Method for seed layer removal for magnetic heads
    11.
    发明授权
    Method for seed layer removal for magnetic heads 失效
    磁头种子层去除方法

    公开(公告)号:US06927940B2

    公开(公告)日:2005-08-09

    申请号:US10633016

    申请日:2003-08-01

    摘要: The electroplated components of a magnetic head of the present invention are fabricated utilizing a seed layer that is susceptible to reactive ion etch removal techniques. A preferred seed layer is comprised of tungsten or titanium. Following the electroplating of the components utilizing a fluorine species reactive ion etch process the seed layer is removed, and significantly, the fluorine RIE process creates a gaseous tungsten or titanium fluoride compound removal product. The problem of seed layer redeposition along the sides of the electroplated components is overcome because the gaseous fluoride compound is not redeposited. The present invention also includes an enhanced two part seed layer, where the lower part is tungsten, titanium or tantalum and the upper part is composed of the material that constitutes the component to be electroplated.

    摘要翻译: 本发明的磁头的电镀部件利用易受反应离子蚀刻去除技术影响的晶种层来制造。 优选的种子层由钨或钛组成。 在利用氟物质反应离子蚀刻工艺对组分进行电镀之后,除去种子层,并且显着地,氟RIE工艺产生气态钨或氟化钛化合物去除产物。 由于气态氟化物不再沉积,克服了沿着电镀部件侧面的种子层再沉积的问题。 本发明还包括增强的两部分种子层,其中下部是钨,钛或钽,并且上部由构成待电镀部件的材料构成。

    Method of laser cutting a metal line on an MR head with a laser
    12.
    发明授权
    Method of laser cutting a metal line on an MR head with a laser 失效
    用激光切割MR头上的金属线的方法

    公开(公告)号:US06049056A

    公开(公告)日:2000-04-11

    申请号:US4693

    申请日:1998-01-08

    IPC分类号: B23K26/40 B23K26/08

    摘要: A thin film conductive line is formed between MR pads on an MR head for protecting an MR sensor from electrostatic discharge (ESD) during assembly steps between row level fabrication of the head and prior to merge of a head stack assembly with a disk stack assembly. The conductive line may have a reduced thickness delete pad. A laser beam having a fluence sufficient to sever the conductive line at the delete pad but insufficient to damage or cause debris from structure underlying or surrounding the conductive line is used to sever the conductive line. The method traverses minimum energy, short laser pulses at a high pulse rate across the line, the melted material withdrawing from the melted area and being heaped on top of adjacent portions of the delete pad by surface tension and the melted material cooling to room temperature before the next pulse so that there is no cumulative heating and therefore no damage to or debris from the underlying structure. The conductive material of the line is incrementally plowed to each side of a severed path by successive overlapping laser pulses so that when the series of laser pulses has traversed the width of the delete pad the conductive line has been severed.

    摘要翻译: 在MR头上的MR焊盘之间形成薄膜导电线,用于在磁头堆叠组件与磁盘堆叠组件合并之前的组装步骤期间保护MR传感器免受静电放电(ESD)的影响。 导线可以具有减小的厚度删除焊盘。 激光束具有足够的能量来切断在删除焊盘处的导线,但是不足以损坏或者导致来自导电线下面或周围的结构的碎屑被切断导线。 该方法穿过线路以高脉冲速度穿过最小能量,短激光脉冲,熔化的材料从熔化区域退出,并通过表面张力堆积在删除焊盘的相邻部分的顶部,并将熔融的材料冷却至室温 下一个脉冲,使得没有累积加热,因此没有来自底层结构的损坏或碎屑。 线的导电材料通过连续重叠的激光脉冲逐渐地被切割到切断路径的每一侧,使得当一系列激光脉冲已经穿过删除焊盘的宽度时,导线已被切断。

