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公开(公告)号：US06352813B2
公开(公告)日：2002-03-05
申请号：US09102916
申请日：1998-06-23
IPC分类号： G03F7032
CPC分类号： G03F7/0382
摘要： A photosensitive resin composition in accordance with the present invention has (a) a polymer having repetition units expressed by a general formula (1): wherein R1, R3, and R5 each represents a hydrogen atom or a methyl group, R2 represents a bridged cyclic hydrocarbon group having a carbon number in the range of 7 to 22 inclusive, R4 represents a hydrocarbon group including an epoxy group, x+y+z=1, wherein 0
摘要翻译： 本发明的感光性树脂组合物具有（a）具有由通式（1）表示的重复单元的聚合物：其中R1，R3和R5各自表示氢原子或甲基，R2表示桥连环状 碳数为7〜22的烃基，R4表示包含环氧基的烃基，x + y + z = 1，其中0
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12.发明授权
公开(公告)号：US6140010A
公开(公告)日：2000-10-31
申请号：US140650
申请日：1998-08-26
IPC分类号： G03F7/004 , G03F7/033 , G03F7/038 , H01L21/027
CPC分类号： G03F7/038 , G03F7/0045
摘要： A negative type photoresist composition includes a polymer which contains a repetition unit which is expressed by a general chemical formula (1) and has a weight average molecule weight in a range of 1000 to 500000, a crosslinker composed of a compound which contains a functional group which is expressed by a general chemical formula (2), and a photo-acid generator which generates acid in response to a light. The general chemical formula (1) is as follows, ##STR1## where in the general chemical formula (1), R.sup.1 is a hydrogen atom or a methyl group, R.sup.2 is an alkylene group containing carbon atoms in a range of 7 to 18 and having a bridged cyclic hydrocarbon group. Also, the general chemical formula (2) is as follows, ##STR2## In the general chemical formula (2), X is a group expressed by a general chemical formula (3), a hydrogen atom, a hydrocarbon group containing carbon atoms in a range of 1 to 6, an alkoxy group containing carbon atoms in a range of 1 to 3, or a hydroxyl group, a1, a2 and a3 are 1 or 2, respectively, b1, b2 and b3 are 0 or 1, respectively, and a1+b1=2, a2+b2=2, and a3+b3=2, and R.sup.8 is a hydrogen atom, or an alkyl group containing carbon atoms in a range of 1 to 6. ##STR3##
摘要翻译： 负型光致抗蚀剂组合物包括含有由通式（1）表示的重复单元，重均分子量为1000〜500000的聚合物，由含有官能团的化合物构成的交联剂 其由一般化学式（2）表示，光生酸剂响应于光而产生酸。 一般化学式（1）如下，其中在通式（1）中，R 1为氢原子或甲基，R 2为碳原子数为7〜18的亚烷基，桥连 环状烃基。 另外，通式（2）中，通式（2）中，X为通式（3）表示的基团，氢原子，碳原子数为 1〜6中，碳原子数1〜3的烷氧基或羟基a1，a2，a3分别为1或2，b1，b2和b3分别为0或1，a1 + b1 = 2，a2 + b2 = 2，a3 + b3 = 2，R8为氢原子或碳原子数为1〜6的烷基。
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13.发明授权
公开(公告)号：US6106998A
公开(公告)日：2000-08-22
申请号：US94021
申请日：1998-06-09
CPC分类号： G03F7/038 , G03F7/0045
摘要： A negative resist material suitable for lithography employing for exposure a beam having a wavelength of 220 nm or less. The negative resist material contains a polymer having a weight average molecular weight of 1,000-500,000 and represented by the following formula (1): ##STR1## wherein R.sup.1, R.sup.3, and R.sup.5 are hydrogen atoms or methyl groups; R.sup.2 is a specified divalent hydrocarbon group; R.sup.4 is a hydrocarbon group having an epoxy group; R.sup.6 is a hydrogen atom or a C.sub.1-12 hydrocarbon group; and each of x, y, and z represents an arbitrary number satisfying certain relations; a photoacid generator generating an acid through exposure; and optionally a polyhydric alcohol or a polyfunctional epoxy group. The present invention also discloses a pattern formation method, and a method of manufacturing semiconductor devices using the pattern formation method.
