公开(公告)号：US09996002B2

公开(公告)日：2018-06-12

申请号：US14854963

申请日：2015-09-15

申请人： SUMITOMO CHEMICAL COMPANY, LIMITED

发明人： Takashi Nishimura ,  Shota Nakano ,  Koji Ichikawa

IPC分类号： G03F7/039 ,  G03F7/004 ,  G03F7/20 ,  G03F7/32 ,  C08F222/18 ,  C08F220/22

CPC分类号： G03F7/0397 ,  C08F220/22 ,  C08F222/18 ,  C08F2222/185 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/325

摘要： A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), a structural unit having a cyclic carbonate and a structural unit represented by formula (I), the resin has no acid-labile group; (A2) a resin which has an acid-labile group; and an acid generator: wherein R3 represents a hydrogen atom or a methyl group, R4 represents a C1 to C24 saturated hydrocarbon group having a fluorine atom, and a methylene group contained in the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group, R1 represents a hydrogen atom or a methyl group, and L1 represents a single bond or a C1 to C18 divalent saturated hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group, and R2 represents a C3 to C18 alicyclic hydrocarbon group where a hydrogen atom may be replaced by a C1 to C8 aliphatic hydrocarbon group or a hydroxy group, provided that the carbon atom directly bonded to L1 has no aliphatic hydrocarbon group by which a hydrogen atom has been replaced.

公开(公告)号：US09971241B2

公开(公告)日：2018-05-15

申请号：US14941235

申请日：2015-11-13

申请人： SUMITOMO CHEMICAL COMPANY, LIMITED

发明人： Tatsuro Masuyama ,  Yuki Suzuki ,  Koji Ichikawa

IPC分类号： G03F7/039 ,  G03F7/20 ,  G03F7/32 ,  G03F7/004 ,  C07C69/73 ,  C08F220/22 ,  C08F220/28 ,  C08F220/18 ,  C08F220/30

CPC分类号： G03F7/0397 ,  C07C69/73 ,  C07C2601/14 ,  C07C2603/74 ,  C08F220/22 ,  C08F220/30 ,  C08F2220/1858 ,  C08F2220/1883 ,  C08F2220/1891 ,  C08F2220/281 ,  C08F2220/282 ,  C08F2220/283 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/325

摘要： A compound represented by formula (I): wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group in which a hydrogen atom may be replaced by a halogen atom, R2 represents a C5 to C18 hydrocarbon group consisting of the following groups (a) and (b): (a) a liner or branched divalent hydrocarbon group and (b) an alicyclic hydrocarbon group, Rf1 and Rf2 each independently represent a C1 to C4 perfluoroalkyl group, A1 represents a single bond, a C1 to C6 alkanediyl group or *-A2-X1-(A3-X2)a-(A4)b-, * represents a binding site to an oxygen atom, A2, A3 and A4 each independently represent a C1 to C6 alkanediyl group, X1 and X2 each independently represent —O—, —CO—O— or —O—CO—, a represents 0 or 1, and b represents 0 or 1.

公开(公告)号：US20180113382A1

公开(公告)日：2018-04-26

申请号：US15848634

申请日：2017-12-20

申请人： SUMITOMO CHEMICAL COMPANY, LIMITED

发明人： Takashi Nishimura ,  Koji Ichikawa

IPC分类号： G03F7/004 ,  C07C309/17 ,  C07C381/12 ,  G03F7/039 ,  C07D327/06 ,  G03F7/38 ,  C08F222/10

CPC分类号： G03F7/0045 ,  C07C309/17 ,  C07C381/12 ,  C07C2603/74 ,  C07D327/06 ,  C08F2222/1013 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/38

