公开(公告)号：US20150277103A1

公开(公告)日：2015-10-01

申请号：US14242328

申请日：2014-04-01

Applicant: Luzhong Yin ,  Jing Zhao

Inventor： Luzhong Yin ,  Jing Zhao

IPC: G02B26/02

CPC classification number: B81B3/0037 ,  B81B3/0035 ,  B81B2201/045 ,  B81B2203/0118 ,  G02B26/023 ,  H02N2/043

Abstract: The present disclosure provides a displacement amplification structure and a method for controlling displacement. In one aspect, the displacement amplification structure of the present disclosure includes a first beam and a second beam substantially parallel to the first beam, an end of the first beam coupled to a fixture site, and an end of the second beam coupled to a motion actuator; and a motion shutter coupled to an opposing end of the first and second beams. In response to a displacement of the motion actuator along an axis direction of the second beam, the motion shutter displaces a distance along a transversal direction substantially perpendicular to the axis direction.

Abstract translation: 本公开提供了一种位移放大结构和一种用于控制位移的方法。 在一个方面，本公开的位移放大结构包括第一光束和基本上平行于第一光束的第二光束，第一光束的端部耦合到固定位置，第二光束的端部耦合到运动 执行机构 以及耦合到第一和第二光束的相对端的运动快门。 响应于运动致动器沿着第二光束的轴线方向的位移，运动快门沿着基本上垂直于轴线方向的横向方向移位一段距离。

公开(公告)号：US08958138B2

公开(公告)日：2015-02-17

申请号：US13483095

申请日：2012-05-30

Applicant: Hidekazu Nitta ,  Makoto Ohkura ,  Takuo Kaitoh ,  Katsumi Matsumoto

Inventor： Hidekazu Nitta ,  Makoto Ohkura ,  Takuo Kaitoh ,  Katsumi Matsumoto

IPC: G02B26/02 ,  G02B26/08 ,  B81B3/00

CPC classification number: G02B26/085 ,  B81B3/0072 ,  B81B2201/045 ,  B81C2201/0167

Abstract: In a movable shutter-system display device, a movable shutter includes an amorphous silicon film material which has a low residual stress and thus is stable. A display device includes a display panel comprising a first substrate and a second substrate. The display panel includes a plurality of pixels; each of the plurality of pixels includes a movable shutter including amorphous silicon and a driving circuit for driving the movable shutter; and the amorphous silicon included in the movable shutter is formed of at least two amorphous silicon films, and where any two amorphous silicon films adjacent to each other among the at least two amorphous silicon films are a first amorphous silicon film and a second amorphous silicon film stacked on the first amorphous silicon film, the first amorphous silicon film and the second amorphous silicon film have different characteristic values.

Abstract translation: 在可移动快门系统显示装置中，可移动遮板包括具有低残余应力并因此是稳定的非晶硅膜材料。 显示装置包括：显示面板，包括第一基板和第二基板。 显示面板包括多个像素; 所述多个像素中的每一个包括可移动快门，其包括非晶硅和用于驱动所述活动快门的驱动电路; 并且包括在可移动快门中的非晶硅由至少两个非晶硅膜形成，并且其中在所述至少两个非晶硅膜中彼此相邻的两个非晶硅膜是第一非晶硅膜和第二非晶硅膜 堆叠在第一非晶硅膜上，第一非晶硅膜和第二非晶硅膜具有不同的特性值。

公开(公告)号：US20140210864A1

公开(公告)日：2014-07-31

申请号：US13754548

申请日：2013-01-30

Applicant: PIXTRONIX, INC.

Inventor： Javier Villarreal ,  Timothy J. Brosnihan ,  Jasper L. Steyn ,  Richard S. Payne ,  Stephen R. Lewis

IPC: G02B26/02 ,  G09G3/22

CPC classification number: G02B26/02 ,  B81B3/007 ,  B81B2201/045 ,  B81B2203/0163 ,  B81B2203/051 ,  B81C2201/053 ,  B81C2201/112 ,  G02B26/023 ,  G09G3/22

Abstract: This disclosure provides systems, methods and apparatus for providing relatively thinner and less stiff compliant beams for a shutter assembly. A protective coating is deposited and patterned over the shutter assembly before it is released from a sacrificial mold over which the shutter assembly is formed. Because some primary surfaces of the compliant beams are in contact with the sacrificial mold, these primary surfaces are not coated with the protective coating. Therefore, when the shutter assembly is finally released, the resulting compliant beams are relatively thinner and less stiff providing a reduction in an actuation voltage used to operate the shutter assembly. In some instances, the protective coating is patterned into discontinuous segments before release.

