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    Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern
    11.
    发明授权
    Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern 有权
    用于形成用于浸渍曝光的上层膜的组合物，用于浸渍曝光的上层膜，以及形成光致抗蚀剂图案的方法

    公开(公告)号：US08431332B2

    公开(公告)日：2013-04-30

    申请号：US12680200

    申请日：2008-09-10

    申请人： Daita Kouno ,  Norihiko Sugie ,  Gouji Wakamatsu ,  Norihiro Natsume ,  Yukio Nishimura ,  Makoto Sugiura

    发明人： Daita Kouno ,  Norihiko Sugie ,  Gouji Wakamatsu ,  Norihiro Natsume ,  Yukio Nishimura ,  Makoto Sugiura

    IPC分类号： G03F7/11 ,  G03F7/09 ,  G03F7/38

    CPC分类号： G03F7/11 ,  G03F7/2041

    摘要： The object of the invention is to provide a composition for forming an upper layer film for immersion exposure capable of forming an upper layer film effectively inhibited from developing defects through an immersion exposure process, such as a watermark defect and dissolution residue defect. Also provided are an upper layer film for immersion exposure and a method of forming a resist pattern. The composition for forming an upper layer film includes a resin ingredient and a solvent. The resin ingredient includes a resin (A) having at least one kind of repeating units selected among those represented by the formulae (1-1) to (1-3) and at least either of the two kinds of repeating units represented by the formulae (2-1) and (2-2). (1-1) (1-2) (1-3) (2-1) (2-2) [In the formulae, R1 represents hydrogen or methyl; R2 and R3 each represents methylene, linear or branched C2-6 alkylene, or alicyclic C4-12 alkylene; R4 represents hydrogen or methyl; and R5 represents a single bond, methylene, or linear or branched C2-6 alkylene.].

    摘要翻译： 本发明的目的是提供一种用于形成用于浸渍曝光的上层膜的组合物，其能够通过诸如水印缺陷和溶解残留缺陷的浸渍曝光工艺有效地防止显影缺陷的形成。 还提供了用于浸渍曝光的上层膜和形成抗蚀剂图案的方法。 用于形成上层膜的组合物包括树脂成分和溶剂。 树脂成分包括具有选自由式（1-1）〜（1-3）表示的重复单元中的至少一种重复单元的树脂（A）和由式 （2-1）和（2-2）。 （1-1）（1-2）（1-3）（2-1）（2-2）[式中，R1表示氢或甲基; R2和R3各自表示亚甲基，直链或支链C 2-6亚烷基或脂环族C 4-12亚烷基; R4代表氢或甲基; 并且R 5表示单键，亚甲基或直链或支链C 2-6亚烷基。

    UPPER LAYER FILM FORMING COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN
    13.
    发明申请
    UPPER LAYER FILM FORMING COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN 有权
    上层膜成膜组合物及形成光电子图案的方法

    公开(公告)号：US20100040974A1

    公开(公告)日：2010-02-18

    申请号：US12442377

    申请日：2007-09-21

    申请人： Daita Kouno ,  Hiromitsu Nakashima ,  Yukio Nishimura

    发明人： Daita Kouno ,  Hiromitsu Nakashima ,  Yukio Nishimura

    IPC分类号： G03F7/20 ,  G03F7/004

    CPC分类号： G03F7/0397 ,  G03F7/0046 ,  G03F7/095 ,  G03F7/11 ,  G03F7/2041 ,  H01L21/0276

    摘要： An upper layer film forming composition for forming an upper layer film on the surface of a photoresist film includes (A) a resin dissolvable in a developer for the photoresist film and (B) a compound having a sulfonic acid residue group, the composition forming an upper layer film with a receding contact angle to water of 70° or more. The upper layer film forming composition of the present invention can form an upper layer film which has a sufficient transparency and is stably maintained without eluting the components into a medium without being intermixed with a photoresist film, can form a resist pattern with high resolution while effectively suppressing a defect, and can suppress a blob defect.

