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公开(公告)号：US07371285B2
公开(公告)日：2008-05-13
申请号：US10804300
申请日：2004-03-19
申请人： Michael Rosenstein , Alex Shenderovich , Marc O. Schweitzer , Ilya Lavitsky , Alvin Lau , Michael Feltsman
发明人： Michael Rosenstein , Alex Shenderovich , Marc O. Schweitzer , Ilya Lavitsky , Alvin Lau , Michael Feltsman
CPC分类号： H01J37/32458 , C23C14/35 , C23C16/44 , E05F15/614 , E05F15/622 , E05Y2900/00 , E05Y2900/60
摘要： A semiconductor processing chamber having a motorized lid is provided. In one embodiment, the semiconductor processing chamber generally includes a chamber body having sidewalls and a bottom defining an interior volume. A lid assembly is coupled to the chamber body and is movable between a first position that encloses the interior volume and a second position. A hinge assembly thereto is coupled between the lid assembly and the chamber body. A motor is coupled to the hinge assembly to facilitate moving the lid assembly between the first position and the second position.
摘要翻译： 提供具有电动盖的半导体处理室。 在一个实施例中，半导体处理室通常包括具有限定内部空间的侧壁和底部的室主体。 盖组件联接到室主体并且可在包围内部容积的第一位置和第二位置之间移动。 其铰链组件连接在盖组件和腔体之间。 电动机联接到铰链组件以便于在第一位置和第二位置之间移动盖组件。
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公开(公告)号：US20050133365A1
公开(公告)日：2005-06-23
申请号：US10942273
申请日：2004-09-16
申请人： Ilyoung Hong , Donny Young , Michael Rosenstein , Robert Lowrance , Daniel Lubben , Michael Miller , Peijun Ding , Sreekrishnan Sankaranarayan , Goichi Yoshidome
发明人： Ilyoung Hong , Donny Young , Michael Rosenstein , Robert Lowrance , Daniel Lubben , Michael Miller , Peijun Ding , Sreekrishnan Sankaranarayan , Goichi Yoshidome
CPC分类号： C23C14/3407 , C23C14/35 , C23C14/54 , H01J37/3408 , H01J37/3455
摘要： A lift mechanism for and a corresponding use of a magnetron in a plasma sputter reactor. A magnetron rotating about the target axis is controllably lifted away from the back of the target to compensate for sputter erosion, thereby maintaining a constant magnetic field and resultant plasma density at the sputtered surface, which is particularly important for stable operation with a small magnetron, for example, one executing circular or planetary motion about the target axis. The lift mechanism can include a lead screw axially fixed to the magnetron support shaft and a lead nut engaged therewith to raise the magnetron as the lead nut is turned. Alternatively, the support shaft is axially fixed to a vertically moving slider. The amount of lift may be controlled according a recipe based on accumulated power applied to the target or by monitoring electrical characteristics of the target.
摘要翻译： 用于等离子体溅射反应器中的磁控管的升降机构和相应的使用。 围绕目标轴旋转的磁控管被可控地从目标的背面提升，以补偿溅射侵蚀，从而在溅射表面保持恒定的磁场和合成的等离子体密度，这对于使用小的磁控管的稳定操作特别重要， 例如，一个执行关于目标轴的圆形或行星运动。 升降机构可以包括轴向固定到磁控管支撑轴的导螺杆和与其接合的导螺母，以在导螺母转动时升高磁控管。 或者，支撑轴轴向固定到垂直移动的滑块。 可以根据基于施加到目标的累积功率的配方或通过监视目标的电气特性来控制升力量。
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公开(公告)号：USD450070S1
公开(公告)日：2001-11-06
申请号：US29090618
申请日：1998-07-13
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公开(公告)号：US20080116067A1
公开(公告)日：2008-05-22
申请号：US11950881
申请日：2007-12-05
申请人： Ilya Lavitsky , Michael Rosenstein , Goichi Yoshidome , Hougong Wang , Zhendong Liu , Mengqi Ye
发明人： Ilya Lavitsky , Michael Rosenstein , Goichi Yoshidome , Hougong Wang , Zhendong Liu , Mengqi Ye
IPC分类号： C23C14/34
CPC分类号： H01J37/3408 , C23C14/35 , C23C14/352 , C23C14/564 , H01J37/32568 , H01J37/32733 , H01J37/3455
摘要： The invention relates to physical vapor deposition (PVD) chambers having a rotatable substrate pedestal and at least one moveable tilted target. Embodiments of the invention facilitate deposition of highly uniform thin films.
