公开(公告)号：US06647086B2

公开(公告)日：2003-11-11

申请号：US09859043

申请日：2001-05-17

申请人： Mitsuaki Amemiya ,  Yutaka Watanabe

发明人： Mitsuaki Amemiya ,  Yutaka Watanabe

IPC分类号： G21K500

CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/7005 ,  G21K5/04 ,  H05G2/00 ,  H05G2/008

摘要： A proximity X-ray exposure apparatus for irradiating a reticle with X-rays generated from an X-ray source and irradiating a substrate with X-rays that have passed through the reticle. The apparatus includes a plasma X-ray source for generating X-rays by producing plasma, and a control device for controlling X-ray intensity distribution by controlling production of the plasma so that the plasma is produced at a plurality of positions in one irradiating operation of the substrate with the X-rays. The control device controls the X-ray intensity distribution in order to control the plurality of positions so that a required amount of defocusing, which is a size of a projection image corresponding to one point on the reticle formed by irradiating the reticle with X-rays generated at the plurality of positions, can be obtained.

摘要翻译： 一种接近X射线曝光装置，用于用X射线源产生的X射线照射掩模版，并且通过已经通过掩模版的X射线照射衬底。 该装置包括：通过产生等离子体产生X射线的等离子体X射线源;以及控制装置，用于通过控制等离子体的产生来控制X射线强度分布，使得在一次照射操作中在多个位置产生等离子体 的X射线。 控制装置控制X射线强度分布，以便控制多个位置，使得所需量的散焦，其是通过用X射线照射掩模版而形成的与掩模版上的一个点相对应的投影图像的尺寸 在多个位置产生。

公开(公告)号：US06272202B1

公开(公告)日：2001-08-07

申请号：US09426945

申请日：1999-10-26

申请人： Keiko Chiba ,  Shunichi Uzawa ,  Mitsuaki Amemiya ,  Yutaka Watanabe

发明人： Keiko Chiba ,  Shunichi Uzawa ,  Mitsuaki Amemiya ,  Yutaka Watanabe

IPC分类号： G21K500

CPC分类号： G03F7/70325 ,  G03F1/22 ,  G03F1/50 ,  G03F7/001 ,  G03F7/2022 ,  G03F7/7035 ,  G03F7/70466

摘要： An exposure method for printing a pattern onto a workpiece to be exposed, includes a first exposure step for forming, on the workpiece and by exposure, a transferred image of a first absorbing material pattern formed on a mask and having no periodic structure, and a second exposure step for printing, on the workpiece and by exposure, a diffraction pattern to be produced through Fresnel diffraction due to a second absorbing material pattern formed on the mask and having a periodic structure, the diffraction pattern having a period corresponding to 1/n of a period of the transferred image of the periodic structure pattern, where n is an integer not less than 2, and wherein the first and second exposure steps are performed simultaneously.

摘要翻译： 一种用于将图案印刷到要曝光的工件上的曝光方法包括：第一曝光步骤，用于在工件上形成并且通​​过曝光形成在掩模上形成并且不具有周期性结构的第一吸收材料图案的转印图像，以及 第二曝光步骤，用于在工件上和通过曝光印刷由于在掩模上形成的具有周期性结构的第二吸收材料图案而通过菲涅耳衍射产生的衍射图案，衍射图案具有对应于1 / n的周期 其中n是不小于2的整数，并且其中同时执行第一和第二曝光步骤。

公开(公告)号：US5835560A

公开(公告)日：1998-11-10

申请号：US963874

申请日：1997-11-04

申请人： Mitsuaki Amemiya ,  Yutaka Watanabe ,  Kazuyuki Kasumi

发明人： Mitsuaki Amemiya ,  Yutaka Watanabe ,  Kazuyuki Kasumi

IPC分类号： G03F7/20 ,  G21K1/06 ,  G21K5/02 ,  G21K5/00

CPC分类号： G03F7/70058 ,  G03F7/708 ,  G21K1/06 ,  G21K5/02

摘要： An exposure apparatus includes a mirror for reflecting radiation light from a light source, a driving mechanism for holding and oscillating the mirror, a detector for detecting the position of a beam of the radiation light projected on the mirror, an adjusting mechanism for adjusting the position of the mirror with respect to the radiation light on the basis of an output of the detector, and a reference table for positioning the driving mechanism and the detector with respect to the same reference.

