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公开(公告)号：US20080117402A1
公开(公告)日：2008-05-22
申请号：US11642987
申请日：2006-12-21
IPC分类号： G03B27/58
CPC分类号： H01L21/6835 , H01L21/67115 , H01L24/80 , H01L2924/01005 , H01L2924/01006 , H01L2924/01033 , H01L2924/01061 , H01L2924/01074 , H01L2924/01078 , H01L2924/01082 , H01L2924/014 , H01L2924/14 , H01L2924/3025 , H01L2924/00
摘要： In an embodiment, a ring seal forming apparatus is disclosed, the apparatus including a substrate holder arranged to hold a substrate coated at least in part with resist, and a heating device configured to heat an area of the resist, relative movement between the substrate holder and heating device being possible, the movement being arranged such that, in use of the apparatus, the area of resist heated by the heating device is ring-shaped.
摘要翻译： 在一个实施例中，公开了一种环形密封形成装置，该装置包括：衬底保持器，其被布置成保持至少部分地涂覆有抗蚀剂的衬底;以及加热装置，其构造成加热抗蚀剂的区域，衬底保持器 并且加热装置是可能的，所述运动被布置成使得在使用该装置时，由加热装置加热的抗蚀剂的面积是环形的。
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12.发明授权Lithographic apparatus, programmable patterning device and lithographic method 有权光刻设备，可编程图案形成装置和光刻方法公开(公告)号：US08531648B2
公开(公告)日：2013-09-10
申请号：US13119884
申请日：2009-09-21
申请人： Pieter Willem Herman De Jager , Vadim Yevgenyevich Banine , Jozef Petrus Henricus Benschop , Cheng-Qun Gui , Johannes Onvlee , Erwin John Van Zwet
发明人： Pieter Willem Herman De Jager , Vadim Yevgenyevich Banine , Jozef Petrus Henricus Benschop , Cheng-Qun Gui , Johannes Onvlee , Erwin John Van Zwet
CPC分类号： G03F7/70183 , G03F7/70275 , G03F7/70291 , G03F7/70391 , G03F7/704
摘要： In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator may be moveable with respect the exposure area and/or the projection system may have an array of lenses to receive the plurality of beams, the array of lenses moveable with respect to the exposure area.
摘要翻译： 在一个实施例中，公开了一种光刻设备，其包括调制器，该调制器被配置为将基板的曝光区域暴露于根据期望图案调制的多个光束;以及投影系统，该投影系统被配置为将经调制的光束投影到基板上。 调制器可以相对于曝光区域可移动，和/或投影系统可以具有用于接收多个光束的透镜阵列，透镜阵列可相对于曝光区域移动。
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公开(公告)号：US08395755B2
公开(公告)日：2013-03-12
申请号：US12506808
申请日：2009-07-21
申请人： Richard Alexander George , Cheng-Qun Gui , Pieter Willem Herman De Jager , Robbert Edgar Van Leeuwen , Jacobus Burghoorn
发明人： Richard Alexander George , Cheng-Qun Gui , Pieter Willem Herman De Jager , Robbert Edgar Van Leeuwen , Jacobus Burghoorn
CPC分类号： G03B27/53 , G03F7/70291 , G03F7/70791 , G03F9/7003 , G03F9/7026
摘要： A lithography apparatus includes a projection system configured to project a radiation beam onto a substrate, a detector configured to inspect the substrate, and a substrate table configured to support the substrate and move the substrate relative to the projection system and the detector. The detector is arranged to inspect a portion of the substrate while the substrate is moved and before the portion is exposed to the radiation beam.
摘要翻译： 光刻设备包括投影系统，该投影系统配置成将辐射束投影到基板上，检测器被配置为检查基板;以及基板台，其构造成支撑基板并相对于投影系统和检测器移动基板。 检测器布置成在衬底移动时和在暴露于辐射束之前检查衬底的一部分。
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公开(公告)号：US20100068416A1
公开(公告)日：2010-03-18
申请号：US12553390
申请日：2009-09-03
CPC分类号： G03F7/164 , G03F7/002 , G03F7/0047 , G03F7/28 , G03G13/283 , G03G13/286 , H01L21/31691
摘要： A lithographic method includes providing particles in dry form on a substrate, or on material provided on the substrate, irradiating one or more of the particles with a dose of radiation, the dose of radiation being sufficient to ensure that at least one particle of the one or more particles is bonded to the substrate, or to the material provided on the substrate, and removing particles from the substrate, or from material provided on the substrate, that have not been bonded to the substrate, or to the material provided on the substrate.
