中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

22 records (took 0.032 seconds)

    POLYESTER RESIN AND MOLDED PRODUCT INCLUDING THE SAME
    12.
    发明申请
    POLYESTER RESIN AND MOLDED PRODUCT INCLUDING THE SAME 有权

    公开(公告)号：US20250034327A1

    公开(公告)日：2025-01-30

    申请号：US18733793

    申请日：2024-06-04

    Applicant: FUJIFILM Corporation

    Inventor： Shohei KATAOKA ,  Shinsuke Tokuoka

    IPC: C08G63/183

    Abstract: Provided are a polyester resin that achieves both a high Tg and low water absorbency at an excellent level; and a molded product including the same.
    A polyester resin including a structural unit represented by General Formula (A) and at least one of a structural unit represented by General Formula (B) or a structural unit represented by General Formula (C); and a molded product including the same. In the formula, R1 represents a linear aliphatic hydrocarbon group having 6 or more carbon atoms, R2 represents a hydrogen atom or a substituent, R3 represents a branched alkyl group having 3 or more carbon atoms, R4 represents a hydrogen atom or an aliphatic hydrocarbon group having 1 to 5 carbon atoms, R5 represents an aliphatic hydrocarbon group and X represents a hydrocarbon group having a cyclic structure. n is an integer of 0 to 8, m is an integer of 1 to 4, and It should be noted that R1 and R2 are not bonded to each other to form a ring, and R3 and R4 are not bonded to each other to form a ring. * represents a bonding site.
    The 1,4-phenylene group in the formulae may be substituted with an aliphatic hydrocarbon group and/or an aromatic hydrocarbon group.

    METHOD OF FORMING PATTERN AND ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION FOR USE IN THE METHOD
    17.
    发明申请
    METHOD OF FORMING PATTERN AND ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION FOR USE IN THE METHOD 审中-公开
    形成图案的方法和用于方法的丙烯酸或辐射敏感性树脂组合物

    公开(公告)号：US20150111157A1

    公开(公告)日：2015-04-23

    申请号：US14581416

    申请日：2014-12-23

    Applicant: FUJIFILM CORPORATION

    Inventor： Keita KATO ,  Michihiro SHIRAKAWA ,  Akinori SHIBUYA ,  Akiyoshi GOTO ,  Shohei KATAOKA ,  Tomoki MATSUDA

    IPC: G03F7/004 ,  G03F7/20

    CPC classification number: G03F7/004 ,  C08F220/26 ,  C08F220/38 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/325

    Abstract: Provided is a method of forming a pattern, including forming a film comprising an actinic-ray- or radiation-sensitive resin composition comprising, resin (A) comprising any of repeating units of general formula (I) below, which resin when acted on by an acid, decreases its solubility in a developer comprising an organic solvent, and a compound (B) expressed by any of general formulae (B-1) to (B-3) below, which compound when exposed to actinic rays or radiation, generates an acid, exposing the film to actinic rays or radiation, and developing the exposed film with a developer comprising an organic solvent to thereby obtain a negative pattern.

    Abstract translation: 提供了形成图案的方法，包括形成包含光化射线或辐射敏感性树脂组合物的膜，所述树脂组合物包含下列通式（I）的任何重复单元的树脂（A） 降低其在包含有机溶剂的显影剂中的溶解度，以及当暴露于光化射线或辐射时该化合物暴露于光化射线或辐射时由下述通式（B-1）至（B-3）表示的化合物（B） 酸，将膜暴露于光化射线或辐射，以及用包含有机溶剂的显影剂显影曝光的膜，从而获得负图案。

    PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM
    18.
    发明申请
    PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM 有权
    图案形成方法，化学放大电阻组合物和电阻膜

    公开(公告)号：US20130115556A1

    公开(公告)日：2013-05-09

    申请号：US13729752

    申请日：2012-12-28

    Applicant: FUJIFILM Corporation

    Inventor： Kaoru IWATO ,  Shohei KATAOKA

    IPC: G06F1/20

    CPC classification number: G03F7/0046 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/325 ,  Y10S430/108

    Abstract: A pattern forming method, includes: (i) forming a film from a chemical amplification resist composition that contains (A) a resin capable of increasing a polarity of the resin (A) to decrease a solubility of the resin (A) for a developer containing an organic solvent by an action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a solvent; (ii) exposing the film; and (iii) performing development by using a developer containing an organic solvent, wherein the resin (A) has a structure in which a polar group is protected with a leaving group capable of decomposing and leaving by an action of an acid, and the leaving group contains a fluorine atom.

