公开(公告)号：US5777722A

公开(公告)日：1998-07-07

申请号：US654382

申请日：1996-05-28

申请人： Seiji Miyazaki ,  Tsuyoshi Narabe ,  Kei Nara ,  Tomohide Hamada ,  Kazuaki Saiki ,  Hideji Goto ,  Muneyasu Yokota

发明人： Seiji Miyazaki ,  Tsuyoshi Narabe ,  Kei Nara ,  Tomohide Hamada ,  Kazuaki Saiki ,  Hideji Goto ,  Muneyasu Yokota

IPC分类号： G03F7/20 ,  G03F9/00 ,  G03B27/42 ,  G03B27/32 ,  G01B11/00

CPC分类号： G03F7/70275 ,  G03F7/70358 ,  G03F9/70

摘要： A scanning exposure apparatus is arranged to illuminate a mask, to project an image of the mask through a projection optical system onto a photosensitive substrate, and to move the mask and the photosensitive substrate relative to the projection optical system, thereby effecting exposure of an entire surface of the mask on the photosensitive substrate, and the exposure apparatus comprises a position detector which detects a relative positional relation between the mask and the photosensitive substrate; a memory which stores positional information obtained by the position detector; a position correcting device which corrects the relative positional relation between the mask and the photosensitive substrate, based on the positional information read out from the memory device; and a controller which makes the position detector detect the relative positional relation between the mask and the photosensitive substrate while the mask and the photosensitive substrate are carried past a projection region of the projection optical system to an exposure start position, and makes the position correcting device correct the relative positional relation between the mask and the photosensitive substrate, based on the positional information read out from the memory, while the mask and the photosensitive substrate are stopped at the exposure start position and/or during the exposure.

摘要翻译： 扫描曝光装置被布置为照亮掩模，通过投影光学系统将光掩模的图像投射到感光基板上，并且使掩模和感光基板相对于投影光学系统移动，从而实现整个曝光 感光基板上的掩模表面，曝光装置包括检测掩模和感光基板之间的相对位置关系的位置检测器; 存储器，其存储由所述位置检测器获取的位置信息; 基于从存储装置读出的位置信息来校正掩模和感光基板之间的相对位置关系的位置校正装置; 以及控制器，其使得位置检测器在将掩模和感光基板通过投影光学系统的投影区域到曝光开始位置时检测掩模和感光基板之间的相对位置关系，并使位置校正装置 基于从存储器读出的位置信息，掩模和感光基板在曝光开始位置和/或曝光期间停止时，校正掩模和感光基板之间的相对位置关系。

公开(公告)号：US5623343A

公开(公告)日：1997-04-22

申请号：US548402

申请日：1995-10-26

申请人： Kei Nara ,  Masamitsu Yanagihara ,  Seiji Miyazaki

发明人： Kei Nara ,  Masamitsu Yanagihara ,  Seiji Miyazaki

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G01B11/00

CPC分类号： G03F7/70225 ,  G03F7/70275 ,  G03F7/70358 ,  G03F9/70

摘要： In the first step of an exposure method of the present invention, an alignment optical system is arranged to oppose one of a first mask mark on a photomask and a first substrate mark on a photosensitive substrate, thereby detecting a first deviation amount between the position of the first mask mark and that of the first substrate mark. In the second step, the alignment optical system is arranged to oppose one of a second mask mark on the photomask and a second substrate mark on the photosensitive substrate, thereby detecting a second deviation mark between the position of the second mask mark and that of the second substrate mark. In the third step, correction values for minimizing the first and second deviation amounts are calculated. In the fourth step, the relative positional relationship between the image of an original pattern on the photomask and a shot area on the photosensitive substrate is adjusted on the basis of a correction value. In the fifth step, at least one of the first and second steps is executed subsequent to the fourth step to newly detect the first or second deviation amount. In the sixth step, the first to fifth steps are repeatedly executed until one of the first and second deviation amounts detected in the fifth step falls within a predetermined allowance.

