公开(公告)号：US5977515A

公开(公告)日：1999-11-02

申请号：US539074

申请日：1995-10-04

申请人： Keiichi Uraki ,  Toshitaka Satsuta ,  Akira Onuma ,  Mitsuo Nakamura ,  Tsutomu Onuma ,  Toshimi Matsumoto ,  Yasumasa Tamai ,  Hiroshi Yamauchi ,  Eisaku Hayashi ,  Ren Morinaka

发明人： Keiichi Uraki ,  Toshitaka Satsuta ,  Akira Onuma ,  Mitsuo Nakamura ,  Tsutomu Onuma ,  Toshimi Matsumoto ,  Yasumasa Tamai ,  Hiroshi Yamauchi ,  Eisaku Hayashi ,  Ren Morinaka

IPC分类号： G21C19/02 ,  B23K9/00 ,  B23K26/00 ,  B23K26/02 ,  B23K26/03 ,  B23K26/06 ,  B23K26/067 ,  B23K26/08 ,  B23K26/12 ,  B23K26/14 ,  B23K37/00 ,  C21D1/09 ,  C21D9/00 ,  C22C38/00 ,  C22C38/50 ,  G21F9/30

CPC分类号： B23K26/067 ,  B23K26/122 ,  B23K26/1423 ,  B23K26/1429 ,  B23K26/146 ,  B23K26/1476

摘要： An underwater laser processing system has a laser torch; a laser torch driving mechanism for changing a laser emission position of the laser torch; and a chamber with one end opened to an external environment, which contains the laser torch; wherein a partitioning wall for preventing permeation of water is provided between a free end of the chamber and the laser torch. The system is used for detecting a sensitized portion and repairing it at one time using a sensitization detecting arrangement. Moreover, it is used for forming an alloying layer by melting a sprayed coating film, and for forming a new surface layer by emitting a laser beam through a solution containing a metal component.

摘要翻译： 水下激光加工系统具有激光焊枪; 用于改变激光束的激光发射位置的激光焊枪驱动机构; 以及具有一端开放到包含激光手电筒的外部环境的室; 其特征在于，在所述室的自由端与所述激光焊枪之间设置有用于防止水渗透的分隔壁。 该系统用于检测敏化部分并使用敏化检测装置一次修复。 此外，其用于通过熔化喷涂的涂膜来形成合金层，并且通过通过包含金属成分的溶液发射激光束来形成新的表面层。

公开(公告)号：US5516247A

公开(公告)日：1996-05-14

申请号：US292282

申请日：1994-08-18

申请人： Yuji Hosoda ,  Eisaku Hayashi ,  Masanori Suzuki

发明人： Yuji Hosoda ,  Eisaku Hayashi ,  Masanori Suzuki

IPC分类号： F16B39/10 ,  G21D1/02 ,  F16B39/00 ,  F16B39/28

CPC分类号： G21D1/02 ,  G21Y2002/206 ,  G21Y2004/301 ,  G21Y2004/303 ,  Y02E30/40

摘要： The invention is a fastening device for fastening a plurality of structures using a bolt and a nut. At least two bolts are provided each having a screw portion at one end. At least one nut is provided for each of the bolts. The nut has a flange having a diameter greater than a distance between axes of the bolts with relative rotation of the nuts being restricted by fixing mutually overlapping portions of the flanges of the nuts threaded on the bolts to each other.

摘要翻译： 本发明是用于使用螺栓和螺母紧固多个结构的紧固装置。 至少提供两个螺栓，每个螺栓在一端具有螺钉部分。 为每个螺栓提供至少一个螺母。 螺母具有直径大于螺栓轴线之间的距离的凸缘，螺母的相对旋转通过将螺栓螺纹连接的螺母的凸缘的相互重叠的部分彼此固定而受到限制。

公开(公告)号：US4182878A

公开(公告)日：1980-01-08

申请号：US893527

申请日：1978-04-04

申请人： Eisaku Hayashi ,  Takeo Higashino ,  Shin-ichi Suzuki

发明人： Eisaku Hayashi ,  Takeo Higashino ,  Shin-ichi Suzuki

IPC分类号： A61K31/505 ,  A61P35/00 ,  C07D487/04 ,  A61K31/415

CPC分类号： C07D487/04

摘要： Novel derivatives of 1-phenyl-1H-pyrazolo[3,4-d]pyrimidine substituted at the 4-position of the pyrimidine ring are provided. A typical example is 1-phenyl-1H-pyrazolo[3,4-d]pyrimidine-4-carbonitrile. The compounds exhibit excellent anti-carcinogenic activities as evidenced by the animal test with mice.

