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11.发明授权Integrated circuit manufacturing methods with patterning device position determination 有权具有图案形成装置位置确定的集成电路制造方法公开(公告)号：US07804584B2
公开(公告)日：2010-09-28
申请号：US12262647
申请日：2008-10-31
申请人： Petrus Rutgerus Bartray , Wilhelmus Josephus Box , Dominicus Jacobus Petrus Adrianus Franken , Bernardus Antonius Johannes Luttikhuis , Engelbertus Antonius Franciscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst , Marc Johannes Martinus Engels
发明人： Petrus Rutgerus Bartray , Wilhelmus Josephus Box , Dominicus Jacobus Petrus Adrianus Franken , Bernardus Antonius Johannes Luttikhuis , Engelbertus Antonius Franciscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst , Marc Johannes Martinus Engels
CPC分类号： G03F7/70716 , G03F7/70775
摘要： Methods of manufacturing an integrated circuit by a lithographic apparatus are disclosed. The methods include patterning a radiation beam with a patterning device, projecting the patterned beam onto a substrate using a projection system, and determining the position of the patterning device. In one example, the patterning device's position relative to the projection system is determined by measuring the position of the patterning device's support structure. In another example, the position can be determined by measuring a position of the patterning device relative to its support and by measuring a position of the support. In another example, a Z-position of the patterning device is determined by directing at least one beam of radiation onto a part of the patterning device located outside a pattern area. This can be done by directing a pair of laser beams from sensors on the projection system to reflecting strips on the patterning device.
摘要翻译： 公开了通过光刻设备制造集成电路的方法。 所述方法包括用图案形成装置图案化辐射束，使用投影系统将图案化的光束投射到衬底上，并且确定图案形成装置的位置。 在一个示例中，图案形成装置相对于投影系统的位置通过测量图案形成装置的支撑结构的位置来确定。 在另一示例中，位置可以通过测量图案形成装置相对于其支撑件的位置并通过测量支撑件的位置来确定。 在另一示例中，通过将至少一束辐射引导到位于图案区域外的图案形成装置的一部分来确定图案形成装置的Z位置。 这可以通过将一对激光束从投影系统上的传感器引导到图案形成装置上的反射条来实现。
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12.发明授权Lithographic apparatus and device manufacturing method utilizing a substrate handler 有权利用基板处理器的平版印刷设备和器件制造方法公开(公告)号：US07538857B2
公开(公告)日：2009-05-26
申请号：US11157201
申请日：2005-06-21
申请人： Hernes Jacobs , Harmen Klaas Van Der Schoot , Petrus Matthijs Henricus Vosters , Bernardus Antonius Johannes Luttikhuis
发明人： Hernes Jacobs , Harmen Klaas Van Der Schoot , Petrus Matthijs Henricus Vosters , Bernardus Antonius Johannes Luttikhuis
CPC分类号： G03F7/7075 , G03F7/70691 , G03F7/70733 , G03F7/70791
摘要： A substrate handler for moving a substrate relative to a substrate table of a lithographic apparatus. The substrate handler comprises at least one support surface or platform adapted to carry a plurality of independent substrates simultaneously. The substrate handler adapted to load substrates onto and unload substrates from the substrate table before and after exposure.
摘要翻译： 一种用于相对于光刻设备的衬底台移动衬底的衬底处理器。 衬底处理器包括至少一个支撑表面或平台，其适于同时承载多个独立衬底。 衬底处理器适于在曝光之前和之后将衬底加载到衬底台上并从衬底台卸载衬底。
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13.发明授权公开(公告)号：US07483120B2
公开(公告)日：2009-01-27
申请号：US11430196
申请日：2006-05-09
申请人： Bernardus Antonius Johannes Luttikhuis , Henrikus Herman Marie Cox , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Harmen Klaas Van Der Schoot
发明人： Bernardus Antonius Johannes Luttikhuis , Henrikus Herman Marie Cox , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Harmen Klaas Van Der Schoot
CPC分类号： G03B27/53 , G03F7/70733 , G03F7/70775
摘要： A displacement measurement system, in particular for measuring the displacement of a substrate table in a lithographic apparatus relative to a reference frame is presented. The displacement measure system includes a plurality of displacement sensors mounted to the substrate table and a target associated with each displacement sensor mounted to the reference frame.
