-
公开(公告)号：US20220319856A1
公开(公告)日：2022-10-06
申请号：US17847971
申请日：2022-06-23
发明人： Juline Shoeb , Alexander Miller Paterson , Ying Wu
IPC分类号： H01L21/3065 , H01J37/305 , H01J37/32
摘要： Systems and methods for etching different features in a substantially equal manner are described. One of the methods includes applying a low frequency bias signal during a low TCP state and applying a high frequency bias signal during a high TCP state. The application of the low frequency bias signal during the low TCP state facilitates generation of hot neutrals, which are used to increase an etch rate of etching dense features compared to an etch rate for etching isolation features. The application of the high frequency bias signal during the high TCP state facilitates generation of ions to increase an etch rate of etching the isolation features compared to an etch rate of etching the dense features. After applying the low frequency bias signal during the low TCP state and the high frequency bias signal during the high TCP state, the isolation and dense features are etched similarly.
-
公开(公告)号：US20220126454A1
公开(公告)日：2022-04-28
申请号：US17427522
申请日：2020-02-06
摘要： Systems and methods are provided for positioning a wafer in relation to a datum structure. In one example, a system comprises a camera arrangement including at least two cameras, each of the at least two cameras including a field of view when positioned in the camera arrangement, each field of view including a peripheral edge of the wafer and a peripheral edge of the datum structure. A processor receives positional data from each of the at least two cameras and determines, in relation to each field of view, a gap size between the respective peripheral edges of the wafer and the datum location included in the respective field of view. A controller adjusts a position of the wafer relative to the datum structure based on the determined respective gap sizes.
-
13.发明授权公开(公告)号：US11056321B2
公开(公告)日：2021-07-06
申请号：US16238926
申请日：2019-01-03
IPC分类号： C23C16/00 , H01L21/67 , H01J37/32 , H01L21/683
摘要： A substrate processing system includes a processing chamber including a substrate support to support a substrate. A coil includes at least one terminal. An RF source configured to supply RF power to the coil. A dielectric window is arranged on one surface of the processing chamber adjacent to the coil. A contamination reducer includes a first plate that is arranged between the at least one terminal of the coil and the dielectric window.
-
公开(公告)号：US10825661B2
公开(公告)日：2020-11-03
申请号：US15969583
申请日：2018-05-02
发明人： Jon McChesney , Saravanapriyan Sriraman , Richard A. Marsh , Alexander Miller Paterson , John Holland
IPC分类号： H01J37/32
摘要： In one embodiment, a plasma processing device may include a dielectric window, a vacuum chamber, an energy source, and at least one air amplifier. The dielectric window may include a plasma exposed surface and an air exposed surface. The vacuum chamber and the plasma exposed surface of the dielectric window can cooperate to enclose a plasma processing gas. The energy source can transmit electromagnetic energy through the dielectric window and form an elevated temperature region in the dielectric window. The at least one air amplifier can be in fluid communication with the dielectric window. The at least one air amplifier can operate at a back pressure of at least about 1 in-H2O and can provide at least about 30 cfm of air.
-
公开(公告)号：US10541168B2
公开(公告)日：2020-01-21
申请号：US15799011
申请日：2017-10-31
发明人： Ali Sucipto Tan , Haoquan Yan , Marc Estoque , Damon Tyrone Genetti , Jon McChesney , Alexander Miller Paterson
IPC分类号： H01L21/68 , H01L21/687
摘要： A system for determining an alignment of an edge ring on a substrate support includes a robot control module configured to control a robot to place the edge ring onto the substrate support and retrieve the edge ring from the substrate support. An alignment module is configured to determine a plurality of first positions of the edge ring on the robot prior to being placed onto the substrate support and determine a plurality of second positions of the edge ring on the robot subsequent to being retrieved from the substrate support. An edge ring position module configured to determine a centered position of the edge ring relative to the substrate support based on offsets between the plurality of first positions and the plurality of second positions.
