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21.发明授权公开(公告)号：US08152511B2
公开(公告)日：2012-04-10
申请号：US12404024
申请日：2009-03-13
申请人： Frank Y. Xu , Michael N. Miller
发明人： Frank Y. Xu , Michael N. Miller
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography mold assembly includes a mold having a surface, a substrate having a surface, and a polymerizable composition disposed between the surface of the mold and the surface of the substrate. The polymerizable composition includes a bulk material and a non-ionic surfactant having a first end and a second end. The first end of the non-ionic surfactant has an affinity for the bulk material, and the second end of the non-ionic surfactant is fluorinated.
摘要翻译： 压印光刻模具组件包括具有表面的模具，具有表面的基底和设置在模具表面和基底表面之间的可聚合组合物。 可聚合组合物包括本体材料和具有第一端和第二端的非离子表面活性剂。 非离子表面活性剂的第一端对本体材料具有亲和性，非离子表面活性剂的第二端被氟化。
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公开(公告)号：US08147731B2
公开(公告)日：2012-04-03
申请号：US12906742
申请日：2010-10-18
IPC分类号： G01B11/26
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/7049 , G03F9/7088
摘要： Methods described include placing a sensor system over a substrate positioned on a chuck. The sensor system generates a beam of optical energy towards the substrate and is configured to receive optical energy deflected from the substrate. The sensor system generates sensor signals in response to variations in received optical energy from the substrate and the chuck.
摘要翻译： 所描述的方法包括将传感器系统放置在位于卡盘上的基板上。 传感器系统向衬底产生光能束，并被配置为接收从衬底偏转的光能。 传感器系统响应于从基板和卡盘接收的光能的变化产生传感器信号。
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公开(公告)号：US08142704B2
公开(公告)日：2012-03-27
申请号：US12575907
申请日：2009-10-08
申请人： Liang Wang , Yeong-jun Choi , Byung-Jin Choi
发明人： Liang Wang , Yeong-jun Choi , Byung-Jin Choi
IPC分类号： B29C59/00
CPC分类号： B29C33/424 , B29C43/003 , B29C43/021 , B29C43/58 , B29C2043/025 , B29C2043/142 , B29C2043/5825 , B29C2043/5833 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A loading unit, surface scanning module, and an imprint module may be integrated into a single tool. Template may be loaded on loading unit and positioned within imprint module. Substrate may then be loaded on loading unit and scanned defects using surface scanning module. If substrate passes inspection by surface scanning module, substrate may be positioned imprint module where formable material may be dispensed thereon and imprinted. The imprinted substrate may then be unloaded from imprinting module.
摘要翻译： 加载单元，表面扫描模块和压印模块可以集成到单个工具中。 模板可以装载在装载单元上，并位于压印模块内。 然后可以使用表面扫描模块将基板加载到加载单元上并扫描缺陷。 如果基板通过表面扫描模块进行检查，则基板可以被定位成压印模块，其中可分配的材料可以分配在其上并被印刷。 然后可以从压印模块卸载压印的基板。
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公开(公告)号：US08142702B2
公开(公告)日：2012-03-27
申请号：US12139911
申请日：2008-06-16
申请人： Weijun Liu , Frank Y. Xu , Edward Brian Fletcher
发明人： Weijun Liu , Frank Y. Xu , Edward Brian Fletcher
IPC分类号： B29C59/00 , H01L21/027
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A solid layer is formed by applying a multiplicity of discrete portions of a fluid composition onto a surface of an imprint lithography substrate, and allowing the discrete portions of the composition to spontaneously spread on the surface of the substrate to form a substantially continuous layer. The composition includes a solvent and a solid or a solvent and a polymerizable material. The composition can be a solution or a dispersion. At least some of the solvent is evaporated from the composition, and a solid layer is formed (e.g., polymerized or dried) on the substrate. The solid layer is substantially free of interstitial voids.
摘要翻译： 通过将多个离散部分的流体组合物施加到压印光刻基板的表面上并使组合物的离散部分自发地扩散在基板的表面上以形成基本上连续的层而形成固体层。 该组合物包括溶剂和固体或溶剂以及可聚合材料。 组合物可以是溶液或分散体。 至少一些溶剂从组合物中蒸发，并在基材上形成固体层（例如聚合或干燥）。 固体层基本上不含间隙。
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公开(公告)号：US08109753B2
公开(公告)日：2012-02-07
申请号：US12684538
申请日：2010-01-08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10S977/887
摘要： A nano-imprint lithography system is described for patterning first and second substrates, the system includes a translation stage constructed to alternatively place substrate chucks in position with respect to a nano-imprint mold assembly such that the nano-imprint mold assembly may imprint a pattern on one of the substrates, while concurrently obtaining a desired spatial relationship for the remaining substrate.
摘要翻译： 描述了用于图案化第一和第二基板的纳米压印光刻系统，该系统包括平移台，该平台被构造成交替地将基板卡盘相对于纳米压印模具组件放置在适当位置，使得纳米压印模具组件可以压印图案 在一个基板上，同时获得剩余基板的期望的空间关系。
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公开(公告)号：US20120006703A1
公开(公告)日：2012-01-12
申请号：US13178268
申请日：2011-07-07
CPC分类号： G01N21/94 , G01N21/00 , G01N21/47 , G01N21/956 , Y10S977/887
摘要： Detection of periodically repeating nanovoids is indicative of levels of substrate contamination and may aid in reduction of contaminants on substrates. Systems and methods for detecting nanovoids, in addition to, systems and methods for cleaning and/or maintaining cleanliness of substrates are described.