摘要翻译： 提出了一种位移测量系统，特别是用于测量光刻设备中的衬底台相对于参考系的位移。 位移测量系统包括安装到衬底台的多个位移传感器和与安装到参考框架的每个位移传感器相关联的目标。
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公开(公告)号：US07253875B1
公开(公告)日：2007-08-07
申请号：US11366803
申请日：2006-03-03
申请人： Bernardus Antonius Johannes Luttikhuis , Engelbertus Antonius Fransiscus Van Der Pasch , Ronald Van Der Ham , Niek Jacobus Johannes Roset
发明人： Bernardus Antonius Johannes Luttikhuis , Engelbertus Antonius Fransiscus Van Der Pasch , Ronald Van Der Ham , Niek Jacobus Johannes Roset
CPC分类号： G03F7/70858 , G03F7/70775 , G03F7/70908
摘要： A lithographic apparatus includes a measurement system to measure the position and/or movement of a substrate support relative to a reference frame. The measurement system includes a target mounted to one of the substrate support and the reference frame, a radiation source mounted to the other one of the substrate support and the reference frame and a sensor configured to detect a pattern of radiation propagating from the target, indicating the position or movement of the substrate support. The substrate support includes one or more gas outlets configured to provide a flow of gas that encapsulates the volume of space through which the beam of radiation propagates to the target.
摘要翻译： 光刻设备包括用于测量衬底支撑件相对于参考框架的位置和/或运动的测量系统。 测量系统包括安装到基板支撑件和参考框架中的一个的目标，安装到基板支撑件和参考框架中的另一个的辐射源以及被配置为检测从目标传播的辐射图案的传感器，指示 衬底支撑件的位置或运动。 衬底支撑件包括一个或多个气体出口，其构造成提供封装辐射束通过其传播到靶的空间体积的气体流。
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公开(公告)号：US08289498B2
公开(公告)日：2012-10-16
申请号：US12483703
申请日：2009-06-12
申请人： Erik Roelof Loopstra , Petrus Rutgerus Bartray , Leon Martin Levasier , Bernardus Antonius Johannes Luttikhuis , Josephus Jacobus Smits , Anthonie Aantjes , Maurice Willem Jozef Etiënne Wijckmans , Johannes Bernardus Ridder , Andre Schreuder , Dennis Jozef Maria Paulussen , Peter Gerardus Jonkers , Hugues Poincelin , Fransiscus Theresia Noel Heusschen
发明人： Erik Roelof Loopstra , Petrus Rutgerus Bartray , Leon Martin Levasier , Bernardus Antonius Johannes Luttikhuis , Josephus Jacobus Smits , Anthonie Aantjes , Maurice Willem Jozef Etiënne Wijckmans , Johannes Bernardus Ridder , Andre Schreuder , Dennis Jozef Maria Paulussen , Peter Gerardus Jonkers , Hugues Poincelin , Fransiscus Theresia Noel Heusschen
CPC分类号： G03F7/709 , G03F7/70808
摘要： A lithographic apparatus includes a projection system configured to project an image onto a substrate, a substrate table configured to support the substrate, a first chamber that at least partially surrounds the projection system, and a second chamber that at least partially surrounds the substrate table and a first frame. The apparatus includes a base frame configured to support the second chamber, and an intermediate frame coupled to the base frame. The intermediate frame is configured to separate the first chamber and the second chamber. The apparatus includes a support coupled to the first frame. The support is configured to support the first chamber through a coupled opening in the intermediate frame and the second chamber.
