公开(公告)号：US06383554B1

公开(公告)日：2002-05-07

申请号：US09654808

申请日：2000-09-05

Applicant: Cheng-Hung Chang ,  Keh-Chyang Leou ,  Chaung Lin ,  Yi-Mei Yang ,  Chuen-Horng Tsai ,  I. G. Chen

Inventor： Cheng-Hung Chang ,  Keh-Chyang Leou ,  Chaung Lin ,  Yi-Mei Yang ,  Chuen-Horng Tsai ,  I. G. Chen

IPC: B05D314

CPC classification number: H01J37/32082 ,  H01J37/3299

Abstract: There is provided a process and its system for fabricating plasma with feedback control on plasma density. This process uses a heterodyne millimeter wave interferometer as a sensor to measure the plasma density in the process container and the plasma density that is needed in the plasma fabricating process, and then provides real-time information of the measurements to a digital control device which makes numerical calculations and then drives the RF power generator to change the RF output power so as to enable the plasma density in the plasma fabricating process to be close to the expected plasma density. The conventional operation parameter method is to control air pressure, RF power, gas flow quantity, temperature and so on. However, it does not control the plasma parameter that has the most direct influence on the process. Therefore, this method cannot guarantee that, in the process of fabricating wafers, different batches of wafers will be operated under similar process plasma conditions. The present invention provides a process plasma source that can be directly controlled so as to obtain process plasma source of steady quality.

Abstract translation: 提供了一种用于制造等离子体的方法及其系统，其具有对等离子体密度的反馈控制。 该方法使用外差毫米波干涉仪作为传感器来测量处理容器中的等离子体密度和等离子体制造过程中所需的等离子体密度，然后将测量值的实时信息提供给数字控制装置，该数字控制装置 数值计算，然后驱动射频发射器改变射频输出功率，使等离子体制造过程中的等离子体密度接近于预期的等离子体密度。常规的操作参数方法是控制空气压力，射频功率， 气体流量，温度等。 然而，它不控制对过程有最直接影响的等离子体参数。 因此，该方法不能保证在制造晶片的过程中，不同批次的晶片将在类似的工艺等离子体条件下运行。 本发明提供可直接控制以获得质量稳定的工艺等离子体源的工艺等离子体源。

公开(公告)号：US06231917B1

公开(公告)日：2001-05-15

申请号：US09335508

申请日：1999-06-18

Applicant: Shinichi Ito ,  Katsuya Okumura

Inventor： Shinichi Ito ,  Katsuya Okumura

IPC: B05D314

CPC classification number: G03C1/49845 ,  B05B13/04 ,  B05C5/0212 ,  B05C5/025 ,  B05C11/10 ,  B05C11/1039 ,  G03F7/16

Abstract: A liquid output portion is arranged above a substrate. In the substrate, a film formation region and a non-film-formation region are determined. The liquid output portion is responsible for continuously outputting a liquid in a constant amount to the substrate. The substrate and the liquid output portion are relatively moved by a moving portion. Below the liquid output portion, a liquid shut-out portion is arranged. At least one of the substrate and the liquid output portion is moved and ready to supply of the liquid from the liquid output portion to the non-film-formation region, the supply is shut out by the liquid shut-out portion. A liquid, which has been controlled so as to spread in a constant amount, is continuously output from the liquid output nozzle to the substrate. While the nozzle and the substrate are relatively moved, the liquid is supplied to a first region on the substrate. While the nozzle and the substrate are relatively moved, the liquid is supplied to a second region on the substrate in such a way that the liquid supplied from the nozzle and spread in a second region on the substrate is in contact with the liquid which has supplied and spread in the first region on the substrate. In the case where projections and depressions are formed on the surface of the substrate, an amount of the liquid to be supplied to the substrate is varied depending upon the ratio between the projections and depressions.

