公开(公告)号：US06319105B1

公开(公告)日：2001-11-20

申请号：US09327650

申请日：1999-06-08

申请人： Tetsuji Togawa ,  Takeshi Sakurai ,  Nobuyuki Takada

发明人： Tetsuji Togawa ,  Takeshi Sakurai ,  Nobuyuki Takada

IPC分类号： B24B2900

CPC分类号： B24B53/017 ,  H01L21/67051

摘要： A polishing apparatus includes a cleaning device for critical cleaning of a top ring or a dressing tool to obtain high quality polishing by minimizing surface damage caused by contaminants originating from the top ring and/or dressing tool. The polishing apparatus includes a polishing table; a workpiece holding member for pressing a workpiece onto the polishing table; a dressing tool for conditioning a work surface provided on the polishing table. A cleaning device is provided for cleaning the dressing tool and/or the workpiece holding member. The cleaning device is provided with a spray nozzle for directing a cleaning solution toward at least an upper surface of the workpiece holding member or the dressing tool.

摘要翻译： 抛光装置包括清洁装置，用于通过最小化由顶环和/或修整工具产生的污染物引起的表面损伤来对顶环或修整工具进行临界清洁以获得高质量的抛光。 抛光装置包括：抛光台; 工件保持构件，用于将工件压在抛光台上; 用于调节设置在抛光台上的工作表面的修整工具。 提供了用于清洁修整工具和/或工件保持构件的清洁装置。 清洁装置设置有用于将清洁溶液引导至至少工件保持构件或修整工具的上表面的喷嘴。

公开(公告)号：US09435016B2

公开(公告)日：2016-09-06

申请号：US13808351

申请日：2010-07-07

申请人： Takeshi Sakurai ,  Yoshio Abe ,  Akira Saito ,  Yoshihiro Kameyama

发明人： Takeshi Sakurai ,  Yoshio Abe ,  Akira Saito ,  Yoshihiro Kameyama

IPC分类号： C22F1/08 ,  C22C9/06 ,  H01B1/02 ,  C22C9/04 ,  C22F1/00 ,  C22C9/10

CPC分类号： C22F1/08 ,  C22C9/04 ,  C22C9/06 ,  C22C9/10 ,  C22F1/00 ,  H01B1/026

摘要： The Cu—Ni—Si-based copper alloy plate contains 1.0 mass % to 3.0 mass % of Ni, and Si at a concentration of ⅙ to ¼ of the mass % concentration of Ni with a remainder of Cu and inevitable impurities, in which, when the average value of the aspect ratio (the minor axis of crystal grains/the major axis of crystal grains) of each crystal grains in an alloy structure is 0.4 to 0.6, the average value of GOS in the all crystal grains is 1.2° to 1.5°, and the ratio (Lσ/L) of the total special grain boundary length Lσ of special grain boundaries to the total grain boundary length L of crystal grain boundaries is 60% to 70%, the spring bending elastic limit becomes 450 N/mm2 to 600 N/mm2, the solder resistance to heat separation is favorable and deep drawing workability is excellent at 150° C. for 1000 hours.

摘要翻译： Cu-Ni-Si系铜合金板含有1.0质量％〜3.0质量％的Ni，Si的质量％浓度为⅙〜¼的Si，余量为Cu和不可避免的杂质， 当合金结构中每个晶粒的纵横比（晶粒的短轴/晶粒的长轴）的平均值为0.4至0.6时，所有晶粒中GOS的平均值为1.2°至 1.5°，特殊晶界的总特殊晶界长度Lσ与晶界的总晶界长L的比（Lσ/ L）为60％〜70％，弹性弯曲弹性极限为450N / mm2〜600N / mm2，耐热焊接性良好，在150℃，1000小时时深冲加工性优异。

