METHODS AND SYSTEMS FOR DETERMINING ONE OR MORE PROPERTIES OF A SPECIMEN
    11.
    发明申请
    METHODS AND SYSTEMS FOR DETERMINING ONE OR MORE PROPERTIES OF A SPECIMEN 审中-公开
    用于确定样本的一个或多个属性的方法和系统

    公开(公告)号:US20070126458A1

    公开(公告)日:2007-06-07

    申请号:US11669209

    申请日:2007-01-31

    IPC分类号: G01R31/26

    CPC分类号: G01R31/311 G01R31/2648

    摘要: Various methods and systems for determining one or more properties of a specimen are provided. One system for determining a property of a specimen is configured to illuminate a specimen with different wavelengths of light substantially simultaneously. The different wavelengths of light are modulated at substantially the same frequency. The system is also configured to perform at least two measurements on the specimen. A minority carrier diffusion length of the specimen may be determined from the measurements and absorption coefficients of the specimen at the different wavelengths. Another system for detecting defects on a specimen is configured to deposit a charge at multiple locations on an upper surface of the specimen. This system is also configured to measure a vibration of a probe at the multiple locations. Defects may be detected on the specimen using a two-dimensional map of the specimen generated from the measured surface voltages.

    摘要翻译: 提供了用于确定样本的一个或多个属性的各种方法和系统。 用于确定样本特性的一个系统被配置为基本上同时照射具有不同波长的光的样本。 不同波长的光以基本上相同的频率被调制。 该系统还被配置为对样本进行至少两次测量。 样品的少数载流子扩散长度可以根据不同波长的样品的测量和吸收系数来确定。 用于检测样本上的缺陷的另一系统被配置为在样本的上表面上的多个位置沉积电荷。 该系统还被配置为测量在多个位置处的探针的振动。 可以使用从测量的表面电压产生的样本的二维图来在样本上检测缺陷。

    Method of minimizing reactive ion etch damage of organic insulating layers in semiconductor fabrication
    12.
    发明授权
    Method of minimizing reactive ion etch damage of organic insulating layers in semiconductor fabrication 有权
    在半导体制造中使有机绝缘层的反应离子蚀刻损伤最小化的方法

    公开(公告)号:US06265320B1

    公开(公告)日:2001-07-24

    申请号:US09467389

    申请日:1999-12-21

    IPC分类号: H01L21302

    摘要: A method of limiting surface damage during reactive ion etching of an organic polymer layer on a semiconductor substrate combines particular choices of process gases and plasma conditions with a post-etch passivation treatment. According to the method, a low density plasma etcher is used with a process gas mixture of one or more of an inert gas such as argon, helium, or nitrogen; methane; hydrogen; and oxygen, where the percentage of oxygen is up to about 5%. Typically a parallel plate plasma etcher is used. The reactive ion etching is followed by a post-etch passivation treatment in a which a gas containing hydrogen is flowed over the etched layer at an elevated temperature. The method is particularly useful in reactive ion etching of fluorinated organic polymer layers such as films formed from parylene AF4, and layers of poly(arylene ethers) and TEFLON®.

    摘要翻译: 在半导体衬底上的有机聚合物层的反应离子蚀刻期间限制表面损伤的方法通过蚀刻后钝化处理来组合工艺气体和等离子体条件的特定选择。 根据该方法,使用低密度等离子体蚀刻器与一种或多种惰性气体如氩气,氦气或氮气的处理气体混合物; 甲烷 氢; 和氧气,其中氧气的百分比高达约5%。 通常使用平行板等离子体蚀刻器。 反应离子蚀刻之后是后蚀刻钝化处理,其中含有氢的气体在升高的温度下流过蚀刻层。 该方法在诸如由聚对二甲苯AF4形成的膜和聚(亚芳基醚)和TEFLON层形成的氟化有机聚合物层的反应离子蚀刻中特别有用。

    Contact temperature probe with unrestrained orientation
    13.
    发明授权
    Contact temperature probe with unrestrained orientation 失效
    接触式温度探头具有无限制的方向

    公开(公告)号:US5791782A

    公开(公告)日:1998-08-11

    申请号:US531602

    申请日:1995-09-21

    CPC分类号: G01K1/143

    摘要: A combination contact temperature probe/wafer support includes a thermocouple enclosing probe head of low thermal mass and large contact area supported by a support means such that 1) there is a high thermal resistivity connection between the support means and the probe head, and 2) the probe head is self orienting under the weight of the wafer so that the contact area is maintained coplanar with the surface of the wafer.

    摘要翻译: 组合接触式温度探针/晶片支架包括热电偶,其包围具有低热质量的探针头和由支撑装置支撑的大的接触面积,使得1)在支撑装置和探头之间存在高热阻连接,以及2) 探针头在晶片的重量下是自定向的,使得接触面积保持与晶片的表面共面。

    Electrodeless lamp starting/operation with sources at different
frequencies
    14.
    发明授权
    Electrodeless lamp starting/operation with sources at different frequencies 失效
    无电极灯起动/不同频率的电源操作

    公开(公告)号:US5767626A

    公开(公告)日:1998-06-16

    申请号:US568290

    申请日:1995-12-06

    IPC分类号: H01J65/04 H05B41/24 H05B41/38

    CPC分类号: H05B41/24 H05B41/382

    摘要: An electrodeless lamp is started by coupling microwave power of a first frequency to a lamp cavity, while the discharge is maintained by coupling microwave power of a second frequency, wherein the first frequency is lower than the second frequency. A cooling fluid is impinged on the lamp bulb immediately before the application of the microwave power of the first frequency.