    摘要翻译： 在光致抗蚀剂膜的表面上形成上层膜的上层成膜组合物包括（A）可溶于光致抗蚀剂膜的显影剂中的树脂和（B）具有磺酸残基的化合物，该组合物形成 上层膜与水的后退接触角为70°以上。 本发明的上层成膜组合物可以形成具有足够透明度且稳定保持的上层膜，而不将组分洗脱到介质中而不与光致抗蚀剂膜混合，可以有效地形成高分辨率的抗蚀剂图案 抑制缺陷，能够抑制斑点缺陷。

    COMPOSITION FOR FORMATION OF UPPER LAYER FILM, AND METHOD FOR FORMATION OF PHOTORESIST PATTERN
    14.
    发明申请
    COMPOSITION FOR FORMATION OF UPPER LAYER FILM, AND METHOD FOR FORMATION OF PHOTORESIST PATTERN 有权
    用于形成上层膜的组合物和形成光电子图案的方法

    公开(公告)号：US20100021852A1

    公开(公告)日：2010-01-28

    申请号：US12445152

    申请日：2007-10-11

    申请人： Yukio Nishimura ,  Norihiko Sugie ,  Hiromitsu Nakashima ,  Norihiro Natsume ,  Daita Kouno

    发明人： Yukio Nishimura ,  Norihiko Sugie ,  Hiromitsu Nakashima ,  Norihiro Natsume ,  Daita Kouno

    IPC分类号： G03F7/00 ,  C09D133/04

    CPC分类号： G03F7/11 ,  G03F7/2041

    摘要： A composition for formation of upper layer film, which is used for forming an upper layer film on the surface of a photoresist film and which comprises a resin (A) having a repeating unit represented by the following general formula (1-1) and not having a repeating unit represented by the following general formula (1-2), and a resin (B) having a repeating unit represented by the following general formula (1-2) and not having a repeating unit represented by the following general formula (1-1). [In the general formulas (1-1) and (1-2), R1 is hydrogen or the like; R2 is single bonds or the like; and R3 is a fluorine-substituted, linear or branched alkyl group having 1 to 12 carbon atoms, or the like.] The composition can form an upper layer film giving a sufficiently high receded contact angle.

    摘要翻译： 一种用于形成上层膜的组合物，其用于在光致抗蚀剂膜的表面上形成上层膜，并且其包含具有由以下通式（1-1）表示的重复单元的树脂（A），而不包含 具有由以下通式（1-2）表示的重复单元和具有由以下通式（1-2）表示的重复单元并且不具有由以下通式表示的重复单元的树脂（B） 1-1）。 [通式（1-1）和（1-2）中，R 1为氢等， R2是单键等; R3是具有1〜12个碳原子的氟取代的直链或支链烷基等。]组合物可以形成具有足够高的后退接触角的上层膜。

    Use of step and flash imprint lithography for direct imprinting of dielectric materials for dual damascene processing
    15.
    发明申请
    Use of step and flash imprint lithography for direct imprinting of dielectric materials for dual damascene processing 失效
    使用步进和闪光压印光刻技术直接刻印用于双镶嵌加工的介质材料

    公开(公告)号：US20060261518A1

    公开(公告)日：2006-11-23

    申请号：US11363071

    申请日：2006-02-27

    申请人： C. Willson ,  Frank Palmieri ,  Yukio Nishimura ,  Stephen Johnson ,  Michael Stewart

    发明人： C. Willson ,  Frank Palmieri ,  Yukio Nishimura ,  Stephen Johnson ,  Michael Stewart

    IPC分类号： B29C59/02 ,  B29C35/08 ,  B28B11/08

    CPC分类号： H01L21/76817 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/76807 ,  H01L21/76828

    摘要： In some embodiments, the present invention is directed to methods that involve the combination of step-and-flash imprint lithography (SFIL) with a multi-tier template to simultaneously pattern multiple levels of, for example, an integrated circuit device. In such embodiments, the imprinted material generally does not serve or act as a simple etch mask or photoresist, but rather serves as the insulation between levels and lines, i.e., as a functional dielectric material. After imprinting and a multiple step curing process, the imprinted pattern is filled with metal, as in dual damascene processing. Typically, the two printed levels will comprise a “via level,” which is used to make electrical contact with the previously patterned under-level, and a “wiring level.” The present invention provides for the direct patterning of functional materials, which represents a significant departure from the traditional approach to microelectronics manufacturing.