摘要翻译： 提供了在嘧啶环的4-位取代的1-苯基-1H-吡唑并[3,4-d]嘧啶的新衍生物。 典型的实例是1-苯基-1H-吡唑并[3,4-d]嘧啶-4-甲腈。 该化合物表现出优异的抗致癌活性，如通过小鼠的动物试验证实的。

公开(公告)号：US07960188B2

公开(公告)日：2011-06-14

申请号：US12465024

申请日：2009-05-13

申请人： Shinrou Ohta ,  Mitsuo Tada ,  Noburu Shimizu ,  Yoichi Kobayashi ,  Taro Takahashi ,  Eisaku Hayashi ,  Hiromitsu Watanabe ,  Tatsuya Kohama ,  Itsuki Kobata

发明人： Shinrou Ohta ,  Mitsuo Tada ,  Noburu Shimizu ,  Yoichi Kobayashi ,  Taro Takahashi ,  Eisaku Hayashi ,  Hiromitsu Watanabe ,  Tatsuya Kohama ,  Itsuki Kobata

IPC分类号： H01L21/00 ,  H01L21/302 ,  G01R31/26

CPC分类号： H01L22/26 ,  H01L21/3212 ,  H01L21/67219 ,  H01L22/14

摘要： A method for polishing a substrate having a metal film thereon is described. The substrate has metal interconnects formed from part of the metal film. The polishing method includes performing a first polishing process of removing the metal film, after the first polishing process, performing a second polishing process of removing the barrier film, after the second polishing process, performing a third polishing process of polishing the insulating film. During the second polishing process and the third polishing process, a polishing state of the substrate is monitored with an eddy current sensor, and the third polishing process is terminated when an output signal of the eddy current sensor reaches a predetermined threshold.

摘要翻译： 描述了在其上抛光具有金属膜的基板的方法。 基板具有由金属膜的一部分形成的金属互连。 抛光方法包括进行第一抛光处理，在第一抛光处理之后，在第二抛光处理之后进行去除阻挡膜的第二抛光工艺，进行抛光绝缘膜的第三抛光工艺。 在第二抛光工艺和第三抛光工艺期间，用涡流传感器监测衬底的抛光状态，并且当涡流传感器的输出信号达到预定阈值时，第三抛光处理结束。

公开(公告)号：US20090286332A1

公开(公告)日：2009-11-19

申请号：US12465024

申请日：2009-05-13

申请人： Shinrou OHTA ,  Mitsuo Tada ,  Noburu Shimizu ,  Yoichi Kobayashi ,  Taro Takahashi ,  Eisaku Hayashi ,  Hiromitsu Watanabe ,  Tatsuya Kohama ,  Itsuki Kobata

发明人： Shinrou OHTA ,  Mitsuo Tada ,  Noburu Shimizu ,  Yoichi Kobayashi ,  Taro Takahashi ,  Eisaku Hayashi ,  Hiromitsu Watanabe ,  Tatsuya Kohama ,  Itsuki Kobata

IPC分类号： H01L21/66

CPC分类号： H01L22/26 ,  H01L21/3212 ,  H01L21/67219 ,  H01L22/14

摘要： A method for polishing a substrate having a metal film thereon is described. The substrate has metal interconnects formed from part of the metal film. The polishing method includes performing a first polishing process of removing the metal film, after the first polishing process, performing a second polishing process of removing the barrier film, after the second polishing process, performing a third polishing process of polishing the insulating film, during the second polishing process and the third polishing process, monitoring a polishing state of the substrate with an eddy current sensor, and terminating the third polishing process when an output signal of the eddy current sensor reaches a predetermined threshold.