摘要： A salt represented by formula (I): wherein Q1 and Q2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group, R1 and R2 in each occurrence independently represent a hydrogen atom, a fluorine atom or a C1 to C6 perfluoroalkyl group, z represents an integer of 0 to 6, X1 represents *—CO—O—, *—O—CO— or —O—, * represents a binding position to C(R1)(R2) or C(Q1)(Q2), A1 represents a C4 to C24 hydrocarbon group having a C4 to C18 divalent alicyclic hydrocarbon moiety, A2 represents a C2 to C12 divalent hydrocarbon group, R3 and R4 independently represent a hydrogen atom or a C1 to C6 monovalent saturated hydrocarbon group, R5 represents a hydrogen atom, a fluorine atom, or a C1 to C6 alkyl group where a hydrogen atom may be replaced by a fluorine atom, and Z+ represents an organic cation.

公开(公告)号：US09880466B2

公开(公告)日：2018-01-30

申请号：US15151618

申请日：2016-05-11

申请人： SUMITOMO CHEMICAL COMPANY, LIMITED

发明人： Takashi Nishimura ,  Koji Ichikawa

IPC分类号： G03F7/039 ,  G03F7/004 ,  C07C309/17 ,  C07C381/12 ,  C07D327/06 ,  G03F7/38 ,  C08F222/10

CPC分类号： G03F7/0045 ,  C07C309/17 ,  C07C381/12 ,  C07C2603/74 ,  C07D327/06 ,  C08F2222/1013 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/38

摘要： A salt represented by formula (I): wherein Q1 and Q2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group, R1 and R2 in each occurrence independently represent a hydrogen atom, a fluorine atom or a C1 to C6 perfluoroalkyl group, z represents an integer of 0 to 6, X1 represents *—CO—O—, *—O—CO— or —O—, * represents a binding position to C(R1)(R2) or C(Q1)(Q2), A1 represents a C4 to C24 hydrocarbon group having a C4 to C18 divalent alicyclic hydrocarbon moiety, A2 represents a C2 to C12 divalent hydrocarbon group, R3 and R4 independently represent a hydrogen atom or a C1 to C6 monovalent saturated hydrocarbon group, R5 represents a hydrogen atom, a fluorine atom, or a C1 to C6 alkyl group where a hydrogen atom may be replaced by a fluorine atom, and Z+ represents an organic cation.

公开(公告)号：US09857683B2

公开(公告)日：2018-01-02

申请号：US14936924

申请日：2015-11-10

申请人： SUMITOMO CHEMICAL COMPANY, LIMITED

发明人： Mitsuyoshi Ochiai ,  Shota Nakano ,  Koji Ichikawa

IPC分类号： G03F7/004 ,  G03F7/38 ,  C07C69/653 ,  C07C69/74 ,  C08F220/24 ,  G03F7/039 ,  G03F7/20 ,  C08F220/18 ,  C08F220/22 ,  C08K5/42 ,  C08F220/28

CPC分类号： G03F7/0392 ,  C07C69/653 ,  C07C69/74 ,  C08F220/18 ,  C08F220/22 ,  C08F220/24 ,  C08F2220/1858 ,  C08F2220/1875 ,  C08F2220/1891 ,  C08F2220/281 ,  C08F2220/283 ,  C08K5/42 ,  G03F7/004 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/38

摘要： A resist composition includes (A1) a resin having an acid-labile group, (A2) a resin which includes a structural unit represented by formula (I), and an acid generator: wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group in which a hydrogen atom can be replaced by a halogen atom, R2 represents a C1 to C12 fluorinated saturated hydrocarbon group, A1 represents a C2 to C6 alkanediyl group or *-A2-X1-(A3-X2)a-A4b-, * represents a binding site to an oxygen atom in —O—CO—, A2, A3 and A4 each independently represent a C1 to C6 alkanediyl group, X1 and X2 each independently represent —O—, —CO—O— or —O—CO—, and “a” represents 0 or 1.

