公开(公告)号：US09052613B2

公开(公告)日：2015-06-09

申请号：US13105748

申请日：2011-05-11

申请人： Johannes Hubertus Antonius Van de Rijdt ,  Joost Jeroen Ottens ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Erik Johannes Antonius Manders

发明人： Johannes Hubertus Antonius Van de Rijdt ,  Joost Jeroen Ottens ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Erik Johannes Antonius Manders

IPC分类号： G03B27/58 ,  G03F7/20 ,  H02K41/03

CPC分类号： G03F7/70758 ,  H02K41/03

摘要： A displacement device with a first and second part which are displaceable relative to one another, the first part being provided with a system of magnets, the second part being provided with a set of coil block units including: at least three first coil block units having current conductors oriented parallel to a second direction, at least two second coil block units having current conductors oriented parallel to a first direction, wherein the displacement device includes a controller configured to control the position of the second part relative to the first part, and wherein when the second part mainly moves in the second direction the controller is configured to levitate the second part from the first part in the third direction by using first coil block units only.

摘要翻译： 一种具有第一和第二部分的位移装置，其相对于彼此可移动，所述第一部分设置有磁体系统，所述第二部分设置有一组线圈块单元，所述一组线圈块单元包括：至少三个第一线圈块单元， 电流导体平行于第二方向定向，至少两个第二线圈块单元，其具有平行于第一方向定向的电流导体，其中所述位移装置包括被配置为控制所述第二部分相对于所述第一部分的位置的控制器，并且其中 当第二部分主要在第二方向上移动时，控制器被配置为仅通过使用第一线圈块单元从第一部分沿第三方向悬浮第二部分。

公开(公告)号：US08994917B2

公开(公告)日：2015-03-31

申请号：US12999512

申请日：2009-07-22

申请人： Joost Jeroen Ottens ,  Johannes Henricus Wilhelmus Jacobs

发明人： Joost Jeroen Ottens ,  Johannes Henricus Wilhelmus Jacobs

IPC分类号： G03B27/52 ,  G03B27/58 ,  G03B27/32 ,  G03F7/20 ,  H01L21/67

CPC分类号： G03F7/70875 ,  H01L21/67109 ,  H01L21/67248

摘要： An article support is constructed to support an article. The article support includes a back fill structure constructed to supply and extract a thermal buffering fluid to and from the article support. The back fill structure is connected to an extraction duct that is constructed and arranged to extract at least a gas phase of the thermal buffering fluid from the back fill structure. The back fill structure is connected to a supply duct, constructed and arranged to supply a liquid phase of the thermal buffering fluid to the back fill structure. The back fill structure is arranged to have the thermal buffering fluid brought in a combined liquid and gas phase to thermally connect with the article.

摘要翻译： 文章支持被构造来支持文章。 物品支撑件包括构造成向物品支撑件提供热提取流体并从其提取热缓冲流体的后填充结构。 背部填充结构连接到提取管道，其被构造和布置成从后部填充结构提取至少一个热缓冲流体的气相。 后填充结构连接到供应管道，构造和布置成将热缓冲流体的液相供应到后填充结构。 背部填充结构被布置成使热缓冲流体进入组合的液体和气相以与制品热连接。

公开(公告)号：US08953142B2

公开(公告)日：2015-02-10

申请号：US12543011

申请日：2009-08-18

申请人： Nicolaas Rudolf Kemper ,  Nicolaas Ten Kate ,  Joost Jeroen Ottens ,  Marcel Beckers ,  Marco Polizzi ,  Michel Riepen ,  Anthonie Kuijper ,  Koen Steffens ,  Adrianes Johannes Baeten ,  Anca Mihaela Antonevici

发明人： Nicolaas Rudolf Kemper ,  Nicolaas Ten Kate ,  Joost Jeroen Ottens ,  Marcel Beckers ,  Marco Polizzi ,  Michel Riepen ,  Anthonie Kuijper ,  Koen Steffens ,  Adrianes Johannes Baeten ,  Anca Mihaela Antonevici

IPC分类号： G03B27/52 ,  G03B27/58 ,  G03B27/60 ,  G03F7/20

CPC分类号： G03F7/70866 ,  B01D19/0021 ,  G03B27/52 ,  G03F7/70341

摘要： An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.