摘要翻译： 适合用于曝光波长为220nm以下的光束的负光刻胶材料。 负抗蚀剂材料含有重均分子量为1,000〜500,000的聚合物，由下式（1）表示：其中R1，R3和R5是氢原子或甲基; R2是指定的二价烃基; R4是具有环氧基的烃基; R6是氢原子或C1-12烃基; 并且x，y和z分别表示满足一定关系的任意数; 通过曝光产生酸的光酸发生剂; 和任选的多元醇或多官能环氧基。 本发明还公开了一种图案形成方法以及使用图案形成方法制造半导体器件的方法。
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14.发明授权
公开(公告)号：US5585507A
公开(公告)日：1996-12-17
申请号：US478969
申请日：1995-06-07
IPC分类号： C07C381/12 , G03F7/004 , C07F5/02 , C07F9/66 , C07F9/90
CPC分类号： G03F7/0045 , C07C381/12 , C07C2101/08 , C07C2101/14 , C07C2103/74 , Y10S430/111 , Y10S430/122
摘要： A photoresist composition containing an alkylsulfonium salt compound represented by the following general formula (I): ##STR1## Wherein R.sup.1 and R.sup.2 may be the same or different, each being a linear, branched or cyclic C.sub.1 to C.sub.8 alkyl radical, R.sup.3 is a linear, branched or cyclic C.sub.1 to C.sub.8 alkyl radical, a C.sub.5 to C.sub.7 2-oxocycloalkyl radical, or a linear or branched C.sub.3 to C.sub.8 2-oxoalkyl radical, and Y.sup.- represents a counter ion. The photoresist composition has high transparency to deep U.V. light having wavelengths of 220 nm or less and is capable of forming good fine patterns with high sensitivity, thus being useful as chemically amplified type resist which is exposed to the deep U.V. light from an ArF excimer laser.
摘要翻译： 含有由以下通式（I）表示的烷基锍盐化合物的光致抗蚀剂组合物：其中R1和R2可以相同或不同，各自为直链，支链或环状的C1至C8烷基，R3 是直链，支链或环状的C1至C8烷基，C5至C72-氧代环烷基，或直链或支链C3至C82-氧代烷基，Y-表示抗衡离子。 光致抗蚀剂组合物对深紫外线具有高透明度。 具有220nm或更小波长的光并能够形成具有高灵敏度的良好精细图案，因此可用作暴露于深紫外线的化学放大型抗蚀剂。 来自ArF准分子激光的光。
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公开(公告)号：US4039148A
公开(公告)日：1977-08-02
申请号：US649150
申请日：1976-01-14
CPC分类号： C21D9/0018 , F27B9/243
摘要： A conveying device for conveying long articles within heat treatment furnaces, the driving means of which includes a drive mechanism and at least one element of linear form, for conveyance of the articles, driven by means of the drive mechanism. Product carriers are conveyed by means of the linear conveying element, each product carrier having a plurality of product supports for supporting the long articles thereon. The foremost one of the carriers, with respect to the direction of motion, has a means of engaging the linear conveying element whereby the linear conveying element transports the product carriers, and thereby the product supports and the long articles disposed thereon.
