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    MICROWAVE PLASMA REACTOR FOR MANUFACTURING SYNTHETIC DIAMOND MATERIAL
    14.
    发明申请
    MICROWAVE PLASMA REACTOR FOR MANUFACTURING SYNTHETIC DIAMOND MATERIAL 有权
    用于制造合成金刚石材料的微波等离子体反应器

    公开(公告)号：US20140048016A1

    公开(公告)日：2014-02-20

    申请号：US13980452

    申请日：2011-12-14

    Applicant: Helen Wilman

    Inventor： Geoffrey Alan Scarsbrook ,  Jonathan James Wilman ,  Joseph Michael Dodson ,  John Robert Brandon ,  Steven Edward Coe ,  Christopher John Howard Wort

    IPC: C23C16/27

    CPC classification number: C23C16/274 ,  C01B32/25 ,  C23C16/511 ,  C30B25/105 ,  C30B29/04 ,  H01J37/32192 ,  H01J37/32642 ,  H01J2237/339

    Abstract: A microwave plasma reactor for manufacturing synthetic diamond material via chemical vapour deposition, the microwave plasma reactor comprising: a plasma chamber; a substrate holder disposed in the plasma chamber and comprising a supporting surface for supporting a substrate on which the synthetic diamond material is to be deposited in use; a microwave coupling configuration for feeding microwaves from a microwave generator into the plasma chamber; and a gas flow system for feeding process gases into the plasma chamber and removing them therefrom; wherein the microwave plasma reactor further comprises an electrically conductive plasma stabilizing annulus disposed around the substrate holder within the plasma chamber.

    Abstract translation: 一种用于通过化学气相沉积制造合成金刚石材料的微波等离子体反应器，所述微波等离子体反应器包括：等离子体室; 衬底保持器，其设置在所述等离子体室中，并且包括支撑表面，所述支撑表面用于支撑在其上沉积合成金刚石材料的基底; 用于将微波从微波发生器馈入等离子体室的微波耦合配置; 以及用于将工艺气体进料到等离子体室中并从中除去它们的气体流动系统; 其中微波等离子体反应器还包括设置在等离子体室内的衬底保持器周围的导电等离子体稳定环。

    Device for ceramic-type coating of a substrate
    16.
    发明申请
    Device for ceramic-type coating of a substrate 审中-公开
    衬底陶瓷型涂层装置

    公开(公告)号：US20040144318A1

    公开(公告)日：2004-07-29

    申请号：US10470400

    申请日：2004-03-22

    Inventor： Thomas Beck ,  Thomas Weber ,  Alexander Schattke ,  Sascha Henke

    IPC: C23C016/00 ,  H05H001/24

    CPC classification number: H01J37/32192 ,  C23C14/06 ,  C23C14/3471 ,  C23C14/354 ,  C23C14/357 ,  H01J2237/339

    Abstract: A device is proposed for the ceramic-type coating of a substrate (2), means being provided for depositing a material (5, 7), especially by using a plasma (8), on a surface of the substrate (2), which, in contrast to the related art, allows a ceramic coating (3) of comparatively temperature-sensitive substrates (2). According to the present invention, this is achieved in that an energy source that differs from a material source (4, 6) of the material (5, 7) provided for the coating, is provided for the locally defined energy input into the material (3, 5, 7, 8) present in front of and/or on the surface.

    Method of synthesizing diamond-like carbon thin films
    17.
    发明授权
    Method of synthesizing diamond-like carbon thin films 失效
    合成类金刚石碳薄膜的方法

    公开(公告)号：US5674573A

    公开(公告)日：1997-10-07

    申请号：US174169

    申请日：1993-12-29

    Applicant: Tsutomu Mitani ,  Hirokazu Nakaue ,  Hideo Kurokawa

    Inventor： Tsutomu Mitani ,  Hirokazu Nakaue ,  Hideo Kurokawa

    IPC: C23C16/26 ,  C23C16/452 ,  C23C16/54 ,  H01J37/32 ,  B05D3/06

    CPC classification number: H01J37/32449 ,  C23C16/26 ,  C23C16/452 ,  C23C16/545 ,  H01J37/32082 ,  H01J37/32357 ,  H01J2237/338 ,  H01J2237/339 ,  Y10S427/106

    Abstract: A method for synthesizing a hard diamond-like thin film on a rotating substrate, the method comprising the steps of: generating plasma of gas containing hydrocarbon gas, in a first vacuum vessel having an inflow portion and an outflow portion for the gas such that the substrate is provided in a second vacuum vessel maintained at a pressure lower, by a factor of 10 or more, than that of the first vacuum vessel due to flow resistance of the gas between the outflow portion and the substrate; and irradiating the plasma onto the substrate by pressure difference between the first vacuum vessel and the second vacuum vessel while an AC power is being applied to a mesh-shaped internal electrode provided in the first vacuum vessel.

    Abstract translation: 一种用于在旋转基板上合成硬质金刚石薄膜的方法，所述方法包括以下步骤：在具有用于气体的流入部分和流出部分的第一真空容器中产生含有烃气体的等离子体，使得 衬底被提供在第二真空容器中，由于流出部分和衬底之间的气体的流动阻力，保持在比第一真空容器低10倍或更多的压力的压力下; 并且在将AC功率施加到设置在第一真空容器中的网状内部电极的同时，通过第一真空容器和第二真空容器之间的压力差将等离子体照射到基板上。

    TECHNIQUES FOR FABRICATING DIAMOND NANOSTRUCTURES
    20.
    发明申请
    TECHNIQUES FOR FABRICATING DIAMOND NANOSTRUCTURES 审中-公开
    制造金刚石纳米结构的技术

    公开(公告)号：US20160052789A1

    公开(公告)日：2016-02-25

    申请号：US14841922

    申请日：2015-09-01

    Applicant: THE TRUSTEES OF COLUMBIA UNIVERSITY IN THE CITY OF NEW YORK

    Inventor： Ophir Gaathon ,  Dirk R. Englund ,  Jonathan Hodges ,  Luozhou Li ,  Matthew Trushem

    IPC: C01B31/06 ,  H01J37/32 ,  C09K11/65

    CPC classification number: H01J37/32788 ,  C01B32/28 ,  C09K11/65 ,  H01J37/32651 ,  H01J2237/3341 ,  H01J2237/339

    Abstract: Techniques for fabricating diamond nanostructures including application of a self-assembled hard mask to a surface of a diamond substrate to define a pattern of masked regions having a predetermined diameter surrounded by an exposed portion. The exposed portion can be vertically etched to a predetermined depth using inductively coupled plasma to form a plurality of nanoposts corresponding to the masked regions. The nanoposts can be harvested to obtain a nanostructure with a diameter corresponding to the predetermined diameter and a length corresponding to the predetermined depth.

    Abstract translation: 用于制造金刚石纳米结构的技术，包括将自组装的硬掩模施加到金刚石基底的表面以限定由暴露部分包围的具有预定直径的掩模区域的图案。 可以使用电感耦合等离子体将暴露部分垂直蚀刻到预定深度，以形成对应于掩蔽区域的多个纳米孔。 可以收获纳米孔，以获得具有对应于预定直径的直径和对应于预定深度的长度的纳米结构。

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