公开(公告)号：US5157700A

公开(公告)日：1992-10-20

申请号：US401615

申请日：1989-08-31

Applicant: Hiroshi Kurosawa ,  Mitsuaki Amemiya ,  Shigeru Terashima ,  Koji Uda ,  Isamu Shimoda ,  Shunichi Uzawa ,  Kunitaka Ozawa ,  Makiko Mori ,  Ryuichi Ebinuma ,  Shinichi Hara ,  Nobutoshi Mizusawa ,  Eigo Kawakami

Inventor： Hiroshi Kurosawa ,  Mitsuaki Amemiya ,  Shigeru Terashima ,  Koji Uda ,  Isamu Shimoda ,  Shunichi Uzawa ,  Kunitaka Ozawa ,  Makiko Mori ,  Ryuichi Ebinuma ,  Shinichi Hara ,  Nobutoshi Mizusawa ,  Eigo Kawakami

IPC: G03F7/20

CPC classification number: G03F7/70691 ,  G03F7/70058 ,  G03F7/70091 ,  G03F7/702

Abstract: An exposure apparatus usable with synchrotron radiation source wherein the synchrotron radiation is generated by electron injection into a ring. The exposure apparatus is to transfer a semiconductor element pattern of a mask onto a semiconductor wafer by the synchrotron radiation. The apparatus includes a shutter for controlling the exposure of the wafer. The shutter controls the exposure with the illuminance distribution on the wafer surface taken into account. The illuminance distribution is determined in response to the electron injection, and thereafter, the illuminance distribution is corrected in a predetermined manner. By this, the illuminance distribution data for controlling the shutter always correspond to the actual illuminance distribution. The entire shot areas of the semiconductor wafer are exposed with high precision.

公开(公告)号：US08686378B2

公开(公告)日：2014-04-01

申请号：US13550702

申请日：2012-07-17

Applicant: Shigeru Terashima

Inventor： Shigeru Terashima

IPC: H01J37/12 ,  H01J7/22

CPC classification number: G03F7/20 ,  B82Y10/00 ,  B82Y40/00 ,  G21K5/04 ,  G21K5/10 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/188

Abstract: A charged particle beam drawing apparatus includes an electrostatic lens including an electrode member and configured to project the plurality of charged particle beams onto the substrate via the electrode member. In the electrode member are formed a plurality of first openings via which the plurality of charged particle beams pass, and a plurality of second openings different from the plurality of first openings, a total area of the plurality of second openings being not smaller than a total area of the plurality of first openings.

Abstract translation: 带电粒子束描绘装置包括具有电极部件的静电透镜，并配置成经由电极部件将多根带电粒子束投射到基板上。 在电极部件中形成有多个带电粒子束通过的多个第一开口以及与多个第一开口不同的多个第二开口，多个第二开口的总面积不小于总数 多个第一开口的区域。

公开(公告)号：US08665415B2

公开(公告)日：2014-03-04

申请号：US13090410

申请日：2011-04-20

Applicant: Takahiro Nakayama ,  Shigeru Terashima ,  Yutaka Watanabe

Inventor： Takahiro Nakayama ,  Shigeru Terashima ,  Yutaka Watanabe

IPC: G03B27/52 ,  G03B27/54

CPC classification number: G03F7/70925

Abstract: An exposure apparatus which projects exposure light from a pattern of an illuminated original onto a substrate, comprises a projection system including an optical element and configured to project the exposure light onto the substrate, an enclosure configured to enclose the projection system, and a cleaning mechanism configured to clean the optical element by irradiating the optical element with ultraviolet light under an environment in which oxygen is present within the enclosure, the cleaning mechanism including a light source configured to generate ultraviolet light, a tubular member including an exit window and configured to partially enclose an optical path between the light source and the optical element, and a regulating device configured to regulate an environment of a space inside the tubular member so that a partial pressure of oxygen becomes lower in the space inside the tubular member than in a space which is outside the tubular member.

Abstract translation: 将曝光光从照明原稿的图案投影到基板上的曝光装置包括：投影系统，包括光学元件，并将曝光光投射到基板上;被构造成包围投影系统的外壳;以及清洁机构 被配置为通过在所述外壳内存在氧气的环境下用紫外线照射所述光学元件来清洁所述光学元件，所述清洁机构包括被配置为产生紫外线的光源，所述管状部件包括出射窗， 在光源和光学元件之间包围光路，以及调节装置，其被配置为调节管状部件内的空间的环境，使得在管状部件内的空间中氧的分压变低 在管状构件外。

公开(公告)号：US20070202423A1

公开(公告)日：2007-08-30

申请号：US11677241

申请日：2007-02-21

Applicant: Masayuki Tanabe ,  Yutaka Watanabe ,  Shigeru Terashima ,  Mika Kanehira

Inventor： Masayuki Tanabe ,  Yutaka Watanabe ,  Shigeru Terashima ,  Mika Kanehira

IPC: G03G15/04

CPC classification number: G03F7/70916 ,  B82Y10/00 ,  G03F7/70308 ,  G03F7/70316 ,  G03F7/70925 ,  G21K1/062

Abstract: An exposure apparatus includes a chamber where an optical element having a capping layer is arranged, and exposes a substrate by using the optical element. The exposure apparatus includes a supply unit which supplies a material to repair the capping layer into the chamber, and a providing unit which provides electromagnetic waves to the optical element. The electromagnetic waves cause a photochemical reaction of the material to grow a layer on the capping layer so as to repair the capping layer.

