公开(公告)号：US20070203873A1

公开(公告)日：2007-08-30

申请号：US11353231

申请日：2006-02-14

申请人： Andre Jeunink ,  Antonius De Kort

发明人： Andre Jeunink ,  Antonius De Kort

IPC分类号： G06F17/30

CPC分类号： G03F7/70508

摘要： The present invention relates to the activation of a software upgrade in a lithographic apparatus that transfers a pattern onto a substrate. The time and date of the activation of a software upgrade is compared with the time and date of the exposure of the first layer of a substrate or of a “lot” of substrates. If the activation date and time is later than the first exposure date and time, software-functionality types is not mixed on a single lot or substrate and the old software-functionality is used for that lot or substrate. If, on the other hand, the activation date and time of the software-functionality update is earlier than the first exposure of the lot or substrate, the lot or substrate has not yet been affected by the old software-functionality and the new, updated software-functionality may be used to control the pattern transfer onto all of the substrate layers.

摘要翻译： 本发明涉及在将图案传送到基板上的光刻设备中的软件升级的激活。 将软件升级的激活的时间和日期与基板的第一层或“批次”的基板的曝光的时间和日期进行比较。 如果激活日期和时间晚于第一个曝光日期和时间，则软件功能类型不会在单个批次或基板上混合，并且旧的软件功能用于该批次或基板。 另一方面，如果软件功能更新的激活日期和时间早于批次或基板的首次曝光，则批次或底板尚未受旧软件功能的影响，新的更新 可以使用软件功能来控制图案转移到所有的基底层上。

公开(公告)号：US20070103666A1

公开(公告)日：2007-05-10

申请号：US11268777

申请日：2005-11-08

申请人： Joost Ottens ,  Marcus Emile Boonman ,  Thomas Josephus Castenmiller ,  Andre Jeunink

发明人： Joost Ottens ,  Marcus Emile Boonman ,  Thomas Josephus Castenmiller ,  Andre Jeunink

IPC分类号： G03B27/58

CPC分类号： G03F7/70783 ,  G03F7/707 ,  H01L21/682 ,  Y10S269/903

摘要： A lithographic apparatus is disclosed that includes an article support constructed to support a first article, capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, in a beam path of the radiation beam or a second article to be placed in a beam path of the patterned radiation beam, the article support having a plurality of supporting protrusions on which the first article or the second article is disposed in use, wherein the plurality of supporting protrusions are constructed to define a support zone to provide a plane of support for the first article or the second article, so that when the first article or the second article is subjected to a thermal load the support zone allows at least a portion of the first article or the second article to expand or contract to reduce the build up of a mechanical stress in the first article or second article, respectively, while maintaining the first article or second article substantially fixed to the article support, and a position sensor configured to determine a position offset, in a direction lying in the plane of the support zone, of the first article or the second article over a period of time, and a projection system configured to project a patterned radiation beam onto a target portion of a second article.

摘要翻译： 公开了一种光刻设备，其包括构造成支撑第一制品的物品支撑件，该第一物品能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束，在辐射束的光束路径中或第二物品 被放置在图案化的辐射束的光束路径中，物品支撑件具有多个支撑突起，第一物品或第二物品在使用中设置在该支撑突起上，其中多个支撑突起构造成限定支撑区域 为第一物品或第二物品提供支撑平面，使得当第一物品或第二物品经受热负荷时，支撑区允许第一物品或第二物品的至少一部分膨胀或收缩 以分别在第一制品或第二制品中分别减少机械应力的累积，同时保持第一制品或第二制品基本固定 以及位置传感器，被配置为在一段时间内确定第一物品或第二物品在位于支撑区域的平面中的方向上的位置偏移;以及投影系统，被配置为投影 图案化的辐射束到第二物品的目标部分上。

