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146 条记录 (耗时 0.033 秒)

    Method of removing integrated circuit chip package and detachment jig therefor
    11.
    发明申请
    Method of removing integrated circuit chip package and detachment jig therefor 有权
    去除集成电路芯片封装和拆卸夹具的方法

    公开(公告)号：US20060107513A1

    公开(公告)日：2006-05-25

    申请号：US11061471

    申请日：2005-02-22

    申请人： Tetsuji Ishikawa ,  Osamu Saitou ,  Masakazu Kobayashi ,  Hideaki Terauchi

    发明人： Tetsuji Ishikawa ,  Osamu Saitou ,  Masakazu Kobayashi ,  Hideaki Terauchi

    IPC分类号： B23P19/00

    CPC分类号： H05K13/0491 ,  H01L24/81 ,  H01L2224/16 ,  H01L2224/81801 ,  H01L2924/00011 ,  H01L2924/00014 ,  H01L2924/14 ,  Y10T29/49821 ,  Y10T29/49822 ,  Y10T29/53274 ,  Y10T29/53283 ,  H01L2924/00 ,  H01L2224/0401

    摘要： A detachment jig is placed on a printed circuit board. Advancement of an inclined surface of the detachment jig is received on a solder bump of solid state disposed between the printed circuit board and an integrated circuit chip package. The solder bump melts to remove restraint to the advancement of the inclined surface, so that the inclined surface advances into a space between the printed circuit board and the chip package in response to the melt of the solder bump. A force to lift the chip package in the direction perpendicular to the surface of the printed circuit board acts on the chip package after the solder bump has completely melted down. Detachment of an electrically conductive pad is thus reliably prevented on the printed circuit board. The chip package can solely be removed without inducing detachment of the electrically conductive pad on the printed circuit board.

    摘要翻译： 分离夹具放置在印刷电路板上。 在布置在印刷电路板和集成电路芯片封装之间的固态焊锡凸块上接纳有分离夹具倾斜表面的前进。 焊料凸块熔化以消除对倾斜表面的推进的限制，使得倾斜表面响应于焊料凸块的熔化而前进到印刷电路板和芯片封装之间的空间。 在焊料凸块完全熔化之后，沿与印刷电路板表面垂直的方向提升芯片封装的力作用在芯片封装上。 因此，可以在印刷电路板上可靠地防止导电垫的分离。 芯片封装可以单独去除，而不会导致印刷电路板上的导电焊盘脱落。

    Electric motor structure
    13.
    发明申请
    Electric motor structure 有权
    电机结构

    公开(公告)号：US20050156471A1

    公开(公告)日：2005-07-21

    申请号：US11028228

    申请日：2005-01-04

    申请人： Masakazu Kobayashi ,  Tomiyuki Segawa ,  Yuki Nakajima

    发明人： Masakazu Kobayashi ,  Tomiyuki Segawa ,  Yuki Nakajima

    IPC分类号： H02K9/19 ,  H02K9/00

    CPC分类号： H02K9/19

    摘要： An electric motor structure includes a rotary shaft with a coolant passageway therein and a rotor with a cooling surface non-rotatably coupled to the rotary shaft. The coolant is supplied from the coolant passageway of the rotary shaft to the cooling surface of the rotor and flows along the cooling surface of the rotor as a liquid film. The electric motor structure is further provided with a coolant discharge restricting section configured and arranged to restrict discharging of the coolant from the cooling surface. The coolant discharge restricting section protrudes from the cooling surface in a direction substantially perpendicular to the cooling surface where the coolant flown along the cooling surface is discharged from the cooling surface. Thus, a high cooling performance is obtained even when the rotor rotates at high rotational speeds by maintaining a sufficient liquid film thickness.

