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公开(公告)号:US20180190344A1
公开(公告)日:2018-07-05
申请号:US15413436
申请日:2017-01-24
Applicant: UNITED MICROELECTRONICS CORP.
Inventor: Chun-Yen Tseng , Ching-Cheng Lung , Yu-Tse Kuo , Chun-Hsien Huang , Chih-Wei Tsai
IPC: G11C11/419 , G11C11/418
CPC classification number: G11C11/419 , G11C11/412 , G11C11/418
Abstract: The present invention provides a six transistor static random-access memory (6T-SRAM) cell, the 6T-SRAM cell includes a first inverter comprising a first pull-up transistor and a first pull-down transistor, and a first storage node, a second inverter comprising a second pull-up transistor, a second pull-down transistor, and a second storage node, wherein the first storage node is coupled to gates of the second pull-up transistor and the second pull-down transistor, a switch transistor configured to couple the second storage node to gates of the first pull-up transistor and the first pull-down transistor, and an access transistor coupled to gates of the first pull-up transistor and the first pull-down transistor.
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公开(公告)号:US20210118507A1
公开(公告)日:2021-04-22
申请号:US17114373
申请日:2020-12-07
Applicant: UNITED MICROELECTRONICS CORP.
Inventor: Chun-Hsien Huang , Ching-Cheng Lung , Yu-Tse Kuo , Shu-Ru Wang , Chun-Yen Tseng
Abstract: A layout pattern of a two-port ternary content addressable memory (TCAM) includes a first storage unit, a second storage unit, a first comparison circuit and a second comparison circuit. The first comparison circuit and the second comparison circuit are positioned in a first side area of a side and a second side area of another side of the layout pattern, respectively. The first storage unit and the second storage unit are positioned in a first middle area and a second middle area between the first side area and the second side area, respectively. The first storage unit is connected to the first comparison circuit through a first gate structure and connected to the second comparison circuit through a second gate structure. The second storage unit is connected to the first comparison circuit through a third gate structure and connected to the second comparison circuit through a fourth gate structure.
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公开(公告)号:US10706914B2
公开(公告)日:2020-07-07
申请号:US16019521
申请日:2018-06-26
Applicant: UNITED MICROELECTRONICS CORP.
Inventor: Chun-Yen Tseng , Ching-Cheng Lung , Yu-Tse Kuo , Chun-Hsien Huang , Hsin-Chih Yu , Shu-Ru Wang
IPC: G11C11/00 , G11C11/412 , G11C11/419 , H01L43/08 , G11C7/12 , H01L27/11 , H01L43/02 , H01L43/10 , G01R33/09 , G11C8/08
Abstract: A static random access memory (SRAM) structure includes a first inverter comprising a first pull-up transistor and a first pull-down transistor, a second inverter comprising a second pull-up transistor and a second pull-down transistor, a first pass transistor coupled to the first inverter, and a second pass transistor coupled to the second inverter. Preferably, the first inverter is coupled to a first tunnel magnetoresistance (TMR) structure and the second inverter is coupled to a second TMR structure.
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公开(公告)号:US20200083232A1
公开(公告)日:2020-03-12
申请号:US16152423
申请日:2018-10-05
Applicant: UNITED MICROELECTRONICS CORP.
Inventor: Chun-Hsien Huang , Ching-Cheng Lung , Yu-Tse Kuo , Shu-Ru Wang , Chun-Yen Tseng
Abstract: A layout pattern of a static random access memory (SRAM) preferably includes a first inverter and a second inverter. Preferably, the first inverter includes a first gate structure extending along a first direction on a substrate, in which the first gate structure includes a gate of a first pull-up device (PL1) and a gate of a first pull-down device (PD1). The second inverter includes a second gate structure extending along the first direction on the substrate, in which the second gate structure includes a gate of a second pull-up device (PL2) and a gate of a second pull-down device (PD2) and the gate of the PD1 is directly under the gate of the PD2.
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公开(公告)号:US20190362776A1
公开(公告)日:2019-11-28
申请号:US16019521
申请日:2018-06-26
Applicant: UNITED MICROELECTRONICS CORP.
Inventor: Chun-Yen Tseng , Ching-Cheng Lung , Yu-Tse Kuo , Chun-Hsien Huang , Hsin-Chih Yu , Shu-Ru Wang
IPC: G11C11/412 , G11C11/419 , H01L43/08 , G11C7/12 , G11C8/08 , H01L43/02 , H01L43/10 , G01R33/09 , H01L27/11
Abstract: A static random access memory (SRAM) structure includes a first inverter comprising a first pull-up transistor and a first pull-down transistor, a second inverter comprising a second pull-up transistor and a second pull-down transistor, a first pass transistor coupled to the first inverter, and a second pass transistor coupled to the second inverter. Preferably, the first inverter is coupled to a first tunnel magnetoresistance (TMR) structure and the second inverter is coupled to a second TMR structure.
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公开(公告)号:US20190206879A1
公开(公告)日:2019-07-04
申请号:US15884063
申请日:2018-01-30
Applicant: United Microelectronics Corp.