摘要翻译： 周期性重复的纳米种类的检测指示底物污染的水平，并且有助于减少底物上的污染物。 描述了用于检测纳米空间的系统和方法，以及用于清洁和/或维持基板清洁的系统和方法。
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公开(公告)号：US08057725B2
公开(公告)日：2011-11-15
申请号：US13028336
申请日：2011-02-16
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , C23F1/08
摘要： The present invention provides a method for patterning a substrate with a template having a mold that features positioning conformable material between the substrate and the mold and filling a volume defined between the mold and the substrate with the conformable material through capillary action between the conformable material and one of the mold and the substrate. Thereafter, the conformable material is solidified. Specifically, the distance between the mold and the substrate is controlled to a sufficient degree to attenuate, if not avoid, compressive forces between the mold and the substrate. As a result, upon initial contact of the mold with the conformable material, capillary filling of the volume between the mold and the substrate occurs.
摘要翻译： 本发明提供了一种用模板图案化模板的方法，该模板具有在基板和模具之间具有定位适形材料的模具，并且通过适形材料之间的毛细管作用在适形材料之间填充限定在模具和基板之间的体积， 模具和基材之一。 此后，使适形材料固化。 具体地说，模具和基板之间的距离被控制到足够的程度以减小模具和基板之间的压缩力（如果不是避免的话）。 结果，当模具与适形材料初次接触时，发生模具和基板之间的体积的毛细管填充。
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公开(公告)号：US08021594B2
公开(公告)日：2011-09-20
申请号：US12488642
申请日：2009-06-22
申请人： Steven C. Shackleton , Pankaj B. Lad , Ian Matthew McMackin , Frank Y. Xu , Sidlgata V. Sreenivasan
发明人： Steven C. Shackleton , Pankaj B. Lad , Ian Matthew McMackin , Frank Y. Xu , Sidlgata V. Sreenivasan
CPC分类号： G03F7/0002 , B29C43/003 , B29C43/021 , B29C43/34 , B29C2043/025 , B29C2043/142 , B29C2043/3438 , B29K2105/0002 , B82Y10/00 , B82Y40/00
摘要： A method/process for curing imprint on a template prior to contact with a substrate. A curing process is used to adhere the imprint to a wafer or substrate. Monomer is deposited on a template and then partially cured using a UV exposure. The exposure is controlled so that the imprint is cured past the gel point, but still retains a thin liquid layer of uncured monomer at the surface that will bond with the wafer. Further, this partially cured layer enables the alignment adjustments between the template and the substrate to be performed after contact between the two without pulling any monomer out of the features.
摘要翻译： 在与基底接触之前在模板上固化印模的方法/方法。 使用固化过程将印记粘附到晶片或基板上。 将单体沉积在模板上，然后使用UV曝光部分固化。 控制曝光使得印迹经过凝胶点固化，但仍然保留在将与晶片结合的表面上的未固化单体的薄液体层。 此外，这种部分固化的层使得能够在两者之间接触之后进行模板和基板之间的对准调整，而不将任何单体拉出特征。
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公开(公告)号：US20110221095A1
公开(公告)日：2011-09-15
申请号：US13108614
申请日：2011-05-16
申请人： Sidlgata V. Sreenivasan , Byung J. Choi , Norman E. Schumaker , Ronald D. Voisin , Michael P. C. Watts , Mario J. Meissl
发明人： Sidlgata V. Sreenivasan , Byung J. Choi , Norman E. Schumaker , Ronald D. Voisin , Michael P. C. Watts , Mario J. Meissl
CPC分类号： B81C1/0046 , B82Y10/00 , B82Y30/00 , B82Y40/00 , G03F7/0002
摘要： The present invention is directed to methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. In one embodiment, the imprint process is designed to imprint only a portion of the substrate. The remainder of the substrate is imprinted by moving the template to a different portion of the template and repeating the imprint lithography process.
摘要翻译： 本发明涉及通过压印光刻图案化衬底的方法。 压印光刻是将液体分配到基板上的过程。 使模板与液体接触并且液体被固化。 固化液体包括在模板中形成的任何图案的印记。 在一个实施例中，压印工艺被设计成仅印刷基板的一部分。 通过将模板移动到模板的不同部分并重复压印光刻工艺来印刷衬底的其余部分。
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公开(公告)号：US08012395B2
公开(公告)日：2011-09-06
申请号：US12464487
申请日：2009-05-12
申请人： Kosta S. Selinidis , Byung-Jin Choi , Gerard M. Schmid , Ecron D. Thompson , Ian Matthew McMackin
发明人： Kosta S. Selinidis , Byung-Jin Choi , Gerard M. Schmid , Ecron D. Thompson , Ian Matthew McMackin
IPC分类号： B28B11/08
CPC分类号： G03F9/7042 , B82Y10/00 , B82Y20/00 , B82Y40/00 , G02B5/1838 , G03F7/0002 , G03F9/7076 , G03F9/708 , G03F9/7084
摘要： Imprint lithography substrates may include alignment marks formed of high contrast material. Exemplary methods for forming alignment marks having high contrast material are described.
摘要翻译： 压印光刻基板可以包括由高对比度材料形成的对准标记。 描述用于形成具有高对比度材料的对准标记的示例性方法。
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