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    PATTERN FORMING METHOD AND ACTINIC-RAY- OR RADIATION-SENSTIVE RESIN COMPOSITION
    12.
    发明申请
    PATTERN FORMING METHOD AND ACTINIC-RAY- OR RADIATION-SENSTIVE RESIN COMPOSITION 有权
    图案形成方法和丙烯酰胺或辐射敏感性树脂组合物

    公开(公告)号：US20130040096A1

    公开(公告)日：2013-02-14

    申请号：US13642751

    申请日：2011-05-20

    申请人： Kaoru Iwato ,  Hidenori Takahashi ,  Shuji Hirano ,  Sou Kamimura ,  Keita Kato

    发明人： Kaoru Iwato ,  Hidenori Takahashi ,  Shuji Hirano ,  Sou Kamimura ,  Keita Kato

    IPC分类号： G03F7/039 ,  H01L21/027 ,  G03F7/20

    CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/0758 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/40 ,  Y10T428/24

    摘要： Provided is a method of forming a pattern and an actinic-ray- or radiation-sensitive resin composition that excels in the limiting resolving power, roughness characteristics, exposure latitude (EL) and bridge defect performance. The method of forming a pattern includes (1) forming an actinic-ray- or radiation-sensitive resin composition into a film, (2) exposing the film to light, and (3) developing the exposed film with a developer containing an organic solvent. The actinic-ray- or radiation-sensitive resin composition contains (A) a resin containing a repeating unit with a structural moiety that is configured to decompose when exposed to actinic rays or radiation to thereby generate an acid, and (B) a solvent.

    摘要翻译： 提供了形成极限分辨能力，粗糙度特性，曝光宽容度（EL）和桥梁缺陷性能优异的图案和光化射线或辐射敏感性树脂组合物的方法。 形成图案的方法包括（1）将光化学射线或辐射敏感性树脂组合物形成膜，（2）将膜曝光，和（3）用含有机溶剂的显影剂显影曝光膜 。 所述光化学射线或辐射敏感性树脂组合物含有（A）含有具有结构部分的重复单元的树脂，所述结构部分被配置为当暴露于光化射线或辐射时分解从而产生酸，和（B）溶剂。

    Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, manufacturing method of electronic device, and electronic device
    13.
    发明授权
    Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, manufacturing method of electronic device, and electronic device 有权
    图案形成方法，电子束敏感或极紫外敏感组合物，抗蚀膜，电子器件的制造方法和电子器件

    公开(公告)号：US08822129B2

    公开(公告)日：2014-09-02

    申请号：US13613437

    申请日：2012-09-13

    申请人： Kaoru Iwato ,  Hideaki Tsubaki ,  Shuji Hirano

    发明人： Kaoru Iwato ,  Hideaki Tsubaki ,  Shuji Hirano

    IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/20

    CPC分类号： G03F7/11 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/2059 ,  G03F7/325 ,  G03F7/40

    摘要： There is provided a pattern forming method comprising (1) a step of forming a film by using an electron beam-sensitive or extreme ultraviolet-sensitive resin composition containing (A) a resin that contains a repeating unit having a partial structure represented by the specific formula and can decrease the solubility for a developer containing an organic solvent by the action of an acid, and (B) a compound capable of generating an acid upon irradiation with an electron beam or an extreme ultraviolet ray, (2) a step of exposing the film by using an electron beam or an extreme ultraviolet ray, and (4) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern.