    Spin valve read head with plasma produced metal oxide insulation layer
between lead and shield layers and method of making
    13.
    发明授权
    Spin valve read head with plasma produced metal oxide insulation layer between lead and shield layers and method of making 失效
    旋转阀读头与等离子体产生金属氧化物绝缘层之间的铅和屏蔽层及其制作方法

    公开(公告)号:US5999379A

    公开(公告)日:1999-12-07

    申请号:US989105

    申请日:1997-12-11

    摘要: A method is provided for providing extra insulation between lead layers and first and second shield layers of a read head so as to prevent electrical shorting therebetween. A sensor layer is partially formed with a capping layer of a first oxidizable metallic layer. A lead layer is formed with a second oxidizable metallic capping layer thereon. A rear edge of the partially completed sensor is then formed followed by formation of an insulation layer which seals the rear edge. The wafer, upon which the components are constructed, is then subjected to an oxygen-based plasma which oxidizes the oxidizable layers with the second oxidizable metallic layers oxidizing at a faster rate than the first oxidizable metallic layer. The second oxidized layer then provides the desired extra insulation between the lead layers and the second shield layer. The read head produced by the method includes a sensor layer and first and second lead layers. A first metal oxide layer is on the sensor layer and a sensor layer and a second metal oxide layer is on each of the first and second lead layers. The sensor layer, the first and second lead layers and the first and second metal oxide layers are located between first and second gap layers and the first and second gap layers are located between first and second shield layers.

    摘要翻译: 提供了一种用于在引线层与读取头的第一和第二屏蔽层之间提供额外的绝缘的方法,以防止它们之间的电短路。 传感器层部分地形成有第一可氧化金属层的覆盖层。 在其上形成有第二可氧化金属覆盖层的引线层。 然后形成部分完成的传感器的后边缘,然后形成密封后边缘的绝缘层。 然后,将构成部件的晶片经受氧基等离子体,其氧化可氧化层,第二可氧化金属层以比第一可氧化金属层更快的速率氧化。 然后,第二氧化层在引线层和第二屏蔽层之间提供所需的额外绝缘。 通过该方法制造的读取头包括传感器层和第一和第二引线层。 第一金属氧化物层位于传感器层上,传感器层和第二金属氧化物层位于第一和第二引线层中的每一个上。 传感器层,第一和第二引线层以及第一和第二金属氧化物层位于第一和第二间隙层之间,并且第一和第二间隙层位于第一和第二屏蔽层之间。

    METHOD FOR MAKING A PATTERNED PERPENDICULAR MAGNETIC RECORDING DISK
    15.
    发明申请
    METHOD FOR MAKING A PATTERNED PERPENDICULAR MAGNETIC RECORDING DISK 审中-公开
    用于制作图案的全磁记录盘的方法

    公开(公告)号:US20100326819A1

    公开(公告)日:2010-12-30

    申请号:US12490480

    申请日:2009-06-24

    IPC分类号: B44C1/22

    摘要: A method for making a patterned-media magnetic recording disk uses nano-imprint lithography (NIL) for patterning a resist layer over the magnetic recording layer. A hard mask layer is located above the magnetic recording layer and an etch stop layer is located above the hard mask layer and below the resist layer. Residual resist material in the recesses of the patterned resist layer is removed by reactive ion etching (RIE) to expose the underlying etch stop layer. The etch stop material in the recesses is then removed by RIE to expose regions of the hard mask layer. A reactive ion milling (RIM) process removes the exposed hard mask material. The RIM process causes no undercutting of the unexposed hard mask material, which allows the very small critical dimensions of the patterned-media disk to be reliably achieved when ion milling is subsequently performed through the hard mask that has been patterned by the RIM process.