    摘要翻译： 在一些实施例中，本发明涉及涉及步进和快速压印光刻（SFIL）与多层模板的组合以同时对例如集成电路器件的多个级别进行图案化的方法。 在这样的实施例中，压印材料通常不起到或用作简单的蚀刻掩模或光致抗蚀剂的作用，而是用作层和线之间的绝缘，即功能介电材料。 在印迹和多步固化过程之后，印刷图案充满金属，如在双镶嵌加工中。 通常，两个印刷电平将包括用于与先前图案化的欠电平进行电接触的“通孔电平”和“接线电平”。 本发明提供了功能材料的直接图案化，其代表了与传统的微电子制造方法的显着不同。

    Radiation-sensitive resin composition
    17.
    发明授权
    Radiation-sensitive resin composition 有权
    辐射敏感树脂组合物

    公开(公告)号：US06800419B2

    公开(公告)日：2004-10-05

    申请号：US10369674

    申请日：2003-02-21

    申请人： Akimasa Soyano ,  Hiroyuki Ishii ,  Hidemitsu Ishida ,  Motoyuki Shima ,  Yukio Nishimura

    发明人： Akimasa Soyano ,  Hiroyuki Ishii ,  Hidemitsu Ishida ,  Motoyuki Shima ,  Yukio Nishimura

    IPC分类号： G03F7039

    CPC分类号： G03F7/0397 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/115

    摘要： A radiation-sensitive resin composition comprising: (A) an alkali insoluble or scarcely alkali-soluble resin having an acid-dissociable protecting group of the following formula [I], wherein R1 groups are monovalent alicyclic hydrocarbon groups or alkyl groups, provided that at least one of the R1 groups is the monovalent alicyclic hydrocarbon group, or any two of the R1 groups and the carbon atom form a divalent alicyclic hydrocarbon group, (B) a photoacid generator, and (C) propylene glycol monomethyl ether acetate, &ggr;-butyrolactone, and cyclohexanone as solvents. The resin composition is useful as a chemically-amplified resist for microfabrication utilizing deep ultraviolet rays and exhibits excellent film thickness uniformity and storage stability.

    摘要翻译： 一种辐射敏感性树脂组合物，其包含：（A）具有下式[I]的酸解离保护基的碱不溶性或几乎不溶的碱溶性树脂，其中R 1为一价脂环族烃基或烷基， 条件是R 1基团中的至少一个为一价脂环族烃基，或者R 1基团和碳原子中的任何两个形成二价脂环族烃基，（B）光致酸发生剂和（C ）丙二醇单甲醚乙酸酯，γ-丁内酯和环己酮作为溶剂。 树脂组合物可用作用于使用深紫外线的微细加工的化学增幅抗蚀剂，并且显示出优异的膜厚均匀性和储存稳定性。

    Rotary head type recording/reproducing method and apparatus for recording and reproducing a digital audio signal
    18.
    发明授权
    Rotary head type recording/reproducing method and apparatus for recording and reproducing a digital audio signal 失效
    用于记录和再现数字音频信号的旋转头型记录/再现方法和装置

    公开(公告)号：US4928185A

    公开(公告)日：1990-05-22

    申请号：US149171

    申请日：1988-01-27

    申请人： Masaharu Kobayashi ,  Yukio Nishimura

    发明人： Masaharu Kobayashi ,  Yukio Nishimura

    IPC分类号： G11B20/10 ,  G11B20/12 ,  G11B20/18 ,  H04N5/926 ,  H04N9/79 ,  H04N9/802

    CPC分类号： G11B20/1809 ,  G11B20/1208 ,  H04N5/9268 ,  H04N9/7925 ,  H04N9/802

    摘要： A rotary-head type magnetic tape recorder for recording a video signal and an audio signal on a magnetic tape by means of a rotary head controlled on the basis of the video signal. Difference is determined between a rate at which the digital audio signal is recorded on the recording medium and which is determined by the video signal and a rate of input data determined by a sampling frequency of the audio signal for a number N of samples of the digital signal to be included within one field period synchronized with the video signal. The number of samples for one field of input data is set by preparing on the basis of the result of detection of the difference in rate a first field containing a number of samples greater than the number N within and a second field containing a number of samples smaller than the number N. Blocks for recording the PCM audio signal on the recording medium are prepared by adding a first error detection/ correction code to the audio signal for every n symbols, while the symbols are imparted with amounts of delay differing from one another and subjected to diagonal incomplete interleave for thereby adding a second error detection/correction code. After addition of a block synchronizing signal, recording is performed on the tape. By adopting the variable fields, matching can be attained between the asynchronous audio and video signal fields. Reproduction capability notwithstanding of burst error is enhanced by incomplete diagonal interleave. Difference in time lag between the video signal and the audio signal involved in the reproduction thereof can be suppressed to a minimum.