摘要翻译： 本发明涉及具有可旋转衬底基座和至少一个可移动倾斜目标的物理气相沉积（PVD）室。 本发明的实施方案有利于沉积高度均匀的薄膜。
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15.发明申请公开(公告)号：US20060096857A1
公开(公告)日：2006-05-11
申请号：US10984265
申请日：2004-11-08
申请人： Ilya Lavitsky , Michael Rosenstein , Goichi Yoshidome , Hougong Wang , Zhendong Liu , Mengqi Ye
发明人： Ilya Lavitsky , Michael Rosenstein , Goichi Yoshidome , Hougong Wang , Zhendong Liu , Mengqi Ye
IPC分类号： C23C14/00
CPC分类号： H01J37/3408 , C23C14/35 , C23C14/352 , C23C14/564 , H01J37/32568 , H01J37/32733 , H01J37/3455
摘要： The invention relates to physical vapor deposition (PVD) chambers having a rotatable substrate pedestal. Embodiments of the invention facilitate deposition of highly uniform thin films. In further embodiments, one or more sputtering targets are movably disposed above the pedestal. The orientation of the targets relative to the pedestal may be adjusted laterally, vertically or angularly. In one embodiment, the target may be adjusted between angles of about 0 to 45 degreees relative to an axis of pedestal rotation.
摘要翻译： 本发明涉及具有可转动的基板底座的物理气相沉积（PVD）室。 本发明的实施方案有利于沉积高度均匀的薄膜。 在另外的实施例中，一个或多个溅射靶可移动地设置在基座上方。 目标相对于基座的取向可以横向，垂直或有角度地调整。 在一个实施例中，可以相对于基座旋转轴线在约0至45度的角度之间调整目标。
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公开(公告)号：US20060096851A1
公开(公告)日：2006-05-11
申请号：US10984291
申请日：2004-11-08
申请人： Ilya Lavitsky , Michael Rosenstein , Goichi Yoshidome , Hougong Wang , Zhendong Liu , Mengqi Ye
发明人： Ilya Lavitsky , Michael Rosenstein , Goichi Yoshidome , Hougong Wang , Zhendong Liu , Mengqi Ye
CPC分类号： H01J37/3408 , C23C14/35 , C23C14/352 , C23C14/564 , H01J37/32568 , H01J37/32733 , H01J37/3455
摘要： The invention relates to physical vapor deposition (PVD) chambers having a rotatable substrate pedestal and at least one moveable tilted target. Embodiments of the invention facilitate deposition of highly uniform thin films.
摘要翻译： 本发明涉及具有可旋转衬底基座和至少一个可移动倾斜目标的物理气相沉积（PVD）室。 本发明的实施方案有利于沉积高度均匀的薄膜。
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公开(公告)号：US06589407B1
公开(公告)日：2003-07-08
申请号：US08862537
申请日：1997-05-23
IPC分类号： C23C1434
CPC分类号： H01J37/32623 , H01J37/3441
摘要： An aluminum deposition shield substantially improves transfer of radiated heat from within the vacuum chamber, in comparison to a stainless steel deposition shield. The aluminum deposition shield remains cooler during wafer processing and assists in cooling the chamber components.
摘要翻译： 与不锈钢沉积屏蔽相比，铝沉积屏蔽件显着地改善了来自真空室内的辐射热传递。 铝沉积屏蔽在晶片加工过程中保持冷却，有助于冷却腔室部件。
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公开(公告)号：US06228236B1
公开(公告)日：2001-05-08
申请号：US09422897
申请日：1999-10-22
IPC分类号： C23C1435
CPC分类号： H01J37/3455 , H01J37/3408
摘要： A magnetron for use in a DC magnetron sputtering reactor that can rotate at a smaller diameter during a deposition phase and at a larger diameter during a cleaning phase, whereby sputter material redeposited outside of the deposition sputtering track is removed during the cleaning phase. An embodiment for a two-diameter magnetron includes a swing arm fixed on one end to the magnetron rotation motor shaft and on the other end to a pivot shaft, pivotably coupled to the magnetron. When the magnetron is rotated in different directions, hydrodynamic forces between the magnetron and the chilling water bath cause magnetron to pivot about the pivot shaft. Two mechanical detents fix the limits of the pivoting and hence establish the two diameters of rotation.