公开(公告)号：US08698002B2

公开(公告)日：2014-04-15

申请号：US12998700

申请日：2009-07-09

申请人： Takeshi Sakurai ,  Seiichi Ishikawa ,  Kenji Kubota ,  Takashi Tamagawa

发明人： Takeshi Sakurai ,  Seiichi Ishikawa ,  Kenji Kubota ,  Takashi Tamagawa

IPC分类号： H05K1/03 ,  H05K3/00

CPC分类号： C25D5/505 ,  C25D5/12 ,  C25D5/50 ,  C25D7/00 ,  H01R13/03 ,  Y10T29/49124 ,  Y10T428/12708

摘要： A Cu—Sn layer and an Sn-based surface layer are formed in this order on the surface of a Cu-based substrate through an Ni-based base layer, and the Cu—Sn layer is composed of a Cu3Sn layer arranged on the Ni-based base layer and a Cu6Sn5 layer arranged on the Cu3Sn layer; the Cu—Sn layer obtained by bonding the Cu3Sn layer and the Cu6Sn5 layer is provided with recessed and projected portions on the surface which is in contact with the Sn-based surface layer; thicknesses of the recessed portions are set to 0.05 μm to 1.5 μm, the area coverage of the Cu3Sn layer with respect to the Ni-based base layer is 60% or higher, the ratio of the thicknesses of the projected portions to the thicknesses of the recessed portions in the Cu—Sn layer is 1.2 to 5, and the average thickness of the Cu3Sn layer is 0.01 μm to 0.5 μm.

摘要翻译： 通过Ni基底层在Cu基基板的表面上依次形成Cu-Sn层和Sn系表面层，Cu-Sn层由设置在Ni上的Cu 3 Sn层构成 基底层和布置在Cu3Sn层上的Cu6Sn5层; 通过结合Cu 3 Sn层和Cu 6 Sn 5层获得的Cu-Sn层在与Sn基表面层接触的表面上设置有凹凸部分; 将凹部的厚度设定为0.05μm〜1.5μm，Cu3Sn层相对于Ni基底层的面积覆盖率为60％以上，凸部的厚度与厚度的比例 Cu-Sn层的凹部为1.2〜5，Cu 3 Sn层的平均厚度为0.01μm〜0.5μm。

公开(公告)号：US08691762B2

公开(公告)日：2014-04-08

申请号：US13425633

申请日：2012-03-21

申请人： Joseph Buxbaum ,  Takeshi Sakurai ,  Ozlem Gunal

发明人： Joseph Buxbaum ,  Takeshi Sakurai ,  Ozlem Gunal

IPC分类号： A61K38/30

CPC分类号： A61K49/0008 ,  A61K31/00 ,  A61K38/06 ,  A61K38/27 ,  A61K38/30 ,  G01N33/53 ,  G01N2333/65 ,  G01N2333/72

摘要： Methods and assays are disclosed for treating subjects with 22q13 deletion syndrome or SHANK3 deletion or duplication, mutation or reduced expression, where the methods comprise administering to the subject insulin-like growth factor 1 (IGF-1), IGF-1-derived peptide or analog, growth hormone, an AMPAkine, a compound that directly or indirectly enhances glutamate neurotransmission, including by inhibiting inhibitory (most typically GABA) transmission, or an agent that activates the growth hormone receptor or the insulin-like growth factor 1 (IGF-1) receptor, or a downstream signaling pathway thereof.

摘要翻译： 公开了用于治疗具有22q13缺失综合征或SHANK3缺失或复制，突变或降低表达的受试者的方法和测定法，其中所述方法包括对受试者施用胰岛素样生长因子1（IGF-1），IGF-1衍生的肽或 类似物，生长激素，AMPAkine，直接或间接增强谷氨酸神经传递的化合物，包括通过抑制（最典型的GABA）传递，或激活生长激素受体或胰岛素样生长因子1（IGF-1 ）受体或其下游信号传导途径。

公开(公告)号：US20110222240A1

公开(公告)日：2011-09-15

申请号：US13129553

申请日：2009-10-23

申请人： Masao Kawata ,  Harumi Takedomi ,  Takeshi Sakurai

发明人： Masao Kawata ,  Harumi Takedomi ,  Takeshi Sakurai

IPC分类号： H05K7/20

CPC分类号： B60L3/00 ,  B60L50/64 ,  B60L58/26 ,  B60L2210/10 ,  H01M2/1083 ,  H01M10/613 ,  H01M10/625 ,  H01M10/6551 ,  H01M10/6563 ,  H01M10/6566 ,  H01M10/667 ,  Y02T10/7005 ,  Y02T10/705 ,  Y02T10/7216