公开(公告)号：US09809669B2

公开(公告)日：2017-11-07

申请号：US14952420

申请日：2015-11-25

申请人： SUMITOMO CHEMICAL COMPANY, LIMITED

发明人： Hiromu Sakamoto ,  Koji Ichikawa

IPC分类号： G03F7/004 ,  G03F7/38 ,  C07C69/54 ,  C07C69/653 ,  C07C309/04 ,  C07C309/06 ,  C07C309/07 ,  C07C309/20 ,  C07C309/22 ,  C07C309/23 ,  C07C303/32 ,  C08F228/02 ,  C07C309/17 ,  C08F220/18 ,  G03F7/039 ,  C07C381/12 ,  C08F220/20 ,  C08F226/06 ,  C08F220/30

CPC分类号： C08F228/02 ,  C07C69/54 ,  C07C69/653 ,  C07C303/32 ,  C07C309/04 ,  C07C309/06 ,  C07C309/07 ,  C07C309/17 ,  C07C309/20 ,  C07C309/22 ,  C07C309/23 ,  C07C381/12 ,  C07C2603/74 ,  C08F220/18 ,  C08F220/20 ,  C08F226/06 ,  C08F2220/1858 ,  C08F2220/1883 ,  C08F2220/1891 ,  C08F2220/301 ,  C08F2220/303 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/38

摘要： A salt represented by formula (I): wherein Q1 and Q2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group, R1 and R2 each independently represent a hydrogen atom, a fluorine atom or a C1 to C6 perfluoroalkyl group, z represents an integer of 0 to 6, R3 represents a hydrogen atom, a fluorine atom, a C1 to C12 alkyl group or a C1 to C12 fluorinated alkyl group, R4 represents a C1 to C12 fluorinated alkyl group, L2 represents a single bond, a C1 to C12 divalent saturated hydrocarbon group, etc., R5 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that may have a halogen atom, L1 represents a group represented by formula (b1-1), etc., * represents a bonding site to —CR3R4; Lb2 and Lb3 each independently represent a single bond or a C1 to C22 divalent saturated hydrocarbon group; Z+ represents an organic cation.

公开(公告)号：US09638997B2

公开(公告)日：2017-05-02

申请号：US14937456

申请日：2015-11-10

申请人： SUMITOMO CHEMICAL COMPANY, LIMITED

发明人： Tatsuro Masuyama ,  Shingo Fujita ,  Koji Ichikawa

IPC分类号： G03F7/004 ,  G03F7/38 ,  G03F7/039 ,  G03F7/20

CPC分类号： G03F7/0046 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/38

摘要： A resist composition includes (A1) a resin having an acid-labile group, (A2) a resin which includes a structural unit represented by formula (I), and an acid generator: wherein R1 represents a hydrogen atom or a C3 to C18 alicyclic hydrocarbon group, A1 represents a single bond, a C1 to C6 alkanediyl group or *-A2-X1-(A3-X2)a-(A4)b-, * represents a binding site to an oxygen atom, A2, A3 and A4 each independently represent a C1 to C6 alkanediyl group, X1 and X2 each independently represent —O—, —CO—O— or —O—CO—, a represents 0 or 1, b represents 0 or 1, and R2 represents a C1 to C13 fluorinated saturated hydrocarbon group.

公开(公告)号：US09580402B2

公开(公告)日：2017-02-28

申请号：US14988156

申请日：2016-01-05

申请人： SUMITOMO CHEMICAL COMPANY, LIMITED

发明人： Hiromu Sakamoto ,  Koji Ichikawa

IPC分类号： G03F7/004 ,  G03F7/20 ,  G03F7/38 ,  C07C303/32 ,  C07C309/04 ,  C07C309/06 ,  C07C309/12 ,  C07C309/17 ,  C07C309/19 ,  C07D327/02 ,  C07D327/04 ,  C07D327/06 ,  C07D333/46 ,  C07D335/02 ,  C07D337/04 ,  C07D307/93 ,  G03F7/039