Inventor: Chun-Hsien Huang , Ching-Cheng Lung , Yu-Tse Kuo , Chang-Hung Chen , Shu-Ru Wang , Wei-Chi Lee , Chun-Yen Tseng
IPC: H01L27/11 , H01L27/092 , G11C11/41 , H01L23/522 , H01L27/02
Abstract: A semiconductor device includes a first circuit structure and a second circuit structure. The first circuit structure has a first line terminal. The second circuit structure has a second line terminal. The first line terminal and the second line terminal are formed in a first circuit layer but separated by a gap. A conductive structure is forming in a second circuit layer above or below the first circuit layer, to electrically connect the first line terminal and the second line terminal.
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公开(公告)号:US20190206459A1
公开(公告)日:2019-07-04
申请号:US15992130
申请日:2018-05-29
Applicant: UNITED MICROELECTRONICS CORP.
Inventor: Tien-Yu Lu , Chun-Hsien Huang , Ching-Cheng Lung , Yu-Tse Kuo , Shou-Sian Chen , Koji Nii , Yuichiro Ishii
IPC: G11C8/16 , G11C8/08 , G11C7/12 , G11C11/412 , H01L27/11
CPC classification number: G11C8/16 , G11C5/025 , G11C7/12 , G11C7/18 , G11C8/08 , G11C8/14 , G11C11/412 , G11C11/418 , G11C11/419 , H01L27/11
Abstract: A dual port static random access memory (DPSRAM) cell includes a first power line, a first bit line and a second bit line. The first power line is disposed between a first word line and a second word line. The first bit line is disposed between the first word line and the first power line. The second bit line is disposed between the second word line and the first power line.
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公开(公告)号:US11170854B2
公开(公告)日:2021-11-09
申请号:US17114373
申请日:2020-12-07
Applicant: UNITED MICROELECTRONICS CORP.
Inventor: Chun-Hsien Huang , Ching-Cheng Lung , Yu-Tse Kuo , Shu-Ru Wang , Chun-Yen Tseng
Abstract: A layout pattern of a two-port ternary content addressable memory (TCAM) includes a first storage unit, a second storage unit, a first comparison circuit and a second comparison circuit. The first comparison circuit and the second comparison circuit are positioned in a first side area of a side and a second side area of another side of the layout pattern, respectively. The first storage unit and the second storage unit are positioned in a first middle area and a second middle area between the first side area and the second side area, respectively. The first storage unit is connected to the first comparison circuit through a first gate structure and connected to the second comparison circuit through a second gate structure. The second storage unit is connected to the first comparison circuit through a third gate structure and connected to the second comparison circuit through a fourth gate structure.
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公开(公告)号:US10559573B2
公开(公告)日:2020-02-11
申请号:US16162340
申请日:2018-10-16
Applicant: UNITED MICROELECTRONICS CORP.
Inventor: Shu-Ru Wang , Ching-Cheng Lung , Yu-Tse Kuo , Chien-Hung Chen , Chun-Hsien Huang , Li-Ping Huang , Chun-Yen Tseng , Meng-Ping Chuang
IPC: H01L27/11 , G11C11/412 , G11C5/06 , G11C8/14 , G11C7/18 , H01L27/02 , H01L27/12 , H01L27/092
Abstract: A layout pattern of a static random access memory (SRAM) includes a substrate, a first pull-up transistor (PL1), a first pull-down transistor (PD1), a second (PL2), and a second pull-down transistor (PD2) on the substrate, and a first pass gate transistor (PG1A), a second pass gate transistor (PG1B), a third pass gate transistor (PG2A) and a fourth pass gate transistor (PG2B), wherein the PG1A and the PG1B comprise a first fin structure, the PG2A and the PG2B comprise a second fin structure, a first local interconnection layer disposed between the PG1A and the PG1B and disposed on the fin structures of the PL1 and the PD1, a second local interconnection layer disposed between the PG2A and the PG2B and disposed between the fin structures of the PL2 and the PD2, the first local interconnection layer and the second local interconnection layer are monolithically formed structures respectively.
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20.
公开(公告)号:US20190221238A1
公开(公告)日:2019-07-18
申请号:US15900811
申请日:2018-02-21
Applicant: UNITED MICROELECTRONICS CORP.
Inventor: Chun-Yen Tseng , Ting-Hao Chang , Ching-Cheng Lung , Yu-Tse Kuo , Shih-Hao Liang , Chun-Hsien Huang , Shu-Ru Wang , Hsin-Chih Yu
IPC: G11C5/02 , H01L27/108 , H01L27/105 , H01L27/11 , G11C11/409 , G11C11/419
CPC classification number: G11C5/02 , G11C11/409 , G11C11/419 , H01L27/1052 , H01L27/10802 , H01L27/1108 , H01L29/7869
Abstract: The present invention provides a memory device, the memory device includes a first region having a plurality of oxide semiconductor static random access memories (OSSRAM) arranged in a first direction, and each of the OSSRAMs comprising a static random access memory (SRAM) and at least an oxide semiconductor dynamic random access memory (DOSRAM), wherein the DOSRAM is connected to the SRAM, wherein each of the DOSRAMs comprises an oxide semiconductor gate (OSG), and each of the OSGs extending in a second direction perpendicular to the first direction, and an oxide semiconductor channel extending in the first direction, an oxide semiconductor gate connection extending in the first direction to connect each of the OSGs, and a word line, a Vcc connection line and a Vss connection line extend in the first direction and are connected to the SRAMs in each OSSRAM.
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