摘要： An electrical component disposed on the top of battery modules includes an electrical component case for accommodating an inverter and a DC/DC converter, and heat sink units attached to the electrical component case on the side of the electrical component case opposite to the side with the battery modules, and constituted of a heat radiating plate having a plurality of radiating fins. In addition, a cooling path has a first cooling path for cooling the battery modules using cooling wind, and a second cooling path for cooling the heat sink units using the cooling wind having passed through the first cooling path. With this arrangement, there is provided a cooling structure for a vehicle power source unit capable of cooling the battery and the electrical component including the inverter with a compact configuration.

摘要翻译： 设置在电池模块顶部的电气部件包括用于容纳逆变器和DC / DC转换器的电气部件壳体，以及附接到电气部件壳体的电气部件壳体的与侧面相反的一侧的散热器单元， 电池模块，并且由具有多个散热片的散热板构成。 此外，冷却路径具有用于使用冷却风冷却电池模块的第一冷却路径，以及使用已经通过第一冷却路径的冷却风来冷却散热器单元的第二冷却路径。 通过这种布置，提供了一种能够以紧凑的结构冷却电池和包括逆变器的电气部件的车辆用电源单元的冷却结构。

公开(公告)号：US07939307B2

公开(公告)日：2011-05-10

申请号：US12084287

申请日：2006-04-14

申请人： Kaori Otsuka ,  Yoshio Tsujino ,  Yusuke Konno ,  Shinji Kurose ,  Kunishige Kataoka ,  Takeshi Sakurai

发明人： Kaori Otsuka ,  Yoshio Tsujino ,  Yusuke Konno ,  Shinji Kurose ,  Kunishige Kataoka ,  Takeshi Sakurai

IPC分类号： C12N9/02 ,  C12N15/00 ,  C12N1/20 ,  C07H21/04 ,  C09B67/00

CPC分类号： A61Q5/10 ,  A61K8/66 ,  C12N9/0004

摘要： Modified CueO having excellent enzymatic activity and a composition for dyeing keratin fiber which contains the enzyme. A recombinant protein having an enzymatic activity for oxidizing p-phenylenediamine, the protein is obtained by removing from CueO at least one member selected from the group consisting of helix 5, helix 6, and helix 7; and the composition for dyeing keratin fiber containing the recombinant protein and an oxidation dye.

摘要翻译： 具有优异酶活性的改良CueO和含有酶的角蛋白纤维染色组合物。 具有氧化对苯二胺的酶活性的重组蛋白质，该蛋白质通过从CueO中除去选自螺旋5，螺旋6和螺旋7的至少一种而获得; 以及用于染色含有重组蛋白和氧化染料的角蛋白纤维的组合物。