    摘要翻译： 提供一种图案形成方法，其包括（1）通过使用电子束敏感或极紫外线敏感性树脂组合物形成膜的步骤，所述树脂组合物含有（A）含有具有由具体的 并且可以通过酸的作用降低含有有机溶剂的显影剂的溶解度，和（B）在用电子束或极紫外线照射时能够产生酸的化合物，（2）曝光步骤 通过使用电子束或极紫外线的膜，以及（4）通过使用含有机溶剂的显影剂显影曝光的膜以形成负图案的步骤。

    Positive resist composition and pattern forming method using the same
    15.
    发明授权
    Positive resist composition and pattern forming method using the same 有权
    正型抗蚀剂组合物和使用其的图案形成方法

    公开(公告)号：US07592118B2

    公开(公告)日：2009-09-22

    申请号：US12053675

    申请日：2008-03-24

    申请人： Kazuyoshi Mizutani ,  Shuji Hirano ,  Shinichi Sugiyama

    发明人： Kazuyoshi Mizutani ,  Shuji Hirano ,  Shinichi Sugiyama

    IPC分类号： G03F7/004 ,  G03F7/30

    CPC分类号： G03F7/0392 ,  G03F7/091 ,  Y10S430/106 ,  Y10S430/111

    摘要： A positive resist composition, includes: (B) a resin containing a repeating unit represented by formula (Ia) or (Ib) as defined in the specification, which decomposes under an action of an acid to increase a solubility of the resin (B) in an aqueous alkali solution; and (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation, and a pattern forming method uses the composition.

    摘要翻译： 正型抗蚀剂组合物包括：（B）含有本说明书中定义的由式（Ia）或（Ib）表示的重复单元的树脂，其在酸的作用下分解以增加树脂（B）的溶解度， 在碱性水溶液中; 和（A）能够在用光化射线或辐射照射时能够产生酸的化合物，并且图案形成方法使用该组合物。

    Resist composition and pattern formation method using the same
    16.
    发明授权
    Resist composition and pattern formation method using the same 有权
    抗蚀剂组成和图案形成方法使用该方法

    公开(公告)号：US07498116B2

    公开(公告)日：2009-03-03

    申请号：US12057931

    申请日：2008-03-28

    申请人： Shuji Hirano ,  Shinichi Sugiyama

    发明人： Shuji Hirano ,  Shinichi Sugiyama

    IPC分类号： G03F7/004 ,  G03F7/30

    CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0048 ,  Y10S430/106 ,  Y10S430/111

    摘要： A resist composition includes: (A) a resin that includes: a repeating unit represented by a following formula (I), and a repeating unit represented by a following formula (II); and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation: wherein the variables in the formulae are defined in the specification.

    摘要翻译： 抗蚀剂组合物包括：（A）树脂，其包含：由下式（I）表示的重复单元和由下式（II）表示的重复单元; 和（B）能够在用光化射线或辐射照射时能够产生酸的化合物：其中式中的变量在说明书中定义。

    POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
    17.
    发明申请
    POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME 有权
    正极性组合物和使用其的图案形成方法

    公开(公告)号：US20080241743A1

    公开(公告)日：2008-10-02

    申请号：US12053675

    申请日：2008-03-24

    申请人： Kazuyoshi Mizutani ,  Shuji Hirano ,  Shinichi Sugiyama

    发明人： Kazuyoshi Mizutani ,  Shuji Hirano ,  Shinichi Sugiyama

    IPC分类号： G03F7/004 ,  G03F7/00

    CPC分类号： G03F7/0392 ,  G03F7/091 ,  Y10S430/106 ,  Y10S430/111

    摘要： A positive resist composition, includes: (B) a resin containing a repeating unit represented by formula (Ia) or (Ib) as defined in the specification, which decomposes under an action of an acid to increase a solubility of the resin (B) in an aqueous alkali solution; and (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation, and a pattern forming method uses the composition.

    摘要翻译： 正型抗蚀剂组合物包括：（B）含有本说明书中定义的由式（Ia）或（Ib）表示的重复单元的树脂，其在酸的作用下分解以增加树脂（B）的溶解度， 在碱性水溶液中; 和（A）能够在用光化射线或辐射照射时能够产生酸的化合物，并且图案形成方法使用该组合物。

    Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same and pattern forming method
    18.
    发明授权
    Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same and pattern forming method 有权
    光化感光或辐射敏感性树脂组合物，抗蚀剂膜使用相同的图案形成方法

