摘要:
A door device for a vehicle includes a cable for connecting a handle device and a lock unit. A cable holding member mounted to the handle device is displaced between an engagement position in which the cable holding member engages with the cable and a non-engagement position in which the cable holding member does not engage with the cable. A contact portion of a door panel is configured such that when the handle device is being mounted to the door panel, the contact portion contacts the cable holding member in the non-engagement position and interferes with the assembly of the handle device to the door panel and the contact portion does not contact the cable holding member in the engagement position.
摘要:
A focusing device comprises a first imaging optical system, a second imaging optical system which splits the optical image in the direction of an AF sensor and further splits the optical image so that a front focus image in which the point that is in focus is in front of the optical image on the inspecting sensor and a back focus image in which the point that is in focus is behind the optical image on the inspecting sensor are formed on the AF sensor, a focus detecting circuit which detects an optimum focus position on the basis of a high-frequency component of a front sensor image in a front focus position and a high-frequency component of a back sensor image in a back focus position, and a focus control circuit which controls the focusing of the first imaging optical system on the basis of the focus position.
摘要:
An electron gun arrangement for color cathode-ray tubes comprising three cathodes for emitting electron beams, for example, for red, green and blue, and a main electron lens comprising three front electron lenses corresponding to the cathodes, respectively, and a back electron lens common to all the cathodes. Each front electron lens is formed with an aperture smaller than that of the back electron lens and is mounted so as to meet Fraunhofer conditions so that aberration is reduced. Electron beam transmitting apertures are formed in the grids forming the front electron lenses, respectively, with the respective center axes thereof parallel to each other, which makes it easy to manufacture the electron gun arrangement and enables accurate machining during manufacturing.
摘要:
A method and system for imaging an object to be inspected and obtaining an optical image; creating a reference image from design pattern data; preparing an inspection recipe including one or more templates and parameter settings necessary for the inspection; checking the pattern and the template against each other, and selecting the reference image which corresponds to the template; detecting first and second edges in the selected reference image in accordance with the parameter setting using determined coordinates as a reference; detecting first and second edges in the optical image, this optical image corresponds to the selected reference image; and determining an inspection value by acquiring the difference between the line width of the optical image and the reference image using the first edge and second edge of the reference image and the first edge and second edges of the optical image.
摘要:
According to one embodiment, a pattern inspection apparatus includes a first inspection data creation section, a first delay section, a first recognition section, a first extraction section, a first and a second level difference calculation section, a first and a second determination section, and a first logic OR calculation section. The first extraction section extracts data of a sub-resolution pattern from the first inspection data and the first delay data. The first and second level difference calculation section calculate differences between an average output level of a surrounding region for a target pixel of the extracted data from the first inspection data or the first delay data and an output level of the extracted data. The first and second determination sections determine presence or absence of a defect. The first logic OR calculation section calculates logic OR of determination results of the first and second determination sections.
摘要:
A method for inspecting a photomask, comprising generating a laser beam, changing a phase of the laser beam to smooth the brightness distribution of the laser beam, applying the smoothed laser beam to the photomask, acquiring an image of the photomask using a sensor while the laser beam and the photomask are relatively moved, examining the image of the photomask for a defect of the mask-pattern of the photomask.
摘要:
The pattern edge direction in reference image data of an object to be examined is detected, the reference image data is differentiated using a differential operator in a direction along the pattern edge direction, and inspection image data obtained by picking up an image of the object to be inspected is differentiated using the differential operator in the direction along the pattern edge direction. The differential data obtained by the differential processing are compared with the inspection image data, and a pattern defect on the object to be inspected is detected based on the difference between these data.
摘要:
A conductive paste composition is described, which comprises an epoxy resin having a diglycidylamino group, a resol type phenol curing agent, and copper powder. The paste composition exhibits excellent moisture resistance and adhesion and provides a cured film of high conductivity level.
摘要:
A pair of edges that are located at ends as viewed in the widthwise direction of a design pattern are recognized. On the basis of the edge direction in which the paired edges are recognized, edge points on the design pattern are detected as sub-pixels. The widthwise dimension of the design pattern is calculated on the basis of the edge points. In addition, the widthwise dimension of a circuit pattern is calculated at the same position as the widthwise dimension of the design pattern. On the basis of the calculated widthwise dimensions, the semiconductor wafer circuit pattern is checked.
摘要:
An apparatus for inspecting a pattern, including: at least one of a first floodlight system for inspection by transmissive light and a second floodlight system for inspection by reflective light; an inspection optical system for capturing an image of the pattern on an object under inspection; and a stage for mounting and moving the object under inspection. The one of the first floodlight system and the second floodlight system includes a diffracted light control means for enhancing light diffracted by the pattern.