公开(公告)号：US4592625A

公开(公告)日：1986-06-03

申请号：US469015

申请日：1983-02-23

申请人： Makoto Uehara ,  Satoru Anzai ,  Kyoichi Suwa

发明人： Makoto Uehara ,  Satoru Anzai ,  Kyoichi Suwa

IPC分类号： G02B13/22 ,  G02B19/00 ,  G02B21/08 ,  G02B27/00 ,  G03F7/20 ,  G01B11/00

CPC分类号： G03F7/70241 ,  G02B13/22

摘要： A double-conjugate maintaining optical system for maintaining the conjugate relation between an object and its image even if the distance between the object and the image varies and also maintaining another set of conjugate relation in a predetermined condition includes an afocal system comprising a plurality of lens units, a first positive lens unit disposed on the object side of the afocal system, and a second positive lens unit disposed on the image side of the afocal system. The first positive lens unit is movable relative to the second positive lens unit so that the object is positioned on the focal plane of the first positive lens unit opposite to the afocal system. The afocal system is movable along the optical axis thereof in a predetermined relation with the first positive lens unit.

摘要翻译： 即使物体与图像之间的距离发生变化并且在预定条件下也保持另一组共轭关系的双重共轭维持光学系统，用于保持物体与其图像之间的共轭关系，包括包括多个透镜的无焦点系统 设置在无焦点系统的物体侧的第一正透镜单元和设置在无焦系统的像侧上的第二正透镜单元。 第一正透镜单元可相对于第二正透镜单元移动，使得物体位于与无焦系统相对的第一正透镜单元的焦平面上。 无焦点系统可以沿其光轴以与第一正透镜单元预定的关系移动。

公开(公告)号：US4566795A

公开(公告)日：1986-01-28

申请号：US586639

申请日：1984-03-06

申请人： Toshio Matsuura ,  Kyoichi Suwa

发明人： Toshio Matsuura ,  Kyoichi Suwa

IPC分类号： H01L21/30 ,  G01B11/00 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G01B11/27

CPC分类号： G03F9/7046 ,  G03F7/70358 ,  G03F9/7049

摘要： An alignment apparatus for aligning one of the substrates with the other by means of first and second reference marks comprises scanning means including a light beam generating means for reciprocally scanning first and second areas respectively by a light beam, discrimination means for generating a discrimination signal indicative of the scanning direction by the scanning means in synchronism with the scanning, first photoelectric means for generating a first signal when the first photoelectric means receives the light beam transmitted through a first area and separated by the first reference mark, second photoelectric means for generating a second signal when the second photoelectric means receives the light beam transmitted through the second area and separated by the second reference mark, operation means for determining the direction and amount of the relative deviation between the first and second reference marks from the first and second signals and from the discrimination signal, and means for moving one of the substrates relative to the other in response to the operation means. The alignment apparatus is simple in structure and can detect alignment marks with higher accuracy. The alignment apparatus enables the alignment of a wafer with a reticle or mask at higher speed and with higher preciseness.

摘要翻译： 用于通过第一和第二参考标记将一个基板与另一个基板对准的对准装置包括扫描装置，其包括用于分别由光束往复扫描第一和第二区域的光束产生装置，用于产生指示 所述第一光电装置用于当所述第一光电装置接收到透过第一区域并被所述第一参考标记分开的光束时产生第一信号;第二光电装置，用于产生第一信号， 第二信号，当第二光电装置接收到通过第二区域传输并被第二参考标记分隔的光束时，用于确定第一和第二参考标记与第一和第二信号之间的相对偏离的方向和量的操作装置，以及 从辨别信号 以及用于响应于操作装置移动基板之一相对于另一个的装置。 对准装置结构简单，可以更精确地检测对准标记。 对准装置使得能够以更高的速度和更高的精度将晶片与掩模版或掩模对准。

公开(公告)号：US4531060A

公开(公告)日：1985-07-23

申请号：US422007

申请日：1982-09-23

申请人： Kyoichi Suwa ,  Kazuo Kuramochi ,  Kiwao Nakazawa

发明人： Kyoichi Suwa ,  Kazuo Kuramochi ,  Kiwao Nakazawa

IPC分类号： H01L21/68 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F9/70

摘要： A method for positioning an object with patterns being formed thereon, employs a first device for extracting first information relative to patterns in a first region on the object, a second device for extracting second information relative to patterns from a second region including the first region on the object, an operating circuit to calculate a degree of coincidence between the first information and the second information, and a detecting circuit for detecting a position of the first region in the second region, whereby the position of the object can be reproduced with high reproducibility in accordance with the position as detected.

