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    Apparatus for generating data for determining a property of a gemstone
    14.
    发明授权
    Apparatus for generating data for determining a property of a gemstone 有权
    用于生成用于确定宝石的属性的数据的装置

    公开(公告)号：US07411663B2

    公开(公告)日：2008-08-12

    申请号：US11515399

    申请日：2006-09-01

    申请人： Marc Frans Alida Van de Velde ,  Christiaan Louis Cecile Keersmaekers

    发明人： Marc Frans Alida Van de Velde ,  Christiaan Louis Cecile Keersmaekers

    IPC分类号： G01N21/00

    CPC分类号： G01N33/381 ,  G01N21/87 ,  G01N2021/8809

    摘要： An apparatus configured to generate image data for use in determining a property of a gemstone is disclosed. The apparatus includes a support structure configured to support the gemstone at an observation position such that an axis of symmetry of the gemstone is substantially parallel to an axis of rotation of the apparatus, a light source, including a reflector having a concave surface arranged to reflect a spatially varied light pattern generally towards the observation position, the concave surface including at least one relatively reflective region and at least one relatively unreflective region and is configured to generate the light pattern, where the length of a boundary between the relatively reflective region and the relatively unreflective region is greater than the radial distance between the center and an edge of the concave surface, and a rotator configured to rotate the gemstone relative to the light pattern substantially about the axis of rotation.

    摘要翻译： 公开了一种被配置为生成用于确定宝石的属性的图像数据的装置。 该装置包括支撑结构，该支撑结构构造成在观察位置处支撑宝石，使得宝石的对称轴线基本上平行于装置的旋转轴线，光源包括反射器，该反射器具有设置成反射的凹面 通常朝向观察位置的空间变化的光图案，所述凹面包括至少一个相对反射区域和至少一个相对非反射区域，并且被配置为产生光图案，其中相对反射区域和 相对非反射区域大于凹面的中心和边缘之间的径​​向距离，以及构造成基本上围绕旋转轴线旋转宝石相对于光图案的旋转体。

    Visual inspection apparatus
    16.
    发明申请
    Visual inspection apparatus 失效
    目视检查仪器

    公开(公告)号：US20010012393A1

    公开(公告)日：2001-08-09

    申请号：US09726122

    申请日：2000-11-30

    发明人： Eiji Yonezawa

    IPC分类号： G06K009/00

    CPC分类号： G01N21/9501 ,  G01N21/8803 ,  G01N21/8806 ,  G01N2021/8809 ,  G01N2021/8845

    摘要： In a visual inspection apparatus for visual inspection of an object, a plurality of monochrome images obtained from an object are used to prepare a plurality of computed color images. The computed color images are switchingly displayed on a color display for visual inspection.

    摘要翻译： 在用于物体目视检查的视觉检查装置中，使用从对象获得的多个单色图像来准备多个计算出的彩色图像。 计算出的彩色图像被切换显示在彩色显示器上用于目视检查。

    Time domain multiplexed defect scanner
    17.
    发明授权
    Time domain multiplexed defect scanner 有权

    公开(公告)号：US11733173B1

    公开(公告)日：2023-08-22

    申请号：US18092382

    申请日：2023-01-02

    申请人： Lumina Instruments, Inc.

    发明人： Steven W. Meeks ,  Hung Phi Nguyen ,  Alireza Shahdoost Moghaddam

    IPC分类号： G01N21/88

    CPC分类号： G01N21/8806 ,  G01N2021/8809 ,  G01N2021/8845 ,  G01N2021/8848

    摘要： An optical scanning system includes a first radiating source capable of outputting a first source light beam, a second radiating source capable of outputting a second source light beam, a first time-varying beam reflector configured to direct the first source light beam and the second source light beam toward the sample, a scan lens configured to focus the first source light beam and the second source light beam reflected by the first time-varying beam reflector onto the sample, and a compound ellipsoidal collector configured to direct light scattered from the sample toward a scattered radiation detector. The optical scanner causes one of the first or second source light beams to be directed towards a sample at an incident angle. The first light beam has a first wavelength, the second light beam has a second wavelength, and the first wavelength and the second wavelength are not the same.

    Lighting Optical System and Substrate Inspecting Device
    18.
    发明公开
    Lighting Optical System and Substrate Inspecting Device 审中-公开

    公开(公告)号：US20230142646A1

    公开(公告)日：2023-05-11

    申请号：US17916629

    申请日：2020-04-10

    申请人： Hitachi High-Tech Corporation

    发明人： Akihiro IWAMATSU ,  Shunichi MATSUMOTO ,  Masaya YAMAMOTO

    IPC分类号： G01N21/95 ,  G01N21/94 ,  G01N21/88

    CPC分类号： G01N21/9501 ,  G01N21/94 ,  G01N21/8806 ,  G01N2021/8809

    摘要： This illumination optical system comprises a laser light source 301, 401, 501, a light collection optical system 311, 411, 511, and a support structure 312, 412 that is able to secure the laser light source and the light collection optical system, wherein the light from the laser light source is focused onto an object to be inspected 307, 407, 507. The light collection optical system comprises a cylindrical mirror 306, 406, 506, and at least one cylindrical lens 304, 404a, 404b, 404c, 504a, 504b, 504c. The cylindrical mirror is an optical element that collects light in a first direction, and the cylindrical lens is an optical element that collects light in a second direction perpendicular to the first direction. The focal distance of the cylindrical lens to the object to be inspected is greater than the focal distance of the cylindrical mirror to the object to be inspected.

    Defect inspecting method and defect inspecting apparatus
    20.
    发明授权
    Defect inspecting method and defect inspecting apparatus 有权
    缺陷检查方法和缺陷检查装置

    公开(公告)号：US09228960B2

    公开(公告)日：2016-01-05

    申请号：US14154612

    申请日：2014-01-14

    申请人： Hitachi High-Technologies Corporation

    发明人： Toshiyuki Nakao ,  Shigenobu Maruyama ,  Akira Hamamatsu ,  Yuta Urano

    IPC分类号： G01N21/00 ,  G01N21/95 ,  G01N21/88 ,  H01L21/66

    CPC分类号： G01N21/9501 ,  G01N21/8806 ,  G01N2021/8809 ,  G01N2021/8848 ,  H01L22/12

    摘要： A defect inspecting method and apparatus for inspecting a surface state including a defect on a wafer surface, in which a polarization state of a laser beam irradiated onto the wafer surface is connected into a specified polarization state, the converted laser beam having the specified polarization state is inserted onto the wafer surface, and a scattering light occurring from an irradiated region where the laser beam having the specified polarization state is irradiated, is separated into a first scattering light occurring due to a defect on the wafer and a second scattering light occurring due to a surface roughness on the wafer. An optical element for optical path division separates the first and second scattering lights approximately at the same time.

    摘要翻译： 一种用于检查包括晶片表面上的缺陷的表面状态的缺陷检查方法和装置，其中照射到晶片表面的激光束的偏振状态连接到指定的偏振状态，具有指定偏振态的转换的激光束 被插入到晶片表面上，并且从照射具有指定的偏振状态的激光束的照射区域发射的散射光被分离为由于晶片上的缺陷而发生的第一散射光和由于正在发生的第二散射光 达到晶片上的表面粗糙度。 用于光路分割的光学元件大致同时分开第一和第二散射光。