摘要翻译： 描述了在其上抛光具有金属膜的基板的方法。 基板具有由金属膜的一部分形成的金属互连。 抛光方法包括：进行第一抛光处理后的第一抛光处理，在第一抛光处理之后，在第二抛光处理之后执行去除阻挡膜的第二抛光工艺，进行抛光绝缘膜的第三抛光处理 第二抛光工艺和第三抛光工艺，用涡流传感器监测衬底的抛光状态，并且当涡流传感器的输出信号达到预定阈值时终止第三抛光处理。

公开(公告)号：US20090111358A1

公开(公告)日：2009-04-30

申请号：US12289507

申请日：2008-10-29

申请人： Hidetaka Nakao ,  Eisaku Hayashi ,  Kunio Oishi ,  Isao Hayakawa ,  Yoshiaki Miyake ,  Yoshikuni Tateyama ,  Takeshi Ashihara

发明人： Hidetaka Nakao ,  Eisaku Hayashi ,  Kunio Oishi ,  Isao Hayakawa ,  Yoshiaki Miyake ,  Yoshikuni Tateyama ,  Takeshi Ashihara

IPC分类号： B24B49/00 ,  B24B49/16 ,  B24B7/20

CPC分类号： B24B37/013 ,  B24B49/16

摘要： The present invention provides a apparatus for polishing an object material such as a film on a substrate. This apparatus includes a polishing table for holding a polishing pad having a polishing surface, a motor configured to drive the polishing table, a holding mechanism configured to hold a substrate having an object material to be polished and to press the substrate against the polishing surface, a dresser configured to dress the polishing surface, and a monitoring unit configured to monitor a removal amount of the object material. The monitoring unit is operable to calculate the removal amount of the object material using a model equation containing a variable representing an integrated value of a torque current of the motor when polishing the object material and a variable representing a cumulative operating time of the dresser.

摘要翻译： 本发明提供一种用于在基板上研磨诸如膜的物体材料的装置。 该设备包括：用于保持具有抛光表面的抛光垫的抛光台，构造成驱动抛光台的电机;保持机构，其构造成保持具有待抛光物体的基板，并将基板压靠在抛光表面上; 修整器，其被配置为修整抛光表面;以及监视单元，被配置为监视对象材料的移除量。 监视单元可操作以使用包含表示电机的转矩电流的积分值的变量的模型方程来计算物体材料的去除量，以及表示修整器的累积操作时间的变量。

公开(公告)号：US20090195754A1

公开(公告)日：2009-08-06

申请号：US12252473

申请日：2008-10-16

申请人： Eisaku Hayashi

发明人： Eisaku Hayashi

IPC分类号： G03B21/00

CPC分类号： G03B21/005

摘要： An image transmitting system includes: an image transmitting unit that receives a projection command to project an annotation image onto an object, and transmits a captured image formed by capturing an image of the object designated by the projection command as an object onto which the annotation image is to be projected, the annotation image representing an annotation about the object; a projector that projects the annotation image in an artificially continuous manner, using an afterimage formed by intermittently projecting light onto the object; and an image capturing unit that captures an image of the object including the portion onto which the light is projected during a period between a time when the projector ends the light projection onto the object and a time when the projector starts the next light projection, and forms the captured image to be transmitted by the image transmitting unit.

摘要翻译： 一种图像发送系统包括：图像发送单元，其接收将注释图像投影到对象上的投影命令，并且将通过拍摄由投影命令指定的对象的图像拍摄的拍摄图像作为对象发送到其上， 要投影，注释图像表示关于对象的注释; 投影仪，其以人为连续的方式投射注释图像，使用通过间歇地将光投射到物体上而形成的残像; 以及图像拍摄单元，其在投影机将光投射到对象上的时间与投影仪开始下一次光投射的时间之间的期间，捕获包括投影光的部分的对象的图像;以及 形成由图像发送单元发送的拍摄图像。

