Fast atom bombardment source, fast atom beam emission method, and surface modification apparatus
    12.
    发明授权
    Fast atom bombardment source, fast atom beam emission method, and surface modification apparatus 有权
    快原子轰击源,快原子束发射法和表面改性装置

    公开(公告)号:US07550715B2

    公开(公告)日:2009-06-23

    申请号:US11790611

    申请日:2007-04-26

    IPC分类号: H05H3/02

    CPC分类号: H05H3/02 G21K5/02 G21K5/04

    摘要: A positive electrode drive unit enables a positive electrode to be repeatedly rotated about the center of the positive electrode to vary a distance between the positive electrode and an atom emission unit. A control unit receives input data which is set to obtain a desired atom density distribution by displacement of the positive electrode, and the control unit outputs a drive control signal for displacing the positive electrode to the positive electrode drive unit. The positive electrode drive unit is stopped during running by the control unit, or a drive speed of the positive electrode drive unit is changed by the control unit. Therefore, a residence time of each attitude is changed in the positive electrode to vary the atom density per unit time.

    摘要翻译: 正极驱动单元能够使正极围绕正极的中心反复旋转,以改变正极和原子发射单元之间的距离。 控制单元接收输入数据,其被设置为通过正极的位移获得期望的原子密度分布,并且控制单元输出用于将正电极移位到正电极驱动单元的驱动控制信号。 正极驱动单元在由控制单元运行期间停止,或者通过控制单元改变正极驱动单元的驱动速度。 因此,在正极中改变每个姿态的停留时间,以改变每单位时间的原子密度。

    Electrodeposition Material, Process for Providing a Corrosion-Protective Layer of TiO2 on an Electrically Conductive Substrate and Metal Substrate Coated with a Layer of TiO2
    13.
    发明申请
    Electrodeposition Material, Process for Providing a Corrosion-Protective Layer of TiO2 on an Electrically Conductive Substrate and Metal Substrate Coated with a Layer of TiO2 审中-公开
    电沉积材料,在导电基材和金属基板上涂覆TiO 2的TiO 2的腐蚀保护层的方法

    公开(公告)号:US20080210567A1

    公开(公告)日:2008-09-04

    申请号:US11961095

    申请日:2007-12-20

    IPC分类号: C25D3/54

    CPC分类号: C25D9/08

    摘要: The present invention relates to electrodeposition material for the electrochemical deposition of a corrosion-protective layer of TiO2 on an electrically conductive substrate comprising a titanium compound, a complexing agent, an accelerator, water and optionally organic solvents, buffering agents and one or more additives, characterized in that the titanium compound is titanyl sulfate and/or titanyl oxalate, the complexing agent is selected from the group consisting of citric acid, citrates, tartaric acid, tartrates, lactic acid, lactates, gluconic acid, gluconates, polyhydroxy-polycarbonic acids, ethylenediaminetetraacetate, methylglycinediacetate, iminodisuccinate, nitrilotriacetic acid and nitrilotriacetate, triethanolamine, phosphonic acid and phosphonates, polyaspartic acid and polyaspartates, polyacrylic acid and polyacrylates and the accelerator is selected from the group consisting of H2O2 and organic peroxides. The invention further relates to a process for providing a corrosion-protective layer of TiO2 on an electrically conductive substrate and to a metal substrate coated with a layer of TiO2.

    摘要翻译: 本发明涉及用于在包含钛化合物,络合剂,促进剂,水和任选的有机溶剂的导电基材上电化学沉积TiO 2的腐蚀保护层的电沉积材料, 缓冲剂和一种或多种添加剂,其特征在于钛化合物是硫酸氧钛和/或草酸氧钛,络合剂选自柠檬酸,柠檬酸盐,酒石酸,酒石酸盐,乳酸,乳酸盐,葡萄糖酸 ,葡糖酸盐,多羟基 - 聚碳酸,乙二胺四乙酸盐,甲基甘氨二乙酸盐,亚氨基二琥珀酸盐,次氮基三乙酸和次氮基三乙酸盐,三乙醇胺,膦酸和膦酸盐,聚天冬氨酸和聚天冬氨酸盐,聚丙烯酸和聚丙烯酸盐,加速剂选自H 2 O 2和有机过氧化物。 本发明还涉及一种在导电衬底上和涂覆有TiO 2层的金属衬底上提供TiO 2的防腐蚀层的方法。