公开(公告)号：US20110096391A1

公开(公告)日：2011-04-28

申请号：US12997612

申请日：2009-06-30

申请人： Toshimasa Kanai ,  Takeshi Sakurai

发明人： Toshimasa Kanai ,  Takeshi Sakurai

IPC分类号： G02B5/28

CPC分类号： G02B5/0825 ,  F24S23/77 ,  F24S23/79 ,  F24S23/82 ,  F24S2023/86 ,  Y02E10/40

摘要： To provide a broadband reflecting mirror having high reflectance within a wavelength band of 400 nm to 2500 nm and having excellent thermal resistance and damage resistance. A broadband reflecting mirror 1 for reflecting light within a wavelength band of 400 nm to 2500 nm includes: a first reflective layered coating 3 for reflecting light in a short wavelength side of the wavelength band of 400 nm to 2500 nm, the first reflective layered coating including first high-refractive index material and first low-refractive index material layers alternately stacked one on another; and a second reflective layered coating 4 for reflecting light in a long wavelength side of the wavelength band of 400 nm to 2500 nm, the second reflective layered coating including second high-refractive index material and second low-refractive index material layers alternately stacked one on another, wherein the first reflective layered coating 3 is disposed on the light-incident side of the broadband reflecting mirror and the second reflective layered coating 4 is disposed at a position where light having passed through the first reflective layered coating 3 can be reflected, and wherein the first high-refractive index material layer is formed of at least one material selected from the group consisting of niobium oxide, titanium oxide, zirconium oxide, tantalum oxide, hafnium oxide, silicon nitride, yttrium oxide and indium tin oxide, the first low-refractive index material layer is formed of at least one material selected from the group consisting of silicon oxide and magnesium fluoride, the second high-refractive index material layer is formed of at least one material selected from the group consisting of silicon and germanium, and the second low-refractive index material layer is formed of at least one material selected from the group consisting of silicon oxide and magnesium fluoride.

摘要翻译： 提供在400nm至2500nm的波长带内具有高反射率的宽带反射镜并具有优异的耐热性和耐损伤性。 用于反射400nm至2500nm的波长带内的光的宽带反射镜1包括：用于反射400nm至2500nm的波长带的短波长侧的光的第一反射层叠膜3，第一反射层叠膜 包括彼此交替堆叠的第一高折射率材料和第一低折射率材料层; 以及第二反射分层涂层4，用于反射400nm至2500nm的波长带的长波长侧的光，第二反射层叠涂层包括第二高折射率材料和第二低折射率材料层， 另一方面，其中第一反射层叠涂层3设置在宽带反射镜的光入射侧，第二反射层叠涂层4设置在能够反射通过第一反射层叠涂层3的光的位置， 其中所述第一高折射率材料层由选自氧化铌，氧化钛，氧化锆，氧化钽，氧化铪，氮化硅，氧化钇和氧化铟锡中的至少一种材料形成，所述第一低折射率材料层 折射率材料层由选自氧化硅和镁流感的至少一种材料形成 所述第二高折射率材料层由选自硅和锗的至少一种材料形成，并且所述第二低折射率材料层由选自下列的至少一种材料形成：硅 氧化物和氟化镁。

公开(公告)号：US06364752B1

公开(公告)日：2002-04-02

申请号：US08881616

申请日：1997-06-25

申请人： Norio Kimura ,  You Ishii ,  Toyomi Nishi ,  Takayoshi Kawamoto ,  Takeshi Sakurai

发明人： Norio Kimura ,  You Ishii ,  Toyomi Nishi ,  Takayoshi Kawamoto ,  Takeshi Sakurai

IPC分类号： B24B722

CPC分类号： B24B53/017 ,  B24B37/005 ,  B24B49/00

摘要： A polishing cloth mounted on a turntable is dressed by bringing a dresser in contact with the polishing cloth for restoring the polishing capability of the polishing cloth. The dressing is performed by measuring heights of a surface of the polishing cloth at radial positions of the polishing cloth in a radial direction thereof, determining a rotational speed of the dresser with respect to a rotational speed of the turntable on the basis of the measured heights, and dressing the polishing cloth by pressing the dresser against the polishing cloth while the turntable and the dresser are rotating. The dresser has an annular diamond grain layer or an annular SiC layer.

摘要翻译： 通过使修整器与抛光布接触来修整安装在转台上的抛光布，以恢复抛光布的抛光能力。 通过在抛光布的径向方向的径向位置处测量抛光布的表面的高度来进行修整，根据测量的高度确定修整器相对于转盘的旋转速度的转速 并且在转台和修整器旋转的同时通过将修整器压靠抛光布来修整抛光布。 修整器具有环形金刚石颗粒层或环形SiC层。

公开(公告)号：US06281663B1

公开(公告)日：2001-08-28

申请号：US09709578

申请日：2000-11-13

申请人： Kazuhiko Yagi ,  Takashi Ishikura ,  Takeshi Sakurai

发明人： Kazuhiko Yagi ,  Takashi Ishikura ,  Takeshi Sakurai

IPC分类号： H01M1044

CPC分类号： B60L11/1874 ,  B60L11/1816 ,  B60L11/185 ,  B60L11/1861 ,  B60L2230/16 ,  H01M10/44 ,  Y02T10/7005 ,  Y02T10/7044 ,  Y02T10/705 ,  Y02T10/7088 ,  Y02T90/121 ,  Y02T90/128 ,  Y02T90/14 ,  Y02T90/163