摘要翻译： 在本发明的曝光方法的第一步骤中，对准光学系统被布置为与光掩模上的第一掩模标记和感光基板上的第一基板标记中的一个相对，从而检测在光敏基板的位置之间的第一偏移量 第一个掩码标记和第一个掩码标记。 在第二步骤中，对准光学系统布置成与光掩模上的第二掩码标记和感光基板上的第二基板标记之一相对，从而检测第二掩模标记的位置与第二掩模标记的位置之间的第二偏移标记 第二基板标记。 在第三步骤中，计算用于使第一和第二偏移量最小化的校正值。 在第四步骤中，基于校正值来调整光掩模上的原始图案的图像与感光基板上的照射区域之间的相对位置关系。 在第五步骤中，在第四步骤之后执行第一和第二步骤中的至少一个，以重新检测第一或第二偏差量。 在第六步骤中，重复执行第一至第五步骤，直到在第五步骤中检测到的第一和第二偏移量之一落入预定余量之内。

公开(公告)号：US20090026872A1

公开(公告)日：2009-01-29

申请号：US12161931

申请日：2007-01-19

申请人： Kenji Tomohara ,  Seiji Miyazaki ,  Mitsuhiro Koga ,  Makoto Matsumoto ,  Hiroshi Koga ,  Shinichi Sakamoto

发明人： Kenji Tomohara ,  Seiji Miyazaki ,  Mitsuhiro Koga ,  Makoto Matsumoto ,  Hiroshi Koga ,  Shinichi Sakamoto

IPC分类号： H02K1/12 ,  H02K15/02

CPC分类号： H02K1/148 ,  H02K15/022 ,  H02K2201/06 ,  Y10T29/49009

摘要： Although in a conventional permanent magnet type synchronous motor, cogging torque is reduced by displacing permanent magnets of a rotor in a circumferential direction or displacing a stator core in a circumferential direction, since the skew so produced reduces the output of the motor and moreover the winding work of windings cannot be automated to make the resulting motor highly expensive, split cores are provided which solves those problems and enables the winding work of windings to be automated so as to obtain an inexpensive and high-output motor.There are provided a plurality of split cores (100) made up of laminated iron cores each having formed thereon a tooth (6), and a yoke (5) and a pole piece (9) which are made to connect to the tooth (6) at both ends thereof, and arranged and connected together into an annular shape to make up a stator, characterized in that both ends of the yokes (5) and both ends of the pole pieces (9) are displaced in one circumferential direction by laminated iron core from a top laminated layer to a bottom laminated layer of the iron cores of the split cores.

摘要翻译： 虽然在传统的永久磁铁式同步电动机中，通过沿圆周方向移动转子的永磁体或使定子铁芯在圆周方向上移位来减小齿槽转矩，但由于产生的倾斜减小了电动机的输出，而且绕组 绕组的工作不能自动化，使得所得到的电动机非常昂贵，提供了解决这些问题的分裂芯，并且使绕组的绕组工作能够自动化，从而获得廉价且高输出的电动机。 设置有多个由分别形成有齿（6）的层叠铁芯构成的分割芯（100）和与齿（6）连接的轭（5）和极片（9） ），并且布置并连接在一起形成环形以构成定子，其特征在于，磁轭（5）的两端和磁极片（9）的两端通过层叠在一个圆周方向上位移 铁芯从顶层叠层到分裂芯的铁芯的底层叠层。

公开(公告)号：US06537938B1

公开(公告)日：2003-03-25

申请号：US09653862

申请日：2000-09-01

申请人： Seiji Miyazaki

发明人： Seiji Miyazaki

IPC分类号： C03C3091

CPC分类号： C03C8/02 ,  C03C3/083 ,  C03C3/085 ,  C03C3/093

摘要： A glass for anodic bonding, which is a glass to be anodically bonded to a silicon crystal substrate and which contains substantially no Na2O and contains from 4 to 8 mol % of Li2O.

