Dispersion, alignment and deposition of nanotubes
    12.
    发明授权
    Dispersion, alignment and deposition of nanotubes 有权
    纳米管的分散,对准和沉积

    公开(公告)号:US08197888B2

    公开(公告)日:2012-06-12

    申请号:US12112675

    申请日:2008-04-30

    Abstract: A dispersible nanocomposite comprising nanotubes associated with nanoplatelets. A method for creating an exfoliated nanotubes solution, aligning nanotubes and depositing them on a substrate or in matrix. In one embodiment, the method includes a nanocomposite of at least one nanotube electrostatically associated with at least one nanoplatelet. The nanoplatelets may be removed from the suspension by altering the ionic strength to create an exfoliated nanotube solution. The exfoliated nanotube solution for injection into microchannel templates and aligned deposition.

    Abstract translation: 包含与纳米片相关的纳米管的可分散的纳米复合材料。 一种用于产生剥离的纳米管溶液的方法,将纳米管排列并将其沉积在基底或基质上。 在一个实施方案中,该方法包括与至少一个纳米血小板静电相关的至少一个纳米管的纳米复合物。 可以通过改变离子强度从悬浮液中除去纳米片,以产生剥离的纳米管溶液。 用于注入微通道模板和对准沉积的剥离的纳米管溶液。

    Combined nanoimprinting and photolithography for micro and nano devices fabrication
    14.
    发明授权
    Combined nanoimprinting and photolithography for micro and nano devices fabrication 有权
    用于微纳米器件制造的组合纳米压印和光刻

    公开(公告)号:US07374864B2

    公开(公告)日:2008-05-20

    申请号:US10545456

    申请日:2004-02-13

    CPC classification number: G03F7/0002 B82Y10/00 B82Y40/00 G03F1/50

    Abstract: A method of fabricating a device including imprinting a mold having a protrusion against a substrate having a resist layer such that the protrusion engages the resist layer. The mold further has a mask member positioned generally adjacent the resist layer. Radiation energy is then transmitted through the mold and into the resist layer; however, the mask member substantially prevents transmission of the radiation energy therethrough, thereby defining an unexposed area in the resist layer. Once the mold is removed from the substrate, which consequently forms a first feature from nanoimprinting, the unexposed area of resist layer is removed through dissolving in a developer solution.

    Abstract translation: 一种制造器件的方法,包括将具有突起的模具压印在具有抗蚀剂层的基底上,使得突起与抗蚀剂层接合。 模具还具有通常邻近抗蚀剂层定位的掩模构件。 然后将辐射能量透过模具并进入抗蚀剂层; 然而,掩模构件基本上防止辐射能量透过,从而在抗蚀剂层中限定未曝光区域。 一旦将模具从基底上移除,从而形成纳米压印的第一特征,则通过溶解在显影剂溶液中去除抗蚀剂层的未曝光区域。

    Reversal imprint technique
    15.
    发明申请
    Reversal imprint technique 审中-公开
    反转印记技术

    公开(公告)号:US20070059497A1

    公开(公告)日:2007-03-15

    申请号:US10513704

    申请日:2002-05-08

    Abstract: The present invention relates to a method for imprinting a micro-/nano-structure on a substrate, the method comprising (a) providing a mold containing a desired pattern or relief for a microstructure; (b) applying a polymer coating to the mold; and (c) transferring the polymer coating from the mold to a substrate under suitable temperature and pressure conditions to form an imprinted substrate having a desired micro-/nano-structure thereon.

    Abstract translation: 本发明涉及一种用于将微/纳米结构压印在基底上的方法,所述方法包括(a)提供含有微结构的所需图案或凹凸的模具; (b)将聚合物涂层施加到模具上; 和(c)在合适的温度和压力条件下将聚合物涂层从模具转移到基底上以形成其上具有所需微/纳米结构的印迹基底。

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