公开(公告)号：US07800735B2

公开(公告)日：2010-09-21

申请号：US11420985

申请日：2006-05-30

Applicant: Salam Harb ,  Kent Douglas ,  Marek Zwyno ,  James Haslim ,  Jon Hamilton

Inventor： Salam Harb ,  Kent Douglas ,  Marek Zwyno ,  James Haslim ,  Jon Hamilton

IPC: G03B27/58

CPC classification number: G03F7/70758 ,  H01L21/68 ,  H01L21/6831 ,  Y10T74/20006 ,  Y10T279/21 ,  Y10T279/23 ,  Y10T279/27

Abstract: Substrate support apparatus and methods are described. Motion of a substrate chuck relative to a stage mirror may be dynamically compensated by sensing a displacement of the substrate chuck relative to the stage mirror and coupling a signal proportional to the displacement in one or more feedback loops with Z stage actuators and/or XY stage actuators coupled to the stage mirror. Alternatively, a substrate support apparatus may include a Z stage plate a stage mirror, one or more actuators attached to the Z stage plate, and a substrate chuck mounted to the stage mirror with constraints on six degrees of freedom of movement of the substrate chuck. The actuators impart movement to the Z stage in a Z direction as the Z stage plate is scanned in a plane perpendicular to the Z direction. The actuators may include force flexures having a base portion attached to the Z stage plate and a cantilever portion extending in a lateral direction from the base portion. The cantilever portion may include a parallelogram flexure coupled between the base portion and a free end of the cantilever portion.

Abstract translation: 描述了基板支撑装置和方法。 衬底卡盘相对于舞台反射镜的运动可以通过感测衬底卡盘相对于舞台镜的位移而被动态地补偿，并将与一个或多个反馈回路中的位移成比例的信号与Z级致动器和/或XY平台 耦合到舞台镜的致动器。 或者，基板支撑装置可以包括Z平台板，平台反射镜，附接到Z平台板的一个或多个致动器以及安装到平台反射镜的基板卡盘，其具有基板卡盘的六个自由度的约束。 当Z平台板在与Z方向垂直的平面中扫描时，执行器在Z方向上向Z平台施加移动。 致动器可以包括具有附接到Z平台板的基部部分和从基部沿横向方向延伸的悬臂部分的力弯曲。 悬臂部分可以包括耦合在基部和悬臂部分的自由端之间的平行四边形弯曲部。

公开(公告)号：US07755061B2

公开(公告)日：2010-07-13

申请号：US11983069

申请日：2007-11-07

Applicant: Luca Grella ,  Leonid Baranov ,  Yehiel Gotkis

Inventor： Luca Grella ,  Leonid Baranov ,  Yehiel Gotkis

IPC: G21K1/02

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/0435 ,  H01J2237/0453

Abstract: One embodiment relates to a dynamic pattern generator for reflection electron beam lithography which includes conductive pixel pads, an insulative border surrounding each conductive pixel pad so as to electrically isolate the conductive pixel pads from each other, and conductive elements coupled to the conductive pixel pads for controllably applying voltages to the conductive pixel pads. The conductive pixel pads are advantageously cup shaped with a bottom portion, a sidewall portion, and an open cavity. Another embodiment relates to a pattern generating apparatus which includes a well structure with sidewalls and a cavity configured above each conductive pixel pad. The sidewalls may include alternating layers of conductive and insulative materials. Other embodiments, aspects and feature are also disclosed.

Abstract translation: 一个实施例涉及用于反射电子束光刻的动态图案发生器，其包括导电像素焊盘，围绕每个导电像素焊盘的绝缘，以将导电像素焊盘彼此电隔离，以及耦合到导电像素焊盘的导电元件， 可控地向导电像素焊盘施加电压。 导电像素焊盘有利地为杯形，其具有底部，侧壁部分和开放空腔。 另一个实施例涉及一种图案生成装置，其包括具有侧壁的阱结构和在每个导电像素垫之上配置的空腔。 侧壁可以包括交替的导电和绝缘材料层。 还公开了其它实施例，方面和特征。