摘要翻译： 曝光装置包括用于反射来自光源的辐射光的反射镜，用于保持和振荡反射镜的驱动机构，用于检测投射在反射镜上的辐射光束的位置的检测器，用于调节位置的调节机构 基于检测器的输出相对于辐射光的反射镜，以及用于相对于相同基准定位驱动机构和检测器的参考表。

公开(公告)号：US07465936B2

公开(公告)日：2008-12-16

申请号：US11359303

申请日：2006-02-21

申请人： Mitsuaki Amemiya

发明人： Mitsuaki Amemiya

IPC分类号： G01T1/16

CPC分类号： G03F7/7085 ,  G01J1/26 ,  G01J1/429 ,  G03F7/70558

摘要： A measuring method that utilizes a bandpass filter and a measurement apparatus to measure an intensity of light having a predetermined wavelength among lights emitted from a light source, the bandpass filter transmitting the light having the predetermined wavelength, the measurement apparatus measuring an absolute intensity of an incident light includes the steps of measuring an output of the measurement apparatus continuously, stopping or starting an emission of the light source in the measuring step, calculating a first extreme value t→t0−0 and a second extreme value t→t0+0 in the output of the measurement apparatus at time t0 where t is time in the measuring step, and t0 is time when the emission of the light source stops; and calculating a difference between the first extreme value t→t0−0 and the second extreme value t→t0+0.

摘要翻译： 一种利用带通滤波器和测量装置测量从光源发出的光中的具有预定波长的光的强度的测量方法，所述带通滤光器透射具有预定波长的光，所述测量装置测量绝对强度 入射光包括在测量步骤中连续地测量测量设备的输出，停止或开始光源的发射的步骤，计算第一极值t-> t0-0和第二极值t-> t0 + 0在测量装置的时间t0，其中t是测量步骤中的时间，t0是光源的发射停止的时间; 并计算第一极值t→t0-0与第二极值t→t0 + 0之差。

公开(公告)号：US20060044538A1

公开(公告)日：2006-03-02

申请号：US11214252

申请日：2005-08-29

申请人： Mitsuaki Amemiya ,  Masahito Shinohara

发明人： Mitsuaki Amemiya ,  Masahito Shinohara

IPC分类号： G03B27/52

CPC分类号： G03F9/7088 ,  G03F9/7065 ,  G03F9/7096

摘要： An alignment apparatus for aligning with each other a mask stage that supports a mask that has an exposure pattern and a wafer stage that supports an object by using a light with wavelength of 1 nm to 50 nm, said alignment apparatus including a substrate for forming a first reference pattern similar to a second reference pattern formed on the mask or the mask stage, and a detection part for detecting a light from the substrate, wherein said substrate and detection part form a hollow housing, in which a gas is filled.

摘要翻译： 一种对准装置，用于将通过使用波长为1nm至50nm的光来支撑具有曝光图案的掩模的掩模台和支撑物体的对准装置，所述对准装置包括用于形成 与掩模或掩模台上形成的第二参考图案相似的第一参考图案，以及用于检测来自基板的光的检测部分，其中所述基板和检测部分形成填充有气体的中空壳体。

公开(公告)号：US06647087B2

公开(公告)日：2003-11-11

申请号：US09981080

申请日：2001-10-18

申请人： Mitsuaki Amemiya ,  Shunichi Uzawa

发明人： Mitsuaki Amemiya ,  Shunichi Uzawa

IPC分类号： G21K500

CPC分类号： G03F7/7035 ,  G03F1/70 ,  G03F7/001 ,  G03F7/2022 ,  G03F7/70466

摘要： An exposure method for exposing a workpiece in a proximity exposure system, includes a first exposure step for printing, by exposure, an image of a first mask pattern on a predetermined portion of the workpiece, and a second exposure step for printing, by exposure, an image of a second mask pattern, different from the first mask pattern, on the predetermined portion of the workpiece, wherein exposures in the first and second exposure steps are performed superposedly, prior to a development process.

公开(公告)号：US06327332B1

公开(公告)日：2001-12-04

申请号：US09425223

申请日：1999-10-22

申请人： Mitsuaki Amemiya ,  Shunichi Uzawa

发明人： Mitsuaki Amemiya ,  Shunichi Uzawa

IPC分类号： H01L2130

CPC分类号： G03F7/7035 ,  G03F1/70 ,  G03F7/001 ,  G03F7/2022 ,  G03F7/70466

摘要： An exposure method for posing a workpiece in a proximity exposure system, includes a first exposure step for printing, by exposure, an image of a first mask pattern on a predetermined portion of the workpiece, and a second exposure step for printing, by exposure, an image of a second mask pattern, different from the first mask pattern, on the predetermined portion of the workpiece, wherein exposures in the first and second exposure steps are performed superposedly, prior to a development process.