摘要翻译： 一种用于在热处理炉内输送长物品的输送装置，其驱动装置包括驱动机构和至少一个线性形式的元件，用于输送通过驱动机构驱动的物品。 产品载体通过线性输送元件输送，每个产品载体具有多个用于在其上支撑长物品的产品支撑件。 相对于运动方向最重要的一个载体具有接合线性输送元件的装置，由此线性输送元件输送产品载体，从而输送产品支撑件和设置在其上的长物品。
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16.发明申请POSITIVE-TYPE PHOTOSENSITIVE INSULATING RESIN COMPOSITION, AND PATTERN FORMING METHOD USING SAME 审中-公开正型型光敏绝缘树脂组合物和使用其的图案形成方法公开(公告)号：US20120021357A1
公开(公告)日：2012-01-26
申请号：US13146841
申请日：2010-01-29
申请人： Katsumi Maeda , Shintaro Yamamichi
发明人： Katsumi Maeda , Shintaro Yamamichi
CPC分类号： G03F7/0392 , C08F220/30 , C08F220/58 , G03F7/0045
摘要： A photosensitive insulating resin composition, comprising a polymer, a photosensitizer, and an amide derivative that is expressed by the following general formula (1); (in formula (1), R1 represents a bivalent alkyl group, R2 represents a hydrocarbon group with a carbon number of 1 to 10, and R3 represents a hydrogen atom or an alkyl group with a carbon number of 1 to 4.)
摘要翻译： 一种感光绝缘树脂组合物，其包含由以下通式（1）表示的聚合物，光敏剂和酰胺衍生物; （式（1）中，R 1表示二价烷基，R 2表示碳数为1〜10的烃基，R 3表示氢原子或碳原子数为1〜4的烷基）
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17.发明申请NEGATIVE PHOTOSENSITIVE INSULATING RESIN COMPOSITION AND METHOD FOR PATTERNING USING THE SAME 审中-公开负离子光敏绝缘树脂组合物及其使用方法公开(公告)号：US20110281217A1
公开(公告)日：2011-11-17
申请号：US13146886
申请日：2010-01-14
申请人： Katsumi Maeda
发明人： Katsumi Maeda
CPC分类号： C08F20/58 , G03F7/0382 , G03F7/40
摘要： This invention relates to a negative photosensitive insulating resin composition characterized in that the composition comprises an alkali-soluble polymer having at least one repeating constitutional unit represented by the following general formula (1), a cross-linker and a photo-acid generator. The negative photosensitive insulating resin composition provides a film having excellent properties such as heat resistance, mechanical properties and electric properties, and can be alkali-developed to achieve high resolution. (In the formula, R1 represents a hydrogen atom or a methyl group, and R2 to R5 represent, independently each other, a hydrogen atom or a hydrocarbon group having 1 to 4 carbon atoms.)
摘要翻译： 本发明涉及一种负型感光绝缘树脂组合物，其特征在于该组合物包含具有至少一个由以下通式（1）表示的重复结构单元，交联剂和光酸发生剂的碱溶性聚合物。 负性感光性绝缘性树脂组合物提供具有优异性能如耐热性，机械性能和电性能的膜，并且可以碱显影以实现高分辨率。 （式中，R1表示氢原子或甲基，R2〜R5彼此独立地表示氢原子或碳原子数1〜4的烃基。）
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18.发明授权(Meth)acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and patterning method 失效（甲基）丙烯酰胺衍生物，聚合物，化学增幅感光性树脂组合物和图案化方法公开(公告)号：US07939241B2
公开(公告)日：2011-05-10
申请号：US11919891
申请日：2006-05-12
申请人： Katsumi Maeda , Kaichirou Nakano
发明人： Katsumi Maeda , Kaichirou Nakano
CPC分类号： G03F7/0392 , C07C233/27 , C07D307/32 , C07D307/93 , C07D309/12 , C07F7/0838 , C08F220/58 , Y10S430/106 , Y10S430/107 , Y10S430/111 , Y10S430/115
摘要： The present invention relates to a novel (meth)acrylamide compound represented by the general formula (1), a (co)polymer of the (meth)acrylamide compound, and a chemically amplified photosensitive resin composition composed of the polymer and a photoacid generator. In the formula, R1 represents a hydrogen atom or a methyl group; R2 represents an acid-decomposable group; and R3 to R6 independently represent a hydrogen atom, a halogen atom or an alkyl group having 1 to 4 carbon atoms.