    摘要翻译: 用于制造图案介质磁记录盘的方法使用纳米压印光刻(NIL)来在磁记录层上图形化抗蚀剂层。 硬掩模层位于磁记录层上方,并且蚀刻停止层位于硬掩模层之上和抗蚀剂层下方。 通过反应离子蚀刻(RIE)去除图案化抗蚀剂层的凹陷中的残留抗蚀剂材料以暴露下面的蚀刻停止层。 然后通过RIE去除凹槽中的蚀刻停止材料以暴露硬掩模层的区域。 反应离子研磨(RIM)工艺去除了暴露的硬掩模材料。 RIM工艺不会导致未曝光的硬掩模材料的底切,这允许当通过已经通过RIM工艺图案化的硬掩模进行离子铣削时,可靠地实现图案化介质盘的非常小的临界尺寸。

    OPTICAL LAPPING GUIDE FOR USE IN THE MANUFACTURE OF PERPENDICULAR MAGNETIC WRITE HEADS
    17.
    发明申请
    OPTICAL LAPPING GUIDE FOR USE IN THE MANUFACTURE OF PERPENDICULAR MAGNETIC WRITE HEADS 失效
    光学写入头制造中使用的光学引导指南

    公开(公告)号:US20080141522A1

    公开(公告)日:2008-06-19

    申请号:US11611829

    申请日:2006-12-15

    IPC分类号: G11B5/127 B05D5/12 H04R31/00

    摘要: An optical lapping guide for determining an amount of lapping performed on a row of sliders in a process for manufacturing sliders for magnetic data recording. The optical lapping guide is constructed with a front edge that is at an angle with respect to an air bearing surface plane ABS plane, such that a portion of the lapping guides is in front of the ABS and portion of the lapping guide is behind the ABS. As lapping progresses, an increasing amount of the lapping guide will be exposed at the ABS and visible for inspection. Therefore, after a lapping process has been performed, the optical lapping guide can be inspected to determine the amount of material removed by lapping. The greater the amount of the lapping guide that is exposed and visible, the greater the amount of material removed by lapping.

    摘要翻译: 光学研磨引导件,用于确定在用于制造用于磁数据记录的滑块的过程中对一排滑块执行的研磨量。 光学研磨引导件的前边缘相对于空气轴承表面平面ABS平面成一定角度,使得研磨导轨的一部分在ABS的前面,研磨导轨的一部分在ABS后面 。 随着研磨的进行,越来越多的研磨导轨将暴露在ABS处并可见以供检查。 因此,在进行研磨处理之后,可以检查光学研磨导向件以确定通过研磨去除的材料的量。 暴露和可见的研磨导轨的量越大,通过研磨去除的材料量就越大。

    PERPENDICULAR MAGNETIC RECORDING WRITE HEAD WITH FLUX-CONDUCTOR CONTACTING WRITE POLE
    18.
    发明申请
    PERPENDICULAR MAGNETIC RECORDING WRITE HEAD WITH FLUX-CONDUCTOR CONTACTING WRITE POLE 失效
    带通电导体的全磁记录写头与接点相连

    公开(公告)号:US20080117546A1

    公开(公告)日:2008-05-22

    申请号:US11560761

    申请日:2006-11-16

    IPC分类号: G11B5/127

    摘要: A perpendicular magnetic recording write head has a flux conductor in contact with the write pole. The flux conductor is substantially wider than the write pole tip in the cross-track direction and has a blunt end that is recessed from the pole tip end. The region of the flux conductor where its blunt end is in contact with the pole tip is the “choke” point for the write pole, i.e., the point where the flux density is highest. The flux conductor enables the write pole to be made with no flare, or with a flare angle and throat height with a much wider tolerance, which substantially simplifies the manufacturing process. The write head may have a trailing shield and side shields that substantially surround the write pole tip and remove stray fields that may be produced by the flux conductor, so that regions of the recording layer other than the track being written are not adversely affected.