-
公开(公告)号：US12046450B2
公开(公告)日：2024-07-23
申请号：US18012212
申请日：2021-09-24
发明人： Ying Wu , John Stephen Drewery , Alexander Miller Paterson , Xiang Zhou , Zhuoxian Wang , Yoshie Kimura
IPC分类号： H01J37/32
CPC分类号： H01J37/32146 , H01J37/32174 , H01J37/32091 , H01J37/321 , H01J2237/334
摘要： Systems and methods for synchronization of radio frequency (RF) generators are described. One of the methods includes receiving, by a first RF generator, a first recipe set, which includes information regarding a first plurality of pulse blocks for operating the first RF generator. The method further includes receiving, by a second RF generator, a second recipe set, which includes information regarding a second plurality of pulse blocks for operating a second RF generator. Upon receiving a digital pulsed signal, the method includes executing the first recipe set and executing the second recipe set. The method further includes outputting a first one of the pulse blocks of the first plurality based on the first recipe set in synchronization with a synchronization signal. The method includes outputting a first one of the pulse blocks of the second plurality based on the second recipe set in synchronization with the synchronization signal.
-
公开(公告)号：US11887819B2
公开(公告)日：2024-01-30
申请号：US17960576
申请日：2022-10-05
发明人： Jon McChesney , Saravanapriyan Sriraman , Richard A. Marsh , Alexander Miller Paterson , John Holland
IPC分类号： H01J37/32
CPC分类号： H01J37/32522 , H01J37/32082 , H01J37/32119 , H01J37/32238
摘要： In one embodiment, a plasma processing device may include a dielectric window, a vacuum chamber, an energy source, and at least one air amplifier. The dielectric window may include a plasma exposed surface and an air exposed surface. The vacuum chamber and the plasma exposed surface of the dielectric window can cooperate to enclose a plasma processing gas. The energy source can transmit electromagnetic energy through the dielectric window and form an elevated temperature region in the dielectric window. The at least one air amplifier can be in fluid communication with the dielectric window. The at least one air amplifier can operate at a back pressure of at least about 1 in-H2O and can provide at least about 30 cfm of air.
-
公开(公告)号：US20230274913A1
公开(公告)日：2023-08-31
申请号：US18012212
申请日：2021-09-24
发明人： Ying Wu , John Stephen Drewery , Alexander Miller Paterson , Xiang Zhou , Zhuoxian Wang , Yoshie Kimura
IPC分类号： H01J37/32
CPC分类号： H01J37/32146 , H01J2237/334 , H01J37/32091 , H01J37/321
摘要： Systems and methods for synchronization of radio frequency (RF) generators are described. One of the methods includes receiving, by a first RF generator, a first recipe set, which includes information regarding a first plurality of pulse blocks for operating the first RF generator. The method further includes receiving, by a second RF generator, a second recipe set, which includes information regarding a second plurality of pulse blocks for operating a second RF generator. Upon receiving a digital pulsed signal, the method includes executing the first recipe set and executing the second recipe set. The method further includes outputting a first one of the pulse blocks of the first plurality based on the first recipe set in synchronization with a synchronization signal. The method includes outputting a first one of the pulse blocks of the second plurality based on the second recipe set in synchronization with the synchronization signal.
-
19.发明公开公开(公告)号：US20230245873A1
公开(公告)日：2023-08-03
申请号：US18009575
申请日：2021-06-10
CPC分类号： H01J37/32935 , H01J37/32082 , G01R27/08 , H02J50/20
摘要： A direct drive system for providing RF power to a component of a substrate processing system includes a direct drive circuit including a switch and configured to supply RF power to the component. A switch protection module is configured to monitor a load current and a load voltage in a processing chamber, calculate load resistance based on the load current and the load voltage, compare the load resistance to a first predetermined load resistance, and adjust at least one of an RF power limit and an RF current limit of the direct drive circuit based on the comparison.
-
公开(公告)号：US20230230805A1
公开(公告)日：2023-07-20
申请号：US18009978
申请日：2021-10-15
IPC分类号： H01J37/32
CPC分类号： H01J37/32174 , H01J37/32146
摘要： Systems and methods for synchronization of radio frequency (RF) pulsing schemes and of sensor data collection are described. One of the methods includes receiving, by an RF generator, a first set of one or more variable levels and one or more duty cycles of an RF signal. The method further includes receiving, by the RF generator from a pulse controller, a synchronization signal having a plurality of pulses. The method also includes generating, during a clock cycle of a clock signal, multiple instances of a first plurality of states of the RF signal in synchronization with the plurality of pulses of the synchronization signal. Each of the first plurality of states of the RF signal has a corresponding one of the one or more variable levels of the first set and a corresponding one of the one or more duty cycles of the first set.
-
-
-
-
-
-
-
-
-
搜索结果
24 条记录 (耗时 0.017 秒)