Abstract translation: 液体输出部分设置在基板的上方。 在基板中，确定成膜区域和非成膜区域。 液体输出部分负责将恒定量的液体连续地输出到基板。 基板和液体输出部分被移动部分相对移动。 在液体输出部分下方布置有液体封闭部分。 衬底和液体输出部分中的至少一个被移动并准备好将液体从液体输出部分供应到非成膜区域，由液体截留部分关闭供给。 从液体输出喷嘴向衬底连续地输出已经被控制成以恒定量扩散的液体。 当喷嘴和基板相对移动时，液体被供应到基板上的第一区域。 当喷嘴和基板相对移动时，液体被供应到基板上的第二区域，使得从喷嘴供应并在基板上的第二区域中扩散的液体与已经供应的液体接触 并扩散在基板上的第一区域中。 在基板的表面上形成有凹凸的情况下，供给到基板的液体的量根据凸部和凹部的比例而变化。

公开(公告)号：US06830774B2

公开(公告)日：2004-12-14

申请号：US10856836

申请日：2004-06-01

Applicant: Shinichi Hayashi ,  Hirofumi Ookuma ,  Kouichi Suefuji

Inventor： Shinichi Hayashi ,  Hirofumi Ookuma ,  Kouichi Suefuji

IPC: B05D314

CPC classification number: H01L21/6715

Abstract: A processing solution is supplied from processing-solution suppliers onto the surfaces of targets to be processed while a flow rate of the processing solution is being adjusted. The processing solution is fed from a processing-solution supply source at a specific pressure via a processing-solution pressure-up feeder. The pressure of the processing solution fed via the processing-solution pressure-up feeder is adjust to another specific pressure or more at least when the processing-solution suppliers are operating simultaneously. A flow-rate detector detects the flow rate of the processing solution supplied from each processing-solution supplier. A pressure detector detects the pressure of the processing solution fed via the processing-solution pressure-up feeder. The flow-rate adjuster and the pressure adjuster are controlled based on prestored control data and detection signals from the flow-rate detector and the pressure detector so that the same amount of processing solution is supplied to the targets from the processing-solution suppliers.

Abstract translation: 当处理液的流量被调整时，处理溶液从处理溶液供应商提供到待处理目标的表面上。 处理溶液通过处理溶液加压给料机从处理溶液供应源以特定压力进料。 至少当处理液供应商同时进行操作时，通过处理溶液加压给料器供给的处理溶液的压力可调至另一个特定压力或更高压力。 流量检测器检测从每个处理溶液供应商提供的处理溶液的流量。 压力检测器检测通过处理溶液升压给料器供给的处理溶液的压力。 基于来自流量检测器和压力检测器的预先存储的控制数据和检测信号来控制流量调节器和压力调节器，使得从处理溶液供应商向目标提供相同量的处理溶液。

公开(公告)号：US06811807B1

公开(公告)日：2004-11-02

申请号：US10049165

申请日：2002-10-01

Applicant: Konrad Zimmermann ,  Klaus Peter Reinke

Inventor： Konrad Zimmermann ,  Klaus Peter Reinke

IPC: B05D314

CPC classification number: B05B9/0403 ,  B05B9/0423 ,  B05B12/006 ,  B05B12/02 ,  B05B12/082 ,  B05B15/52 ,  B05D1/325

Abstract: A process for producing a peel-off protective layer for surfaces, especially for painted surfaces of motor vehicle bodies. A curable liquid coating material is sprayed by a spray nozzle onto the surface to be protected, where it forms a two-dimensional protective layer which cures. Coating material emerging essentially as a continuous strand or strip of material from an applicator nozzle is applied to the surface to be coated at the edges of the areas of the coating material which has been sprayed onto the surface.

Abstract translation: 一种用于制造用于表面的剥离保护层的方法，特别是用于汽车车身的涂漆表面。 将可固化的液体涂料通过喷嘴喷射到待保护的表面上，在其上形成二维保护层，其固化。 基本上作为连续的来自施加喷嘴的材料条的涂层材料被施加到被喷涂到表面上的涂料的区域的边缘处的待涂覆表面上。

公开(公告)号：US06613397B2

公开(公告)日：2003-09-02

申请号：US10000013

申请日：2001-12-04

Applicant: Seung Taek Oh

Inventor： Seung Taek Oh

IPC: B05D314

CPC classification number: B32B15/016 ,  B23K1/0008 ,  B23K2103/10 ,  C23C24/10 ,  C23C26/02

Abstract: In a method for manufacturing an Al clad product, first, cladding material is fused and coated on base material having Al. Then, slurry material is coated on the cladding material coated on the base material, the slurry material including mixture of a flux powder, a resin binder powder and a diluent. Thereafter, the slurry material is hardened to thereby provide a hardened product including the base material, the cladding material and hardened slurry material. In a subsequent step, the hardened product is brazed to thereby provide an Al clad product, wherein the diluent included in the slurry material is gasified in the hardening process of the slurry material and the cladding material is fused by employing an arc discharge technique.