摘要翻译： 一种用于阳极接合的玻璃，其是阳极结合到硅晶体基底上并且基本上不含Na 2 O并含有4至8mol％的Li 2 O的玻璃。

公开(公告)号：USRE37762E1

公开(公告)日：2002-06-25

申请号：US09247857

申请日：1999-02-11

申请人： Seiji Miyazaki ,  Kei Nara ,  Masami Seki ,  Masamitsu Yanagihara ,  Tomohide Hamada

发明人： Seiji Miyazaki ,  Kei Nara ,  Masami Seki ,  Masamitsu Yanagihara ,  Tomohide Hamada

IPC分类号： G03B2742

CPC分类号： G03F9/7003 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70475 ,  G03F7/70791

摘要： The present invention is directed to scanning exposure apparatus and exposure method to achieve simultaneous projection of images of plural regions on a mask onto a photosensitive substrate with correcting an orthogonality error of a pattern on the mask or photosensitive substrate. If the pattern on the mask or photosensitive substrate has an orthogonality error causing a deviation of a certain angle in a first direction perpendicular to a scanning direction as it goes in the scanning direction, the mask and the photosensitive substrate are rotated relative to each other in the plane thereof to align one coordinate axis in a coordinate system of each pattern with the first direction. Then a relative displacement is given by an amount of the orthogonality error between positions of images projected through a first optical system and positions of images projected through a second optical system, and relative positions of the mask and the photosensitive substrate are continuously changed by the amount of the orthogonality error in the first direction in accordance with the position of the mask or photosensitive substrate in the scanning direction.

摘要翻译： 本发明涉及扫描曝光装置和曝光方法，以通过校正掩模或感光基底上的图案的正交性误差来将掩模上的多个区域的图像同时投影到感光基板上。 如果掩模或感光基板上的图案具有在沿着扫描方向进入垂直于扫描方向的第一方向上产生一定角度的偏差的正交性误差，则掩模和感光基板相对于彼此旋转 其平面将每个图案的坐标系中的一个坐标轴与第一方向对齐。 然后通过第一光学系统投影的图像的位置和通过第二光学系统投影的图像的位置之间的正交性误差的量给出相对位移，并且掩模和感光基板的相对位置连续地改变量 根据掩模或感光基板在扫描方向上的位置，在第一方向上的正交性误差。

公开(公告)号：USRE37361E1

公开(公告)日：2001-09-11

申请号：US09300376

申请日：1999-04-27

申请人： Masamitsu Yanagihara ,  Susumu Mori ,  Tsuyoshi Naraki ,  Masami Seki ,  Seiji Miyazaki ,  Tsuyohsi Narabe ,  Hiroshi Chiba

发明人： Masamitsu Yanagihara ,  Susumu Mori ,  Tsuyoshi Naraki ,  Masami Seki ,  Seiji Miyazaki ,  Tsuyohsi Narabe ,  Hiroshi Chiba

IPC分类号： H01L21027

CPC分类号： G03F7/70275 ,  G03F7/70241 ,  G03F7/70258 ,  G03F7/70358 ,  G03F7/70858 ,  G03F7/70883 ,  G03F9/70

摘要： In a scanning type exposure apparatus for exposing an entire surface of a pattern region on a mask to a substrate by scanning the mask and the substrate with respect to a projection optical system in a predetermined direction with a speed ratio in accordance with a magnification of the projection optical system, there are provided a plurality of illumination optical systems for illuminating respective areas of the pattern region on the mask with respective light fluxes from respective light source; a plurality of projection optical systems arranged so as to correspond to the respective illumination optical systems, the projection optical systems projecting respective images of the areas illuminated by the respective illumination optical systems onto respective projection areas on the substrate; a memory device for obtaining and storing a change of shape of the substrate; a magnification changing device for changing a magnification of at least one of the projection optical systems in accordance with the change of shape of the substrate; and an imaging position changing device for changing the position of said image projected via the at least one projection optical systems in accordance with the change in magnification. An exposure apparatus for exposing a pattern of a mask onto a substrate includes an image transfer system, an imaging characteristic adjusting mechanism and an exposure system. The image transfer system projects the pattern of the mask onto the substrate while moving the mask and the substrate synchronously during the projection of the pattern onto the substrate such that portions of the pattern overlap each other. The imaging characteristic adjusting mechanism is disposed in a space between the mask and the substrate, and adjusts imaging characteristics of a portion of the image transfer system that projects the pattern onto the substrate. The exposure system exposes the pattern during the synchronous movement of the mask and the substrate by the image transfer system.