公开(公告)号：US07714300B1

公开(公告)日：2010-05-11

申请号：US11711552

申请日：2007-02-26

Applicant: Mark A. McCord ,  Tom G. Miller ,  David L. Brown

Inventor： Mark A. McCord ,  Tom G. Miller ,  David L. Brown

IPC: G01T1/00

CPC classification number: H01J37/244 ,  H01J37/28 ,  H01J2237/2441 ,  H01J2237/2444

Abstract: One embodiment relates to a solid-state charged-particle detector. The detector includes a PIN diode and a conductive coating on the front-side of the PIN diode, wherein the front-side receives incident charged particles to be detected. In addition, the detector includes a metal layer on the backside of the PIN diode and electrical connections to the metal layer and to the conductive coating. Other embodiment are also disclosed.

Abstract translation: 一个实施方案涉及固态带电粒子检测器。 检测器包括PIN二极管和PIN二极管前侧的导电涂层，其中前侧接收待检测的入射带电粒子。 此外，检测器包括在PIN二极管背面的金属层和与金属层和导电涂层的电连接。 还公开了其他实施例。

公开(公告)号：US07709792B2

公开(公告)日：2010-05-04

申请号：US11622758

申请日：2007-01-12

Applicant: Mehran Naser-Ghodsi ,  Tzu-Chin Chuang ,  Kenneth Krzeczowski ,  Matthew Lent ,  Chris Huang ,  Stanislaw Marek Borowicz

Inventor： Mehran Naser-Ghodsi ,  Tzu-Chin Chuang ,  Kenneth Krzeczowski ,  Matthew Lent ,  Chris Huang ,  Stanislaw Marek Borowicz

IPC: H01J37/28 ,  H01J37/305 ,  G01N23/225

CPC classification number: H01J37/28 ,  H01J2237/226 ,  H01J2237/2611 ,  H01J2237/3174

Abstract: Methods and apparatus for imaging a structure and a related processor-readable medium are disclosed. A surface of a substrate (or a portion thereof) is exposed to a gas composition. The gas composition includes one or more components that etch the substrate upon activation by interaction with a beam of electrons. A beam of electrons is directed to one or more portions of the surface of the substrate that are exposed to the gas composition to etch the one or more portions. A plurality of images is obtained of the one or more portions at different instances of time as the one or more portions are etched. A three-dimensional model of one or more structures embedded within the one or more portions of the substrate is generated from the plurality of images.

Abstract translation: 公开了用于对结构进行成像和相关处理器可读介质的方法和装置。 将基材（或其一部分）的表面暴露于气体组合物。 气体组合物包括一种或多种在通过与电子束的相互作用激活时蚀刻衬底的组分。 电子束被引导到暴露于气体组合物的衬底的表面的一个或多个部分以蚀刻一个或多个部分。 当蚀刻一个或多个部分时，在不同的时间点获得一个或多个部分的多个图像。 从多个图像生成嵌入在基板的一个或多个部分内的一个或多个结构的三维模型。

公开(公告)号：US07696498B2

公开(公告)日：2010-04-13

申请号：US11686905

申请日：2007-03-15

Applicant: Allen M. Carroll

Inventor： Allen M. Carroll

IPC: G01J3/10

CPC classification number: H01J1/34 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/073 ,  H01J37/3174 ,  H01J2237/06333 ,  H01J2237/31779

Abstract: Embodiments of the invention include an electron beam lithography device using a dynamically controllable photocathode capable of producing a patterned electron beam. One such implementation includes a dynamic pattern generator configurable to produce an electron beam having a desired image pattern impressed thereon. Such an electron beam pattern being enabled by selectively activating programmable photoemissive elements of the pattern generator. The apparatus further including an illumination source arranged to direct a light beam onto the dynamic pattern generator to produce the electron beam having the desired pattern. The electron beam being directed through associated electron optics configured to receive the electron beam from the dynamic pattern generator and direct the electron beam onto a target substrate mounted on a stage.