摘要翻译： 光刻方法包括将干燥形式的颗粒提供在基材上或者提供在基材上的材料上，用一定剂量的辐射照射一个或多个颗粒，辐射剂量足以确保至少一个颗粒的一个颗粒 或更多的颗粒结合到基板上，或者与设置在基板上的材料接合，以及从基板上提供的颗粒，或者从基板上提供的材料去除未结合到基板上的材料，或者去除设置在基板上的材料 。
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公开(公告)号：US07468291B2
公开(公告)日：2008-12-23
申请号：US11431107
申请日：2006-05-10
CPC分类号： H01L21/67138 , H01L23/544 , H01L24/11 , H01L24/742 , H01L2223/54473 , H01L2224/16 , H01L2924/01006 , H01L2924/01029 , H01L2924/01033 , H01L2924/01046 , H01L2924/01047 , H01L2924/01061 , H01L2924/01074 , H01L2924/01075 , H01L2924/01079 , H01L2924/01082 , H01L2924/01322 , H01L2924/14
摘要： A method for locating, forming, or both locating and forming, bumps of material on a substrate having a plurality of devices, the method includes receiving data which indicates the number and location of the devices on the substrate, then using a flip-chip bumping apparatus to locate, form, or both locate and form, bumps of material on the devices, the positions of the devices being determined using the data.
摘要翻译： 一种用于在具有多个器件的衬底上定位，形成或两者定位和形成材料凸起的方法，所述方法包括接收指示衬底上器件的数量和位置的数据，然后使用倒装芯片凸起 定位，形成或两者定位和形成设备上材料的凸块的装置，使用数据确定装置的位置。
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公开(公告)号：US20080218718A1
公开(公告)日：2008-09-11
申请号：US12113831
申请日：2008-05-01
申请人： Richard Alexander George , Cheng-Qun Gui , Pieter Willem Herman de Jager , Robbert Edgar Van Leeuwen , Jacobus Burghoorn
发明人： Richard Alexander George , Cheng-Qun Gui , Pieter Willem Herman de Jager , Robbert Edgar Van Leeuwen , Jacobus Burghoorn
IPC分类号： G03B27/42
CPC分类号： G03B27/53 , G03F7/70291 , G03F7/70791 , G03F9/7003 , G03F9/7026
摘要： A lithographic apparatus is provided. The lithographic apparatus includes a radiation source configured to provide radiation, an array of optical light engines, and a substrate table that supports a substrate. Each of the optical light engines includes an array of individually controllable elements arranged and constructed to receive and to pattern the radiation and projection optics configured to receive the patterned radiation and to project the patterned radiation onto the substrate. The substrate table is arranged and constructed to move relative to the array of optical light engines during exposure of the substrate to the patterned radiation.
摘要翻译： 提供光刻设备。 光刻设备包括被配置为提供辐射的辐射源，光学引擎的阵列以及支撑衬底的衬底台。 每个光学引擎包括独立可控元件的阵列，其被布置和构造为接收和图案化配置成接收图案化辐射的辐射和投影光学元件，并将图案化的辐射投射到衬底上。 衬底台布置和构造成在将衬底暴露于图案化辐射期间相对于光学发动机阵列移动。
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公开(公告)号：US07385675B2
公开(公告)日：2008-06-10
申请号：US10853577
申请日：2004-05-26
申请人： Richard Alexander George , Cheng-Qun Gui , Pieter Willem Herman de Jager , Robbert Edgar Van Leeuwen , Jacobus Burghoom
发明人： Richard Alexander George , Cheng-Qun Gui , Pieter Willem Herman de Jager , Robbert Edgar Van Leeuwen , Jacobus Burghoom
CPC分类号： G03B27/53 , G03F7/70291 , G03F7/70791 , G03F9/7003 , G03F9/7026
摘要： A lithographic apparatus in which alignment marks on the substrate are inspected during the exposure of the substrate to optimize the exposure conditions.