摘要翻译： 光刻设备包括：投影系统，被配置为将图像投影到基板上;衬底台，其被配置为支撑所述基板;第一室，其至少部分地围绕所述投影系统;以及第二室，其至少部分地围绕所述基板台; 第一帧。 该装置包括被配置为支撑第二室的基座框架，以及耦合到该底座框架的中间框架。 中间框架构造成分离第一室和第二室。 该装置包括耦合到第一框架的支撑件。 支撑构造成通过中间框架和第二室中的联接开口支撑第一室。
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16.发明授权Lithographic apparatus, device manufacturing method and exchangeable optical element 有权光刻设备，器件制造方法和可交换光学元件公开(公告)号：US07724351B2
公开(公告)日：2010-05-25
申请号：US11341894
申请日：2006-01-30
申请人： Erik Roelof Loopstra , Adrianus Franciscus Petrus Engelen , Bernardus Antonius Johannes Luttikhuis , Maria Johanna Agnes Rubingh , Johannes Martinus Andreas Hazenberg , Laurentius Catrinus Jorritsma , Johannes Wilhelmus De Klerk , Bernhard Geuppert , Aart Adrianus Van Beuzekom , Petrus Franciscus Wilhelmus Maria Mandigers , Franz Sorg , Peter Deufel , Peter Schaap
发明人： Erik Roelof Loopstra , Adrianus Franciscus Petrus Engelen , Bernardus Antonius Johannes Luttikhuis , Maria Johanna Agnes Rubingh , Johannes Martinus Andreas Hazenberg , Laurentius Catrinus Jorritsma , Johannes Wilhelmus De Klerk , Bernhard Geuppert , Aart Adrianus Van Beuzekom , Petrus Franciscus Wilhelmus Maria Mandigers , Franz Sorg , Peter Deufel , Peter Schaap
CPC分类号： G03F7/70308 , G03F7/70825 , G03F7/70933
摘要： A lithographic apparatus has an assembly to exchange optical elements in a pupil plane of its projection system. The optical elements may be pupil filters and may conform to the physical dimensions specified for a reticle standard, e.g. having sides substantially equal to 5, 6 or 9 inches.
摘要翻译： 光刻设备具有在其投影系统的光瞳平面中交换光学元件的组件。 光学元件可以是光瞳滤光器，并且可以符合对于掩模版标准规定的物理尺寸，例如。 侧面基本上等于5,6或9英寸。
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17.发明申请Lithographic Apparatus and Device Manufacturing Method Utilizing a Substrate Handler 有权利用基板处理器的平版印刷设备和器件制造方法公开(公告)号：US20100085553A1
公开(公告)日：2010-04-08
申请号：US12639457
申请日：2009-12-16
申请人： Hernes Jacobs , Bernardus Antonius Johannes Luttikhuis , Harmen Klaas Van Der Schoot , Petrus Matthijs Henricus Vosters
发明人： Hernes Jacobs , Bernardus Antonius Johannes Luttikhuis , Harmen Klaas Van Der Schoot , Petrus Matthijs Henricus Vosters
CPC分类号： G03F7/7075 , G03F7/70691 , G03F7/70733 , G03F7/70791
摘要： A substrate handler is provided. The substrate handler includes a support surface configured to carry a substrate and a pre-conditioning unit configured to pre-condition the substrate. The substrate handler is configured to move the substrate relative to a substrate table.
摘要翻译： 提供衬底处理器。 衬底处理器包括被配置为承载衬底的支撑表面和被配置为预处理衬底的预调节单元。 衬底处理器被配置为相对于衬底台移动衬底。
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18.发明授权Lithographic apparatus and device manufacturing method utilizing a substrate handler 有权利用基板处理器的平版印刷设备和器件制造方法公开(公告)号：US07656506B2
公开(公告)日：2010-02-02
申请号：US11320494
申请日：2005-12-29
申请人： Hernes Jacobs , Bernardus Antonius Johannes Luttikhuis , Harmen Klaas Van Der Schoot , Petrus Matthijs Henricus Vosters
发明人： Hernes Jacobs , Bernardus Antonius Johannes Luttikhuis , Harmen Klaas Van Der Schoot , Petrus Matthijs Henricus Vosters
CPC分类号： G03F7/7075 , G03F7/70691 , G03F7/70733 , G03F7/70791
摘要： A substrate handler for moving a substrate relative to a substrate table of a lithographic apparatus. The substrate handler comprises at least one support surface or platform adapted to carry a plurality of independent substrates simultaneously. The substrate handler adapted to load substrates onto and unload substrates from the substrate table before and after exposure.
