公开(公告)号：US20100103400A1

公开(公告)日：2010-04-29

申请号：US12632055

申请日：2009-12-07

申请人： Markus Deguenther ,  Andras G. Major ,  Anne Christine Andresen

发明人： Markus Deguenther ,  Andras G. Major ,  Anne Christine Andresen

IPC分类号： G03B27/72

CPC分类号： G03F7/70425 ,  G03F7/70116 ,  G03F7/70191 ,  G03F7/702

摘要： An illumination system of a microlithographic projection exposure apparatus comprises a pupil surface and an arrangement of individually drivable beam deviating elements. Each beam deviating element is configured to direct light impinging thereon onto different positions on the pupil surface in response to a control signal applied to the beam deviating element. According to the disclosure an attenuation unit is provided which is configured to reduce the intensity of light, which is directed by any arbitrary beam deviating element (onto the pupil surface, by more than 50%. This makes it possible to reduce the intensity of light in the pupil surface that has been reflected by defective beam deviating elements.

摘要翻译： 微光刻投影曝光装置的照明系统包括光瞳表面和单独驱动的光束偏离元件的布置。 响应于施加到光束偏离元件的控制信号，每个光束偏离元件被配置为将光照射到其上的光瞳表面上的不同位置上。 根据本公开，提供了一种衰减单元，其被配置为减少由任何任意的光束偏离元件（在瞳孔表面上）超过50％的光的强度，这使得可以降低光的强度 在瞳孔表面已经被有缺陷的光束偏离元件反射。

公开(公告)号：US20100039629A1

公开(公告)日：2010-02-18

申请号：US12506364

申请日：2009-07-21

申请人： Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Andras G. Major ,  Manfred Maul ,  Johannes Eisenmenger ,  Damian Fiolka ,  Jan Horn ,  Markus Deguenther ,  Florian Bach ,  Michael Patra ,  Johannes Wangler ,  Michael Layh

发明人： Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Andras G. Major ,  Manfred Maul ,  Johannes Eisenmenger ,  Damian Fiolka ,  Jan Horn ,  Markus Deguenther ,  Florian Bach ,  Michael Patra ,  Johannes Wangler ,  Michael Layh

IPC分类号： G03B27/54

CPC分类号： G03F7/70258 ,  G01B11/002 ,  G01B11/272 ,  G01M11/30 ,  G01N21/55 ,  G02B26/0833 ,  G03F7/70058 ,  G03F7/70116 ,  G03F7/70133 ,  G03F7/702 ,  G03F7/70291 ,  G03F7/70516 ,  G03F7/7085 ,  G05B13/048 ,  Y10S359/904

摘要： An illumination system of a microlithographic projection exposure apparatus has a pupil surface and an essentially flat arrangement of desirably individually drivable beam deviating elements for variable illumination of the pupil surface. Each beam deviating element allows deviation of a projection light beam incident on it to be achieved as a function of a control signal applied to the beam deviating element. A measurement illumination instrument directs a measurement light beam, independent of the projection light beams, onto a beam deviating element. A detector instrument records the measurement light beam after deviation by the beam deviating element. An evaluation unit determines the deviation of the projection light beam from measurement signals provided by the detector instrument.

摘要翻译： 微光刻投影曝光装置的照明系统具有瞳孔表面和基本上平坦的布置，其具有期望地单独驱动的光束偏离元件，用于可变照明瞳孔表面。 每个光束偏离元件允许作为施加到光束偏离元件的控制信号的函数来实现入射到其上的投影光束的偏移。 测量照明仪器将独立于投影光束的测量光束引导到光束偏离元件上。 检测仪器在光束偏离元件偏离后记录测量光束。 评估单元确定投影光束与由检测器仪器提供的测量信号的偏差。

公开(公告)号：US20090262324A1

公开(公告)日：2009-10-22

申请号：US12464730

申请日：2009-05-12

申请人： Michael Patra ,  Markus Deguenther ,  Michael Layh ,  Johannes Wangler ,  Manfred Maul