摘要： A reduction in charging time is achieved while suppressing any deterioration in the lifetime of the battery. A battery temperature increase margin is determined from the battery temperature at charge commencement and the upper limit value of the battery temperature. Moreover, the target charging capacity is determined from the initial state of charge at charge commencement and the target state of charge at charge completion. Furthermore, a value of an upper limit of the battery temperature increase is determined from these. Then, the battery charge current maximum value is set by map referral based on the value of an upper limit of the battery temperature increase such that the temperature of the battery during charging does not exceed the upper limit value. A driver performs the battery charging using a charge current value that has been set on the basis of the battery charge maximum value.

摘要翻译： 在抑制电池寿命的任何劣化的同时实现充电时间的减少。 电池温度增加裕度由充电开始时的电池温度和电池温度的上限值确定。 此外，目标充电容量根据充电开始时的初始充电状态和充电完成时的目标充电状态来确定。 此外，由这些确定电池温度上升的上限值。 然后，基于电池温度上升的上限的值通过地图转介来设定电池充电电流最大值，使得充电期间电池的温度不超过上限值。 驱动器使用基于电池充电最大值设定的充电电流值来执行电池充电。

公开(公告)号：US5577816A

公开(公告)日：1996-11-26

申请号：US281559

申请日：1994-07-28

申请人： Osamu Suzuki ,  Keishin Tanaka ,  Tatsuo Hayashi ,  Takushi Matsuto ,  Chiaki Kumagai ,  Takeshi Sakurai ,  Atsuo Ota

发明人： Osamu Suzuki ,  Keishin Tanaka ,  Tatsuo Hayashi ,  Takushi Matsuto ,  Chiaki Kumagai ,  Takeshi Sakurai ,  Atsuo Ota

IPC分类号： B60T8/17 ,  B60T8/174 ,  B60T8/1761 ,  B60T8/32 ,  B60T8/42 ,  B60T8/50 ,  B60T8/66 ,  G06G7/00

CPC分类号： B60T8/174 ,  B60T8/1706 ,  B60T8/17616 ,  B60T8/3225 ,  B60T8/4266 ,  B60T8/50 ,  B60T8/5043

摘要： The ABS is provided with a modulator, and when the ABS is activated, control of the caliper pressure by the driver, is modified by the operation of the modulator having the aforementioned inlet valve (normally closed to a pressurized fluid source) and aforementioned outlet valve (normally open to a fluid exit), both controlled by the above-described control logic circuit. The modulator increases or decreases the caliper pressure, in response to changes in the pressurized fluid, regulated by such valves. Depending on the operation of the control logic circuit described above, three events may occur. When the inlet and outlet valves are not operated (i.e. their normal state), the modulator releases pressurized fluid through the output valve, and increases caliper pressure, to increase braking up to a predetermined maximum. If only the outlet valve is operated (i.e. both the inlet and outlet valves are closed), the modulator remains in a constant state and likewise, the caliper pressure is kept constant. If both the inlet and outlet valves are operated (i.e. opened and closed respectively), then in response to the increased pressurized fluid, the modulator effects a decrease in caliper pressure to reduce braking. The above is summarized in FIG. 2.Thus it is seen that the brake control is effected by setting a threshold value for each of the slip ratio .lambda. and the acceleration/deceleration .alpha., and determining whether the actual state of each wheel (i.e. .lambda.and .alpha.), is at their respective threshold value or above (less). It is thus necessary to set processing times as short as possible to improve the operating speed of an actuator which executes the process referred to above. However, there are limitations on the operating speed of the actuator, and an improvement is actually difficult to achieve.In another prior art system, the modulator comprises an input hydraulic chamber which communicates with a master cylinder, for