Abstract:
An overvoltage protection device capable of protecting a power supply line and including in parallel a break-over diode, a controlled switch, and a circuit for controlling the switch.
Abstract:
A circuit for controlling a capacitor having a capacitance settable by biasing, including at least one terminal for receiving a digital set point value depending on the value desired for the capacitance, a circuit for determining a drift of the capacitance with respect to a nominal value, and a circuit of application of a correction to said digital set point value, depending on the determined drift.
Abstract:
A vertical power component includes a silicon substrate of a first conductivity type with a well of the second conductivity type on a lower surface of the substrate. The first well is bordered at a component periphery with an insulating porous silicon ring. An upper surface of the porous silicon ring is only in contact with the substrate of the first conductivity type. The insulating porous silicon ring penetrates into the substrate down to a depth greater than a thickness of the well.
Abstract:
An overvoltage protection device capable of protecting a power supply line and including in parallel a break-over diode, a controlled switch, and a circuit for controlling the switch.
Abstract:
A coupling circuit, including: a coupler including a first conductive line and a second conductive line coupled to the first one; at each end of the second line of the coupler, a two-output signal splitter; and at each output of each splitter, a filtering function.
Abstract:
A method for encapsulating electronic components, including the steps of: forming, in a first surface of a semiconductor wafer, electronic components; forming, on the first surface, an interconnection stack including conductive tracks and vias separated by an insulating material; forming first and second bonding pads on the interconnection stack; thinning down the wafer, except at least on its contour; filling the thinned-down region with a first resin layer; arranging at least one first chip on the first bonding pads and forming solder bumps on the second bonding pads; depositing a second resin layer covering the first chips and partially covering the solder bumps; bonding an adhesive strip on the first resin layer; and scribing the structure into individual chips.
Abstract:
A method for manufacturing semiconductor chips from a semiconductor wafer, including the steps of: fastening, on a first support frame, a second support frame having outer dimensions smaller than the outer dimensions of the first frame and greater than the inner dimensions of the first frame; arranging the wafer on a surface of a film stretched on the second frame; carrying out wafer processing operations by using equipment capable of receiving the first frame; separating the second frame from the first frame and removing the first frame; and carrying out wafer processing operations by using equipment capable of receiving the second frame.
Abstract:
An object containing electronic circuits and a rechargeable cell, wherein the cell is arranged close to a surface of the object, a charge coil being shiftable with respect to the cell between an operating position where it is arranged around the cell and a recharge position where it is axially offset with respect to the cell.
Abstract:
The disclosure concerns a method for etching a PVD deposited barium strontium titanate layer, wherein a non-ionic surfactant at a concentration between 0.1 and 1 percent is added to an acid etching solution.
Abstract:
A surface mount chip including, on the side of a surface, first and second pads of connection to an external device, wherein, in top view, the first pad has an elongated general shape, and the second pad is a point-shaped pad which is not aligned with the first pad.