Abstract:
Systems, methods and computer program products detect a position of a new alignment mark on a substrate by producing an alignment signal model from sample alignment signals and fitting the new alignment signal to the alignment signal model. The alignment signal model may be produced from the multiple sample alignment signals using singular value decomposition, based on subspace decomposition of the alignment signals. By producing an alignment signal model from multiple sample alignment signals, asymmetries in the sample alignment marks and/or in the coatings that are fabricated on the sample alignment marks, may be taken into account when detecting the position of a new alignment mark.
Abstract:
The present invention is an improved mechanism for the coarse adjustment of a scanning tunneling microscope stage. In the present invention the stage is moved by forces transmitted through rigid wire springs mounted on leaf spring assemblies which transmit the motion from rigidly mounted micrometer adjusting devices. It is intended that the coarse adjustment mechanism of the present invention will provide improved performance over coarse adjustment mechanisms presently available for STM applications.The present invention replaces separate sets of leaf springs for X and Y motion with a single set of four wire springs. This simplifies the design and increases the rigidity and stability by reducing the mechanical path length from the solid base to the X-Y-Z stage. The screw mechanisms are all directly connected to the rigid base. (This is made possible by the additional pairs of wire springs connected from the X and Y screws to the stage.) The following advantages are achieved: first, since the screw mechanisms do not move with the stage, driving mechanisms such as motors and gears can be simply connected; and, second, the rigidity and stability are again increased since the stage position is referenced directly to the base through all three screws rather than through intermediate support structures.
Abstract:
One embodiment of improved swim fins consists of a right foot attachment (101) with an outer right blade (111) and an inner right blade (112) which is arranged such that it does not mechanically interfere with an inner left blade (113). The blades may include a pivot mechanism (220) that allows the blades to maintain an optimal angle of attack as the swimmer moves their legs up and down. In another embodiment, a right blade (1011) and a left blade (1013) are attached to the feet of a person who is propelled by the blades above the surface of the water as they pump their feet up and down, forming a human-powered hydrofoil. Other embodiments are described and shown.
Abstract:
One embodiment relates to an apparatus for automated inspection of a semiconductor substrate. Processor-executable code is configured to control the stage electronics to move the substrate using a continuous motion in a substrate-translation direction and is configured to control the beam to scan it across the surface of the substrate and collect corresponding image data, scan lines of the scan being along a scan-line direction perpendicular to the substrate-translation direction. Processor-executable code is also configured to select from the image data two cells of the repeating pattern on the surface of the substrate, the two cells being displaced from each other by one or multiple cell heights in the scan-line direction. Finally, processor-executable code is configured to generate a difference image by subtracting image data from said two cells on a pixel-by-pixel basis. Other embodiments, aspects and features are also disclosed.
Abstract:
One embodiment relates to a method of inspecting a substrate using electrons. Mirror-mode electron-beam imaging is performed on a region of the substrate at multiple voltage differences between an electron source and a substrate, and image data is stored corresponding to the multiple voltage differences. A calculation is made of a measure of variation of an imaged aspect of a feature in the region with respect to the voltage difference between the electron source and the substrate. Other embodiments and features are also disclosed.
Abstract:
One embodiment relates to a portable scanning electron microscope (SEM) system. The system includes a portable SEM device including a CRT-type gun and deflectors to generate and scan the electron beam. Another embodiment relates to a portable SEM device which includes a CRT-type gun and deflectors to generate and scan the electron beam, a chamber through which the electron beam is scanned, and a detector in the chamber for detecting radiation emitted as a result of scanning the electron beam. Another embodiment relates to a method of obtaining an electron beam image of a surface of a bulk specimen where a portable SEM device is moved to the bulk specimen. Other embodiments and features are also disclosed.
Abstract:
One embodiment disclosed relates to an electron beam imaging apparatus. An electron source is configured to generate an electron beam, and a beam-limiting aperture is configured to block a portion of the electron beam and to allow transmission of another portion of the electron beam through the aperture. A first detector is configured to detect scattered electrons emitted by the aperture due to the blocked portion of the electron beam. The imaging apparatus may also include a second detector configured to detect scattered electrons emitted by the sample due to impingement of the transmitted portion of the electron beam. A gain control device may also be included to adjust a gain of a detected signal derived from the second detector using a control signal derived from the first detector. Another embodiment disclosed relates to an electron beam lithography apparatus. The lithography apparatus may adjust a pixel dwell time based on a control signal derived from the scattered electrons emitted by the aperture.
Abstract:
A method for inspecting samples uses a multiple beam electron system having a uniform magnetic focusing field. Deflection of the incident electron beams is produced by deflector plates generating an electrostatic deflection force which produces a uniform force on the electron beams. Thermal field emission sources generate incident electron beams towards at least two portions of the sample. A detector array collects multiple detection electrons.
Abstract:
An X-ray mask membrane 12 is discussed wherein a cantilever and tip portion such as used on an atomic force or scanning tunneling microscope are fabricated directly as part of the mask. The mask is located over a wafer and the vertical (z) motion of the tip with respect to the wafer is achieved with a piezoelectric device which is mounted on a movable support above the cantilever. Piezoelectric device may be a tube having an electrode divided into quadrants so that the end of the tube could be positioned in three dimensions to allow for alignment of the end of the tube to the cantilever tip. X and Y motion of the tip and the mask membrane relative to the wafer is achieved by mounting the wafer on an x-y stage driven by piezoelectric or other transducers. The wafer includes a raised alignment mask on its upper surface. The wafer, mask membrane, and z piezoelectric tube are held rigidly but adjustably with respect to each other by a mechanical fixture. The z piezoelectric tube is lowered until it touches the cantilever; it is then lowered further by the designed gap spacing, deflecting the cantilever downward. The wafer is then raised until it is detected by the tip on the cantilever, either by sensing a tunneling current (STM) or a force (AFM). The wafer is now at the correct z gap setting, and is scanned back and forth in the x and y directions until the location of the alignment mark is determined by the cantilever tip following the contours of the alignment mark, thus setting the proper alignment between the wafer and the mask in the x, y direction.
Abstract:
A method of increasing consistency between separate parametric measurement readings that are taken with an electron beam imaging tool at different times within a period of time, by correcting drift in the imaging tool at a time frequency that is less than a time period during which the drift is anticipated to be undesirably large.