Abstract translation: 曝光装置包括其中布置有具有盖层的光学元件的室，并且通过使用光学元件使基板曝光。 曝光装置包括供给单元，该供给单元将覆盖层修复到室中的材料，以及向光学元件提供电磁波的提供单元。 电磁波引起材料的光化学反应，以在覆盖层上生长层，从而修复覆盖层。

公开(公告)号：US06954255B2

公开(公告)日：2005-10-11

申请号：US10170590

申请日：2002-06-14

Applicant: Noriyasu Hasegawa ,  Shigeru Terashima

Inventor： Noriyasu Hasegawa ,  Shigeru Terashima

IPC: G03F7/20 ,  G03B27/52 ,  G03B27/42

CPC classification number: G03F7/70933 ,  G03F7/70358 ,  G03F7/70866

Abstract: An exposure apparatus which projects a pattern formed on a mask onto a substrate by using exposure light. The apparatus includes a shielding member which surrounds a light path space through which exposure light passes and has a passage which makes the light path space communicate with an ambient space, and a gas supply system which supplies inert gas to the light path space surrounded by the shielding member. A direction of the passage coincides with a flow direction of an ambient atmosphere which flows through the ambient space, and the passage includes a first passage and a second passage. The first passage is located at a position upstream, with respect to the flow direction, relative to the second passage, and the first passage is smaller in section than the second passage.

Abstract translation: 曝光装置，其通过使用曝光光将形成在掩模上的图案投影到基板上。 该装置包括遮蔽构件，该屏蔽构件围绕曝光光通过的光路空间，并具有使光路空间与周围空间连通的通道;以及气体供给系统，其向由所述光路空间包围的光路空间供给惰性气体 屏蔽构件。 通道的方向与流过环境空间的环境气氛的流动方向一致，并且通道包括第一通道和第二通道。 第一通道位于相对于第二通道相对于流动方向的上游位置，并且第一通道的截面小于第二通道。

公开(公告)号：US06418187B1

公开(公告)日：2002-07-09

申请号：US09349490

申请日：1999-07-09

Applicant: Keiko Chiba ,  Shigeru Terashima

Inventor： Keiko Chiba ,  Shigeru Terashima

IPC: G21K500

CPC classification number: G03F1/64 ,  G03F1/22 ,  G03F7/70866 ,  G03F7/70933 ,  G03F7/70983

Abstract: An X-ray mask structure and X-ray exposure method using the same are disclosed, wherein the mask has an X-ray absorptive material pattern, a supporting film for supporting the pattern, and a holding frame for holding the supporting film, wherein a suction port is arranged to be communicated with an external gas drawing system, and wherein a supply port is provided so that a gas can be supplied therethrough, for prevention of dust adhesion to the mask.

Abstract translation: 公开了使用其的X射线掩模结构和X射线曝光方法，其中掩模具有X射线吸收材料图案，用于支撑图案的支撑膜和用于保持支撑膜的保持框架，其中 吸入口被设置成与外部气体抽吸系统连通，并且其中设置供应口以便可以通过其供应气体，以防止与面罩的灰尘附着。

公开(公告)号：US06351512B1

公开(公告)日：2002-02-26

申请号：US09489914

申请日：2000-01-24

Applicant: Shigeru Terashima ,  Yutaka Watanabe

Inventor： Shigeru Terashima ,  Yutaka Watanabe

IPC: G01N2300

CPC classification number: G03F7/708 ,  G03F7/7035 ,  G03F7/70358 ,  G03F7/70808 ,  G21K5/04

Abstract: An X-ray exposure apparatus includes a partition structure for defining therein an ambience of one of an atmospheric pressure and a reduced pressure, for accommodating an X-ray mask and an article to be exposed, an X-ray window provided on the partition structure for spatially isolating the inside of the partition structure and an X-ray source, and having a function for transmitting therethrough an X-ray beam with which the article as placed inside the partition structure can be exposed through the X-ray mask, and a scanning mechanism for scanningly moving the X-ray window in a direction intersecting with an optical axis of the X-ray beam, in a single exposure and without interruption at least from just before the start of the exposure to just after the end of the exposure.