摘要翻译： 一种用于相对于光刻设备的衬底台移动衬底的衬底处理器。 衬底处理器包括至少一个支撑表面或平台，其适于同时承载多个独立衬底。 衬底处理器适于在曝光之前和之后将衬底加载到衬底台上并从衬底台卸载衬底。
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19.发明授权公开(公告)号：US07576835B2
公开(公告)日：2009-08-18
申请号：US11175037
申请日：2005-07-06
申请人： Harmen Klaas Van Der Schoot , Hernes Jacobs , Bernardus Antonius Johannes Luttikhuis , Petrus Matthijs Henricus Vosters , Johannes Martinus Andreas Hazenberg , Aart Adrianus Van Beuzekom
发明人： Harmen Klaas Van Der Schoot , Hernes Jacobs , Bernardus Antonius Johannes Luttikhuis , Petrus Matthijs Henricus Vosters , Johannes Martinus Andreas Hazenberg , Aart Adrianus Van Beuzekom
CPC分类号： G03F7/70875 , G03F7/7075
摘要： Embodiments of the invention relates to a substrate handler for handling a substrate, including a conditioning device for conditioning the substrate. In an embodiment, the substrate handler includes a displacing device configured to displace the substrate in a direction substantially parallel to the support surface, wherein the displacing device is configured to displace the substrate during the conditioning process from one conditioning position to one or more other conditioning positions. According to another embodiment of the invention, the substrate handler includes a float device for providing an air bed above a support surface of the substrate handler, the substrate handler being configured to support the substrate on an air bed during conditioning of the substrate.
摘要翻译： 本发明的实施例涉及一种用于处理基板的基板处理器，包括用于调节基板的调节装置。 在一个实施例中，衬底处理器包括移位装置，其配置成在基本上平行于支撑表面的方向上移动衬底，其中，移位装置构造成在调节过程期间将衬底从一个调节位置移位到一个或多个其他调节 职位 根据本发明的另一实施例，衬底处理器包括用于在衬底处理器的支撑表面上方提供空气床的浮动装置，衬底处理器被配置为在衬底调节期间将衬底支撑在空气床上。
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20.发明授权Lithographic apparatus and device manufacturing method utilizing movement of clean air to reduce contamination 有权利用清洁空气的移动来减少污染的平版印刷设备和设备制造方法公开(公告)号：US07522258B2
公开(公告)日：2009-04-21
申请号：US11169305
申请日：2005-06-29
申请人： Bernardus Antonius Johannes Luttikhuis , Petrus Rutgerus Bartray , Wilhelmus Josephus Box , Marco Koert Stavenga , Thijs Harink
发明人： Bernardus Antonius Johannes Luttikhuis , Petrus Rutgerus Bartray , Wilhelmus Josephus Box , Marco Koert Stavenga , Thijs Harink
CPC分类号： G03F7/70916 , G03F7/7075 , G03F7/70791
摘要： A lithographic apparatus comprises a substrate table that supports a substrate and a substrate handler that moves the substrate relative to the substrate table. The substrate handler is adapted to load substrates on to and unload substrates from the substrate table before and after exposure. Also, a clean gas supply system supplies a clean gas to at least one location at which the substrate is located. The clean gas supply system is moveably mounted. A device manufacturing method utilizing the lithographic apparatus can be used to manufacture at least one of a flat panel display and an integrated circuit device.
摘要翻译： 光刻设备包括支撑衬底的衬底台和相对于衬底台移动衬底的衬底处理器。 衬底处理器适于在曝光之前和之后将衬底加载到衬底台上并从衬底台卸载衬底。 此外，清洁气体供应系统将清洁气体提供到至少一个位置，在该位置处衬底被定位。 清洁气体供应系统可移动安装。 利用光刻设备的器件制造方法可用于制造平板显示器和集成电路器件中的至少一个。
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