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公开(公告)号：US08524584B2
公开(公告)日：2013-09-03
申请号：US13010397
申请日：2011-01-20
申请人： William D. Lee , Daniel R. Tieger , Tseh-Jen Hsieh
发明人： William D. Lee , Daniel R. Tieger , Tseh-Jen Hsieh
IPC分类号： H01L21/26
CPC分类号： H01L21/26506 , H01L21/823807 , H01L21/823814
摘要： Methods and carbon ion precursor compositions for implanting carbon ions generally includes vaporizing and ionizing a gas mixture including carbon oxide and methane gases in an ion source to create a plasma and produce carbon ions. The ionized carbon within the plasma is then extracted to form an ion beam. The ion beam is mass analyzed with a mass analyzer magnet to permit the ionized carbon to pass therethrough and implant into a workpiece.
摘要翻译： 用于注入碳离子的方法和碳离子前体组合物通常包括在离子源中蒸发和电离包括碳氧化物和甲烷气体的气体混合物以产生等离子体并产生碳离子。 然后提取等离子体内的离子化碳以形成离子束。 用质量分析器磁体对离子束进行质量分析，以允许离子化碳通过并且植入工件中。
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公开(公告)号：US08422193B2
公开(公告)日：2013-04-16
申请号：US11641334
申请日：2006-12-19
IPC分类号： H01L21/683
CPC分类号： H01L21/6833
摘要： An electrostatic clamp (ESC), system, and method for clamping a workpiece is provided. A clamping plate of the ESC has central disk and an annulus encircling the central disk, wherein the central disk is recessed from the annulus by a gap distance, therein defining a volume. Backside gas delivery apertures are positioned proximate to an interface between the annulus and the central disk. A first voltage to a first electrode of the annulus clamps a peripheral region of the workpiece to a first layer. A second voltage to a second electrode of the central disk generally compensates for a pressure of a backside gas within the volume. The ESC can be formed of J-R- or Coulombic-type materials. A cooling plate associated with the clamping plate further provides cooling by one or more cooling channels configured to route a cooling fluid therethrough.
摘要翻译： 提供了用于夹紧工件的静电夹（ESC），系统和方法。 ESC的夹紧板具有中心盘和围绕中心盘的环形空间，其中中心盘从环形空间中间隙距离定义一个体积。 背侧气体输送孔位于环形区域与中央盘之间的界面附近。 环到第一电极的第一电压将工件的周边区域夹紧到第一层。 中心盘的第二电极的第二电压通常补偿体积内的背侧气体的压力。 ESC可由J-R-或库仑型材料形成。 与夹紧板相关联的冷却板还通过一个或多个冷却通道提供冷却，所述冷却通道被配置成使冷却流体从其中引导。
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公开(公告)号：US20110015311A1
公开(公告)日：2011-01-20
申请号：US12887977
申请日：2010-09-22
申请人： Paul J. Buras , William D. Lee , James R. Butler
发明人： Paul J. Buras , William D. Lee , James R. Butler
IPC分类号： C08L95/00
CPC分类号： C09D195/00 , C08K3/20 , C08L95/00 , C08L2666/02
摘要： Asphalt compositions and methods of forming such are described herein. The asphalt compositions and methods of forming such are generally adapted to enable open air processing while producing asphalt compositions that exhibit properties capable of meeting SUPERPAVE™ specifications.
摘要翻译： 本文描述了沥青组合物及其形成方法。 沥青组合物及其形成方法通常适于在露出空气处理的同时生产具有能够满足SUPERPAVE TM规格的性能的沥青组合物。
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公开(公告)号：US09711324B2
公开(公告)日：2017-07-18
申请号：US13485186
申请日：2012-05-31
申请人： William D. Lee , Steve Drummond
发明人： William D. Lee , Steve Drummond
IPC分类号： H01J37/18 , H01J37/317
CPC分类号： H01J37/185 , H01J37/3171 , H01J2237/022 , H01J2237/184 , H01J2237/2001 , H01J2237/31701
摘要： An ion implantation system provides ions to a workpiece positioned in a process environment of a process chamber on a sub-ambient temperature chuck. An intermediate chamber having an intermediate environment is in fluid communication with an external environment and has a cooling station and heating station for cooling and heating the workpiece. A load lock chamber is provided between the process chamber and intermediate chamber to isolate the process environment from the intermediate environment. A positive pressure source provides a dry gas within the intermediate chamber at dew point that is less than a dew point of the external environment to the intermediate chamber. The positive pressure source isolates the intermediate environment from the external environment via a flow of the dry gas from the intermediate chamber to the external environment.