摘要翻译： 描述了一种浸没式光刻设备，其中通过使富液体流优先沿着表面流动，将两相流分离成富含液体的富气流。

公开(公告)号：US08913228B2

公开(公告)日：2014-12-16

申请号：US11730749

申请日：2007-04-03

申请人： Maurice Wijckmans ,  Martinus Agnes Willem Cuijpers ,  Martinus Hendrikus Antonius Leenders ,  Frits Van Der Meulen ,  Joost Jeroen Ottens ,  Theodorus Petrus Maria Cadee ,  Frederik Eduard De Jong ,  Wilhelmus Franciscus Johannes Simons ,  Edwin Augustinus Matheus Van Gompel ,  Martin Frans Pierre Smeets ,  Rob Jansen ,  Gerardus Adrianus Antonius Maria Kusters ,  Martijn Van Baren

发明人： Maurice Wijckmans ,  Martinus Agnes Willem Cuijpers ,  Martinus Hendrikus Antonius Leenders ,  Frits Van Der Meulen ,  Joost Jeroen Ottens ,  Theodorus Petrus Maria Cadee ,  Frederik Eduard De Jong ,  Wilhelmus Franciscus Johannes Simons ,  Edwin Augustinus Matheus Van Gompel ,  Martin Frans Pierre Smeets ,  Rob Jansen ,  Gerardus Adrianus Antonius Maria Kusters ,  Martijn Van Baren

IPC分类号： G03B27/58 ,  G03F7/20 ,  F16L55/053

CPC分类号： G03F7/70875 ,  F16L55/053 ,  G03F7/70341 ,  G03F7/70783

摘要： A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table configured to hold a substrate. The substrate table includes a conditioning system configured to hold a conditioning fluid and to condition the substrate table. The conditioning system includes a pressure damper that is in fluid communication with the conditioning system and is arranged to dampen a pressure variation in the conditioning system.

摘要翻译： 公开了一种光刻设备，其被布置成将图案从图案形成装置投影到基板上，光刻设备具有被配置为保持基板的基板台。 衬底台包括配置成保持调理流体并调节衬底台的调节系统。 调节系统包括压力调节器，其与调节系统流体连通并且被布置成抑制调节系统中的压力变化。

公开(公告)号：US08564763B2

公开(公告)日：2013-10-22

申请号：US12436635

申请日：2009-05-06

申请人： Johannes Henricus Wilhelmus Jacobs ,  Martinus Hendrikus Antonius Leenders ,  Frits Van der Meulen ,  Joost Jeroen Ottens ,  Anko Jozef Cornelus Sijben ,  Wouterus Johannes Petrus Maria Maas ,  Hendrikus Johannes Marinus Van Abeelen ,  Henricus Petrus Versteijnen ,  Paula Steffens

发明人： Johannes Henricus Wilhelmus Jacobs ,  Martinus Hendrikus Antonius Leenders ,  Frits Van der Meulen ,  Joost Jeroen Ottens ,  Anko Jozef Cornelus Sijben ,  Wouterus Johannes Petrus Maria Maas ,  Hendrikus Johannes Marinus Van Abeelen ,  Henricus Petrus Versteijnen ,  Paula Steffens

IPC分类号： G03B27/52 ,  G03B27/58

CPC分类号： G03F7/70875 ,  G03F7/70341 ,  G03F7/70716

摘要： A substrate table is disclosed in which heaters are provided to account for a heat load which may be applied to the substrate. The heaters are grouped in segments to improve control. A temperature sensor per segment may be provided. The temperature sensor may be embedded in the substrate table.

摘要翻译： 公开了一种衬底台，其中提供加热器以考虑可施加于衬底的热负荷。 加热器分段分段以改善控制。 可以提供每个段的温度传感器。 温度传感器可以嵌入在基板台中。

公开(公告)号：US20110279800A1

公开(公告)日：2011-11-17

申请号：US13194136

申请日：2011-07-29

申请人： Joeri Lof ,  Erik Theodorus Maria Bijlaart ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Arie Jeffrey Maria Den Boef ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Marcus Adrianus Van De Kerkhof ,  Aleksey Yurievich Kolesnychenko ,  Mark Kroon ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Joost Jeroen Ottens ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

发明人： Joeri Lof ,  Erik Theodorus Maria Bijlaart ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Arie Jeffrey Maria Den Boef ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Marcus Adrianus Van De Kerkhof ,  Aleksey Yurievich Kolesnychenko ,  Mark Kroon ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Joost Jeroen Ottens ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

IPC分类号： G03B27/42

CPC分类号： G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.