摘要翻译： 一种用于定位其上形成图案的物体的方法，采用第一装置，用于提取相对于物体上的第一区域中的图案的第一信息;第二装置，用于从包括第一区域的第二区域提取关于图案的图案的第二信息 该目的是计算第一信息和第二信息之间的一致度的操作电路，以及用于检测第二区域中的第一区域的位置的检测电路，从而能够以高再现性再现对象的位置 根据检测到的位置。

公开(公告)号：US5434026A

公开(公告)日：1995-07-18

申请号：US989909

申请日：1992-12-11

申请人： Norihiko Takatsu ,  Kyoichi Suwa ,  Shinichi Nakamura ,  Hiroaki Hosokawa ,  Shigeru Hirukawa

发明人： Norihiko Takatsu ,  Kyoichi Suwa ,  Shinichi Nakamura ,  Hiroaki Hosokawa ,  Shigeru Hirukawa

IPC分类号： G03F7/20 ,  G03F7/207 ,  H01L21/027 ,  H01L21/30 ,  G03C5/00

CPC分类号： G03F7/2022 ,  G03F7/70633 ,  G03F7/70641 ,  G03F7/70675

摘要： In a method for measuring a condition for exposing, at a predetermined energy quantity, a pattern formed on a mask onto a photosensitive substrate on which a resist image is formed on the surface thereof by using an exposing device, first patterns formed at a plurality of positions on the mask are successively exposed onto a plurality of partial regions on the photosensitive substrate while changing said exposure condition. Second patterns are, with overlapping, exposed onto at least a portion of the latent image of said first patterns formed in said partial regions due to said process while changing the exposure condition. A predetermined state where the resist image is formed on the resist layer after the development is detected so that the exposure condition is measured in accordance with the state.

摘要翻译： 在通过使用曝光装置测量以预定能量将形成在其上形成有抗蚀剂图像的感光基板上的掩模曝光的条件的方法中，形成多个 在改变所述曝光条件的同时，将掩模上的位置依次曝光在感光基板上的多个部分区域上。 在改变曝光条件的同时，由于所述处理，第二图案重叠地暴露在形成在所述部分区域中的所述第一图案的至少一部分潜像上。 在显影后在抗蚀剂层上形成抗蚀剂图像的预定状态，使得根据状态测量曝光条件。

公开(公告)号：US4806987A

公开(公告)日：1989-02-21

申请号：US135377

申请日：1987-12-21

申请人： Takashi Mori ,  Koichi Matsumoto ,  Tsutomu Takai ,  Masaichi Murakami ,  Kyoichi Suwa

发明人： Takashi Mori ,  Koichi Matsumoto ,  Tsutomu Takai ,  Masaichi Murakami ,  Kyoichi Suwa

IPC分类号： H01L21/30 ,  G03F7/20 ,  H01L21/027 ,  G03B27/42

CPC分类号： G03F7/70475

摘要： A projection-exposing apparatus comprises a projecting optical system for projecting an image of a reticle having a predetermined pattern onto a wafer, and a stage for causing a relative shifting movement between a position of the wafer and a position of the reticle. A first exposure is effected for projecting and exposing the reticle image pattern from the projection optical system in a first area on the wafer and then the stage is shifted by a predetermined amount to effect second exposure for projecting and exposing the reticle image pattern in a second area positioned adjacent to the first area on the wafer thereby the reticle image being projected and exposed onto different areas on the same wafer. The stage causes the relative shifting movement between the reticle and the wafer in such a manner that the reticle image pattern obtained by the first exposure and the reticle image pattern obtained by the second exposure are overlapped with each other on the wafer by a predetermined amount.

