性或辐射敏感性树脂组合物形成膜的方法 式（b1）和包含能够被酸分解并产生极性基团的基团的重复单元和能够通过光化射线照射或照射而产生酸的化合物（B）; （ii）使用光化射线或波长等于或小于200nm的辐射使膜曝光的方法; 和（iii）使用包含含有杂原子的有机溶剂和具有7个或更多个碳原子的碳原子的显影剂显影曝光的膜以形成负色调图案的方法。

公开(公告)号：US20240231235A1

公开(公告)日：2024-07-11

申请号：US18610588

申请日：2024-03-20

Applicant: FUJIFILM Corporation

Inventor： Kei YAMAMOTO ,  Naohiro TANGO ,  Michihiro SHIRAKAWA

IPC: G03F7/30 ,  G03F7/32

CPC classification number: G03F7/3028 ,  G03F7/325

Abstract: Provided are a method for testing a photosensitive composition and a method for producing a photosensitive composition that can easily test whether or not the photosensitive composition exhibits a predetermined LWR. A method for testing a photosensitive composition according to the present invention has a step 1 of using a reference photosensitive composition to form a resist film, bringing the resist film into contact with a treatment liquid, and measuring a dissolution rate of the resist film to obtain reference data; a step 2 of using a photosensitive composition for measurement to form a resist film, bringing the resist film into contact with a treatment liquid, and measuring a dissolution rate of the resist film to obtain measurement data; and a step 3 of performing comparison between the reference data and the measurement data to determine whether or not an allowable range is satisfied, wherein the treatment liquid includes an organic solvent and a metal X, the organic solvent does not include an aromatic hydrocarbon and includes an aliphatic hydrocarbon, and a mass ratio of a content of the aromatic hydrocarbon to a content of the metal X is 5.0×102 to 5.0×1012.

公开(公告)号：US20210011378A1

公开(公告)日：2021-01-14

申请号：US17031067

申请日：2020-09-24

Applicant: FUJIFILM Corporation

Inventor： Kei YAMAMOTO ,  Yasufumi OISHI ,  Noahiro TANGO ,  Hidenori TAKAHASHI

IPC: G03F7/027 ,  G03F7/004 ,  C08L33/06 ,  C08L33/14

Abstract: A photosensitive resin composition including an ethylenically unsaturated compound, a resin having a polarity that increases by the action of an acid, and metal atoms, in which a total content of the metal atoms is from 1 ppt to 30 ppb with respect to a total mass of the photosensitive resin composition, and a content of the ethylenically unsaturated compound is from 0.0001% by mass to 1% by mass with respect to the total mass of the photosensitive resin composition, and a method for producing the same; and a resist film, a pattern forming method, and a method for manufacturing an electronic device, each of which uses the photosensitive resin composition.

公开(公告)号：US20180181003A1

公开(公告)日：2018-06-28

申请号：US15904438

申请日：2018-02-26

Applicant: FUJIFILM Corporation

Inventor： Wataru NIHASHI ,  Hideaki TSUBAKI ,  Toru TSUCHIHASHI ,  Kei YAMAMOTO

IPC: G03F7/11 ,  G03F7/20 ,  G03F7/32 ,  G03F7/38

Abstract: The pattern forming method includes forming an actinic ray-sensitive or radiation-sensitive film using an actinic ray-sensitive or radiation-sensitive composition, forming an upper layer film on the actinic ray-sensitive or radiation-sensitive film using a composition for forming an upper layer film, exposing the actinic ray-sensitive or radiation-sensitive film having the upper layer film formed thereon, and developing the exposed actinic ray-sensitive or radiation-sensitive film using a developer, in which the composition for forming an upper layer film includes a solvent and a crosslinking agent; and in which the content of a solvent having a hydroxyl group is 80% by mass or less with respect to all the solvents included in the composition for forming an upper layer film. The method for manufacturing an electronic device includes the pattern forming method. The laminate has an actinic ray-sensitive or radiation-sensitive film, and an upper layer film including a crosslinking agent.

公开(公告)号：US20180081277A1

公开(公告)日：2018-03-22

申请号：US15823593

申请日：2017-11-28

Applicant: FUJIFILM Corporation

Inventor： Naoki INOUE ,  Naohiro TANGO ,  Kei YAMAMOTO ,  Michihiro SHIRAKAWA ,  Akiyoshi GOTO

IPC: G03F7/32 ,  G03F7/11

CPC classification number: G03F7/32 ,  G03F7/091 ,  G03F7/11 ,  G03F7/325

Abstract: Provided are a pattern forming method including a step of applying a composition for forming an upper layer film, containing a resin having a C log P(Poly) of 3.0 or more and at least one compound selected from the group consisting of (A1) to (A4) described in the specification onto a resist film to form an upper layer film, a step of exposing the resist film, and a step of developing the exposed resist film with a developer including an organic solvent; a resist pattern formed by the pattern forming method; a method for manufacturing an electronic device, including the pattern forming method; and the composition for forming an upper layer film.