Abstract translation: 本公开提供了用于为快门组件提供相对较薄且较不硬的柔性梁的系统，方法和装置。 在从快门组件形成的牺牲模具释放之前，将保护涂层沉积并在其上形成图案。 由于柔性梁的一些主表面与牺牲模具接触，所以这些主表面没有涂覆保护涂层。 因此，当快门组件最终被释放时，所产生的柔性梁相对较薄并且较不硬，从而降低用于操作闸板组件的致动电压。 在一些情况下，保护性涂层在释放之前被图案化成不连续段。

公开(公告)号：US08693083B2

公开(公告)日：2014-04-08

申请号：US13336190

申请日：2011-12-23

Applicant: Osamu Tsuboi ,  Satoshi Ueda ,  Yoshihiro Mizuno ,  Ippei Sawaki ,  Fumio Yamagishi

Inventor： Osamu Tsuboi ,  Satoshi Ueda ,  Yoshihiro Mizuno ,  Ippei Sawaki ,  Fumio Yamagishi

IPC: G02B26/00

CPC classification number: B81C1/00142 ,  B81B3/0078 ,  B81B2201/042 ,  B81B2201/045 ,  B81B2203/0136 ,  B81B2203/0181 ,  B81B2203/058 ,  B81C1/00396 ,  G02B26/0841 ,  Y10S359/904

Abstract: A method is provided for making a micromirror unit which includes a frame, a mirror forming base, and bridges connecting the frame to the mirror forming base. The method includes the following steps. First, a first mask pattern is formed on a substrate for masking portions of the substrate which are processed into the frame and the mirror forming base. Then, a second mask pattern is formed on the substrate for masking portions of the substrate which are processed into the bridges. Then, the substrate is subjected to a first etching process with the first and the second mask patterns present as masking means. Then, the second mask pattern is removed selectively. Then, the substrate is subjected to a second etching process with the first mask pattern present as masking means. Finally, the first mask pattern is removed.

Abstract translation: 提供了一种用于制造微镜单元的方法，该微镜单元包括框架，反射镜形成基座和将框架连接到反射镜形成基座的桥。 该方法包括以下步骤。 首先，在基板上形成第一掩模图案，以掩蔽基板的被加工成框架和反射镜形成基座的部分。 然后，在衬底上形成第二掩模图案，用于掩蔽加工成桥的衬底部分。 然后，以第一和第二掩模图形作为掩模装置对基板进行第一蚀刻处理。 然后，选择性地去除第二掩模图案。 然后，以第一掩模图案作为掩模装置对基板进行第二蚀刻处理。 最后，删除第一个掩模图案。

公开(公告)号：US08472098B2

公开(公告)日：2013-06-25

申请号：US12877053

申请日：2010-09-07

Applicant: Chialun Tsai ,  Jeffrey F. DeNatale

Inventor： Chialun Tsai ,  Jeffrey F. DeNatale

IPC: G02B26/08

CPC classification number: G02B26/105 ,  B81B2201/045 ,  B81C1/00142 ,  B81C2201/019 ,  G02B26/0841 ,  Y10S359/90

Abstract: A wafer-level manufacturing method produces stress compensated x-y gimbaled comb-driven MEMS mirror arrays using two SOI wafers and a single carrier wafer. MEMS structures such as comb drives, springs, and optical surfaces are formed by processing front substrate layer surfaces of the SOI wafers, bonding together the processed surfaces, and removing the unprocessed SOI layers to expose second surfaces of the front substrate layers for further wafer-level processing. The bonded SOI wafers are mounted to a surface of the carrier wafer that has been separately processed. Processing wafer surfaces may include formation of a stress compensation layer to counteract physical effects of MEMS mirrors. The method may form multi-layered conductive spring structures for the mirrors, each spring having a first conducting layer for energizing a comb drive, a second conducting layer imparting a restoring force, and an insulating layer between the first and second conducting layers.