公开(公告)号：US20080076656A1

公开(公告)日：2008-03-27

申请号：US11934138

申请日：2007-11-02

申请人： Kazuhiro SUZUKI ,  Manabu Nishizawa ,  Seiji Miyazaki ,  Junichiro Kase ,  Kei Maeda

发明人： Kazuhiro SUZUKI ,  Manabu Nishizawa ,  Seiji Miyazaki ,  Junichiro Kase ,  Kei Maeda

IPC分类号： C03C3/091

CPC分类号： C03B5/225 ,  C03C3/118

摘要： To provide an alkali free glass which is suitable as a glass substrate for LCD and has few defects of bubbles and an undissolved starting material, and a process for producing an alkali free glass which can readily lower the defects in bubbles and an undissolved starting material. An alkali free glass with a matrix composition comprising SiO2, Al2O3, B2O3, MgO, CaO, SrO and BaO and containing substantially no alkali metal oxide, of which the temperature at which the viscosity becomes 102 dPa·s, is at most 1,600° C. and which contains sulfur in an amount of from 0.001 to 0.1% as calculated as SO3, as represented by the mass percentage, per 100% of the total amount of the above matrix composition, and a process for producing a glass which comprises preparing a starting material and melting it so that a sulfate be incorporated to the starting material in an amount of from 0.01 to 5% as calculated as SO3, as represented by the mass percentage, per 100% of the total amount of the above matrix composition.

摘要翻译： 为了提供适合作为LCD的玻璃基板并且几乎没有气泡和未溶解的原料的无碱玻璃，以及可以容易地降低气泡缺陷和未溶解的原料的无碱玻璃的制造方法。 具有基质组合物的无碱玻璃，其包含SiO 2，Al 2 O 3，B 2 O 3 > 3，MgO，CaO，SrO和BaO，并且基本上不含碱金属氧化物，其粘度达到10psa.s的温度为至多1600℃ 并且其含有以SO 3计算的0.001至0.1％的硫，以质量百分比表示，相对于上述基质组合物的总量的100％，以及工艺 用于制备玻璃，其包括制备原料并使其熔融，使得硫酸盐以SO 3计算的0.01至5％的量掺入原料中，如质量 百分比，每100％的上述基质组合物的总量。

公开(公告)号：US06714648B2

公开(公告)日：2004-03-30

申请号：US10252669

申请日：2002-09-24

申请人： Seiji Miyazaki ,  Kazuo Takaragi

发明人： Seiji Miyazaki ,  Kazuo Takaragi

IPC分类号： H04L928

CPC分类号： G06F7/725 ,  G06F7/728

摘要： In an IC card incorporating residual multiplier hardware for implementing a high-speed algorithm for a residual multiplication arithmetic, a method and a device capable of executing a public key encryption processing such as an elliptic curve encryption processing at a high speed. Residual arithmetic succeeding to generation of a random number and residual arithmetic in a signature generating processing can be executed by using a residual multiplier. Further, in order to use effectively the residual multiplier for arithmetic operation on an elliptic curve, the point on the elliptic curve is transformed from a two-dimensional affine coordinate system to a three-dimensional coordinate system. Additionally, multiplicative inverse arithmetic for realizing reverse transformation from the three-dimensional coordinate system to the two-dimensional affine coordinate system as well as for determining a signature s can be executed only with the residual multiplication arithmetic. By making use of the residual multiplier in this manner, the processing speed can be increased. Computation complexity can be reduced by storing previously those parameters which are used frequently and constant multiplies of a base point of the elliptic curve in the form of tables, which also contributes to increasing of processing speed.

摘要翻译： 在包含用于实现用于残余乘法运算的高速算法的残余乘法器硬件的IC卡中，能够以高速执行诸如椭圆曲线加密处理的公钥加密处理的方法和装置。 可以通过使用剩余乘数来执行在签名生成处理中继续生成随机数和残差算术的剩余算术。 此外，为了有效地使用用于椭圆曲线上的算术运算的剩余乘数，将椭圆曲线上的点从二维仿射坐标系变换为三维坐标系。 另外，用于实现从三维坐标系到二维仿射坐标系的反向变换以及用于确定签名s的乘法逆运算只能用剩余乘法运算来执行。 通过以这种方式利用剩余乘数，可以提高处理速度。 可以通过先前存储经常使用的那些参数和椭圆曲线的基点的恒定倍数以表的形式来减少计算复杂度，这也有助于提高处理速度。