公开(公告)号：US20110273678A1

公开(公告)日：2011-11-10

申请号：US13187055

申请日：2011-07-20

申请人： Nicolaas Rudolf KEMPER ,  Sjoerd Nicolaas Lambertus Donders ,  Joost Jeroen Ottens ,  Edwin Cornelis Kadijk ,  Sergei Shulepov

发明人： Nicolaas Rudolf KEMPER ,  Sjoerd Nicolaas Lambertus Donders ,  Joost Jeroen Ottens ,  Edwin Cornelis Kadijk ,  Sergei Shulepov

IPC分类号： G03B27/52

CPC分类号： G03B27/42 ,  G03F7/70341 ,  G03F7/70716

摘要： Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.

公开(公告)号：US07864292B2

公开(公告)日：2011-01-04

申请号：US11404091

申请日：2006-04-14

申请人： Martinus Hendrikus Antonius Leenders ,  Nicolaas Rudolf Kemper ,  Joost Jeroen Ottens

发明人： Martinus Hendrikus Antonius Leenders ,  Nicolaas Rudolf Kemper ,  Joost Jeroen Ottens

IPC分类号： G03B27/42

CPC分类号： G03F7/70866 ,  G03F7/70341

摘要： An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.

摘要翻译： 公开了一种浸没式光刻设备，其中液体供应系统（其在投影系统和基板之间提供液体）的至少一部分可在扫描期间在基本上平行于基板的顶表面的平面中移动。 移动部件以减小该部件与基板之间的相对速度，使得可以相对于投影系统移动基板的速度。

公开(公告)号：US07804582B2

公开(公告)日：2010-09-28

申请号：US11494794

申请日：2006-07-28

申请人： Koen Jacobus Johannes Maria Zaal ,  Joost Jeroen Ottens ,  Judocus Marie Dominicus Stoeldraijer ,  Antonius Johannes De Kort ,  Franciscus Van De Mast ,  Marteijn De Jong

发明人： Koen Jacobus Johannes Maria Zaal ,  Joost Jeroen Ottens ,  Judocus Marie Dominicus Stoeldraijer ,  Antonius Johannes De Kort ,  Franciscus Van De Mast ,  Marteijn De Jong

IPC分类号： G03B27/58

CPC分类号： G03F7/70858 ,  G03F7/70516 ,  G03F7/70775

摘要： A lithographic apparatus includes a system to compensate for the effect of thermal distortion of the substrate table on position measurements of the substrate table using lateral mirrors in the substrate table. Methods of calibrating a lithographic apparatus using various substrate table scan trajectories and measurements of the localized position and rotation of lateral mirrors in the substrate table are presented. A dual stage lithographic apparatus with alignment marks defining the geometry of a lateral mirror used only at the exposure station to measure the geometry of the lateral mirror when the substrate table is at the measurement station.

摘要翻译： 光刻设备包括一个系统，用于补偿衬底台的热变形对衬底台的位置测量的影响，使用衬底台中的侧视镜。 提出了使用各种衬底台扫描轨迹校准光刻设备的方法以及衬底台中横向镜的局部位置和旋转的测量。 具有对准标记的双级光刻设备，其限定仅在曝光站处使用的侧视镜的几何形状，以便当衬底台位于测量站时测量侧视镜的几何形状。

公开(公告)号：US07751027B2

公开(公告)日：2010-07-06

申请号：US11454129

申请日：2006-06-16

申请人： Johannes Henricus Wilhelmus Jacobs ,  Igor Petrus Maria Bouchoms ,  Nicolaas Ten Kate ,  Nicolaas Rudolf Kemper ,  Martinus Hendrikus Antonius Leenders ,  Erik Roelof Loopstra ,  Joost Jeroen Ottens ,  Martinus Cornelis Maria Verhagen ,  Yücel Kök ,  Johannes Van Es ,  Herman Boom ,  Franciscus Johannes Joseph Janssen

发明人： Johannes Henricus Wilhelmus Jacobs ,  Igor Petrus Maria Bouchoms ,  Nicolaas Ten Kate ,  Nicolaas Rudolf Kemper ,  Martinus Hendrikus Antonius Leenders ,  Erik Roelof Loopstra ,  Joost Jeroen Ottens ,  Martinus Cornelis Maria Verhagen ,  Yücel Kök ,  Johannes Van Es ,  Herman Boom ,  Franciscus Johannes Joseph Janssen

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/72 ,  G03B27/32

CPC分类号： G03F7/70875 ,  G03F7/70341 ,  G03F7/70716

摘要： Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation controller and/or condensation controller acting to decrease localized evaporation and/or increase localized condensation in response to the information in the timetable. Evaporation of liquid from the surface of the substrate cools it down, while condensing liquid on its bottom surface heats the substrate locally.