Magnetic domain wall shift register memory devices with high magnetoresistance ratio structures
    15.
    发明授权
    Magnetic domain wall shift register memory devices with high magnetoresistance ratio structures 有权
    具有高磁阻比结构的磁畴壁移位寄存器存储器件

    公开(公告)号:US09431600B2

    公开(公告)日:2016-08-30

    申请号:US14506798

    申请日:2014-10-06

    Abstract: A device includes a seed layer, a magnetic track layer disposed on the seed layer, an alloy layer disposed on the magnetic track layer, a tunnel barrier layer disposed on the alloy layer, a pinning layer disposed on the tunnel barrier layer, a synthetic antiferromagnetic layer spacer disposed on the pinning layer, a pinned layer disposed on the synthetic antiferromagnetic spacer layer and an antiferromagnetic layer disposed on the pinned layer, and another device includes a seed layer, an antiferromagnetic layer disposed on the seed layer, a pinned layer disposed on the antiferromagnetic layer, a synthetic antiferromagnetic layer spacer disposed on the pinned layer, a pinning layer disposed on the synthetic antiferromagnetic layer spacer, a tunnel barrier layer disposed on the pinning layer, an alloy layer disposed on the tunnel barrier layer and a magnetic track layer disposed on alloy layer.

    Abstract translation: 一种器件包括种子层,设置在种子层上的磁道层,设置在磁道层上的合金层,设置在合金层上的隧道势垒层,设置在隧道势垒层上的钉扎层,合成反铁磁性 设置在钉扎层上的层间隔层,设置在合成反铁磁间隔层上的钉扎层和设置在钉扎层上的反铁磁层,另一装置包括种子层,设置在种子层上的反铁磁层,被钉扎层设置在 反铁磁层,设置在被钉扎层上的合成反铁磁层间隔物,设置在合成反铁磁层间隔物上的钉扎层,设置在钉扎层上的隧道势垒层,设置在隧道势垒层上的合金层和磁道层 放置在合金层上。

    MAGNETIC DOMAIN WALL SHIFT REGISTER MEMORY DEVICES WITH HIGH MAGNETORESISTANCE RATIO STRUCTURES
    16.
    发明申请
    MAGNETIC DOMAIN WALL SHIFT REGISTER MEMORY DEVICES WITH HIGH MAGNETORESISTANCE RATIO STRUCTURES 有权
    具有高磁性比例结构的磁性域移位寄存器存储器件

    公开(公告)号:US20160099404A1

    公开(公告)日:2016-04-07

    申请号:US14506798

    申请日:2014-10-06

    Abstract: A device includes a seed layer, a magnetic track layer disposed on the seed layer, an alloy layer disposed on the magnetic track layer, a tunnel barrier layer disposed on the alloy layer, a pinning layer disposed on the tunnel barrier layer, a synthetic antiferromagnetic layer spacer disposed on the pinning layer, a pinned layer disposed on the synthetic antiferromagnetic spacer layer and an antiferromagnetic layer disposed on the pinned layer, and another device includes a seed layer, an antiferromagnetic layer disposed on the seed layer, a pinned layer disposed on the antiferromagnetic layer, a synthetic antiferromagnetic layer spacer disposed on the pinned layer, a pinning layer disposed on the synthetic antiferromagnetic layer spacer, a tunnel barrier layer disposed on the pinning layer, an alloy layer disposed on the tunnel barrier layer and a magnetic track layer disposed on alloy layer.

    Abstract translation: 一种器件包括种子层,设置在种子层上的磁道层,设置在磁道层上的合金层,设置在合金层上的隧道势垒层,设置在隧道势垒层上的钉扎层,合成反铁磁性 设置在钉扎层上的层间隔层,设置在合成反铁磁间隔层上的钉扎层和设置在钉扎层上的反铁磁层,另一装置包括种子层,设置在种子层上的反铁磁层,被钉扎层设置在 反铁磁层,设置在被钉扎层上的合成反铁磁层间隔物,设置在合成反铁磁层间隔物上的钉扎层,设置在钉扎层上的隧道势垒层,设置在隧道势垒层上的合金层和磁道层 放置在合金层上。

    Magnetic materials with enhanced perpendicular anisotropy energy density for STT-RAM
    17.
    发明授权
    Magnetic materials with enhanced perpendicular anisotropy energy density for STT-RAM 有权
    具有增强的垂直各向异性能量密度的磁性材料用于STT-RAM

    公开(公告)号:US09059399B2

    公开(公告)日:2015-06-16

    申请号:US13911602

    申请日:2013-06-06

    Inventor: Guohan Hu

    CPC classification number: H01L43/12 H01L43/08 H01L43/10

    Abstract: A mechanism is provided for a spin torque transfer random access memory device. A reference layer is disposed on a seed layer. A tunnel barrier is disposed on the reference layer. A free layer is disposed on the tunnel barrier. A cap layer is disposed on the free layer. The free layer includes a magnetic layer and a metal oxide layer, in which the magnetic layer is disposed on the tunnel barrier and the metal oxide layer is disposed on the magnetic layer. A metal material used in the metal oxide layer includes at least one of Ti, Ta, Ru, Hf, Al, La, and any combination thereof.

    Abstract translation: 提供了一种用于自旋转矩传递随机存取存储器件的机构。 参考层设置在种子层上。 隧道势垒设置在参考层上。 自由层设置在隧道屏障上。 盖层设置在自由层上。 自由层包括磁性层和金属氧化物层,其中磁性层设置在隧道势垒上,金属氧化物层设置在磁性层上。 用于金属氧化物层的金属材料包括Ti,Ta,Ru,Hf,Al,La中的至少一种及其任何组合。

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