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公开(公告)号：US09558980B2
公开(公告)日：2017-01-31
申请号：US12725508
申请日：2010-03-17
IPC分类号： H01L21/687 , H01L21/683 , H01J37/20 , H01J37/317 , H01L21/67
CPC分类号： H01L21/6831 , H01J37/20 , H01J37/3171 , H01J2237/002 , H01J2237/2001 , H01J2237/2007 , H01J2237/20214 , H01J2237/2065 , H01J2237/31701 , H01L21/67109
摘要： Aspects of the present invention relate to ion implantation systems that make use of a vapor compression cooling system. In one embodiment, a thermal controller in the vapor compression system sends refrigeration fluid though a compressor and a condenser according to an ideal vapor compression cycle to help limit or prevent undesired heating of a workpiece during implantation, or to actively cool the workpiece.
摘要翻译： 本发明的方面涉及利用蒸气压缩冷却系统的离子注入系统。 在一个实施例中，蒸汽压缩系统中的热控制器根据理想的蒸汽压缩循环通过压缩机和冷凝器发送制冷流体，以帮助限制或防止在植入期间不期望的加热工件，或者主动冷却工件。
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公开(公告)号：US20130320208A1
公开(公告)日：2013-12-05
申请号：US13485186
申请日：2012-05-31
申请人： William D. Lee , Steve Drummond
发明人： William D. Lee , Steve Drummond
CPC分类号： H01J37/185 , H01J37/3171 , H01J2237/022 , H01J2237/184 , H01J2237/2001 , H01J2237/31701
摘要： An ion implantation system provides ions to a workpiece positioned in a process environment of a process chamber on a sub-ambient temperature chuck. An intermediate chamber having an intermediate environment is in fluid communication with an external environment and has a cooling station and heating station for cooling and heating the workpiece. A load lock chamber is provided between the process chamber and intermediate chamber to isolate the process environment from the intermediate environment. A positive pressure source provides a dry gas within the intermediate chamber at dew point that is less than a dew point of the external environment to the intermediate chamber. The positive pressure source isolates the intermediate environment from the external environment via a flow of the dry gas from the intermediate chamber to the external environment.
摘要翻译： 离子注入系统向位于次环境温度卡盘上的处理室的处理环境中的工件提供离子。 具有中间环境的中间室与外部环境流体连通，具有用于冷却和加热工件的冷却站和加热站。 在处理室和中间室之间设置负载锁定室，以将过程环境与中间环境隔离。 正压源在中间室内的露点处提供干燥气体，其露点小于外部环境对中间室的露点。 正压源通过干气从中间室流向外部环境，将中间环境与外部环境隔离开来。
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公开(公告)号：US08330129B1
公开(公告)日：2012-12-11
申请号：US13216812
申请日：2011-08-24
申请人： William D. Lee
发明人： William D. Lee
CPC分类号： H01J37/3171 , H01J37/244 , H01J2237/24542
摘要： One embodiment relates to an ion implanter. The ion implanter includes an ion source to generate an ion beam, as well as a scanner to scan the ion beam across a surface of a workpiece. The ion implanter also includes an array of absorption and radiation elements arranged to absorb energy of the scanned ion beam and radiate at least some of the absorbed energy away from the propagation direction. A detection element (e.g., an infrared detector) is arranged to detect energy (e.g., in the form of heat) radiated by the array of absorption and radiation elements and to determine a beam profile of the scanned ion beam based on the detected energy.
