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    Lithographic apparatus and device manufacturing method
    1.
    发明申请
    Lithographic apparatus and device manufacturing method 失效
    光刻设备和器件制造方法

    公开(公告)号：US20070103666A1

    公开(公告)日：2007-05-10

    申请号：US11268777

    申请日：2005-11-08

    申请人： Joost Ottens ,  Marcus Emile Boonman ,  Thomas Josephus Castenmiller ,  Andre Jeunink

    发明人： Joost Ottens ,  Marcus Emile Boonman ,  Thomas Josephus Castenmiller ,  Andre Jeunink

    IPC分类号： G03B27/58

    CPC分类号： G03F7/70783 ,  G03F7/707 ,  H01L21/682 ,  Y10S269/903

    摘要： A lithographic apparatus is disclosed that includes an article support constructed to support a first article, capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, in a beam path of the radiation beam or a second article to be placed in a beam path of the patterned radiation beam, the article support having a plurality of supporting protrusions on which the first article or the second article is disposed in use, wherein the plurality of supporting protrusions are constructed to define a support zone to provide a plane of support for the first article or the second article, so that when the first article or the second article is subjected to a thermal load the support zone allows at least a portion of the first article or the second article to expand or contract to reduce the build up of a mechanical stress in the first article or second article, respectively, while maintaining the first article or second article substantially fixed to the article support, and a position sensor configured to determine a position offset, in a direction lying in the plane of the support zone, of the first article or the second article over a period of time, and a projection system configured to project a patterned radiation beam onto a target portion of a second article.

    摘要翻译： 公开了一种光刻设备，其包括构造成支撑第一制品的物品支撑件，该第一物品能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束，在辐射束的光束路径中或第二物品 被放置在图案化的辐射束的光束路径中，物品支撑件具有多个支撑突起，第一物品或第二物品在使用中设置在该支撑突起上，其中多个支撑突起构造成限定支撑区域 为第一物品或第二物品提供支撑平面，使得当第一物品或第二物品经受热负荷时，支撑区允许第一物品或第二物品的至少一部分膨胀或收缩 以分别在第一制品或第二制品中分别减少机械应力的累积，同时保持第一制品或第二制品基本固定 以及位置传感器，被配置为在一段时间内确定第一物品或第二物品在位于支撑区域的平面中的方向上的位置偏移;以及投影系统，被配置为投影 图案化的辐射束到第二物品的目标部分上。

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    5.
    发明申请
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：US20050128463A1

    公开(公告)日：2005-06-16

    申请号：US10734641

    申请日：2003-12-15

    申请人： Joost Ottens ,  Hendrik Neerhof ,  Koen Jacobus Zaal ,  Marco Le Kluse

    发明人： Joost Ottens ,  Hendrik Neerhof ,  Koen Jacobus Zaal ,  Marco Le Kluse

    IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/683 ,  G03B27/62

    CPC分类号： H01L21/6831 ,  G03F7/707 ,  G03F7/70708

    摘要： A lithographic apparatus includes an illumination system for providing a beam of radiation, an article support for supporting a flat article to be placed in a beam path of the beam of radiation on the article support, a backfill gas feed arranged in the article support for feeding backfill gas to a backside of the article when supported by the article support, and a clamp for clamping the article against the article support during projection. According to one aspect of the invention, the apparatus includes a controller for controlling the clamp and/or the backfill gas feed pressure so as to release the clamp prior to reducing the backfill gas feed pressure.

    摘要翻译： 光刻设备包括用于提供辐射束的照明系统，用于支撑待放置在物品支架上的辐射束的光束路径中的平坦物品的物品支撑件，布置在物品支撑件中用于进给的回填气体供给 当由物品支撑件支撑时，将气体回填到物品的背面，以及用于在投影期间将物品夹紧在物品支撑件上的夹具。 根据本发明的一个方面，该装置包括用于控制夹紧和/或回填气体进料压力的控制器，以便在减少回填气体进料压力之前释放夹具。

    Using unflatness information of the substrate table or mask table for decreasing overlay
    7.
    发明申请
    Using unflatness information of the substrate table or mask table for decreasing overlay 有权
    使用衬底表或掩模台的不平坦信息减少重叠

    公开(公告)号：US20060114436A1

    公开(公告)日：2006-06-01

    申请号：US10998179

    申请日：2004-11-29

    申请人： Rene Oesterholt ,  Ralph Brinkhof ,  Tjarko Van Empel ,  Leon Levasier ,  Joost Ottens ,  Koen Jacobus Zaal ,  Koenraad Stephan Salden

    发明人： Rene Oesterholt ,  Ralph Brinkhof ,  Tjarko Van Empel ,  Leon Levasier ,  Joost Ottens ,  Koen Jacobus Zaal ,  Koenraad Stephan Salden

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70783 ,  G03F7/707

    摘要： The invention relates to a lithographic system that includes an illumination system for providing a projection beam of radiation, a mask table for supporting a mask, the mask serving to impart the projection beam with a pattern in its cross-section, a substrate table for holding a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. The system also comprises a processor arranged to calculate overlay corrections using a reference height map representing a surface of the substrate table or the mask table. The invention allows feed forward correction of non-flatness induced wafer grid distortion during alignment and during exposure, thereby reducing overlay errors caused by differences in flatness characteristics. It provides an indirect qualification method for overlay accuracy related to exposure chuck flatness based on height map information.