公开(公告)号：US20060061743A1

公开(公告)日：2006-03-23

申请号：US10946334

申请日：2004-09-22

申请人： Arie Den Boef ,  Andre Jeunink ,  Henricus Maria Pellemans ,  Irwan Setija ,  Cas Johannes Petrus Van Nuenen ,  Stefan Carolus Jacobus Keij

发明人： Arie Den Boef ,  Andre Jeunink ,  Henricus Maria Pellemans ,  Irwan Setija ,  Cas Johannes Petrus Van Nuenen ,  Stefan Carolus Jacobus Keij

IPC分类号： G03B27/42

CPC分类号： G03F9/7088 ,  G03F9/7092

摘要： A lithographic apparatus according to one embodiment includes an alignment system for aligning a substrate. The alignment system comprises an illuminator system configured to illuminate an alignment mark on the substrate with an illumination spot, the alignment mark comprising a plurality of lines and spaces. The system also includes a combiner system configured to transfer two-images of the illuminated alignment mark without spatial filtering of the images, rotate the images 180° relatively to each other, and combine the two images; and a detection system configured to detect an alignment signal from the combined images and to determine a unique alignment position by selecting a specific one of extreme values in the detected alignment signal.

摘要翻译： 根据一个实施例的光刻设备包括用于对准衬底的对准系统。 对准系统包括照明器系统，其被配置为用照明点照射基板上的对准标记，该对准标记包括多个线和间隔。 该系统还包括一个组合器系统，配置成传递照明的对准标记的两个图像，而不对图像进行空间滤波，使图像相对于彼此旋转180度，并组合两个图像; 以及检测系统，被配置为检测来自组合图像的对准信号，并且通过选择检测到的对准信号中的特定值之一来确定唯一的对准位置。

公开(公告)号：US20050210438A1

公开(公告)日：2005-09-22

申请号：US10886055

申请日：2004-07-08

申请人： Leonardus Henricus Verstappen ,  Jozef Finders ,  Andre Jeunink ,  Wim Tel ,  Alexander Van Der Hoff

发明人： Leonardus Henricus Verstappen ,  Jozef Finders ,  Andre Jeunink ,  Wim Tel ,  Alexander Van Der Hoff

IPC分类号： H01L21/027 ,  G03F7/20 ,  G06F17/50

CPC分类号： G03F7/705 ,  G03F7/706

摘要： A method is provided for modifying an image of a pattern during a lithographic imaging process, where the pattern is arranged on a mask for imaging by a projection system on a surface, and the image is an image formed from the pattern by the projection system. In this method the imaging quality of the projection system is described by selected imaging quality parameters, and the image is adjustable by image adjustment parameters of the projection system. The method comprises the steps of determining an ideal image of the pattern, determining a simulated distorted image of the pattern based on the selected imaging quality parameters; determining a deviation between the simulated distorted image and the ideal image, and adapting the image adjustment parameters during the imaging process to minimize the deviation between the simulated distorted image and the ideal image on the basis of the selected imaging quality parameters.

摘要翻译： 提供一种用于在光刻成像处理期间修改图案的图像的方法，其中图案被布置在用于通过投影系统在表面上成像的掩模上，并且图像是通过投影系统从图案形成的图像。 在这种方法中，通过选定的成像质量参数来描述投影系统的成像质量，并且可以通过投影系统的图像调整参数来调整图像。 该方法包括以下步骤：确定图案的理想图像，基于所选择的成像质量参数确定图案的模拟失真图像; 确定所述模拟失真图像和所述理想图像之间的偏差，以及在所述成像处理期间适配所述图像调整参数，以基于所选择的成像质量参数来最小化所述模拟失真图像与所述理想图像之间的偏差。

公开(公告)号：US20060215161A1

公开(公告)日：2006-09-28

申请号：US11232236

申请日：2005-09-22

申请人： Arie Den Boef ,  Andre Jeunink ,  Henricus Pellemans ,  Irwan Setija ,  Cas Johannes Van Nuenen ,  Stefan Carolus Keij

