公开(公告)号：US07231016B2

公开(公告)日：2007-06-12

申请号：US11396719

申请日：2006-04-04

Applicant: David Berman ,  Isaac Mazor ,  Boris Yokhin ,  Amos Gvirtzman

Inventor： David Berman ,  Isaac Mazor ,  Boris Yokhin ,  Amos Gvirtzman

IPC: G01N23/20

CPC classification number: G01N23/203 ,  G01B15/02

Abstract: A method for inspection of a sample having a surface layer. The method includes acquiring a first reflectance spectrum of the sample while irradiating the sample with a collimated beam of X-rays, and processing the first reflectance spectrum to measure a diffuse reflection property of the sample. A second reflectance spectrum of the sample is acquired while irradiating the sample with a converging beam of the X-rays. The second reflectance spectrum is analyzed using the diffuse reflection property so as to determine a characteristic of the surface layer of the sample.

Abstract translation: 一种用于检查具有表面层的样品的方法。 该方法包括在准直的X射线束照射样品时获取样品的第一反射光谱，并且处理第一反射光谱以测量样品的漫反射特性。 在用X射线的会聚束照射样品的同时获取样品的第二反射光谱。 使用漫反射特性分析第二反射光谱，以确定样品的表面层的特性。

公开(公告)号：US20060133570A1

公开(公告)日：2006-06-22

申请号：US11018352

申请日：2004-12-22

Applicant: Isaac Mazor ,  Boris Yokhin

Inventor： Isaac Mazor ,  Boris Yokhin

IPC: G01N23/20

CPC classification number: G01N23/20

Abstract: A method for X-ray analysis of a sample includes directing a beam of X-rays to impinge on an area of a periodic feature on a surface of the sample and receiving the X-rays scattered from the surface in a reflection mode so as to detect a spectrum of diffraction in the scattered X-rays as a function of azimuth. The spectrum of diffraction is analyzed in order to determine a dimension of the feature.

公开(公告)号：US06947520B2

公开(公告)日：2005-09-20

申请号：US10313280

申请日：2002-12-06

Applicant: Boris Yokhin ,  Isaac Mazor ,  David Berman

Inventor： Boris Yokhin ,  Isaac Mazor ,  David Berman

IPC: G01B15/00 ,  G01B15/08 ,  G01N23/20 ,  G01N23/201

CPC classification number: G01B15/00 ,  G01N23/20

Abstract: A method for testing a surface of a sample includes irradiating the surface at a grazing incidence with a beam of radiation having a focal region, whereby the radiation is reflected from the surface. At least one of the focal region and the sample is adjusted through a plurality of adjustment stages within an adjustment range so as to vary a location of the focal region relative to the surface. Respective angular profiles of the radiation reflected from the surface are measured at the plurality of adjustment stages, and the angular profiles are compared in order to select an adjustment within the range at which the surface is in a desired alignment with the beam.

Abstract translation: 用于测试样品表面的方法包括用具有聚焦区域的辐射束以掠入射照射表面，由此辐射从表面反射。 焦点区域和样本中的至少一个通过调整范围内的多个调节台进行调节，以便改变聚焦区域相对于表面的位置。 在多个调整阶段测量从表面反射的辐射的各个角度分布，并且比较角剖面，以便在表面与光束所期望的对准的范围内选择调节。

公开(公告)号：US06680996B2

公开(公告)日：2004-01-20

申请号：US10078640

申请日：2002-02-19

Applicant: Boris Yokhin ,  Isaac Mazor ,  Amos Gvirtzman

Inventor： Boris Yokhin ,  Isaac Mazor ,  Amos Gvirtzman

IPC: G01N2320

CPC classification number: G01N23/20

Abstract: A method for testing a surface includes finding respective first and second critical angles for total external reflection of radiation from an area of the surface at first and second wavelengths. The first and second critical angles are compared to determine an orientation of a tangent to the surface in the area.

Abstract translation: 用于测试表面的方法包括：在第一和第二波长处，从表面的区域发现用于辐射的全部外部反射的相应的第一和第二临界角。 比较第一和第二临界角以确定该区域中与表面相切的取向。

公开(公告)号：US06556652B1

公开(公告)日：2003-04-29

申请号：US09635212

申请日：2000-08-09

Applicant: Isaac Mazor ,  Boris Yokhin ,  Amos Gvirtzman

Inventor： Isaac Mazor ,  Boris Yokhin ,  Amos Gvirtzman

IPC: G01N23201

CPC classification number: G01B15/00 ,  G01N23/201

Abstract: A method for measurement of critical dimensions includes irradiating a surface of a substrate with a beam of X-rays. A pattern of the X-rays scattered from the surface due to features formed on the surface is detected and analyzed to measure a dimension of the features in a direction parallel to the surface.