摘要翻译： 一种用于在接近曝光系统中曝光工件的曝光方法包括：第一曝光步骤，用于通过曝光打印在工件的预定部分上的第一掩模图案的图像;以及第二曝光步骤，用于通过曝光打印， 在工件的预定部分上的与第一掩模图案不同的第二掩模图案的图像，其中在显影处理之前，重叠地执行第一和第二曝光步骤中的曝光。

公开(公告)号：US5680428A

公开(公告)日：1997-10-21

申请号：US519755

申请日：1995-08-28

申请人： Mitsuaki Amemiya ,  Shunichi Uzawa

发明人： Mitsuaki Amemiya ,  Shunichi Uzawa

IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  H01L21/683 ,  B32B31/04

CPC分类号： G03F7/70716 ,  G03F7/70783 ,  G03F7/70866 ,  G03F7/70875 ,  Y10T279/11

摘要： Disclosed are an object holding process and and an apparatus therefor in which a process strain of the object can be accurately compensated for. When the exposure operation is started, the bottom surface of the object is held by a holding unit. If the object has a strain, the process strain is calculated. Here, if the process strain is larger than a tolerance, the temperature of the object is set to an object setting temperature in a position other than an exposure position in order to contract or expand the object by a predetermined amount for a magnification correction. The bottom surface of the object is then held by the holding unit again, and the exposure of the object is performed in the exposure position.

摘要翻译： 公开了一种物体保持过程及其装置，其中可以精确地补偿物体的过程应变。 当曝光操作开始时，物体的底面由保持单元保持。 如果物体有应变，则计算过程应变。 这里，如果过程应变大于公差，则将物体的温度设定为除曝光位置以外的位置的物体设定温度，以使物体收缩或扩大预定量用于倍率校正。 然后，物体的底面再次被保持单元保持，并且在曝光位置进行物体的曝光。

公开(公告)号：US5581590A

公开(公告)日：1996-12-03

申请号：US272374

申请日：1994-07-06

申请人： Makiko Mori ,  Kunitaka Ozawa ,  Mitsuaki Amemiya

发明人： Makiko Mori ,  Kunitaka Ozawa ,  Mitsuaki Amemiya

IPC分类号： G03F7/20 ,  H01L21/027 ,  G21K5/00

CPC分类号： G03F7/708

摘要： In an SOR exposure system for transferring patterns on masks to semiconductor wafers by using SOR radiation reflected by an X-ray reflecting mirror, a first shutter device for shielding at least .gamma. rays and a second shutter device for shielding X-rays are provided between the SOR ring and the mirror inside a beam port, and an exposure adjustment device for adjusting the amount of exposure when a circuit pattern on a mask is transferred to a wafer is provided between the mirror and the wafer. As a result, the human body can be protected against radiation rays, such as gamma rays, generated from the SOR ring when electrons are implanted thereto or when the SOR ring is stopped. Damage to the X-ray reflecting mirror caused by radiation rays is reduced, and stable reflectance of the mirror can be obtained. Maintenance of the SOR exposure system is also made easier.

摘要翻译： 在通过使用由X射线反射镜反射的SOR辐射将掩模上的图案转印到半导体晶片的SOR曝光系统中，至少屏蔽至少伽马射线的第一快门装置和用于屏蔽X射线的第二快门装置 SOR环和光束端口内的反射镜，以及用于当将掩模上的电路图案转印到晶片时调节曝光量的曝光调节装置设置在反射镜和晶片之间。 结果，当电子被植入其中时或当SOR环停止时，可以保护人体免受从SOR环产生的辐射线，例如γ射线。 由放射线引起的对X射线反射镜的伤害降低，反射镜的反射率稳定。 SOR曝光系统的维护也变得更加容易。

公开(公告)号：US20050270509A1

公开(公告)日：2005-12-08

申请号：US11144319

申请日：2005-06-03

申请人： Nobuaki Ogushi ,  Mitsuaki Amemiya

发明人： Nobuaki Ogushi ,  Mitsuaki Amemiya

IPC分类号： G03F7/20 ,  G03B27/52 ,  G03F9/00 ,  H01L21/027

CPC分类号： G03F9/7088 ,  G03F9/7076

摘要： A measuring apparatus according for measuring relative positions between a first mark on a movable reticle stage to hold a reticle, and a second mark on a movable object stage to hold an object to be exposed, the apparatus includes a detector for detecting light that has passed the first and second marks, and a processor for calculating the relative positions based on an output of the detector, wherein each of the first and second marks includes plural patterns to direct the light, at least ones of widths and intervals of the plural patterns being non-uniform.

摘要翻译： 一种测量装置，用于测量可动掩模台上的第一标记以保持掩模版之间的相对位置，以及在可移动物体台上的第二标记以保持待曝光的物体，该装置包括用于检测已经通过的光的检测器 第一和第二标记，以及用于基于检测器的输出来计算相对位置的处理器，其中第一和第二标记中的每一个包括多个图案以引导光，多个图案中的至少一个宽度和间隔是 不均匀