公开(公告)号：US06485777B1

公开(公告)日：2002-11-26

申请号：US09646795

申请日：2000-11-24

Applicant: Philipp Riedener ,  Ernst Sturzenegger

Inventor： Philipp Riedener ,  Ernst Sturzenegger

IPC: B05D314

CPC classification number: B41F15/0809 ,  B41M1/12 ,  B41P2215/11

Abstract: A device for coating a sheet comprises at least one screen cylinder configured to be positioned downstream of a sheet feeding mechanism. The screen cylinder is further configured to coat a sheet. The device further comprises a constant conveyor for feeding a sheet from the feeding mechanism to the screen cylinder and a variable speed drive for rotating the screen cylinder. The variable speed drive is configured to rotate the screen cylinder based on one of a print length and a print position of the sheet to be coated.

Abstract translation: 用于涂布片材的装置包括至少一个筛筒，其构造成位于片材进给机构的下游。 筛筒还被构造成涂覆片材。 该装置还包括用于将片材从进给机构馈送到丝网滚筒的恒定传送器和用于旋转筛筒的变速驱动器。 变速驱动器被配置为基于待涂覆的片材的打印长度和打印位置中的一个旋转筛筒。

公开(公告)号：US06436487B1

公开(公告)日：2002-08-20

申请号：US09612615

申请日：2000-07-06

Applicant: Manabu Ikemoto ,  Katsuhisa Yuda

Inventor： Manabu Ikemoto ,  Katsuhisa Yuda

IPC: B05D314

CPC classification number: H01L21/02164 ,  C23C16/402 ,  C23C16/452 ,  C23C16/45565 ,  C23C16/52 ,  H01L21/02211 ,  H01L21/02274 ,  H01L21/31612

Abstract: In a film deposition process wherein a plasma generation chamber is divided from a deposition chamber, radicals are extracted from the plasma generation chamber to the deposition chamber and caused to react with a process gas to form a silicon oxide film. The deposition apparatus has a host controller for dictating a pattern of control of the process gas flow to an MFC provided in a feed part for feeding the process gas into the deposition chamber. The host controller gives the MFC instructions for executing control to, in a first half side time constituting not more than half of the whole film deposition time, first make zero or limit and then gradually increase the process gas flow. The process gas flow in the first half side time can also be limited so that the thickness of film deposited in the first half side time is not greater than 10% of the overall thickness of the silicon oxide film. A silicon-hydrogen compound (SinH2n+2 (n=1, 2, 3, . . . )) is used as the process gas.

Abstract translation: 在其中将等离子体产生室从沉积室分离的膜沉积工艺中，将自由基从等离子体产生室提取到沉积室，并使其与处理气体反应以形成氧化硅膜。 沉积设备具有主机控制器，用于指示处理气体流到控制馈送部分中的MFC的控制模式，用于将处理气体供给到沉积室中。 主机控制器给出用于执行控制的MFC指令，在构成不超过整个成膜时间的一半的前半时间中，首先使零或极限，然后逐渐增加处理气体流量。 前半个时间的处理气体流量也可以被限制，使得在前半个时间内沉积的膜的厚度不大于氧化硅膜的总厚度的10％。 使用硅氢化合物（SinH2n + 2（n = 1,2,3，...））作为处理气体。

公开(公告)号：US06399157B1

公开(公告)日：2002-06-04

申请号：US09562703

申请日：2000-04-28

Applicant: Mark C. Zaretsky

Inventor： Mark C. Zaretsky

IPC: B05D314

CPC classification number: G03C1/74 ,  B05C5/007 ,  B05D3/14 ,  B05D2252/02 ,  G03C2001/7411 ,  G03C2001/7433 ,  G03C2001/7459 ,  Y10S118/04

Abstract: Apparatus and method for depositing controlled short intervals of electrostatic charge on a moving web substrate to be coated, including a mathematical model that estimates the charging performance of the apparatus. The model is constructed via benchtop characterization of the apparatus. The model is implemented in coating production via an algorithm comprising a best-fit equation representing the model predictions over a range of relevant input parameter values such as web speed, web capacitance, and desired web voltage. The apparatus includes an electrical charging apparatus, a power supply for powering the charging apparatus, and a controller programmed with the algorithm for automatically setting and controlling the intensity and duration of the output of the power supply to yield the optimal electrostatic potential on the charging apparatus. In operation, run-specific variables including web type and coating speed are also provided as inputs to the controller. The invention is useful in minimizing coating disturbances at starts and between-roll splices.

