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公开(公告)号：US07122291B2
公开(公告)日：2006-10-17
申请号：US10909513
申请日：2004-08-02
CPC分类号： G03F7/0395 , Y10S430/111
摘要： The present invention provides for a photoresist composition comprising a mixture of two different copolymers.
摘要翻译： 本发明提供包含两种不同共聚物的混合物的光致抗蚀剂组合物。
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公开(公告)号：US20120122029A1
公开(公告)日：2012-05-17
申请号：US12944420
申请日：2010-11-11
摘要： The present invention relates to a photoimageable underlayer composition comprising a polymer, a crosslinker comprising a vinyl ether group, and a thermal acid generator comprising a salt of a mono or polycarboxylic acid and an amine, where the amine has a boiling point of at least 150° C. The invention also relates to a process for forming an image in the underlayer comprising the novel composition.
摘要翻译： 本发明涉及一种可光成像底层组合物，其包含聚合物，包含乙烯基醚基团的交联剂和包含单羧酸和多元羧酸盐和胺的热酸产生剂，其中胺的沸点为至少150 本发明还涉及一种用于在包含新组合物的底层中形成图像的方法。
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公开(公告)号：US07595141B2
公开(公告)日：2009-09-29
申请号：US10973633
申请日：2004-10-26
CPC分类号： G03F7/40
摘要： The present invention relates to an aqueous coating composition for coating a photoresist pattern comprising a polymer containing amino group. The present invention also relates to a process for manufacturing a microelectronic device comprising providing a substrate with a photoresist pattern, coating the photoresist pattern with the novel coating material reacting a portion of the coating material in contact with the photoresist pattern, and removing a portion of the coating material which is not reacted with a removal solution.
摘要翻译： 本发明涉及包含含有氨基的聚合物的光致抗蚀剂图案的水性涂料组合物。 本发明还涉及一种用于制造微电子器件的方法，包括提供具有光致抗蚀剂图案的基底，用新颖的涂层材料涂覆光致抗蚀剂图案，使一部分涂料与光致抗蚀剂图案接触，并且将一部分 不与去除溶液反应的涂料。
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公开(公告)号：US20120308939A1
公开(公告)日：2012-12-06
申请号：US13153765
申请日：2011-06-06
摘要： The present invention relates to an antireflective coating composition comprising a crosslinking agent, a polymer comprising at least one chromophore group and at least one hydroxyl and/or a carboxyl group, and an additive, further where the additive has structure 1 and comprises at least one arylene-hydroxyl moiety, where Y is selected from an carboxylate anion or sulfonate anion, R1, R2, and R3 are independently selected from unsubstituted C1-C8 alkyl, substituted C1-C8 alkyl, aryl and arylene-hydroxyl; X1, X2, and X3 are independently selected from direct valence bond and C1-C8 alkylene group, and, n=1, 2 or 3. The invention further relates to a process for using the composition.
摘要翻译： 本发明涉及包含交联剂，包含至少一个发色团和至少一个羟基和/或羧基的聚合物和添加剂的抗反射涂料组合物，此外，其中添加剂具有结构1并且包含至少一个 亚芳基 - 羟基部分，其中Y选自羧酸根阴离子或磺酸根阴离子，R 1，R 2和R 3独立地选自未取代的C 1 -C 8烷基，取代的C 1 -C 8烷基，芳基和亚芳基 - 羟基; X1，X2和X3独立地选自直接键键和C1-C8亚烷基，n = 1,2或3.本发明还涉及使用该组合物的方法。
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公开(公告)号：US20090053652A1
公开(公告)日：2009-02-26
申请号：US11844589
申请日：2007-08-24
申请人： Srinivasan Chakrapani , Munirathna Padmanaban , Muthiah Thiyagarajan , Takanori Kudo , David L. Rentkiewicz
发明人： Srinivasan Chakrapani , Munirathna Padmanaban , Muthiah Thiyagarajan , Takanori Kudo , David L. Rentkiewicz
CPC分类号： C08F220/28 , C08F220/18 , G03F7/0397
摘要： Photoresist compositions are disclosed.
摘要翻译： 公开了光致抗蚀剂组合物。
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公开(公告)号：US08623589B2
公开(公告)日：2014-01-07
申请号：US13153765
申请日：2011-06-06
摘要： The present invention relates to an antireflective coating composition comprising a crosslinking agent, a polymer comprising at least one chromophore group and at least one hydroxyl and/or a carboxyl group, and an additive, further where the additive has structure 1 and comprises at least one arylene-hydroxyl moiety, where Y is selected from an carboxylate anion or sulfonate anion, R1, R2, and R3 are independently selected from unsubstituted C1-C8 alkyl, substituted C1-C8 alkyl, aryl and arylene-hydroxyl; X1, X2, and X3 are independently selected from direct valence bond and C1-C8 alkylene group, and, n=1, 2 or 3. The invention further relates to a process for using the composition.