    摘要翻译: 垂直磁记录写头具有与写极接触的磁通导体。 磁通导体在横向磁道方向上基本上比写入磁极尖端更宽,并且具有从磁极末端凹进的钝端。 其钝端与极尖接触的磁通导体的区域是写极的“扼流”点,即磁通密度最高的点。 磁通导体使写磁极能够制成没有耀斑,或具有更宽公差的喇叭角和喉部高度,这大大简化了制造过程。 写头可以具有基本上围绕写磁极尖端的后屏蔽和侧屏蔽,并且去除可能由磁通导体产生的杂散场,使得除了正在写入的磁道之外的记录层的区域不受不利影响。

    Method of fabricating a head for perpendicular magnetic recording with a self-aligning side shield structure
    19.
    发明授权
    Method of fabricating a head for perpendicular magnetic recording with a self-aligning side shield structure 失效
    用自对准侧屏蔽结构制造用于垂直磁记录的磁头的方法

    公开(公告)号:US07367112B2

    公开(公告)日:2008-05-06

    申请号:US11354139

    申请日:2006-02-14

    IPC分类号: G11B5/193

    摘要: A method is provided for fabricating a head for perpendicular recording with self-aligning side shields. The voids where the side shields will be formed are milled into the layer of material for the pole tip to achieve self-alignment. A mask is patterned with openings defining initial shape of the pole piece tip nearest the air-bearing surface including the width and the point at which the pole tip widens out. A film of soft magnetic material to form the side shields is deposited over the wafer. A chemical-mechanical-polishing process is preferably used to remove the mask and the material deposited on it. A new mask is patterned over the predetermined area for the final shape of the pole tip and the side shields. The excess side shield material and pole tip material outside of the mask is then removed.

    摘要翻译: 提供一种用于制造用于具有自对准侧屏蔽件的垂直记录头部的方法。 将形成侧面屏蔽的空隙铣成用于极尖的材料层以实现自对准。 掩模被图案化,其开口限定最靠近空气轴承表面的极片末端的初始形状,包括宽度和极尖扩大的点。 用于形成侧面屏蔽的软磁性材料薄膜沉积在晶片上。 优选使用化学机械抛光工艺来去除掩模和沉积在其上的材料。 在预定区域上形成新的掩模,用于极尖和侧屏的最终形状。 然后除去掩模外部的多余的侧屏蔽材料和极尖材料。

    Method for electroplating a body-centered cubic nickel-iron alloy thin film with a high saturation flux density
    20.
    发明授权
    Method for electroplating a body-centered cubic nickel-iron alloy thin film with a high saturation flux density 失效
    用于电镀具有高饱和磁通密度的体心立方镍铁合金薄膜的方法

    公开(公告)号:US07001499B2

    公开(公告)日:2006-02-21

    申请号:US10053785

    申请日:2002-01-18

    IPC分类号: C25D5/50

    摘要: A process for electroplating and annealing thin-films of nickel-iron alloys having from 63% to 81% iron content by weight to produce pole pieces having saturation flux density (BS) in the range from 1.9 to 2.3 T (19 to 23 kG) with acceptable magnetic anisotropy and magnetostriction and a coercivity (HC) no higher than 160 A/m (2 Oe). The desired alloy layer properties, including small crystal size and minimal impurity inclusions, can be produced by including higher relative levels of Fe++ ions in the electroplating bath while holding the bath at a lower temperature while plating from a suitable seed layer. The resulting alloy layer adopts a small crystal size (BCC) without significant inclusion of impurities, which advantageously permits annealing to an acceptable HC while retaining the high BS desired.

    摘要翻译: 电镀和退火铁含量为63%至81%的镍铁合金薄膜的方法,以产生具有饱和磁通密度(B S S S S)的范围在1.9至 2.3 T(19〜23kG)具有可接受的磁各向异性和磁致伸缩,矫顽力(H C C)不高于160A / m(2Oe)。 包括小晶体尺寸和最小杂质夹杂物在内的期望的合金层性能可以通过在电镀浴中包含更高的相对水平的Fe ++离子而制备,同时将浴保持在较低温度,同时从 合适的种子层。 所得到的合金层采用小晶粒尺寸(BCC),而不显着地包含杂质,这有利地允许退火到可接受的H C,同时保持所需的高B S S S。