    摘要翻译： 本发明涉及一种光刻系统，其包括用于提供投影辐射束的照明系统，用于支撑掩模的掩模台，用于使投影光束在其横截面上具有图案的掩模，用于保持 基板和用于将图案化的光束投影到基板的目标部分上的投影系统。 该系统还包括处理器，其被布置为使用表示衬底台或掩模台的表面的参考高度图计算覆盖校正。 本发明允许在对准和曝光期间非平坦度引起的晶片格栅失真的前馈校正，从而减少由平坦度特性的差异引起的重叠误差。 它提供了基于高度图信息的与曝光卡盘平坦度相关的覆盖精度的间接鉴定方法。

    Lithographic apparatus and device manufacturing method
    9.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US20050195382A1

    公开(公告)日：2005-09-08

    申请号：US10980834

    申请日：2004-11-04

    申请人： Joost Ottens ,  Koen Maria Zaal

    发明人： Joost Ottens ,  Koen Maria Zaal

    IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/683 ,  G03B27/58

    CPC分类号： G03F7/707 ,  G03F7/70708 ,  G03F7/70783 ,  G03F7/70875

    摘要： A lithographic apparatus includes an article support for supporting a substantially flat article to be placed in a beam path of a beam of radiation. The article support includes a plurality of supporting protrusions that define a support zone for providing a plane of support. A backfill gas feed is arranged in the support zone and provides a backfill gas that flows to a backside of the article when supported by the article support. The support zone is surrounded by a boundary zone that has a reduced height relative to the plane of support so that the backfill gas flow is permitted to exit the support zone. A tunable clamp clamps the article to the article support, and a flow measuring system measures the outflow of the backfill gas. The tunable clamp is operatively coupled to the flow measuring system to tune the clamping based on the measured outflow.

    摘要翻译： 光刻设备包括用于支撑待放置在辐射束的光束路径中的基本平坦的物品的物品支撑件。 物品支撑件包括限定用于提供支撑平面的支撑区域的多个支撑突起。 回填气体进料设置在支撑区域中，并且当由物品支撑件支撑时提供回流到物品的后侧的回填气体。 支撑区被边界区围绕，该边界区相对于支撑平面具有减小的高度，使得回填气体流被允许离开支撑区。 可调式夹具将制品夹紧到物品支撑件上，流量测量系统测量回填气体的流出。 可调式夹具可操作地连接到流量测量系统，以基于所测量的流出来调节夹紧。

    Optimized correction of wafer thermal deformations in a lithographic process
    10.
    发明申请
    Optimized correction of wafer thermal deformations in a lithographic process 失效
    光刻过程中晶片热变形的优化校正

    公开(公告)号：US20050136346A1

    公开(公告)日：2005-06-23

    申请号：US10743272

    申请日：2003-12-23

    申请人： Joost Ottens ,  Harmen Van Der Schoot ,  Jeroen Starreveld ,  Wouterus Petrus Maria Maas ,  Willem Venema ,  Boris Menchtchikov

    发明人： Joost Ottens ,  Harmen Van Der Schoot ,  Jeroen Starreveld ,  Wouterus Petrus Maria Maas ,  Willem Venema ,  Boris Menchtchikov

    IPC分类号： G03F9/00 ,  G03F7/20 ,  H01L21/027 ,  G03B27/00 ,  G03C5/00

    CPC分类号： G03F7/70616 ,  G03F7/70783 ,  G03F7/70875

    摘要： A method and apparatus of correcting thermally-induced field deformations of a lithographically exposed substrate, is presented herein. In one embodiment, the method includes exposing a pattern onto a plurality of fields of a substrate in accordance with pre-specified exposure information and measuring attributes of the fields to assess deformation of the fields induced by thermal effects of the exposing process. The method further includes determining corrective information based on the measured attributes, and adjusting the pre-specified exposure information, based on the corrective information, to compensate for the thermally-induced field deformations. Other embodiments include the use of predictive models to predict thermally-induced effects on the fields and thermographic imaging to determine temperature variations across a substrate.

    摘要翻译： 本文介绍了一种校正光刻曝光的基底的热诱导场变形的方法和装置。 在一个实施例中，该方法包括根据预先指定的曝光信息将图案曝光到基板的多个场上，并测量场的属性以评估由曝光过程的热效应引起的场的变形。 该方法还包括基于所测量的属性来确定校正信息，并且基于校正信息调整预定曝光信息，以补偿热诱导的场变形。 其他实施例包括使用预测模型来预测对场的热诱导效应和热成像以确定跨越衬底的温度变化。