    摘要翻译： 电动机结构包括其中具有冷却剂通道的旋转轴和具有不可旋转地联接到旋转轴的冷却表面的转子。 冷却剂从旋转轴的冷却剂通道供给到转子的冷却表面，并且作为液膜沿着转子的冷却表面流动。 电动机结构还设置有冷却剂排出限制部，其构造和布置成限制冷却剂从冷却表面的排出。 冷却剂排出限制部从与冷却面大致垂直的方向从冷却面突出，冷却面沿冷却面流动的冷却剂从冷却面排出。 因此，即使转子通过保持足够的液膜厚度而以高转速旋转，也能获得高的冷却性能。

    Rinsing solution for lithography and method for processing substrate with the use of the same
    15.
    发明授权
    Rinsing solution for lithography and method for processing substrate with the use of the same 有权
    用于光刻的冲洗溶液和使用它的基板处理方法

    公开(公告)号：US06815151B2

    公开(公告)日：2004-11-09

    申请号：US09877124

    申请日：2001-06-11

    申请人： Masahito Tanabe ,  Kazumasa Wakiya ,  Masakazu Kobayashi ,  Toshimasa Nakayama

    发明人： Masahito Tanabe ,  Kazumasa Wakiya ,  Masakazu Kobayashi ,  Toshimasa Nakayama

    IPC分类号： G03F742

    CPC分类号： G03F7/42 ,  G03F7/425

    摘要： The present invention provides a rinsing solution for lithography with which finely processed parts of a resist pattern can be well rinsed without corroding a metallic film made of Al, Al—Si, Al—Si—Cu, etc. and which is economically advantageous and has a high safety; and a method for processing a substrate with the use of the same. The rinsing solution contains at least one selected from the group consisting of ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether and ethyl lactate.

    摘要翻译： 本发明提供了一种用于光刻的冲洗溶液，其中抗蚀剂图案的精细加工部分可以很好地冲洗而不腐蚀由Al，Al-Si，Al-Si-Cu等制成的金属膜，并且在经济上有利并具有 安全性高 以及使用该方法处理基板的方法。 冲洗溶液含有选自乙二醇单甲醚，乙二醇单乙醚，丙二醇单甲醚，丙二醇单乙醚和乳酸乙酯中的至少一种。

    Hematopoietic stem cell proliferating agents
    16.
    发明授权
    Hematopoietic stem cell proliferating agents 失效
    造血干细胞增殖剂

    公开(公告)号：US06495365B1

    公开(公告)日：2002-12-17

    申请号：US09147689

    申请日：1999-05-13

    申请人： Yoshimasa Saito ,  Yoshiko Ueda ,  Kouichi Tamura ,  Yoko Takata ,  Hisashi Yamada ,  Tatsuo Yamashita ,  Masakazu Kobayashi

    发明人： Yoshimasa Saito ,  Yoshiko Ueda ,  Kouichi Tamura ,  Yoko Takata ,  Hisashi Yamada ,  Tatsuo Yamashita ,  Masakazu Kobayashi

    IPC分类号： C12N500

    CPC分类号： A61K38/30 ,  A61K2300/00

    摘要： This invention relates to a hematopoietic stem cell proliferating agent comprising IGF-I, a hematopoietic stem cell proliferating agent comprising IGF-I and at least one protein selected from among SCF, M-CSF, and G-CSF, and a method of growing hematopoietic stem cells which comprises culturing hematopoietic stem cells in a medium containing IGF-I and at least one protein selected from the group consisting of SCF and M-CSF. The hematopoietic stem cell proliferating agent of the invention causes hematopoietic stem cells to proliferate in the undifferentiated state whether in vivo or in vitro and can, therefore, be used for amelioration of the cytopenia induced by radiotherapy or chemotherapy using anticancer drugs, prevention of infectious diseases associated with lymphopenia, or in vitro culture for multiplication of hematopoietic stem cells and extrasomatic culture of recombinant stem cells in gene therapy.

    摘要翻译： 本发明涉及造血干细胞增殖剂，其包含IGF-I，包含IGF-I的造血干细胞增殖剂和选自SCF，M-CSF和G-CSF中的至少一种蛋白质，以及造血造血干细胞增殖的方法 干细胞，其包括在含有IGF-I和至少一种选自SCF和M-CSF的蛋白质的培养基中培养造血干细胞。本发明的造血干细胞增殖剂引起造血干细胞在未分化的细胞中增殖 说明是否在体内或体外，因此可以用于改善由放射治疗或化疗引起的血细胞减少症，使用抗癌药物，预防与淋巴细胞减少有关的感染性疾病，或体外培养造血干细胞和外植体培养物 基因治疗中的重组干细胞。