Abstract translation: 本发明的实施例包括使用能够产生图案化电子束的动态可控光电阴极的电子束光刻装置。 一种这样的实现包括动态图案发生器，其被配置为产生具有所加载的所需图像图案的电子束。 这种电子束图案通过选择性地激活图案发生器的可编程发光元件来实现。 该装置还包括照明源，其被布置成将光束引导到动态图案发生器上以产生具有期望图案的电子束。 电子束通过相关联的电子光学器件被配置成从动态图案发生器接收电子束并将电子束引导到安装在载物台上的目标基底上。

公开(公告)号：US07692167B1

公开(公告)日：2010-04-06

申请号：US11588492

申请日：2006-10-26

Applicant: Marian Mankos

Inventor： Marian Mankos

IPC: H01J37/302

CPC classification number: H01J37/3175 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/30483 ,  H01J2237/31789

Abstract: One embodiment pertains to an apparatus for reflection electron beam lithography, including at least illumination electron-optics, an electron-reflective pattern generator, projection electron-optics, a moving stage holding a target substrate, control circuitry, and a deflection system. The illumination electron-optics is configured to form an illumination electron beam. The electron-reflective pattern generator configured to generate an electron-reflective pattern of pixels and to reflect the illumination electron beam using the pattern to form a patterned electron beam. The projection electron-optics is configured to project the patterned electron beam onto the moving target substrate. The control circuitry is configured to shift the generated pattern in discrete steps in synchronization with the stage motion. The deflection system is configured to deflect said projected patterned electron beam so as to compensate for said stage motion in between discrete shifts of said generated pattern. Other features and embodiments are also disclosed.

Abstract translation: 一个实施例涉及用于反射电子束光刻的装置，至少包括照明电子光学，电子反射图案发生器，投射电子光学，保持目标衬底的移动台，控制电路和偏转系统。 照明电子光学被配置为形成照明电子束。 电子反射型图形发生器被配置为产生像素的电子反射图案并且使用该图案反射照射电子束以形成图案化的电子束。 投影电子学被配置为将图案化电子束投影到移动目标衬底上。 控制电路被配置为与台阶运动同步地以离散步进移位生成的图案。 偏转系统被配置为偏转所述投影的图案化电子束，以补偿所述生成图案的离散位移之间的所述阶段运动。 还公开了其它特征和实施例。

公开(公告)号：US07672043B2

公开(公告)日：2010-03-02

申请号：US10903494

申请日：2004-07-29

Applicant: J. Joseph Armstrong ,  Yung-Ho Chuang ,  David R. Shafer

Inventor： J. Joseph Armstrong ,  Yung-Ho Chuang ,  David R. Shafer

IPC: G02B5/08

CPC classification number: G03F7/70225 ,  G02B17/0808 ,  G02B17/0812 ,  G02B17/0856 ,  G02B17/0892 ,  G02B21/02 ,  G03F7/70341

Abstract: A relatively high spectral bandwidth objective employed for use in imaging a specimen and method for imaging a specimen is provided. The objective includes a lens group having at least one focusing lens configured to receive light energy and form an intermediate image, at least one field lens oriented to receive the intermediate image and provide intermediate light energy, and a Mangin mirror arrangement positioned to receive the intermediate light energy and apply light energy to the specimen. The objective may provide, in certain instances, a spectral bandwidth up to approximately 193 to 266 nanometers and can provide numerical apertures in excess of 0.9. Elements are less than 100 millimeters in diameter and may fit within a standard microscope. The field lens may include more than one lens and may be formed of a material different from at least one other lens in the objective.

Abstract translation: 提供了用于成像试样的相对高的光谱带宽目标和用于成像试样的方法。 该目的包括具有至少一个聚焦透镜的透镜组，该至少一个聚焦透镜被配置为接收光能并形成中间图像，定向成接收中间图像并提供中间光能的至少一个场透镜，以及定位成接收中间图像的中间图像 光能并向样品施加光能。 在某些情况下，目标可以提供高达约193至266纳米的光谱带宽，并且可以提供超过0.9的数值孔径。 元素的直径小于100毫米，并且可以适合标准显微镜。 场透镜可以包括多于一个透镜，并且可以由与物镜中的至少一个其它透镜不同的材料形成。

公开(公告)号：US07652430B1

公开(公告)日：2010-01-26

申请号：US11224921

申请日：2005-09-12

Applicant: Gildardo R. Delgado

Inventor： Gildardo R. Delgado

IPC: H01J17/04 ,  H01J61/04

CPC classification number: H01J61/16 ,  H01J61/0737

Abstract: Broadband radiation may be generated by supplying a gas mixture containing hydrogen and/or deuterium and/or helium and/or neon to an enclosure, generating a plasma inside the enclosure with the gas mixture. Broadband radiation generated as a result of the plasma discharge to a substrate may be optically coupled to a substrate located outside the enclosure.