公开(公告)号：US20170184970A1

公开(公告)日：2017-06-29

申请号：US15461586

申请日：2017-03-17

Applicant: FUJIFILM Corporation

Inventor： Akiyoshi GOTO ,  Naoki INOUE ,  Kei YAMAMOTO ,  Naohiro TANGO ,  Michihiro SHIRAKAWA

IPC: G03F7/11 ,  C09D133/14 ,  C08F220/18 ,  C08F220/28 ,  G03F7/40 ,  G03F7/09 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38 ,  G03F7/32 ,  C09D133/08 ,  G03F7/004

Abstract: Provided are a pattern forming method capable of providing good DOF, EL, and watermark defect performance, a resist pattern formed by the pattern forming method, a composition for forming an upper layer film, used in the pattern forming method, and a method for manufacturing an electronic device, including the pattern forming method. The pattern forming method includes a step a of coating an active-light-sensitive or radiation-sensitive resin composition onto a substrate to forming a resist film, a step b of coating a composition for forming an upper layer film onto the resist film to form an upper layer film on the resist film, a step c of exposing the resist film having the upper layer film formed thereon, and a step d of developing the exposed resist film using a developer including an organic solvent to form a pattern, in which a receding contact angle of water on a surface of the upper layer film is 80° or more.

公开(公告)号：US20170176862A1

公开(公告)日：2017-06-22

申请号：US15446695

申请日：2017-03-01

Applicant: FUJIFILM Corporation

Inventor： Naoki INOUE ,  Naohiro TANGO ,  Kei YAMAMOTO ,  Michihiro SHIRAKAWA ,  Akiyoshi GOTO

IPC: G03F7/11 ,  G03F7/16 ,  G03F7/09 ,  G03F7/039 ,  G03F7/38 ,  G03F7/32 ,  G03F7/40 ,  G03F7/038 ,  C09D133/08 ,  G03F7/20

CPC classification number: G03F7/11 ,  C08F2/48 ,  C08F220/18 ,  C09D133/08 ,  C09D133/10 ,  G03F7/038 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/091 ,  G03F7/16 ,  G03F7/168 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/327 ,  G03F7/38 ,  G03F7/40 ,  C08F2220/283 ,  C08F2220/1875 ,  C08F2220/185

Abstract: A pattern forming method includes coating an actinic ray-sensitive or radiation-sensitive resin composition onto a substrate to form an actinic ray-sensitive or radiation-sensitive film, coating a composition for forming a protective film onto the actinic ray-sensitive or radiation-sensitive film to form a protective film, exposing the actinic ray-sensitive or radiation-sensitive film covered with the protective film, and developing the exposed actinic ray-sensitive or radiation-sensitive film using a developer containing an organic solvent, in which the protective film contains a compound (A) including at least one group or bond selected from the group consisting of an ether bond, a thioether bond, a hydroxyl group, a thiol group, a carbonyl bond, and an ester bond, and a resin (X).

公开(公告)号：US20170038685A1

公开(公告)日：2017-02-09

申请号：US15291538

申请日：2016-10-12

Applicant: FUJIFILM Corporation

Inventor： Akiyoshi GOTO ,  Michihiro SHIRAKAWA ,  Keita KATO ,  Fumihiro YOSHINO ,  Kei YAMAMOTO

IPC: G03F7/039 ,  G03F7/16 ,  G03F7/40 ,  G03F7/38 ,  G03F7/32 ,  G03F7/004 ,  G03F7/20

CPC classification number: G03F7/0397 ,  C07C309/06 ,  C07C381/12 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/16 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/38 ,  G03F7/40 ,  H01L21/0274

Abstract: An active-light-sensitive or radiation-sensitive resin composition includes a resin (A) and a photoacid generator (B) capable of generating an acid upon irradiation with active light or radiation, in which the active-light-sensitive or radiation-sensitive resin composition contains at least a photoacid generator (B1) represented by the following General Formula (1) and a photoacid generator (B2) other than the photoacid generator (B1) as the photoacid generator (B).

Abstract translation: 本发明提供一种活性光敏或辐射敏感性树脂组合物，其包含当用活性光或辐射照射时产生酸的树脂（A）和光酸产生剂（B）。 光致酸产生剂（B）至少含有与光酸产生剂（B1）不同的由式（1）表示的光致酸产生剂（B1）和光酸产生剂（B2）。

公开(公告)号：US20140349225A1

公开(公告)日：2014-11-27

申请号：US14456309

申请日：2014-08-11

Applicant: FUJIFILM Corporation

Inventor： Kei YAMAMOTO ,  Hidenori TAKAHASHI ,  Shuhei YAMAGUCHI ,  Junichi ITO

IPC: G03F7/038 ,  G03F7/20

CPC classification number: G03F7/0388 ,  G03F7/0048 ,  G03F7/038 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/40

Abstract: There is provided a pattern forming method, including: (a) forming a film by an actinic ray-sensitive or radiation-sensitive resin composition containing: (A) a resin capable of increasing polarity by an action of an acid to decrease solubility in an organic solvent-containing developer, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a solvent, and (D) a resin, which contains substantially no fluorine atom and silicon atom and is other than the resin (A), (b) exposing the film; and (c) performing development using the organic solvent-containing developer to form a negative type pattern, wherein a receding contact angle of water on the film formed by (a) is 70° or more.

Abstract translation: 提供了一种图案形成方法，其包括：（a）通过光化射线敏感或辐射敏感性树脂组合物形成膜，所述树脂组合物包含：（A）能够通过酸的作用增加极性的树脂，以降低溶解度 含有有机溶剂的显影剂，（B）能够以光化射线或辐射照射后能够产生酸的化合物，（C）溶剂，（D）基本上不含氟原子和硅原子的树脂， 比树脂（A），（b）曝光该膜; 和（c）使用含有机溶剂的显影剂进行显影以形成负型图案，其中由（a）形成的膜上的水的后退接触角为70°以上。