    Photoresist stripping liquid compositions and a method of stripping photoresists using the same
    17.
    发明授权
    Photoresist stripping liquid compositions and a method of stripping photoresists using the same 有权
    光刻胶剥离液体组合物和使用其剥离光致抗蚀剂的方法

    公开(公告)号：US06291142B1

    公开(公告)日：2001-09-18

    申请号：US09599729

    申请日：2000-06-23

    申请人： Masahito Tanabe ,  Kazumasa Wakiya ,  Masakazu Kobayashi ,  Toshimasa Nakayama

    发明人： Masahito Tanabe ,  Kazumasa Wakiya ,  Masakazu Kobayashi ,  Toshimasa Nakayama

    IPC分类号： G03C1124

    CPC分类号： G03F7/425

    摘要： The present invention relates to photoresist stripping liquid compositions comprising (a) 2-30 wt % of a hydroxylamine, (b) 2-35 wt % of water, (c) 25-40 wt % of at least one member selected from monoethanolamine and diethanolamine, (d) 20-32 wt % of dimethyl sulfoxide and (e) 2-20 wt % of an aromatic hydroxy compound and a method of stripping photoresists with the use of the same. The present invention provides photoresist stripping liquid compositions which are, even at higher treating temperatures, excellent in the capabilities of both stripping photoresist films and modified films and effective in prevention of the corrosion that would otherwise occur in substrates overlaid with Al or Al alloy layers or Ti layers, and a method for stripping photoresists by using the same.

    摘要翻译： 本发明涉及光致抗蚀剂剥离液体组合物，其包含（a）2-30重量％的羟胺，（b）2-35重量％的水，（c）25-40重量％的至少一种选自单乙醇胺和 二乙醇胺，（d）20-32重量％的二甲基亚砜和（e）2-20重量％的芳族羟基化合物，以及使用它们剥离光致抗蚀剂的方法。 本发明提供了光刻胶剥离液体组合物，即使在更高的处理温度下，剥离光致抗蚀剂膜和改性膜的性能也是优异的，并且有效地防止了否则会发生在覆盖有Al或Al合金层的基材中的腐蚀，或者 Ti层，以及通过使用它们剥离光致抗蚀剂的方法。

    Liquid coating composition for use in forming antireflective film and photoresist material using said antireflective film
    18.
    发明授权
    Liquid coating composition for use in forming antireflective film and photoresist material using said antireflective film 有权
    用于使用所述抗反射膜形成抗反射膜和光致抗蚀剂材料的液体涂料组合物

    公开(公告)号：US06136505A

    公开(公告)日：2000-10-24

    申请号：US330001

    申请日：1999-06-11

    申请人： Masahito Tanabe ,  Kazumasa Wakiya ,  Masakazu Kobayashi ,  Hiroshi Komano ,  Toshimasa Nakayama

    发明人： Masahito Tanabe ,  Kazumasa Wakiya ,  Masakazu Kobayashi ,  Hiroshi Komano ,  Toshimasa Nakayama

    IPC分类号： G03F7/004 ,  G03F7/09 ,  G03F7/11 ,  H01L21/027

    CPC分类号： G03F7/091

    摘要： Disclosed herein is a liquid coating composition for use in forming an antireflective film comprising a mixture of a cyclic perfluoroalkyl polyether and a chain perfluoroalkyl polyether in a ratio of from 3:10 to 10:1 by weight, and a fluorocarbon organic solvent. Disclosed also herein is a photoresist material consisting of a photoresist layer and said antireflective film formed thereon using said liquid coating composition. The antireflective film remarkably reduces the standing-wave effect especially in the case where the photoresist layer of chemically amplified type is used. The antireflective film also has good film quality and film removability.

    摘要翻译： 本文公开了一种用于形成抗反射膜的液体涂料组合物，其包含按重量比计为3:10至10:1的环状全氟烷基聚醚和链全氟烷基聚醚的混合物，以及氟碳有机溶剂。 此处还公开了由光致抗蚀剂层和在其上使用所述液体涂料组合物形成的所述抗反射膜组成的光致抗蚀剂材料。 抗反射膜特别是在使用化学放大型光致抗蚀剂层的情况下，显着地降低了驻波效应。 抗反射膜也具有良好的膜质量和膜去除性。