发明人： Michael Patra ,  Markus Deguenther ,  Michael Layh ,  Johannes Wangler ,  Manfred Maul

IPC分类号： G03B27/80

CPC分类号： G03F7/7085 ,  G03F7/70116

摘要： A microlithographic projection exposure apparatus (1) comprises an illumination system (4) with an illumination optics (5) for illuminating an illumination field in a reticle plane (6). The illumination optics (5) further includes a light distribution device (12a) which comprises a light deflection array (12) of separate elements and an optical assembly (21, 23 to 26) which converts the light intensity distribution defined by the light distribution device (12a) in a first plane (19) of the illumination optics (5) into an illumination angle distribution in the reticle plane (6). Downstream of an output coupling device (17), which is arranged in the light path between the light deflection array (12) and the reticle plane (6), a space and time resolving detection device (30) is exposed to outcoupled illumination light (31) in such a way that the detection device (30) detects a light intensity distribution corresponding to the light intensity distribution in the first plane (19). The detection device (30) allows the influence of separate elements or groups of separate elements on the light intensity distribution in the first plane (19) to be determined, particularly by varying said separate elements or groups of separate elements over time. The result is an illumination optics in which the function of the light deflection array is performed during normal operation.

摘要翻译： 微光刻投影曝光装置（1）包括具有用于照亮标线板平面（6）中的照明场的照明光学器件（5）的照明系统（4）。 照明光学器件（5）还包括配光装置（12a），其包括分离元件的光偏转阵列（12）和光学组件（21,23至26），该光学组件（21,23至26）将由光分配装置 （5）的第一平面（19）中的光线（12a）成为所述掩模版平面（6）中的照明角度分布。 布置在光偏转阵列（12）和光罩平面（6）之间的光路中的输出耦合装置（17）的下游，空间和时间分辨检测装置（30）暴露于外耦合照明光 31），使得检测装置（30）检测对应于第一平面（19）中的光强度分布的光强度分布。 检测装置（30）允许确定分离的元件或单独元件组对第一平面（19）中的光强度分布的影响，特别是通过随时间改变所述单独元件或单独元件组。 结果是在正常操作期间执行光偏转阵列的功能的照明光学器件。

公开(公告)号：US20070019179A1

公开(公告)日：2007-01-25

申请号：US11440475

申请日：2006-05-25

申请人： Damian Fiolka ,  Markus Deguenther

发明人： Damian Fiolka ,  Markus Deguenther

IPC分类号： G03B27/72

CPC分类号： G03F7/70191 ,  G02B7/008 ,  G02B27/286 ,  G03B27/72 ,  G03F7/70341 ,  G03F7/70566 ,  G03F7/70891 ,  G03F7/70966

摘要： The invention relates to a projection system, comprising a radiation source, an illumination system operable to illuminate a structured mask, and a projection objective for projecting an image of the mask structure onto a light-sensitive substrate, wherein said projection system comprises an optical system comprising an optical axis or a preferred direction given by the direction of a light beam propagating through the optical system; the optical system comprising a temperature compensated polarization-modulating optical element described by coordinates of a coordinate system, wherein one preferred coordinate of the coordinate system is parallel to the optical axis or parallel to said preferred direction; said temperature compensated polarization-modulating optical element comprising a first and a second polarization-modulating optical element, the first and/or the second polarization-modulating optical element comprising solid and/or liquid optically active material and a profile of effective optical thickness, wherein the effective optical thickness varies at least as a function of one coordinate different from the preferred coordinate of the coordinate system, in addition or alternative the first and/or the second polarization-modulating optical element comprises solid and/or liquid optically active material, wherein the effective optical thickness is constant as a function of at least one coordinate different from the preferred coordinate of the coordinate system; wherein the first polarization-modulating optical element comprises optically active material with a specific rotation of opposite sign compared to the optically active material of the second polarization-modulating optical element.