Abstract translation: 晶片级制造方法使用两个SOI晶片和单载体晶片产生应力补偿的x-y万向节梳状驱动的MEMS反射镜阵列。 MEMS结构如梳形驱动器，弹簧和光学表面是通过处理SOI晶片的前衬底层表面，将经处理的表面结合在一起并去除未加工的SOI层以暴露前衬底层的第二表面以形成另外的晶片 - 级处理。 结合的SOI晶片被安装到已经分开处理的载体晶片的表面上。 处理晶片表面可以包括形成应力补偿层以抵消MEMS反射镜的物理效应。 该方法可以形成用于反射镜的多层导电弹簧结构，每个弹簧具有用于激励梳状驱动器的第一导电层，赋予恢复力的第二导电层以及第一和第二导电层之间的绝缘层。

公开(公告)号：US08462410B2

公开(公告)日：2013-06-11

申请号：US13412504

申请日：2012-03-05

Applicant: Fusao Shimokawa ,  Shingo Uchiyama ,  Johji Yamaguchi ,  Makoto Sato ,  Kunihiko Sasakura ,  Hirofumi Morita ,  Shuichiro Inagaki ,  Katsuyuki Machida ,  Hiromu Ishii ,  Makoto Murakami

Inventor： Fusao Shimokawa ,  Shingo Uchiyama ,  Johji Yamaguchi ,  Makoto Sato ,  Kunihiko Sasakura ,  Hirofumi Morita ,  Shuichiro Inagaki ,  Katsuyuki Machida ,  Hiromu Ishii ,  Makoto Murakami

IPC: G02B26/08

CPC classification number: B81B3/004 ,  B81B3/0086 ,  B81B2201/045 ,  B81B2203/058 ,  G02B6/3518 ,  G02B6/3556 ,  G02B6/3584 ,  G02B26/0841 ,  Y10T29/49885 ,  Y10T156/10

Abstract: A mirror device includes a mirror (153) which is supported to be pivotable with respect to a mirror substrate (151), a driving electrode (103-1-103-4) which is formed on an electrode substrate (101) facing the mirror substrate, and an antistatic structure (106) which is arranged in a space between the mirror and the electrode substrate. This structure can fix the potential of the lower surface of the mirror and suppress drift of the mirror by applying a second potential to the antistatic structure.

公开(公告)号：US08353600B1

公开(公告)日：2013-01-15

申请号：US12822180

申请日：2010-06-23

Applicant: Yee-Chung Fu

Inventor： Yee-Chung Fu

IPC: G02B5/08

CPC classification number: G02B6/3518 ,  B81B3/0021 ,  B81B2201/033 ,  B81B2201/045 ,  G02B6/357 ,  G02B26/0833 ,  G02B26/101

Abstract: A micro-electro-mechanical system (MEMS) actuator assembly includes a mirror and four actuators. Each actuator includes a lever pivotable about a fulcrum axis. The inner end of each lever is coupled to one side of the mirror. Force is applied to one outer end of the levers to move one side of the mirror, which positions the mirror in one of four positions. Force is applied to two outer ends of the levers to move two sides of the mirror, which positions the mirror in one of four additional positions.

Abstract translation: 微机电系统（MEMS）致动器组件包括反射镜和四个致动器。 每个致动器包括可围绕支点轴线枢转的杆。 每个杠杆的内端连接到镜子的一侧。 将力施加到杆的一个外端以移动镜的一侧，其将镜定位在四个位置之一中。 将力施加到杠杆的两个外端以移动镜的两侧，其将镜定位在四个附加位置之一中。

公开(公告)号：US20120307334A1

公开(公告)日：2012-12-06

申请号：US13483095

申请日：2012-05-30

Applicant: Hidekazu NITTA ,  Makoto Ohkura ,  Takuo Kaitoh ,  Katsumi Matsumoto

Inventor： Hidekazu NITTA ,  Makoto Ohkura ,  Takuo Kaitoh ,  Katsumi Matsumoto

IPC: G02B26/02 ,  H01L33/08

CPC classification number: G02B26/085 ,  B81B3/0072 ,  B81B2201/045 ,  B81C2201/0167

Abstract: In a movable shutter-system display device, a movable shutter includes an amorphous silicon film material which has a low residual stress and thus is stable. A display device includes a display panel comprising a first substrate and a second substrate. The display panel includes a plurality of pixels; each of the plurality of pixels includes a movable shutter including amorphous silicon and a driving circuit for driving the movable shutter; and the amorphous silicon included in the movable shutter is formed of at least two amorphous silicon films, and where any two amorphous silicon films adjacent to each other among the at least two amorphous silicon films are a first amorphous silicon film and a second amorphous silicon film stacked on the first amorphous silicon film, the first amorphous silicon film and the second amorphous silicon film have different characteristic values.