Abstract translation: 可以通过将包含氢和/或氘和/或氦和/或氖的气体混合物供应到外壳来产生宽带辐射，在气体混合物内在外壳内产生等离子体。 作为等离子体放电到基板的结果而产生的宽带辐射可光学耦合到位于外壳外部的基板。

公开(公告)号：US07646533B2

公开(公告)日：2010-01-12

申请号：US11093850

申请日：2005-03-29

Applicant: Yung-Ho Chuang ,  David R. Shafer ,  J. Joseph Armstrong

Inventor： Yung-Ho Chuang ,  David R. Shafer ,  J. Joseph Armstrong

IPC: G02B17/00

CPC classification number: G02B17/0892 ,  G02B17/0812 ,  G02B17/0856 ,  G02B21/02 ,  G02B21/04 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/70341

Abstract: A relatively high spectral bandwidth objective employed for use in imaging a specimen and method for imaging a specimen is provided. The objective includes a lens group having at least one focusing lens configured to receive light energy and form focused light energy. The focused light energy forms an intermediate image. The objective further includes at least one field lens located in proximity to an intermediate image, and a catadioptric arrangement positioned to receive the intermediate light energy from the at and form controlled light energy. The catadioptric arrangement may include at least one Mangin element and can include a meniscus lens element.

Abstract translation: 提供了用于成像试样的相对高的光谱带宽目标和用于成像试样的方法。 该目的包括透镜组，其具有被配置为接收光能并形成聚焦光能的至少一个聚焦透镜。 聚焦光能形成中间图像。 该目的还包括位于中间图像附近的至少一个场透镜，以及定位用于从中接收中间光能并形成受控光能的反射折射装置。 折反射装置可以包括至少一个Mangin元件并且可以包括弯月形透镜元件。

公开(公告)号：US20100005442A1

公开(公告)日：2010-01-07

申请号：US12560229

申请日：2009-09-15

Applicant: Mark Ghinovker ,  Michael E. Adel ,  Jorge Poplawski ,  Joel L. Seligson

Inventor： Mark Ghinovker ,  Michael E. Adel ,  Jorge Poplawski ,  Joel L. Seligson

IPC: G06F17/50

CPC classification number: G06F17/5068 ,  G03F7/70633 ,  G06F2217/12 ,  Y02P90/265

Abstract: Disclosed are techniques and apparatus are provided for determining overlay error or pattern placement error (PPE) across the field of a scanner which is used to pattern a sample, such as a semiconductor wafer or device. This determination is performed in-line on the product wafer or device. That is, the targets on which overlay or PPE measurements are performed are provided on the product wafer or device itself. The targets are either distributed across the field by placing the targets within the active area or by distributing the targets along the streets (the strips or scribe areas) which are between the dies of a field. The resulting overlay or PPE that is obtained from targets distributed across the field may then be used in a number of ways to improve the fabrication process for producing the sample. For instance, the resulting overlay or PPE may be used to more accurately predict device performance and yield, more accurately correct a deviating photolithography scanning tool, or determine wafer lot disposition.

Abstract translation: 公开了提供用于确定扫描仪领域的重叠误差或图案布置误差（PPE）的技术和装置，其用于对样品（例如半导体晶片或器件）进行图案化。 该确定在产品晶片或器件上在线执行。 也就是说，在产品晶片或器件本身上提供执行覆盖或PPE测量的目标。 目标是通过将目标放置在活动区域​​内或通过在场的模具之间的街道（条带或划线区域）上分布目标来分布在场上。 然后可以以多种方式使用从分布在场上的目标获得的所得覆盖物或PPE，以改进用于生产样品的制造过程。 例如，所得覆盖层或PPE可用于更准确地预测设备性能和产量，更精确地校正偏离的光刻扫描工具，或确定晶片批次布置。