CPC分类号： C07D327/06 ,  C07C303/32 ,  C07C309/04 ,  C07C309/06 ,  C07C309/12 ,  C07C309/17 ,  C07C309/19 ,  C07D307/93 ,  C07D327/02 ,  C07D327/04 ,  C07D333/46 ,  C07D335/02 ,  C07D337/04 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/38

摘要： A salt represented by the formula (I): wherein R1 represents a C1 to C12 alkyl group in which a methylene group can be replaced by an oxygen atom or a carbonyl group; Q1 and Q2 each independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; A1 represents a lactone ring-containing group which has 4 to 24 carbon atoms; R2 represents an acid-labile group; and “m” represents an integer of 0 to 3.

摘要翻译： 由式（I）表示的盐：其中R1表示可被氧原子或羰基代替亚甲基的C1至C12烷基; Q1和Q2各自独立地表示氟原子或C1〜C6全氟烷基; A1表示含有4〜24个碳原子的含内酯环的基团。 R2代表酸不稳定基团; “m”表示0〜3的整数。

公开(公告)号：US11822244B2

公开(公告)日：2023-11-21

申请号：US17332216

申请日：2021-05-27

申请人： SUMITOMO CHEMICAL COMPANY, LIMITED

发明人： Tatsuro Masuyama ,  Takuya Nakagawa ,  Koji Ichikawa

IPC分类号： G03F7/039 ,  C08F220/30 ,  C07C69/54 ,  G03F7/004 ,  G03F7/038

CPC分类号： G03F7/039 ,  C07C69/54 ,  C08F220/302 ,  G03F7/0045 ,  G03F7/038

摘要： Disclosed are a compound represented by formula (I), a resin and a resist composition:




wherein R1 represents an alkyl group having 1 to 6 carbon atoms which may have a halogen, hydrogen or halogen atom, R2 and R3 each independently represent a hydrogen atom or a hydrocarbon group having 1 to 12 carbon atoms, R4 represents a fluorine atom, an alkyl fluoride group having 1 to 6 carbon atoms or an alkyl group having 1 to 12 carbon atoms, and —CH2— included in the alkyl fluoride group and the alkyl group may be replaced by —O— or —CO—, R5 represents a hydrogen atom, an alkylcarbonyl group having 2 to 6 carbon atoms or an acid-labile group, m2 represents an integer of 1 to 4, m4 represents an integer of 0 to 3, and m5 represents 1 or 2, in which 2≤m2+m4+m5≤5.

公开(公告)号：US11822241B2

公开(公告)日：2023-11-21

申请号：US17232459

申请日：2021-04-16

申请人： SUMITOMO CHEMICAL COMPANY, LIMITED

发明人： Katsuhiro Komuro ,  Takashi Nakakoji ,  Koji Ichikawa

IPC分类号： G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  C07D307/77 ,  C07D321/10 ,  C07C309/12 ,  C07C381/12 ,  G03F7/38

CPC分类号： G03F7/0045 ,  C07C309/12 ,  C07C381/12 ,  C07D307/77 ,  C07D321/10 ,  G03F7/038 ,  G03F7/039 ,  G03F7/38 ,  C07C2603/74

摘要： A salt represented by formula (I), an acid generator and a resist composition:




wherein R1, R2 and R3 each represent a hydroxy group, —O—R10, —O—CO—O—R10 or —O-L1-CO—O—R10, L1 represents an alkanediyl group, R4, R5, R6, R7, R8 and R9 each represent a halogen atom, an alkyl fluoride group or a hydrocarbon group, R10 represents an acid-labile group, X1, X2 and X3 each independently represent an oxygen atom or a sulfur atom, m1 is an integer of 1 to 5, m2, m3, m8 and m9 represent an integer of 0 to 5, m4, m5, m6 and m7 represent an integer of 0 to 4, in which 1≤m1+m7≤5, 0≤m2+m8≤5, 0≤m3+m9≤5, and AI− represents an organic anion.