摘要翻译： 用于DC磁控溅射反应器的磁控管，其可以在清洁阶段期间在沉积阶段和较大直径期间以较小直径旋转，由此在清洗阶段期间去除沉积在沉积溅射轨道之外的溅射材料。 两直径磁控管的一个实施例包括一个摆臂，固定在磁控管旋转电机轴的一端，另一端固定在枢转轴上，该枢轴与磁控管相连。 当磁控管沿不同方向旋转时，磁控管和冷却水浴之间的流体动力使磁控管绕枢轴转动。 两个机械制动器固定了转动的极限，从而建立了两个旋转直径。
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公开(公告)号：US07674360B2
公开(公告)日：2010-03-09
申请号：US10942273
申请日：2004-09-16
申请人： Ilyoung Richard Hong , Donny Young , Michael Rosenstein , Robert B. Lowrance , Daniel C. Lubben , Michael Andrew Miller , Peijun Ding , Sreekrishnan Sankaranarayan , Goichi Yoshidome
发明人： Ilyoung Richard Hong , Donny Young , Michael Rosenstein , Robert B. Lowrance , Daniel C. Lubben , Michael Andrew Miller , Peijun Ding , Sreekrishnan Sankaranarayan , Goichi Yoshidome
CPC分类号： C23C14/3407 , C23C14/35 , C23C14/54 , H01J37/3408 , H01J37/3455
摘要： A lift mechanism for and a corresponding use of a magnetron in a plasma sputter reactor. A magnetron rotating about the target axis is controllably lifted away from the back of the target to compensate for sputter erosion, thereby maintaining a constant magnetic field and resultant plasma density at the sputtered surface, which is particularly important for stable operation with a small magnetron, for example, one executing circular or planetary motion about the target axis. The lift mechanism can include a lead screw axially fixed to the magnetron support shaft and a lead nut engaged therewith to raise the magnetron as the lead nut is turned. Alternatively, the support shaft is axially fixed to a vertically moving slider. The amount of lift may be controlled according a recipe based on accumulated power applied to the target or by monitoring electrical characteristics of the target.
摘要翻译： 用于等离子体溅射反应器中的磁控管的升降机构和相应的使用。 围绕目标轴旋转的磁控管被可控地从目标的背面提升，以补偿溅射侵蚀，从而在溅射表面保持恒定的磁场和合成的等离子体密度，这对于使用小的磁控管的稳定操作特别重要， 例如，一个执行关于目标轴的圆形或行星运动。 升降机构可以包括轴向固定到磁控管支撑轴的导螺杆和与其接合的导螺母，以在导螺母转动时升高磁控管。 或者，支撑轴轴向固定到垂直移动的滑块。 可以根据基于施加到目标的累积功率的配方或通过监视目标的电气特性来控制升力量。
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公开(公告)号：US20060151306A1
公开(公告)日：2006-07-13
申请号：US11312235
申请日：2005-12-20
申请人： Allen Lau , Michael Rosenstein , Carl Johnson , Sharon Niehoff
发明人： Allen Lau , Michael Rosenstein , Carl Johnson , Sharon Niehoff
IPC分类号： H01H9/28
CPC分类号： H01H9/282
摘要： An apparatus for a lock out/tag out device that is a permanent attachment to a standard breaker box is disclosed. The device is designed to prevent movement of an electrical breaker handle to a closed position when the device is in use. The device also prevents locking a breaker in an on position, thereby lowering safety concerns. When the device is not in use, the device will not interfere with the operation of the breakers and stays conveniently attached to the breaker box. The device also allows storage of locking devices when not in use, thereby enabling personnel to perform a service procedure more efficiently.
摘要翻译： 公开了一种用于锁定/标签输出装置的装置，其是与标准断路器盒的永久附件。 该设备被设计成当设备使用时防止电气断路器手柄移动到关闭位置。 该装置还防止将断路器锁定在接通位置，从而降低安全性。 当设备不使用时，设备不会干扰断路器的操作并且保持方便地连接到断路器盒。 该装置还允许在不使用时存储锁定装置，从而使人员能够更有效地执行服务程序。
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