公开(公告)号：US4625556A

公开(公告)日：1986-12-02

申请号：US751299

申请日：1985-07-02

申请人： Yusuke Sukahara ,  Eiji Takeuchi ,  Eisaku Hayashi

发明人： Yusuke Sukahara ,  Eiji Takeuchi ,  Eisaku Hayashi

IPC分类号： G01S15/88 ,  G01B17/02 ,  G01N29/00

CPC分类号： G01B17/025

摘要： The layer thickness of an object including a substrate and a layer formed thereon is measured by the following steps. First, with regard to a reference system consisting of a reference substrate and a reference layer formed thereon, which are formed of the same materials as those of the object, and an ultrasonic wave propagation medium, the incident angle .theta. at which an ultrasonic wave is applied through the propagation medium to the reference layer and the product H of the frequency of the ultrasonic wave and the thickness of the reference layer are calculated, the incident angle .theta. and product H having such values as minimize the intensity of the ultrasonic wave reflected from the reference layer. The layer of the object is put in contact with the ultrasonic wave propagation medium, and an ultrasonic wave is applied to the layer through the propagation medium at the incident angle .theta.. Then, the frequency of the ultrasonic wave reflected from the layer is measured to detect the frequency of the incident ultrasonic wave for the minimum reflected wave intensity. The thickness of the layer of the object is calculated from the detected frequency and the value H.

摘要翻译： 通过以下步骤测量包括基底和形成在其上的层的物体的层厚度。 首先，关于由与其相同的材料形成的参考基板和参考层构成的参考系，以及超声波传播介质，超声波的入射角θ 通过传播介质施加到参考层，并计算超声波的频率和参考层的厚度的乘积H，入射角θ和乘积H具有使从超声波反射的超声波的强度最小化的值 参考层。 物体的层与超声波传播介质接触，并且通过传播介质以入射角θ向该层施加超声波。 然后，测量从层反射的超声波的频率，以检测最小反射波强度的入射超声波的频率。 从检测到的频率和值H计算物体层的厚度。

公开(公告)号：US4001021A

公开(公告)日：1977-01-04

申请号：US554924

申请日：1975-03-03

申请人： Tomio Nakajima ,  Teiji Habu ,  Elichi Sakamoto ,  Hiroshi Yamada ,  Katsuhide Mitsui ,  Eisaku Hayashi

发明人： Tomio Nakajima ,  Teiji Habu ,  Elichi Sakamoto ,  Hiroshi Yamada ,  Katsuhide Mitsui ,  Eisaku Hayashi

IPC分类号： G03C1/06 ,  G03C5/20

CPC分类号： G03C1/067 ,  Y10S430/15

摘要： An improved lith-type silver halide photosensitive material of a wide latitude for infectious developing is disclosed which comprises, in an amount of 5 mg to 5 g per mole of silver halide, a compound represented by the following general formula: ##STR1## wherein R.sub.1 is a substituted or unsubstituted alkyl, aryl, aralkyl, arythio or aryloxy group, and R.sub.2 is hydrogen, halogen, alkyl, alkoxy or nitro.

公开(公告)号：US08078306B2

公开(公告)日：2011-12-13

申请号：US12289507

申请日：2008-10-29

申请人： Hidetaka Nakao ,  Eisaku Hayashi ,  Kunio Oishi ,  Isao Hayakawa ,  Yoshiaki Miyake ,  Yoshikuni Tateyama ,  Takeshi Ashihara

发明人： Hidetaka Nakao ,  Eisaku Hayashi ,  Kunio Oishi ,  Isao Hayakawa ,  Yoshiaki Miyake ,  Yoshikuni Tateyama ,  Takeshi Ashihara

IPC分类号： G06F19/00

CPC分类号： B24B37/013 ,  B24B49/16

摘要： An apparatus polishes an object material such as a film on a substrate. This apparatus includes a polishing table for holding a polishing pad having a polishing surface, a motor configured to drive the polishing table, a holding mechanism configured to hold a substrate having an object material to be polished and to press the substrate against the polishing surface, a dresser configured to dress the polishing surface, and a monitoring unit configured to monitor a removal amount of the object material. The monitoring unit is operable to calculate the removal amount of the object material using a model equation containing a variable representing an integrated value of a torque current of the motor when polishing the object material and a variable representing a cumulative operating time of the dresser.

摘要翻译： 一种装置在基板上抛光诸如膜之类的物体材料。 该设备包括：用于保持具有抛光表面的抛光垫的抛光台，构造成驱动抛光台的电机;保持机构，其构造成保持具有待抛光物体的基板，并将基板压靠在抛光表面上; 修整器，其被配置为修整抛光表面;以及监视单元，被配置为监视对象材料的移除量。 监视单元可操作以使用包含表示电机的转矩电流的积分值的变量的模型方程来计算物体材料的去除量，以及表示修整器的累积操作时间的变量。