摘要翻译： 本发明涉及一种投影系统，包括辐射源，可操作以照亮结构化掩模的照明系统和用于将掩模结构的图像投影到感光基板上的投影物镜，其中所述投影系统包括光学系统 包括通过光学系统传播的光束的方向给出的光轴或优选方向; 所述光学系统包括由坐标系的坐标描述的温度补偿偏振调制光学元件，其中所述坐标系的一个优选坐标平行于光轴或平行于所述优选方向; 所述温度补偿偏振调制光学元件包括第一和第二偏振调制光学元件，第一和/或第二偏振调制光学元件包括固体和/或液体光学活性材料和有效光学厚度的轮廓，其中 另外或替代地，第一和/或第二偏振调制光学元件包括固体和/或液体光学活性材料，其中有效光学厚度至少作为不同于坐标系的优选坐标的一个坐标的函数而变化，其中 有效光学厚度作为与坐标系的优选坐标不同的至少一个坐标的函数是恒定的; 其中与第二偏振调制光学元件的光学活性材料相比，第一偏振调制光学元件包括具有相反符号的特定旋转的光学活性材料。

公开(公告)号：US09176390B2

公开(公告)日：2015-11-03

申请号：US13421024

申请日：2012-03-15

申请人： Michael Layh ,  Markus Deguenther

发明人： Michael Layh ,  Markus Deguenther

IPC分类号： G03B27/68 ,  G03B27/52 ,  G03B27/72 ,  G03B27/32 ,  G03F7/20 ,  G03B27/54

CPC分类号： G03F7/70075 ,  G03F7/70083 ,  G03F7/70191 ,  G03F7/702

摘要： A method includes moving a correction device into a neutral position; subsequently ascertaining, for a given arrangement of imaging light channels in the illumination optical unit of the projection exposure apparatus, intensity distributions of at least some of the individual imaging light partial beams along a transverse coordinate transverse to a displacement direction of an object to be imaged; subsequently ascertaining, in dependence on the transverse coordinate, an actual variation of actual values of structure image sizes of object structures in an image field, onto which the object is imaged; and subsequently specifying a predetermined variation of the structure image sizes over the transverse coordinate and displacing correction elements of the correction device, starting from the neutral position, such that the actual variation matches the predetermined variation within a tolerance bandwidth. The method can provide improved imaging results as compared to known uniformity adjustment.

摘要翻译： 一种方法包括将校正装置移动到中立位置; 随后确定对于投影曝光装置的照明光学单元中的成像光通道的给定布置，沿着与待成像对象的位移方向横向的横向坐标的至少一些单独成像光部分光束的强度分布 ; 随后根据横坐标确定对象被成像的图像场中的对象结构的结构图像尺寸的实际值的实际变化; 并且随后从中性位置开始指定校正装置的横向坐标和位移校正元件上的结构图像尺寸的预定变化，使得实际变化与公差带宽内的预定变化相匹配。 与已知的均匀度调整相比，该方法可以提供改善的成像结果。

公开(公告)号：US08891057B2

公开(公告)日：2014-11-18

申请号：US12818501

申请日：2010-06-18

申请人： Michael Layh ,  Markus Deguenther ,  Michael Patra ,  Johannes Wangler ,  Manfred Maul ,  Damian Fiolka ,  Gundula Weiss

发明人： Michael Layh ,  Markus Deguenther ,  Michael Patra ,  Johannes Wangler ,  Manfred Maul ,  Damian Fiolka ,  Gundula Weiss