    摘要翻译: 通过将第一频率的微波功率耦合到灯泡腔来启动无电极灯,同时通过耦合第二频率的微波功率来维持放电,其中第一频率低于第二频率。 在施加第一频率的微波功率之前,冷却流体就立即撞在灯泡上。

    Methods and systems for determining one or more properties of a specimen
    17.
    发明授权
    Methods and systems for determining one or more properties of a specimen 有权
    用于确定样品的一个或多个性质的方法和系统

    公开(公告)号:US07187186B2

    公开(公告)日:2007-03-06

    申请号:US11078669

    申请日:2005-03-10

    IPC分类号: G01R31/302

    CPC分类号: G01R31/311 G01R31/2648

    摘要: Various methods and systems for determining one or more properties of a specimen are provided. One system for determining a property of a specimen is configured to illuminate a specimen with different wavelengths of light substantially simultaneously. The different wavelengths of light are modulated at substantially the same frequency. The system is also configured to perform at least two measurements on the specimen. A minority carrier diffusion length of the specimen may be determined from the measurements and absorption coefficients of the specimen at the different wavelengths. Another system for detecting defects on a specimen is configured to deposit a charge at multiple locations on an upper surface of the specimen. This system is also configured to measure a vibration of a probe at the multiple locations. Defects may be detected on the specimen using a two-dimensional map of the specimen generated from the measured surface voltages.

    摘要翻译: 提供了用于确定样本的一个或多个属性的各种方法和系统。 用于确定样本特性的一个系统被配置为基本上同时照射具有不同波长的光的样本。 不同波长的光以基本上相同的频率被调制。 该系统还被配置为对样本进行至少两次测量。 样品的少数载流子扩散长度可以根据不同波长的样品的测量和吸收系数来确定。 用于检测样本上的缺陷的另一系统被配置为在样本的上表面上的多个位置沉积电荷。 该系统还被配置为测量在多个位置处的探针的振动。 可以使用从测量的表面电压产生的样本的二维图来在样本上检测缺陷。

    Methods for imperfect insulating film electrical thickness/capacitance measurement
    18.
    发明授权
    Methods for imperfect insulating film electrical thickness/capacitance measurement 失效
    绝缘膜电气厚度/电容测量不完美的方法

    公开(公告)号:US07075318B1

    公开(公告)日:2006-07-11

    申请号:US10754332

    申请日:2004-01-09

    IPC分类号: G01R31/302 G01R27/26

    摘要: Methods for determining an electrical parameter of an insulating film are provided. One method includes measuring a surface potential of a leaky insulating film without inducing leakage across the insulating film and determining the electrical parameter from the surface potential. Another method includes applying an electrical field across the insulating film. Leakage across the insulating film caused by the electrical field is negligible. The method also includes measuring a surface potential of the specimen and determining a potential of the substrate. In addition, the method includes determining a pure voltage across the insulating film from the surface potential and the substrate potential. The method further includes determining the electrical parameter from the pure voltage. The electrical parameter may be capacitance or electrical thickness of the insulating film.

    摘要翻译: 提供了确定绝缘膜的电参数的方法。 一种方法包括测量泄漏绝缘膜的表面电位,而不会导致绝缘膜上的泄漏并且从表面电位确定电参数。 另一种方法包括在绝缘膜上施加电场。 由电场引起的绝缘膜上的泄漏可忽略不计。 该方法还包括测量样品的表面电位并确定衬底的电位。 此外,该方法包括从表面电位和衬底电位确定绝缘膜两端的纯电压。 该方法还包括从纯电压确定电参数。 电气参数可以是绝缘膜的电容或电气厚度。

    UV exposure for improving properties and adhesion of dielectric polymer films formed by chemical vapor deposition
    19.
    发明授权
    UV exposure for improving properties and adhesion of dielectric polymer films formed by chemical vapor deposition 失效
    UV曝光用于改善通过化学气相沉积形成的介电聚合物膜的性能和粘合力

    公开(公告)号:US06284050B1

    公开(公告)日:2001-09-04

    申请号:US09080905

    申请日:1998-05-18

    IPC分类号: C23C1600

    摘要: An ultraviolet-assisted chemical vapor deposition system for improving the adhesion, hardness, and thermal stability of organic polymer films deposited on semiconductor wafers is provided. The system includes an ultraviolet lamp and a tube-shaped monomer distribution system positioned over the wafer allowing ultraviolet irradiation of the wafer before, during and/or after deposition. Processes for depositing organic polymer films on semiconductor wafers are also provided. The processes include one or more depositions, one or more ultraviolet exposures, and one or more anneals.

    摘要翻译: 提供了一种用于提高沉积在半导体晶片上的有机聚合物膜的粘附性,硬度和热稳定性的紫外线辅助化学气相沉积系统。 该系统包括紫外灯和位于晶片上方的管状单体分配系统,允许在沉积之前,期间和/或之后对晶片进行紫外线照射。 还提供了用于在半导体晶片上沉积有机聚合物膜的工艺。 这些过程包括一个或多个沉积,一个或多个紫外线曝光和一个或多个退火。