发明人： Arie Den Boef ,  Andre Jeunink ,  Henricus Pellemans ,  Irwan Setija ,  Cas Johannes Van Nuenen ,  Stefan Carolus Keij

IPC分类号： G01B11/00

CPC分类号： G03F9/7088 ,  G03F9/7092

摘要： A lithographic apparatus according to one embodiment includes an alignment system for aligning a substrate. The alignment system comprises an illuminator system configured to illuminate an alignment mark on the substrate with an illumination spot, the alignment mark comprising a plurality of lines and spaces. The system also includes a combiner system configured to transfer two images of the illuminated alignment mark without spatial filtering of the images, rotate the images 180° relatively to each other, and combine the two images; and a detection system configured to detect an alignment signal from the combined images and to determine a unique alignment position by selecting a specific one of extreme values in the detected alignment signal.

摘要翻译： 根据一个实施例的光刻设备包括用于对准衬底的对准系统。 对准系统包括照明器系统，其被配置为用照明点照射基板上的对准标记，该对准标记包括多个线和间隔。 该系统还包括一个组合器系统，被配置为传送照明对准标记的两个图像，而不对图像进行空间滤波，使图像相对于彼此旋转180度，并组合两个图像; 以及检测系统，被配置为检测来自组合图像的对准信号，并且通过选择检测到的对准信号中的特定值之一来确定唯一的对准位置。

公开(公告)号：US20060114437A1

公开(公告)日：2006-06-01

申请号：US11000507

申请日：2004-12-01

申请人： M'hamed Akhssay ,  Johannes Baselmans ,  Franciscus Antonius Chrysogonus Commissaris ,  Simon De Groot ,  Andre Jeunink ,  Wim Tel ,  Alexander Hendrikus Van Der Hoff ,  Arnout Van De Stadt

发明人： M'hamed Akhssay ,  Johannes Baselmans ,  Franciscus Antonius Chrysogonus Commissaris ,  Simon De Groot ,  Andre Jeunink ,  Wim Tel ,  Alexander Hendrikus Van Der Hoff ,  Arnout Van De Stadt

IPC分类号： G03B27/52

CPC分类号： G03F7/70891 ,  G03F7/70258 ,  G03F7/705 ,  G03F7/706

摘要： A lithographic projection apparatus includes a measurement system for measuring changes in projection system aberrations with time, and a predictive control system for predicting variation of projection system aberrations with time on the basis of model parameters and for generating a control signal for compensating a time-varying property of the apparatus, such as the OVL values (X-Y adjustment) and the FOC values (Z adjustment) of a lens of the projection system for example. An inline model identification system is provided for estimating model parameter errors on the basis of projection system aberration values provided by the predictive control system and measured projection system aberration values provided by the measurement system, and an updating system utilizes the model parameter errors for updating the model parameters of the predictive control system in order to maintain the time-varying property within acceptable performance criteria.

摘要翻译： 光刻投影设备包括用于随时间测量投影系统像差的变化的测量系统，以及用于根据模型参数随时间预测投影系统像差的变化的预测控制系统，以及用于产生用于补偿时变的控制信号 属性，例如投影系统的透镜的OVL值（XY调整）和FOC值（Z调整）。 提供了一种在线模型识别系统，用于基于由预测控制系统提供的投影系统像差值和测量系统提供的测量投影系统像差值来估计模型参数误差，并且更新系统利用模型参数误差来更新 预测控制系统的模型参数，以便将时变性能保持在可接受的性能标准内。

公开(公告)号：US20060008716A1

公开(公告)日：2006-01-12

申请号：US10886051

申请日：2004-07-08

申请人： Andre Jeunink ,  M'Hamed Akhssay ,  Johannes Baselmans ,  Franciscus Antonius Commissaris ,  Simon De Groot ,  Wim Tel ,  Alexander Hendrikus Van Der Hoff ,  Arnout Van De Stadt ,  Remco Van Dijk

