Abstract:
A semiconductor device may include a gate electrode, a metal nitride layer on the gate electrode, a gate insulating film on the metal nitride layer, a channel on the gate insulating film, a source electrode in one side of the channel, and a drain electrode in another side of the channel.
Abstract:
Provided are a wiring material for a semiconductor device, the wiring material including a boride-based compound containing boron and at least one metal selected from elements of Groups 2 to 14, a wiring for a semiconductor device including the same, and a semiconductor device including the wiring containing the wiring material.
Abstract:
A battery case comprising a container configured to house an electrode assembly, wherein the container comprises a bottom wall and a plurality of side walls, the bottom wall and the plurality of side walls are integrated to define an internal space for housing the electrode assembly and to further define a top opening on an opposing side from the bottom wall, at least one of the bottom wall and the plurality of side walls comprises a liquid crystal polymer, the liquid crystal polymer comprises a plurality of blocks comprising an average of about 2 to about 5 structural units derived from hydroxybenzoic acid, and the container has a water vapor transmission rate at a wall thickness of 1 mm of less than about 0.07 g/m2/day, as measured at 38° C. and a relative humidity of 100% according to ISO 15106 and ASTM F1249.
Abstract:
A monomer represented by Chemical Formula 1-1 wherein in Chemical Formula 1-1, Z, L1, L2, R1 to R6, n, m, p, and a to f are the same as defined in the detailed description.
Abstract:
A semiconductor device may include a channel layer including a two-dimensional (2D) semiconductor material, a gate insulating layer on a center portion of the channel layer, a gate electrode on the gate insulating layer, and a first conductive layer and a second conductive layer respectively contacting opposite sides of the channel layer. Each of the first and second conductive layers may include metal boride.
Abstract:
A semiconductor interconnect and an electrode for semiconductor devices may include a thin film including a multielement compound represented by Formula 1 and having a thickness equal to or less than about 50 nm, a grain size (A) to thickness (B) ratio (A/B) equal to or greater than about 1.2, and a resistivity equal to or less than about 200 µΩ·cm:
M
n+1
AX
n
Formula 1
In Formula 1, M, A, X, and n are as described in the specification.
Abstract:
An interconnect structure may include a dielectric layer including a trench, a conductive wiring including graphene filling an inside of the trench, and a liner layer in contact with at least one surface of the conductive wiring and including a metal.
Abstract:
Provided are a wiring material for a semiconductor device, the wiring material including a boride-based compound containing boron and at least one metal selected from elements of Groups 2 to 14, a wiring for a semiconductor device including the same, and a semiconductor device including the wiring containing the wiring material.
Abstract:
A monomer represented by Chemical Formula 1-1 wherein in Chemical Formula 1-1, Z, L1, L2, R1 to R6, n, m, p, and a to f are the same as defined in the detailed description.
Abstract:
A polymerizable liquid crystal compound represented by Chemical Formula 1: wherein in Chemical Formula 1, groups and variables are the same as defined in the detailed description.