摘要翻译： 一个实施例涉及一种离子注入机。 离子注入机包括用于产生离子束的离子源，以及扫描器以横过工件的表面扫描离子束。 离子注入机还包括吸收和辐射元件的阵列，其布置成吸收扫描的离子束的能量并且辐射至少一些被吸收的能量远离传播方向。 检测元件（例如，红外检测器）被布置成检测由吸收和辐射元件阵列辐射的能量（例如，以热的形式），并且基于检测到的能量来确定扫描离子束的光束分布。
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公开(公告)号：US08270142B2
公开(公告)日：2012-09-18
申请号：US12331619
申请日：2008-12-10
IPC分类号： H01L21/683
CPC分类号： H01L21/6833 , H01L21/6831
摘要： One embodiment of the present invention relates to a method for declamping a semiconductor wafer that is electrically adhered to a surface of an electrostatic chuck by a clamping voltage. In this method, the clamping voltage is deactivated. For a time following the deactivation, a first region of the wafer is lifted an first distance from the surface of the electrostatic chuck while a second region of the wafer remains adhered to the surface of the electrostatic chuck. A predetermined condition is monitored during the time. The second region is lifted from the surface of the electrostatic chuck when the predetermined condition is met.
摘要翻译： 本发明的一个实施例涉及一种用于通过钳位电压电粘合到静电卡盘表面上的半导体晶片的方法。 在这种方法中，钳位电压被去激活。 在停用之后的一段时间，晶片的第一区域从静电卡盘的表面提升第一距离，而晶片的第二区域保持粘附到静电卡盘的表面。 在此期间监视预定条件。 当满足预定条件时，第二区域从静电卡盘的表面提升。
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公开(公告)号：US07952851B2
公开(公告)日：2011-05-31
申请号：US12262399
申请日：2008-10-31
IPC分类号： H01L21/683
CPC分类号： H01L21/6831 , H01L21/68742
摘要： An electrostatic chuck and method for clamping and de-clamping a workpiece is provided. The ESC comprises a clamping plate having a clamping surface, and one or more electrodes. An electric potential applied to the one or more electrodes selectively clamps the workpiece to the clamping surface. An arc pin operably coupled to the clamping plate and a power source provides an arc for penetrating an insulating layer of the workpiece. The arc pin is selectively connected to an electrical ground, wherein upon removal of the insulative layer of the workpiece, the arc pin provides an electrical ground connection to the workpiece.
摘要翻译： 提供了用于夹紧和去夹紧工件的静电卡盘和方法。 ESC包括具有夹紧表面的夹板和一个或多个电极。 施加到一个或多个电极的电位选择性地将工件夹紧到夹紧表面。 可操作地联接到夹持板的电弧销和电源提供用于穿透工件的绝缘层的电弧。 弧形销被选择性地连接到电接地，其中在移除工件的绝缘层时，电弧销提供与工件的电接地连接。
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公开(公告)号：US20100142114A1
公开(公告)日：2010-06-10
申请号：US12331813
申请日：2008-12-10
IPC分类号： H01L21/683
CPC分类号： H01L21/6831 , H02N13/00
摘要： The present invention is directed to an electrostatic chuck (ESC) with a compliant layer formed from TT-Kote® and a method of forming a clamping plate for an ESC. The ESC comprises a compliant layer having a low friction surface for reducing or eliminating particulates generated from thermal expansion. The method comprises forming a clamping member for a substrate comprising a ceramic material and a ceramic surface, and coating the ceramic surface with a compliant layer comprising an organic silicide or TT-Kote®.
摘要翻译： 本发明涉及一种具有由TT-Kote制成的顺应层的静电卡盘（ESC）和形成ESC用夹板的方法。 ESC包括具有低摩擦表面的柔顺层，用于减少或消除由热膨胀产生的微粒。 该方法包括形成用于包括陶瓷材料和陶瓷表面的基底的夹紧构件，并且用包含有机硅化物或TT-Kote的柔性层涂覆陶瓷表面。
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