发明人： Andre Jeunink ,  M'Hamed Akhssay ,  Johannes Baselmans ,  Franciscus Antonius Commissaris ,  Simon De Groot ,  Wim Tel ,  Alexander Hendrikus Van Der Hoff ,  Arnout Van De Stadt ,  Remco Van Dijk

IPC分类号： G03C5/00 ,  G03B27/00 ,  G06F17/50 ,  G03F9/00

CPC分类号： G03F7/70891 ,  G03F7/70258 ,  G03F7/70491 ,  G03F7/705 ,  G03F7/706 ,  G03F9/7046

摘要： A manufacturing method is utilized in lithographic projection apparatus in order to enable all aberrations to be compensated for but with those aberrations that are of most significance to the particular application (the particular pattern, illumination mode, etc.) being given precedence over aberrations that are of lesser significance in relation to that particular application. The method uses a substrate having a target portion for receiving an image, a mask for applying a pattern in accordance with a required patterning application, and a projection system to project a selected beam of radiation onto the mask to produce a specific required patterned beam providing an image of the pattern on the target portion. In order to compensate for the aberrations in a manner that gives precedence to those aberrations of particular significance to the required application, the method incorporates the steps of predicting projection system aberration changes with time, determining the application-specific effect on certain parameters of the image of such predicted projection system aberration changes with respect to certain measured aberration values, generating a control signal specific to the required patterned beam according to such predicted projection system aberration changes in the projection system aberrations with time and their application-specific effect on certain parameters of the image; and carrying out imaging adjustments in dependence on the control signal to compensate for the application-specific effect of the predicted changes in the aberrations on the image. The adjustments are therefore determined optimally for the given application.

摘要翻译： 在光刻投影设备中使用制造方法，以便能够补偿所有像差，但是对于特定应用（特定图案，照明模式等）具有最重要意义的那些像差优先于像差， 与该特定应用相关的意义较小。 该方法使用具有用于接收图像的目标部分的基板，用于根据所需图案化应用来施加图案的掩模以及投影系统，以将所选择的辐射束投影到掩模上，以产生特定的所需图案束提供 目标部分上的图案的图像。 为了以对所需应用具有特别意义的那些像差优先的方式补偿像差，该方法包括随时间预测投影系统像差变化的步骤，确定对图像的某些参数的应用特定影响 这种预测的投影系统像差相对于某些测量的像差值发生变化，根据投影系统像差随时间的这种预测的投影系统像差变化产生对所需图案化光束特有的控制信号及其对某些参数的应用特定影响 图片; 并且根据控制信号执行成像调整，以补偿预测图像上像差变化的应用特定效果。 因此，对于给定的应用，最佳地确定调整。

公开(公告)号：US20050018163A1

公开(公告)日：2005-01-27

申请号：US10712264

申请日：2003-11-14

申请人： Andre Jeunink ,  Frank Commissaris ,  Vera Lemmen ,  M'Hamed Akhssay

发明人： Andre Jeunink ,  Frank Commissaris ,  Vera Lemmen ,  M'Hamed Akhssay

IPC分类号： G03F7/20 ,  G03B27/72

CPC分类号： G03F7/70891 ,  G03F7/70258

摘要： The change in a property of a lithographic apparatus (e.g. the change in magnification of the projection system due to lens heating effects) is predicted, and when the change since the last time an alignment task was performed is greater than a threshold, an additional alignment task is carried out. A realignment is triggered when the predictive correction, and hence the error in it, becomes larger than a desired maximum. This avoids unnecessary realignments but ensures that an alignment does occur when likely errors are out of permitted ranges.

摘要翻译： 预测光刻设备的特性变化（例如，由于透镜加热效应引起的投影系统的放大倍数的变化），并且当上次执行对准任务时的变化大于阈值时，附加的对准 执行任务 当预测校正因此其误差变得大于期望的最大值时，触发重新对准。 这避免了不必要的重新对齐，但是确保当可能的错误超出允许范围时确定对齐。