Abstract translation: X射线曝光装置包括用于在其中限定大气压和减压之一的气氛的分隔结构，用于容纳X射线掩模和待曝光的物品，设置在分隔结构上的X射线窗口 用于空间隔离分隔结构的内部和X射线源，并且具有透射X射线束的功能，通过该X射线束，可以通过X射线掩模将分配结构中放置的物品暴露出来， 扫描机构，用于在与曝光结束之后至少从曝光开始之前到曝光结束之后的单次曝光和不间断地沿与X射线束的光轴相交的方向扫描地移动X射线窗口 。

公开(公告)号：US6054713A

公开(公告)日：2000-04-25

申请号：US13304

申请日：1998-01-26

Applicant: Akira Miyake ,  Masato Muraki ,  Masahiko Okunuki ,  Shigeru Terashima ,  Shin Matsui

Inventor： Akira Miyake ,  Masato Muraki ,  Masahiko Okunuki ,  Shigeru Terashima ,  Shin Matsui

IPC: G03F7/20 ,  H01J37/317 ,  H01L21/027 ,  H01J37/30

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F7/70375 ,  H01J37/3175 ,  H01J2237/31779

Abstract: An electron beam exposure apparatus, which illuminates a mask with light emitted by a light source, photoelectrically converts the light patterned by the mask using a photoelectric converter, and exposes an object to be exposed with a patterned electron beam emitted by the photoelectric converter. The apparatus includes an electron optical system for imaging the electron beam emitted by the photoelectric converter onto the object, an axial shifter for shifting an optical center of the electron optical system in a direction perpendicular to an optical axis, an axial deflector for deflecting the electron beam that propagates in the electron optical system, a region limiter for limiting a region of the mask to be projected onto the object via the photoelectric converter and the electron optical system to a partial region of the mask, and a scan controller for scanning the object with the region-limited electron beam by changing the partial region to be limited while controlling the axial shifter and axial deflector.

Abstract translation: 用光源发出的光照射掩模的电子束曝光装置使用光电转换器对由掩模图案化的光进行光电转换，并用由光电转换器发射的图案化电子束曝光待曝光的物体。 该装置包括用于将由光电转换器发射的电子束成像到物体上的电子光学系统，用于沿垂直于光轴移动电子光学系统的光学中心的轴向移动器，用于偏转电子的轴向偏转器 在电子光学系统中传播的光束，用于将要经由光电转换器和电子光学系统投射到物体上的掩模的区域限制到掩模的部分区域的区域限制器，以及用于扫描物体的扫描控制器 通过在控制轴向移位器和轴向偏转器的同时改变局部区域来限制电子束区域。

公开(公告)号：US5131022A

公开(公告)日：1992-07-14

申请号：US769493

申请日：1991-10-01

Applicant: Shigeru Terashima ,  Mitsuaki Amemiya ,  Isamu Shimoda ,  Shunichi Uzawa ,  Takao Kariya

Inventor： Shigeru Terashima ,  Mitsuaki Amemiya ,  Isamu Shimoda ,  Shunichi Uzawa ,  Takao Kariya

IPC: G03F7/20

CPC classification number: G03F7/70558 ,  G03F7/2008 ,  G03F7/70875

Abstract: An exposure apparatus for lithographically transferring a pattern of a mask onto a workpiece coated with a radiation sensitive material includes a first filter made the same material as of the substrate of the mask, a second filter formed by a base member made of the same material as the mask substrate and being coated with a radiation sensitive material, an illuminometer for measuring illuminance of light passed through the first and second filters, respectively, and a control device for determining an exposure time for lithographic transfer of the pattern of the mask onto the wafer, on the basis of a difference between a measured value as measured through the first filter and a measured value as measured through the second filter.

公开(公告)号：US07566422B2

公开(公告)日：2009-07-28

申请号：US11201142

申请日：2005-08-11

Applicant: Shinichi Hara ,  Yutaka Tanaka ,  Shigeru Terashima ,  Takayuki Hasegawa ,  Shin Matsui

Inventor： Shinichi Hara ,  Yutaka Tanaka ,  Shigeru Terashima ,  Takayuki Hasegawa ,  Shin Matsui

IPC: G05D16/00 ,  C23C14/00

CPC classification number: G05D16/2013

Abstract: A processing apparatus includes a sealed vacuum chamber which contains a processing portion; a pressure controlling system which keeps the internal pressure of the sealed vacuum chamber constant at a predetermined level by exhausting the ambient gas in the sealed vacuum chamber; and an ambient gas recirculating system which recirculates the ambient gas exhausted from the sealed vacuum chamber back into the sealed vacuum chamber; wherein the ambient as recirculated by the ambient gas recirculating system is blown into the sealed vacuum chamber so that a gas flow is generated in a predetermined direction along the processing portion.

Abstract translation: 一种处理装置，包括：密封真空室，其包含处理部分; 压力控制系统，通过排出密封真空室中的环境气体来保持密封真空室的内部压力恒定在预定水平; 以及环境气体循环系统，其将从密封的真空室排出的环境气体再循环回密封的真空室中; 其中由环境气体再循环系统再循环的环境被吹入密封的真空室中，使得沿着处理部分沿预定方向产生气流。