摘要翻译： 本发明涉及由通式（1）表示的新型（甲基）丙烯酰胺化合物，（甲基）丙烯酰胺化合物的（共）聚合物和由聚合物和光酸产生剂组成的化学增幅感光性树脂组合物。 在该式中，R 1表示氢原子或甲基; R2代表酸可分解基团; R 3〜R 6独立地表示氢原子，卤素原子或碳原子数1〜4的烷基。
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19.发明授权Alicyclic unsaturated compound, polymer, chemically amplified resist composition and method for forming pattern using said composition 失效脂环族不饱和化合物，聚合物，化学增幅抗蚀剂组合物和使用所述组合物形成图案的方法公开(公告)号：US07470499B2
公开(公告)日：2008-12-30
申请号：US10548067
申请日：2004-03-04
申请人： Katsumi Maeda , Kaichiro Nakano
发明人： Katsumi Maeda , Kaichiro Nakano
IPC分类号： G03F7/039 , G08F32/08 , C07C35/52 , C07C69/65 , C07C43/178
CPC分类号： C07C35/52 , C07C2603/66 , G03F7/0046 , G03F7/0395 , Y10S430/108
摘要： A noble alicyclic unsaturated compound represented by the general formula (1): wherein at least one of R1 and R2 is a fluorine atom or a fluorinated alkyl group; a polymer formed by the polymerization of a polymer precursor comprising the alicyclic compound. The polymer is useful, in the lithography using a light having a wavelength of 190 nm or less, as a chemically amplified resist which exhibits excellent transparency with respect to the light for use in exposure and also is excellent in the adhesion to a substrate and the resistance to dry etching.
摘要翻译： 由通式（1）表示的高级脂环族不饱和化合物：其中R 1和R 2中的至少一个为氟原子或氟代烷基; 通过包含脂环族化合物的聚合物前体的聚合形成的聚合物。 聚合物在使用波长为190nm以下的光的光刻中作为化学放大型抗蚀剂是有用的，该抗蚀剂相对于曝光用光具有优异的透明性，并且对基材的粘附性也优异， 耐干蚀刻。
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20.发明申请Hexagonal Wurtzite Type Single Crystal, Process For Producing The Same, And Hexagonal Wurtzite Type Single Crystal Substrate 审中-公开六角纤锌矿型单晶，其制造方法及六角纤锌矿型单晶基板公开(公告)号：US20080056984A1
公开(公告)日：2008-03-06
申请号：US11576408
申请日：2005-09-21
申请人： Kenji Yoshioka , Hiroshi Yoneyama , Katsumi Maeda , Ikuo Niikura , Mitsuru Sato , Masumi Ito , Fumio Orito
发明人： Kenji Yoshioka , Hiroshi Yoneyama , Katsumi Maeda , Ikuo Niikura , Mitsuru Sato , Masumi Ito , Fumio Orito
摘要： Provided is a single crystal with a hexagonal wurtzite structure which is useful as a substrate for various devices and has high purity and is uniform. The single crystal with a hexagonal wurtzite structures which is obtained by a crystal growth on at least an m-plane of a columnar seed crystal and represented by AX (A representing an electropositive element and X representing an electronegative element) is characterized in that a variation in the concentration of a metal other than the electropositive element A and having a concentration of 0.1 to 50 ppm is within 100%.
摘要翻译： 提供具有六方纤锌矿结构的单晶，其可用作各种装置的基板，并且具有高纯度并且均匀。 通过在柱状晶种的至少m面上由AX（表示正电荷的元素和表示电负性元素的X）表示的晶体生长获得的具有六方纤锌矿结构的单晶的特征在于， 在正电性元素A以外的金属浓度为0.1〜50ppm的浓度为100％以下。
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