    Abstract translation: 图案形成方法包括：（i）从化学增幅抗蚀剂组合物形成膜，该组合物含有（A）能提高树脂（A）极性的树脂，以降低树脂（A）对显色剂的溶解度 通过酸的作用含有有机溶剂，（B）在用光化射线或辐射照射时能够产生酸的化合物和（C）溶剂; （ii）曝光胶片; 和（iii）通过使用包含有机溶剂的显影剂进行显影，其中树脂（A）具有极性基团被离去基团保护的结构，其能够通过酸的作用分解和离开，并且离开 基团含有氟原子。

    ELECTROLYTIC SOLUTION FOR NON-AQUEOUS SECONDARY BATTERY, NON-AQUEOUS SECONDARY BATTERY, AND METAL COMPLEX
    19.
    发明申请
    ELECTROLYTIC SOLUTION FOR NON-AQUEOUS SECONDARY BATTERY, NON-AQUEOUS SECONDARY BATTERY, AND METAL COMPLEX 审中-公开

    公开(公告)号：US20190280335A1

    公开(公告)日：2019-09-12

    申请号：US16424494

    申请日：2019-05-29

    Applicant: FUJIFILM Corporation

    Inventor： Shohei KATAOKA

    IPC: H01M10/0567 ,  H01M10/0569 ,  H01M10/0525 ,  C07F7/00

    Abstract: Provided are an electrolytic solution for a non-aqueous secondary battery containing an electrolyte, an organic solvent, and a metal complex represented by General Formula (I), a non-aqueous secondary battery in which the electrolytic solution for a non-aqueous secondary battery is used, and a metal complex. In General Formula (I), M represents a transition metal. k represents an integer of 0 or more, m represents an integer of 0 to 4, and n represents an integer of 1 or more. Here, k+n represents a valence of M. R1 represents an alkyl group, an aryl group, an alkoxy group, a carbonyl group-containing group, a sulfonyl group-containing group, or a halogen atom. R2 and R3 represent a hydrogen atom, an alkyl group, an aryl group, an alkoxy group, a carbonyl group-containing group, a sulfonyl group-containing group, or a halogen atom. L represents a monodentate ligand.

    PATTERN FORMING METHOD, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
    20.
    发明申请
    PATTERN FORMING METHOD, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE 审中-公开
    图案形成方法，主动感光或辐射敏感性树脂组合物，主动感光或辐射敏感膜，制造电子设备的方法和电子设备

    公开(公告)号：US20160070174A1

    公开(公告)日：2016-03-10

    申请号：US14938061

    申请日：2015-11-11

    Applicant: FUJIFILM CORPORATION

    Inventor： Shuhei YAMAGUCHI ,  Kei YAMAMOTO ,  Shohei KATAOKA

    IPC: G03F7/32 ,  G03F7/20 ,  G03F7/038 ,  G03F7/16

    CPC classification number: G03F7/325 ,  C08F220/28 ,  G03F7/038 ,  G03F7/0397 ,  G03F7/16 ,  G03F7/20

    Abstract: Disclosed is a pattern forming method including forming an active light sensitive or radiation sensitive film by coating a substrate with an active light sensitive or radiation sensitive resin composition; exposing the active light sensitive or radiation sensitive film; and forming a negative type pattern by developing the exposed active light sensitive or radiation sensitive film using a developer which includes an organic solvent, in which the active light sensitive or radiation sensitive resin composition contains a resin (A) which includes a repeating unit (a) which has an acidic group and a lactone structure and of which, due to a polarity thereof being increased by an action of an acid, a solubility decreases with respect to a developer which includes an organic solvent.

    Abstract translation: 公开了一种图案形成方法，包括通过用活性光敏或辐射敏感性树脂组合物涂布基底来形成活性光敏或辐射敏感膜; 暴露有源光敏或辐射敏感膜; 并使用包括有机溶剂的显影剂，通过显影曝光的有源光敏感或感光膜形成负型图案，其中活性光敏或辐射敏感性树脂组合物含有包含重复单元（a）的树脂（A） ），其具有酸性基团和内酯结构，并且由于其极性由于酸的作用而增加，相对于包含有机溶剂的显影剂，溶解度降低。

Patent Agency Ranking