    Sheet feeding apparatus and image forming apparatus
    14.
    发明授权
    Sheet feeding apparatus and image forming apparatus 有权
    送纸装置和成像装置

    公开(公告)号:US07059597B2

    公开(公告)日:2006-06-13

    申请号:US10611884

    申请日:2003-07-03

    IPC分类号: B65H1/00

    摘要: A sheet supply apparatus includes a sheet supply tray for stacking a sheet, and an auxiliary tray movable between a support position where the auxiliary tray supports a portion of the sheet stacked on the sheet supply tray and a storage position where the auxiliary tray overlaps the sheet supply tray. A sheet supply device supplies the sheet stacked on the sheet supply tray. A sheet detection device is mounted on the auxiliary tray for detecting the sheet stacked on the sheet supply tray, and a tray position detection device detects a position of the auxiliary tray between the support position and the storage position. An identifying device identifies a length of the sheet in a sheet supply direction based on detection results of the sheet detection device and the tray detection device.

    摘要翻译: 供纸装置包括用于堆叠纸张的供纸托盘和可在支撑位置之间移动的辅助托盘,其中辅助托盘支撑堆叠在供纸托盘上的片材的一部分和辅助托盘与片材重叠的存储位置 供应托盘。 供纸装置供给堆叠在供纸盘上的纸张。 纸张检测装置安装在辅助托盘上,用于检测堆叠在供纸托盘上的纸张,托盘位置检测装置检测辅助托盘在支撑位置和存储位置之间的位置。 识别装置基于片材检测装置和托盘检测装置的检测结果来识别片材在片材供给方向上的长度。

    Film substrate treatment apparatus, film substrate treatment method, and film substrate transport method
    17.
    发明授权
    Film substrate treatment apparatus, film substrate treatment method, and film substrate transport method 失效
    薄膜基板处理装置,薄膜​​基板处理方法以及薄膜基板输送方法

    公开(公告)号:US06667250B2

    公开(公告)日:2003-12-23

    申请号:US10403081

    申请日:2003-04-01

    IPC分类号: H01L2131

    摘要: To provide a film substrate treatment apparatus that appropriately mounts film substrates on an electrostatic adsorption stage. In the film substrate treatment apparatus, adsorption pads are disposed on the first adsorption units that mount film substrates on an electrostatic stage, and a pressing member that presses the edge portion areas of the film substrates against the stage is provided. The film substrates can thereby be reliably attached to the stage, and the film substrates can be appropriately treated in a decompressed atmosphere.

    摘要翻译: 提供一种适当地将薄膜基板安装在静电吸附台上的薄膜基板处理装置。 在薄膜基板处理装置中,设置吸附垫,将第一吸附单元安装在静电台上的薄膜基板上,并且提供将薄膜基板的边缘部分区域压在台上的按压构件。 因此,能够将膜基材可靠地附着在载物台上,并且可以在减压气氛中适当地处理膜基材。

    Apparatus and method for forming thin film
    20.
    发明授权
    Apparatus and method for forming thin film 失效
    用于形成薄膜的装置和方法

    公开(公告)号:US5501739A

    公开(公告)日:1996-03-26

    申请号:US158305

    申请日:1993-11-29

    摘要: A forming apparatus of a thin film includes a processing chamber where a predetermined process is carried out on a surface of a supplied substrate. A feeding device is provided in the processing chamber for feeding material to form an organic molecular layer including silicon or germanium on the surface of the substrate. A forming method of a thin film includes the steps of forming the thin film on the surface of the supplied substrate in the processing chamber, and feeding material for forming the organic molecular layer, including silicon or germanium, on the formed thin film on the surface of the substrate through a feeding device in the processing chamber, and then forming the organic molecular layer on the surface of the substrate.

    摘要翻译: 薄膜的形成装置包括处理室,其中在所提供的基板的表面上进行预定的处理。 在处理室中设置有供给装置,用于供给材料以在基板的表面上形成包括硅或锗的有机分子层。 薄膜的形成方法包括以下步骤:在处理室中供应的基板的表面上形成薄膜,以及在表面上形成的薄膜上形成有机分子层(包括硅或锗)的材料 通过处理室中的进料装置,然后在基材表面上形成有机分子层。