IPC分类号： G03B27/42 ,  G03F7/20

CPC分类号： G03F7/702 ,  G02B5/09 ,  G02B26/105 ,  G03F7/70116 ,  G03F7/7055 ,  G03F7/70583

摘要： A projection exposure apparatus for microlithography comprises illumination optics for illuminating object field points of an object field in an object plane is disclosed. The illumination optics have, for each object field point of the object field, an exit pupil associated with the object point, where sin(γ) is a greatest marginal angle value of the exit pupil. The illumination optics include a multi-mirror array that includes a plurality of mirrors to adjust an intensity distribution in exit pupils associated to the object field points. The illumination optics further contain at least one optical system to temporally stabilize the illumination of the multi-mirror array so that, for each object field point, the intensity distribution in the associated exit pupil deviates from a desired intensity distribution in the associated exit pupil in the case of a centroid angle value sin(β) by less than 2% expressed in terms of the greatest marginal angle value sin(γ) of the associated exit pupil and/or, in the case of ellipticity by less than 2%, and/or in the case of a pole balance by less than 2%.

摘要翻译： 公开了一种用于微光刻的投影曝光装置，包括用于照射物平面中的物场的对象场点的照明光学装置。 对于物场的每个物场点，照明光学器件具有与对象点相关联的出射光瞳，其中sin（γ）是出射光瞳的最大边缘角度值。 照明光学器件包括多镜阵列，其包括多个反射镜以调整与对象场点相关联的出射光瞳中的强度分布。 照明光学器件还包含至少一个光学系统，用于暂时稳定多镜阵列的照明，使得对于每个物体场点，相关出射光瞳中的强度分布偏离相关联的出射光瞳中的期望强度分布 以关联出射光瞳的最大边缘角度值sin（γ）表示的质心角值sin（＆bgr）小于2％的情况和/或在椭圆度小于2％的情况下， 和/或在极平衡小于2％的情况下。

公开(公告)号：US08861084B2

公开(公告)日：2014-10-14

申请号：US12200068

申请日：2008-08-28

申请人： Damian Fiolka ,  Markus Deguenther

发明人： Damian Fiolka ,  Markus Deguenther

IPC分类号： G02B5/30 ,  G02B27/28 ,  F21V9/14 ,  G03B27/72 ,  G03F7/20 ,  G02B1/08 ,  G02F1/01

CPC分类号： G02B5/3083 ,  G02B1/08 ,  G02B5/3025 ,  G02B5/3075 ,  G02B27/286 ,  G02F1/0136 ,  G02F1/0147 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70566

摘要： A polarization-modulating optical element consisting of an optically active crystal material has a thickness profile where the thickness, as measured in the direction of the optical axis, varies over the area of the optical element. The polarization-modulating optical element has the effect that the plane of oscillation of a first linearly polarized light ray and the plane of oscillation of a second line early polarized light ray are rotated, respectively, by a first angle of rotation and a second angle of rotation, with the first angle of rotation and the second angle of rotation being different from each other.

摘要翻译： 由光学活性晶体材料组成的偏振调制光学元件具有厚度分布，其中沿光轴方向测量的厚度在光学元件的面积上变化。 偏振调制光学元件具有如下效果：第一直线偏振光的振荡平面和第二行的早期偏振光的振动平面分别旋转第一旋转角度和第二角度 旋转，第一旋转角度和第二旋转角度彼此不同。

公开(公告)号：US08755031B2

公开(公告)日：2014-06-17

申请号：US13005833

申请日：2011-01-13

申请人： Markus Deguenther

发明人： Markus Deguenther

IPC分类号： G03B27/54 ,  G03F7/20

CPC分类号： G03F7/70141 ,  G02B26/02 ,  G02B26/0833 ,  G02B26/101 ,  G03F7/70066 ,  G03F7/70075 ,  G03F7/70116 ,  G03F7/70158 ,  G03F7/702

摘要： An illumination system of a microlithographic projection exposure apparatus includes an optical raster element configured to produce a plurality of secondary light sources located in a system pupil surface. The optical raster element has a plurality of light entrance facets, each being associated with one of the secondary light sources. A beam deflecting device includes a beam deflection array of reflective or transparent beam deflecting elements, each being configured to illuminate a spot on one of the light entrance facets at a position that is variable by changing a deflection angle produced by the beam deflecting element. A control unit is configured to control the beam deflection elements such that variable light patterns assembled from the spots can be formed on at least one of the plurality of light entrance facets.