公开(公告)号：US6141082A

公开(公告)日：2000-10-31

申请号：US172144

申请日：1998-10-14

申请人： Kei Nara ,  Seiji Miyazaki ,  Hideki Koitabashi

发明人： Kei Nara ,  Seiji Miyazaki ,  Hideki Koitabashi

IPC分类号： G03F9/00 ,  G03B27/52

CPC分类号： G03F9/7011 ,  G03F9/00 ,  G03F9/7003 ,  G03F9/7076 ,  G03F9/7088 ,  Y10S438/975

摘要： In order to provide a search alignment method capable of high-speed alignment without a relative movement between an alignment system and a substrate, an alignment mark is constituted by a plurality of element marks having shapes different from each other, the plurality of element marks are provided in such a manner that each two of them has a gap a little shorter than the size of the field of view of the alignment system therebetween, and if even one of the element marks constituting the alignment mark comes into the field of view of the alignment system, said element mark is identified out of all of said element marks, whereby the position of the entire alignment is measured from the position of said one element mark. Therefore, if the alignment mark is moved in a range wider than the field of view of the alignment system, it is possible to detect the position of the alignment mark by one measurement.

摘要翻译： 为了提供能够在对准系统和基板之间没有相对移动的情况下进行高速对准的搜索对准方法，由具有彼此不同的形状的多个元素标记构成对准标记，多个元素标记 设置成使得它们中的每一个具有比它们之间的对准系统的视场尺寸稍短的间隙，并且如果构成对准标记的元件标记中的一个进入到 对准系统中，从所有元件标记中识别所述元件标记，由此从所述一个元件标记的位置测量整个对准的位置。 因此，如果对准标记在比对准系统的视野宽的范围内移动，则可以通过一次测量来检测对准标记的位置。

公开(公告)号：US5999244A

公开(公告)日：1999-12-07

申请号：US743096

申请日：1996-11-04

申请人： Masamitsu Yanagihara ,  Kei Hara ,  Seiji Miyazaki ,  Hideki Koitabashi ,  Yoichi Hamashima ,  Hiroshi Kitano ,  Yoshiyuki Katamata

发明人： Masamitsu Yanagihara ,  Kei Hara ,  Seiji Miyazaki ,  Hideki Koitabashi ,  Yoichi Hamashima ,  Hiroshi Kitano ,  Yoshiyuki Katamata

IPC分类号： G03F7/20 ,  H01L21/027

CPC分类号： G03F7/706 ,  G03F7/70258 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70691

摘要： Positional discrepancies of images of segmental areas, which are caused by stretching of a substrate in the Y direction, are corrected by changing magnifications of respective projection optical systems and inclinations of parallel plane glass pieces with respect optical axes. After that, positional discrepancies of the images after the correction are accurately detected by using a calibration system for the projection optical systems. Thus it is possible to confirm whether or not the positional discrepancies are accurately corrected. If the correction is insufficient as a result of the confirmation, at least one of correction of the magnifications of the respective projection optical systems and shift of the images projected through the respective projection optical systems onto the substrate is executed again so that amounts of the positional discrepancies are sufficiently small. On the other hand, the positional discrepancy can be easily determined by storing positional information and a detected signal concerning an image formed by a projection optical system in synchronization with a clock, followed by signal processing.

摘要翻译： 通过改变各个投影光学系统的放大率和平行平面玻璃片相对于光轴的倾斜来校正由Y方向上的基板的拉伸引起的节段区域的图像的位置差异。 之后，通过使用投影光学系统的校准系统来精确地检测校正后的图像的位置偏差。 因此，可以确认位置差异是否被精确地校正。 如果作为确认的结果校正不足，则再次执行各个投影光学系统的放大率的校正和通过各个投影光学系统投影的图像的移位中的至少一个，使得位置 差异足够小。 另一方面，通过与时钟同步地存储与投影光学系统形成的图像有关的位置信息和检测信号，接着进行信号处理，可以容易地确定位置偏差。