摘要翻译： 在基板曝光期间检查基板上的对准标记以优化曝光条件的光刻设备。
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公开(公告)号：US20080032203A1
公开(公告)日：2008-02-07
申请号：US11498980
申请日：2006-08-04
申请人： Geoffrey Norman Phillipps , Cheng-Qun Gui , Rudy Jan Maria Pellens , Paulus Wilhelmus Leonardus Van Dijk
发明人： Geoffrey Norman Phillipps , Cheng-Qun Gui , Rudy Jan Maria Pellens , Paulus Wilhelmus Leonardus Van Dijk
CPC分类号： G03F7/70475 , G03F7/70633
摘要： A lithographic method includes patterning a beam of radiation with a patterning device. The patterning device includes at least two image patterning portions and at least two metrology mark patterning portions. The method also includes projecting at least two image portions of the patterned beam of radiation sequentially onto target portions of a substrate such that the projected image portions are substantially adjacent to each other on the substrate and collectively form a composite image on the substrate. The method also includes projecting a metrology mark onto the substrate outside of the area of the composite image at the same time as projecting each of at least two of the image portions, and measuring the alignment of the metrology marks to determine the relative positions of the at least two image portions.
摘要翻译： 光刻方法包括用图案形成装置图案化辐射束。 图案形成装置包括至少两个图像构图部分和至少两个计量标记图案形成部分。 该方法还包括将图案化的辐射束的至少两个图像部分顺序地投影到基板的目标部分上，使得投影的图像部分在基板上基本上彼此相邻并且在基板上共同形成合成图像。 所述方法还包括在将所述图像部分中的至少两个投影到所述图像部分中的每一个的同时，将所述测量标记投影到所述合成图像的区域外部的所述基板上，并且测量所述计量标记的对准以确定所述合成图像的相对位置 至少两个图像部分。
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公开(公告)号：US07190434B2
公开(公告)日：2007-03-13
申请号：US10779823
申请日：2004-02-18
IPC分类号： G03B27/42
CPC分类号： G03F7/70208 , G03F7/70275 , G03F7/70283 , G03F7/70291
摘要： Provided is a radiation distribution system for distributing the radiation from an illumination system to two or more patterning means, each for patterning beams of radiation, which are subsequently projected onto a substrate.
摘要翻译： 提供了一种用于将照明系统的辐射分配到两个或更多个图案形成装置的辐射分布系统，每个图案装置用于构图辐射束，随后将其投影到衬底上。
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公开(公告)号：US20050275840A1
公开(公告)日：2005-12-15
申请号：US10854770
申请日：2004-05-27
IPC分类号： G01B11/00 , G01B11/14 , G03F7/20 , G03F9/00 , H01L21/027
CPC分类号： G03F7/70275 , G03F9/7088
摘要： An optical position assessment apparatus and method has an illumination system that supplies an alignment beam of radiation, and positional data is derived from reflections of the alignment beam. A substrate is supported on a substrate table and a projection system is used to project the alignment beam onto a target portion of the substrate. A positioning system causes relative movement between the substrate and the projection system. An array of lenses is arranged such that each lens in the array focuses a respective portion of the alignment beam onto a respective part of the target portion. An array of detectors is arranged such that each detector in the array detects light reflected from the substrate through a respective lens in the array and provides an output representative of the intensity of light reflected to it from the substrate through the respective lens. A processor is connected to the outputs of the detectors for deriving data representing the position of the lens array relative to the substrate from the outputs of the detectors.
摘要翻译： 光学位置评估装置和方法具有照射系统，其提供对准的辐射束，并且位置数据源自对准光束的反射。 基板被支撑在基板台上，并且使用投影系统将对准光束投影到基板的目标部分上。 定位系统引起基板和投影系统之间的相对移动。 透镜阵列被布置成使得阵列中的每个透镜将对准光束的相应部分聚焦到目标部分的相应部分上。 一组检测器被布置成使得阵列中的每个检测器通过阵列中的相应透镜来检测从基板反射的光，并且通过相应的透镜提供代表从基板反射的光的强度的输出。 处理器连接到检测器的输出，用于从检测器的输出导出表示透镜阵列相对于基板的位置的数据。
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