摘要翻译： 微光刻投影曝光装置的照明系统包括被配置为产生位于系统光瞳表面中的多个次级光源的光栅元件。 光栅元件具有多个光入射面，每个光入射面与二次光源中的一个相关联。 光束偏转装置包括反射或透明光束偏转元件的光束偏转阵列，每个光束偏转阵列被配置为在通过改变由光束偏转元件产生的偏转角可变的位置处照射光入射面中的一个上的光斑。 控制单元被配置为控制光束偏转元件，使得可以在多个光入射面中的至少一个上形成从斑点组装的可变光图案。

公开(公告)号：US08705000B2

公开(公告)日：2014-04-22

申请号：US12846470

申请日：2010-07-29

申请人： Artur Hoegele ,  Markus Deguenther

发明人： Artur Hoegele ,  Markus Deguenther

IPC分类号： G03B27/42

CPC分类号： G03F7/7015 ,  G03F7/70141 ,  G03F7/70191

摘要： An illumination optics illuminates an object field of a projection exposure apparatus for microlithography. The illumination optics include a condenser group of optical components which guide a bundle of useful light. An objective group of bundle-guiding components is arranged downstream of the condenser group. At least one component of the condenser group and at least one component of the objective group are displaceable for compensation of deviations of the object field, which is in an actual illumination state, from a desired illumination state.

摘要翻译： 照明光学器件照射用于微光刻的投影曝光装置的物体场。 照明光学器件包括引导一束有用光的光学部件的聚光器组。 束导向部件的目标组布置在冷凝器组的下游。 冷凝器组的至少一个部件和物镜组的至少一个部件可移位以补偿处于实际照明状态的物场偏离所期望的照明状态。

公开(公告)号：US08467031B2

公开(公告)日：2013-06-18

申请号：US12795014

申请日：2010-06-07

申请人： Erich Schubert ,  Alexander Kohl ,  Gerhard-Wilhelm Ziegler ,  Michael Patra ,  Markus Deguenther ,  Michael Layh

发明人： Erich Schubert ,  Alexander Kohl ,  Gerhard-Wilhelm Ziegler ,  Michael Patra ,  Markus Deguenther ,  Michael Layh

IPC分类号： G03B27/68 ,  G03B27/32

CPC分类号： G03F7/70083 ,  G03F7/70116 ,  G03F7/70191 ,  G03F7/70433

摘要： An illumination system of a micro-lithographic projection exposure apparatus is provided, which is configured to illuminate a mask positioned in a mask plane. The system includes a pupil shaping optical subsystem and illuminator optics that illuminate a beam deflecting component. For determining a property of the beam deflecting component, an intensity distribution in a system pupil surface of the illumination system is determined. Then the property of the beam deflecting component is determined such that the intensity distribution produced by the pupil shaping subsystem in the system pupil surface approximates the intensity distribution determined before. At least one of the following aberrations are taken into account in this determination: (i) an aberration produced by the illuminator optics; (ii) an aberration produced by the pupil shaping optical subsystem; (iii) an aberration produced by an optical element arranged between the system pupil surface and the mask plane.

摘要翻译： 提供微光刻投影曝光装置的照明系统，其被配置为照亮位于掩模平面中的掩模。 该系统包括光束成形光学子系统和照射光束偏转部件的照明器光学器件。 为了确定光束偏转分量的特性，确定照明系统的系统光瞳表面中的强度分布。 然后确定光束偏转分量的特性，使得瞳孔成形子系统在系统光瞳表面中产生的强度分布近似于之前确定的强度分布。 在该确定中考虑以下像差中的至少一个：（i）由照明器光学器件产生的像差; （ii）由光瞳成形光学子系统产生的像差; （iii）由布置在系统光瞳表面和掩模平面之间的光学元件产生的像差。