    公开(公告)号：US08541161B2

    公开(公告)日：2013-09-24

    申请号：US13257069

    申请日：2010-03-23

    申请人： Kana Fujii ,  Shuji Hirano ,  Shinki Yamada ,  Toru Fujimori

    发明人： Kana Fujii ,  Shuji Hirano ,  Shinki Yamada ,  Toru Fujimori

    IPC分类号： G03F7/039 ,  G03F7/20 ,  G03F7/30

    CPC分类号： C08F212/14 ,  C08F8/12 ,  C08F220/20 ,  C08F2220/1825 ,  C08K5/375 ,  C08K5/41 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  C08F2220/281 ,  C08F220/30

    摘要： Provided are an actinic ray-sensitive or radiation-sensitive resin composition; a resist film using the composition; and a pattern forming method. The actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid, the resin containing a repeating unit represented by formula (I), a repeating unit represented by formula (II) and a repeating unit represented by formula (III), and (B) a compound capable of generating a fluorine atom-containing acid upon irradiation with an actinic ray or radiation: wherein each of R1 and R11 independently represents a hydrogen atom or an alkyl group which may have a substituent, and R12 represents a phenyl group which may have a substituent.

    摘要翻译： 提供光化射线敏感或辐射敏感性树脂组合物; 使用该组合物的抗蚀剂膜; 和图案形成方法。 光化射线敏感性或辐射敏感性树脂组合物包含（A）能够通过酸的作用增加在碱性显影剂中的溶解性的树脂，含有式（I）表示的重复单元的树脂，表示的重复单元 通过式（II）表示的重复单元和式（III）表示的重复单元，和（B）能够在用光化学射线或辐射照射时能够产生含氟原子的酸的化合物：其中R 1和R 11各自独立地表示氢 原子或可以具有取代基的烷基，R12表示可以具有取代基的苯基。

    Resist composition and pattern-forming method using the same
    20.
    发明授权
    Resist composition and pattern-forming method using the same 有权
    抗蚀剂组合物和使用其的图案形成方法

    公开(公告)号：US07989137B2

    公开(公告)日：2011-08-02

    申请号：US12238856

    申请日：2008-09-26

    申请人： Shuji Hirano ,  Kazuyoshi Mizutani ,  Shinichi Sugiyama ,  Jiro Yokoyama

    发明人： Shuji Hirano ,  Kazuyoshi Mizutani ,  Shinichi Sugiyama ,  Jiro Yokoyama

    IPC分类号： G03F7/039 ,  G03F7/20 ,  G03F7/30

    CPC分类号： G03F7/0392 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

    摘要： A resist composition includes (A) a resin including: a repeating unit capable of decomposing by the action of an acid to increase solubility in an alkali developing solution and represented by formula (I), and a repeating unit represented by formula (II); and (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation: wherein A represents a hydrogen atom, an alkyl group, a hydroxyl group, an alkoxyl group, a halogen atom, a cyano group, a nitro group, an acyl group, an acyloxy group, a cycloalkyl group, an aryl group, a carboxyl group, an alkyloxycarbonyl group, an alkylcarbonyloxy group, or an aralkyl group; Ra represents a group containing a group capable of decomposing by the action of an acid; Rb represents an alkylene group, a cycloalkylene group, or a group of combining these groups; Y represents a heterocyclic group; and m represents 0 or 1.

    摘要翻译： 抗蚀剂组合物包括（A）树脂，其包含：能够通过酸的分解而分解的碱性显影液中的溶解度并由式（I）表示的重复单元和由式（II）表示的重复单元的重复单元; 和（B）能够在用光化射线或辐射照射时能够产生酸的化合物：其中A表示氢原子，烷基，羟基，烷氧基，卤素原子，氰基，硝基， 酰基，酰氧基，环烷基，芳基，羧基，烷氧基羰基，烷基羰基氧基或芳烷基; Ra表示含有能够通过酸的作用分解的基团的基团; Rb表示亚烷基，亚环烷基或组合这些基团的基团; Y表示杂环基; m表示0或1。