Abstract translation: 在可移动快门系统显示装置中，可移动遮板包括具有低残余应力并因此是稳定的非晶硅膜材料。 显示装置包括：显示面板，包括第一基板和第二基板。 显示面板包括多个像素; 所述多个像素中的每一个包括可移动快门，其包括非晶硅和用于驱动所述活动快门的驱动电路; 并且包括在可移动快门中的非晶硅由至少两个非晶硅膜形成，并且其中在至少两个非晶硅膜中彼此相邻的两个非晶硅膜是第一非晶硅膜和第二非晶硅膜 堆叠在第一非晶硅膜上，第一非晶硅膜和第二非晶硅膜具有不同的特性值。

公开(公告)号：US20120162736A1

公开(公告)日：2012-06-28

申请号：US13412510

申请日：2012-03-05

Applicant: Shingo UCHIYAMA ,  Johji YAMAGUCHI ,  Makoto SATO ,  Kunihiko SASAKURA ,  Hirofumi MORITA ,  Shuichiro INAGAKI ,  Katsuyuki MACHIDA ,  Hiromu ISHII ,  Makoto MURAKAMI

Inventor： Shingo UCHIYAMA ,  Johji YAMAGUCHI ,  Makoto SATO ,  Kunihiko SASAKURA ,  Hirofumi MORITA ,  Shuichiro INAGAKI ,  Katsuyuki MACHIDA ,  Hiromu ISHII ,  Makoto MURAKAMI

IPC: G02B26/08

CPC classification number: B81B3/004 ,  B81B3/0086 ,  B81B2201/045 ,  B81B2203/058 ,  G02B6/3518 ,  G02B6/3556 ,  G02B6/3584 ,  G02B26/0841 ,  Y10T29/49885 ,  Y10T156/10

Abstract: A mirror device includes a mirror (153) which is supported to be pivotable with respect to a mirror substrate (151), a driving electrode (103-1-103-4) which is formed on an electrode substrate (101) facing the mirror substrate, and an antistatic structure (106) which is arranged in a space between the mirror and the electrode substrate. This structure can fix the potential of the lower surface of the mirror and suppress drift of the mirror by applying a second potential to the antistatic structure.

公开(公告)号：US20120105936A1

公开(公告)日：2012-05-03

申请号：US13336190

申请日：2011-12-23

Applicant: Osamu Tsuboi ,  Satoshi Ueda ,  Yoshihiro Mizuno ,  Ippei Sawaki ,  Fumio Yamagishi

Inventor： Osamu Tsuboi ,  Satoshi Ueda ,  Yoshihiro Mizuno ,  Ippei Sawaki ,  Fumio Yamagishi

IPC: G02B26/00

CPC classification number: B81C1/00142 ,  B81B3/0078 ,  B81B2201/042 ,  B81B2201/045 ,  B81B2203/0136 ,  B81B2203/0181 ,  B81B2203/058 ,  B81C1/00396 ,  G02B26/0841 ,  Y10S359/904

Abstract: A method is provided for making a micromirror unit which includes a frame, a mirror forming base, and bridges connecting the frame to the mirror forming base. The method includes the following steps. First, a first mask pattern is formed on a substrate for masking portions of the substrate which are processed into the frame and the mirror forming base. Then, a second mask pattern is formed on the substrate for masking portions of the substrate which are processed into the bridges. Then, the substrate is subjected to a first etching process with the first and the second mask patterns present as masking means. Then, the second mask pattern is removed selectively. Then, the substrate is subjected to a second etching process with the first mask pattern present as masking means. Finally, the first mask pattern is removed.

Abstract translation: 提供了一种用于制造微镜单元的方法，该微镜单元包括框架，反射镜形成基座和将框架连接到反射镜形成基座的桥。 该方法包括以下步骤。 首先，在基板上形成第一掩模图案，以掩蔽基板的被加工成框架和反射镜形成基座的部分。 然后，在衬底上形成第二掩模图案，用于掩蔽加工成桥的衬底部分。 然后，以第一和第二掩模图形作为掩模装置对基板进行第一蚀刻处理。 然后，选择性地去除第二掩模图案。 然后，以第一掩模图案作为掩模装置对基板进行第二蚀刻处理。 最后，删除第一个掩模图案。