Abstract translation: 用于在被涂覆的移动网状基材上沉积控制短的静电电荷间隔的装置和方法，包括估计装置的充电性能的数学模型。 该模型通过该装置的台式表征构建。 该模型通过包括最佳拟合方程的算法来实现，该算法表示在相关输入参数值的范围（例如幅材速度，幅面电容和期望的网络电压）上的模型预测。 该装置包括充电装置，用于为充电装置供电的电源以及用该算法编程的控制器，用于自动设置和控制电源的输出的强度和持续时间以产生充电装置上的最佳静电电位 。 在运行中，运行特定的变量，包括纸张类型和涂布速度也作为输入提供给控制器。 本发明可用于最小化开始和辊间接合处的涂层干扰。

公开(公告)号：US06242051B1

公开(公告)日：2001-06-05

申请号：US09439390

申请日：1999-11-15

Applicant: Mark C. Zaretsky

Inventor： Mark C. Zaretsky

IPC: B05D314

CPC classification number: B05D3/14 ,  B05D1/007

Abstract: A method for electrostatically assisting in coating a liquid composition from a hopper to a web supported by a backing roller, characterized by the steps of a) neutralizing all charges on both surfaces of the web by passing the web through an appropriate electrostatic environment ahead of the coating point, and b) providing a uniform electrostatic field around the backing roller, which field extends through the web to engender an electrostatic “pressure” for urging the liquid composition toward the coatable surface of the substrate at the coating point resulting in an increase in the maximum coating speed achievable without onset of air entrainment at the coating point, improved thickness uniformity of coating, and a reduction in residual charge on the web after coating.

Abstract translation: 一种用于静电辅助将液体组合物从料斗涂覆到由支撑辊支撑的幅材的方法，其特征在于以下步骤：a）通过使所述幅材通过在所述纸幅的适当静电环境之前中和所述幅材的两个表面上的所有电荷 涂覆点，以及b）在支撑辊周围提供均匀的静电场，该场延伸穿过幅材以产生静电“压力”，用于在涂层处将液体组合物推向基材的可涂覆表面，导致增加 在涂层处没有开始引入空气夹带的最大涂布速度，涂层的厚度均匀性得到改善，并且涂布后的幅材上的残余电荷减少。

公开(公告)号：US06190741B1

公开(公告)日：2001-02-20

申请号：US09203654

申请日：1998-12-02

Applicant: Ricardo Miranda

Inventor： Ricardo Miranda

IPC: B05D314

CPC classification number: B32B27/10 ,  B29C47/00 ,  B29C47/0021 ,  B29C47/0038 ,  B29C47/0059 ,  B29C47/0069 ,  B29C47/025 ,  B29C47/065 ,  B29C59/10 ,  B29C2791/001 ,  B29K2023/0633 ,  B32B27/32 ,  B32B37/153 ,  B32B38/0008 ,  B32B38/145 ,  B32B2038/0064 ,  B32B2307/406 ,  B32B2309/04 ,  B32B2310/14 ,  B32B2317/12 ,  B32B2323/04 ,  B32B2323/046 ,  D21H19/22 ,  D21H19/824 ,  D21H23/30 ,  D21H23/46 ,  D21H25/06 ,  D21H27/10

Abstract: A method and apparatus for producing a polyethylene coated paperboard material with a mirror-pocket finish and a predetermined Dyne level is disclosed herein. The apparatus and method utilizes a double corona treatment on a single polyethylene surface to create the material with the predetermined Dyne level. Such paperboard material is often used for fabrication of cups, and the like. The predetermined Dyne level is required for printing requirements. The method and apparatus allow for the production of the predetermined Dyne level material at standard laminator operating speeds.

Abstract translation: 本文公开了一种用于生产具有镜面口袋表面和预定的Dyne水平的聚乙烯涂覆纸板材料的方法和设备。 该设备和方法在单个聚乙烯表面上采用双电晕处理以产生具有预定的Dyne水平的材料。 这种纸板材料通常用于制造杯子等。 打印要求需要预定的Dyne等级。 该方法和装置允许以标准的层压机操作速度生产预定的Dyne级材料。