摘要翻译： 投影曝光装置包括投影光学系统，用于将具有预定图案的掩模版的图像投影到晶片上，以及用于在晶片的位置和光罩之间进行相对移动的台。 进行第一曝光以在晶片上的第一区域中投影和曝光来自投影光学系统的标线片图像图案，然后将该台移动预定量，以进行第二次曝光，以在第二曝光中投影和曝光标线图像图案 区域定位成与晶片上的第一区域相邻，从而掩模版图像被投影并暴露在同一晶片上的不同区域上。 该阶段以这样的方式引起标线片和晶片之间的相对移动运动，使得通过第一曝光获得的标线图像图案和通过第二次曝光获得的标线图像图案在晶片上彼此重叠预定量。

公开(公告)号：US4770533A

公开(公告)日：1988-09-13

申请号：US51203

申请日：1987-05-18

申请人： Kyoichi Suwa

发明人： Kyoichi Suwa

IPC分类号： G03F1/00 ,  G03F1/38 ,  G03F1/42 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/68 ,  G01B11/00

CPC分类号： G03F9/7023 ,  G03F9/7076

摘要： An apparatus for detecting a position of a semiconductor wafer comprises a linear alignment mark formed on a surface of the wafer along a pair of parallel straight lines extending in a given direction intersecting a radial direction of the wafer. The alignment mark includes at least two projection sections projected from the surface and spaced from each other in the given direction. Each of the projection sections has a first stepped edge provided on or along one of the pairs of straight lines and a second stepped edge provided on and along the other of the pair of straight lines, the pair of straight lines being separated from each other by a distance d', and each of the projection sections being defined such that the following relationship is satisfied:l'>d'where l' is the length of one of the projection sections in the given direction. A position of the alignment mark with respect to a direction intersecting the given direction is determined on the basis of light scattered by the first and second stepped edges.

摘要翻译： 用于检测半导体晶片的位置的装置包括沿着沿与晶片的径向相交的给定方向延伸的一对平行直线形成在晶片的表面上的线性对准标记。 对准标记包括从表面突出并且沿给定方向彼此间隔开的至少两个突出部分。 每个突出部分具有设置在一对直线上或沿着一对直线中的一个上的第一阶梯边缘，以及设置在该对直线上并沿着另一条直线的第二台阶边缘，该一对直线彼此分开通过 距离d'，并且每个投影部分被限定为使得满足以下关系：l'> d'其中l'是给定方向上的一个投影部分的长度。 基于由第一和第二台阶边缘散射的光来确定对准标记相对于与给定方向相交的方向的位置。

公开(公告)号：US4704020A

公开(公告)日：1987-11-03

申请号：US903500

申请日：1986-09-04

申请人： Masaichi Murakami ,  Hidemi Kawai ,  Kyoichi Suwa

发明人： Masaichi Murakami ,  Hidemi Kawai ,  Kyoichi Suwa

IPC分类号： H01L21/30 ,  G03F9/00 ,  H01L21/027 ,  H01L21/66 ,  H01L21/67 ,  G01B11/26

CPC分类号： G03F9/7023

摘要： A projection optical apparatus for projecting the pattern of a mask onto a substrate through a projection optical system includes a stage for supporting thereon a substrate having a plurality of marks for detection on the surface thereof, first detecting means for detecting the amount of inclination of the surface of the substrate relative to the surface on which the pattern is projected and imaged, through the projection optical system, second detecting means for detecting the amount of inclination of the surface of the substrate relative to a predetermined reference plane independently of the projection optical system, and calibrating means for calibrating the amount of inclination detected by the second detecting means on the basis of the amount of inclination detected by the first detecting means.