摘要翻译： 本发明涉及包含交联剂，包含至少一个发色团和至少一个羟基和/或羧基的聚合物和添加剂的抗反射涂料组合物，此外，其中添加剂具有结构1并且包含至少一个 亚芳基 - 羟基部分，其中Y选自羧酸根阴离子或磺酸根阴离子，R 1，R 2和R 3独立地选自未取代的C 1 -C 8烷基，取代的C 1 -C 8烷基，芳基和亚芳基 - 羟基; X1，X2和X3独立地选自直接键键和C1-C8亚烷基，n = 1,2或3.本发明还涉及使用该组合物的方法。
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公开(公告)号：US20060024610A1
公开(公告)日：2006-02-02
申请号：US10909513
申请日：2004-08-02
IPC分类号： G03C1/76
CPC分类号： G03F7/0395 , Y10S430/111
摘要： The present invention provides for a photoresist composition comprising a mixture of two different copolymers.
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18.发明授权Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds 有权用于深紫外光刻的光致抗蚀剂组合物，其包含光活性化合物的混合物公开(公告)号：US06991888B2
公开(公告)日：2006-01-31
申请号：US10439472
申请日：2003-05-16
CPC分类号： G03F7/0392 , G03F7/0045 , Y10S430/115
摘要： The present invention relates to a novel photoresist composition that can be developed with an aqueous alkaline solution, and is capable of being imaged at exposure wavelengths in the deep ultraviolet. The invention also relates to a process for imaging the novel photoresist as well as novel photoacid generators.The novel photoresist comprises a) a polymer containing an acid labile group, and b) a novel mixture of photoactive compounds, where the mixture comprises a lower absorbing compound selected from structure 1 and 2, and a higher absorbing compound selected from structure 4 and 5, where, R1 and R2 R5, R6, R7, R8, and R9 are defined herein; m=1–5; X− is an anion, and Ar is selected from naphthyl, anthracyl, and structure 3, where R30, R31, R32, R33, and R34 are defined herein.
摘要翻译： 本发明涉及一种可用碱性水溶液显影的新型光刻胶组合物，能够在深紫外线的曝光波长下成像。 本发明还涉及用于对新型光致抗蚀剂以及新型光酸产生剂进行成像的方法。 新型光致抗蚀剂包含a）含有酸不稳定基团的聚合物，和b）光活性化合物的新混合物，其中该混合物包含选自结构1和2的较低吸收化合物和选自结构4和5的较高吸收化合物 ，其中R 1和R 2 R 5，R 6，R 7，或N R 8，R 9和R 9在本文中定义; m = 1-5; X - 是阴离子，Ar选自萘基，蒽基和结构3，其中R 30，R 31，R SUB > 32，R 33和R 34在本文中定义。
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公开(公告)号：US06800416B2
公开(公告)日：2004-10-05
申请号：US10042531
申请日：2002-01-09
IPC分类号： G03F7004
CPC分类号： G03F7/0382 , G03F7/0045 , G03F7/0046 , Y10S430/108
摘要： The present invention relates to a novel negative working deep uv photoresist that is developable in an aqueous alkaline solution, and comprises a fluorinated polymer, photoactive compound and a crosslinking agent. The photoresist composition is particularly useful for patterning with exposure wavelengths of 193 nm and 157 nm.
摘要翻译： 本发明涉及一种可在碱性水溶液中显影的新型负极深紫外光致抗蚀剂，其包含氟化聚合物，光活性化合物和交联剂。 光致抗蚀剂组合物特别适用于193nm和157nm的曝光波长的图形化。
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20.发明授权公开(公告)号：US06610465B2
公开(公告)日：2003-08-26
申请号：US09833226
申请日：2001-04-11
IPC分类号： G03F732
CPC分类号： B01J20/28033 , B01J20/28004 , B01J20/28028 , B01J20/2803 , B01J20/28085 , B01J47/018 , B01J47/133 , C08F6/02 , C08F6/16 , G03F7/0395
摘要： The present invention provides a method for producing a film forming resin suitable for use in a photoresist composition, involving the following steps: (a) providing a solution of a film forming resin in a solvent; (b) providing the following two filter sheets: (i) a filter sheet containing a self-supporting fibrous matrix having immobilized therein a particulate filter aid and particulate ion exchange resin particles, where the particulate filter aid and ion exchange resin particles are distributed substantially uniformly throughout a cross-section of said matrix; and (ii) a filter sheet containing a self-supporting matrix of fibers having immobilized therein particulate filter aid and binder resin; (c) rinsing the filter sheets of step (b) with the solvent of step (a); and (d) passing the solution of the film forming resin through the rinsed filter sheets of step (c).
摘要翻译： 本发明提供一种适用于光致抗蚀剂组合物的成膜树脂的制造方法，包括以下步骤：（a）在成膜剂中提供成膜树脂的溶液; （b）提供以下两个过滤片：（i）含有固定有微粒过滤助剂和粒状离子交换树脂颗粒的自支撑纤维基质的过滤片，其中颗粒助滤剂和离子交换树脂颗粒基本上分布 均匀地遍布所述基质的横截面; 和（ii）含有固定有颗粒助滤剂和粘合剂树脂的纤维自支撑基质的过滤片; （c）用步骤（a）的溶剂冲洗步骤（b）的过滤片; 和（d）使成膜树脂的溶液通过步骤（c）的冲洗过的滤纸。
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