摘要翻译： 一种用于通过投影光学系统将掩模的图案投影到基板上的投影光学装置包括：用于在其上表面支撑具有多个用于检测的标记的基板的台，用于检测其上的倾斜量的第一检测装置 通过投影光学系统相对于图案投射和成像的表面的基板的表面，用于独立于投影光学系统检测基板相对于预定参考平面的表面的倾斜量的第二检测装置 以及校准装置，用于基于由第一检测装置检测到的倾斜量来校准由第二检测装置检测到的倾斜量。

公开(公告)号：US4699515A

公开(公告)日：1987-10-13

申请号：US705699

申请日：1985-02-26

申请人： Akikazu Tanimoto ,  Toshio Matsuura ,  Kyoichi Suwa

发明人： Akikazu Tanimoto ,  Toshio Matsuura ,  Kyoichi Suwa

IPC分类号： G03F9/00 ,  G01B11/00

CPC分类号： G03F9/70

摘要： In an exposure apparatus for manufacturing semiconductor devices, a pattern on a photomask is aligned with a plurality of patterns formed on a wafer in a manner that detects and corrects misalignment, including, inter alia, rotational errors, not only between a photomask and a wafer, but also between a photomask and individual chips formed on the wafer, so that pattern matching is attained with very high accuracy. Apparatus for achieving this result employs different arrangements of alignment marks together with optical systems and positional adjustment devices.

摘要翻译： 在用于制造半导体器件的曝光装置中，光掩模上的图案以形成在晶片上的多个图案与检测和校正不对准的方式对准，包括尤其是除了光掩模和晶片之间的旋转误差 ，而且在光掩模和形成在晶片上的单个芯片之间，使得以非常高的精度获得图案匹配。 用于实现该结果的装置与光学系统和位置调整装置一起使用对准标记的不同布置。

公开(公告)号：US4666273A

公开(公告)日：1987-05-19

申请号：US844263

申请日：1986-03-25

申请人： Hisayuki Shimizu ,  Satoru Anzai ,  Hiroshi Tanaka ,  Kyoichi Suwa

发明人： Hisayuki Shimizu ,  Satoru Anzai ,  Hiroshi Tanaka ,  Kyoichi Suwa

IPC分类号： G03F7/20 ,  G03B27/42

CPC分类号： G03F7/70241 ,  G03F7/70858 ,  G03F7/70883 ,  G03F7/70891

摘要： An apparatus for projecting the image of an object onto a substrate comprises light source means for supplying light energy for illuminating the object, optical means for forming the image of the object on the substrate, the image magnification of the optical means being heated and varied by the light energy from the light source means, means for monitoring the manner in which the light energy is applied to the optical means, means for determining the variation in the image magnification of the optical means in response to the monitor means, and means for adjusting the size of the image formed on the substrate in response to the determining means.

摘要翻译： 用于将物体的图像投影到基板上的装置包括用于提供用于照射物体的光能的光源装置，用于在基板上形成物体的图像的光学装置，光学装置的图像放大率被加热和变化 来自光源的光能意味着，用于监视光能被施加到光学装置的方式的装置，用于响应于监视装置确定光学装置的图像放大率的变化的装置，以及用于调节装置 响应于确定装置在基板上形成的图像的尺寸。

公开(公告)号：US06855997B2

公开(公告)日：2005-02-15

申请号：US09729339

申请日：2000-12-05

申请人： Kyoichi Suwa

发明人： Kyoichi Suwa

IPC分类号： H01L21/027 ,  G03F1/00 ,  G03F1/38 ,  G03F1/44 ,  G03F1/84 ,  G03F7/20 ,  H01L21/66 ,  H01L23/544 ,  H01L31/0232

CPC分类号： G03F1/44 ,  G03F1/84 ,  G03F7/70625 ,  H01L22/34 ,  H01L2924/0002 ,  H01L2924/00

摘要： A mask of the present invention has a circuit pattern to be transferred to a substrate via an optical system, and an inspection pattern to be used for a measurement of a line width of the pattern transferred to the substrate. By using such a mask, the time for proceeding from inspection to actual device exposure can be shortened.

摘要翻译： 本发明的掩模具有经由光学系统传送到基板的电路图案，以及用于测量转印到基板的图案的线宽的检查图案。 通过使用这样的掩模，可以缩短从检查到实际的设备曝光的时间。