Abstract translation: 用于测量临界尺寸的方法包括用X射线照射衬底的表面。 检测并分析由于表面上形成的特征而从表面散射的X射线的图案，以测量特征在平行于表面的方向上的尺寸。

公开(公告)号：US5740953A

公开(公告)日：1998-04-21

申请号：US193188

申请日：1994-05-17

Applicant: Colin Smith ,  Kalman Kaufman ,  Isaac Mazor ,  Elik Chen ,  Dan Vilenski

Inventor： Colin Smith ,  Kalman Kaufman ,  Isaac Mazor ,  Elik Chen ,  Dan Vilenski

IPC: H01L21/66 ,  B28D5/00 ,  H01L21/301 ,  B26F3/00

CPC classification number: B28D5/0094 ,  B28D5/0005 ,  B28D5/0023 ,  B28D5/0064 ,  Y10T225/10 ,  Y10T225/12

Abstract: A method and apparatus are described for cleaving a relatively thin semiconductor wafer for inspecting a target feature on a workface thereof by: producing, on a first lateral face of the semiconductor wafer, laterally of the workface on one side of the target feature, an indentation in alignment with the target feature; and inducing by impact, in a second lateral face of the semiconductor wafer, laterally of the workface on the opposite side of the target feature, a shock wave substantially in alignment with the target feature and the indentation on the first lateral face, to split the semiconductor wafer along a cleavage plane essentially coinciding with the target feature and the indentation.

Abstract translation: PCT No.PCT / EP92 / 01867 Sec。 371日期：1994年5月17日 102（e）日期1994年5月17日PCT提交1992年8月14日PCT公布。 公开号WO93 / 04497 日期1993年3月4日描述了一种方法和装置，用于通过以下步骤来切割用于检查其工作面上的目标特征的相对薄的半导体晶片：在半导体晶片的第一侧面上，在 目标特征，与目标特征对齐的缩进; 并且通过冲击在所述半导体晶片的第二侧面中在所述目标特征的相对侧上的所述工作面的横向上引入基本上与所述目标特征和所述第一侧面上的所述凹陷对准的冲击波， 半导体晶片沿着解理平面基本上与目标特征和凹陷重合。

公开(公告)号：US08565379B2

公开(公告)日：2013-10-22

申请号：US13419497

申请日：2012-03-14

Applicant: Isaac Mazor ,  Matthew Wormington ,  Ayelet Dag ,  Bagrat Khachatryan

Inventor： Isaac Mazor ,  Matthew Wormington ,  Ayelet Dag ,  Bagrat Khachatryan

IPC: G01N23/201

CPC classification number: G01N23/201 ,  G01N21/211 ,  G01N21/274 ,  G01N21/33 ,  G01N21/8422 ,  G01N21/94 ,  G01N21/9501 ,  G01N2021/8438 ,  G01N2223/1006 ,  G01N2223/61

Abstract: Apparatus for inspection of a sample includes an X-ray source, which is configured to irradiate a location on the sample with a beam of X-rays. An X-ray detector is configured to receive the X-rays that are scattered from the sample and to output a first signal indicative of the received X-rays. A VUV source is configured to irradiate the location on the sample with a beam of VUV radiation. A VUV detector is configured to receive the VUV radiation that is reflected from the sample and to output a second signal indicative of the received VUV radiation. A processor is configured to process the first and second signals in order to measure a property of the sample.

Abstract translation: 用于检查样品的装置包括X射线源，其被配置为用X射线照射样品上的位置。 X射线检测器被配置为接收从样本散射的X射线并输出指示所接收的X射线的第一信号。 VUV源配置为用VUV辐射束照射样品上的位置。 VUV检测器被配置为接收从样本反射的VUV辐射并输出指示所接收的VUV辐射的第二信号。 处理器被配置为处理第一和第二信号以便测量样品的性质。

公开(公告)号：US07653174B2

公开(公告)日：2010-01-26

申请号：US12003215

申请日：2007-12-20

Applicant: Isaac Mazor ,  David Berman ,  Boris Yokhin ,  Alexander Tokar

Inventor： Isaac Mazor ,  David Berman ,  Boris Yokhin ,  Alexander Tokar

IPC: G01N23/223

CPC classification number: G01N23/223 ,  G01N2223/076

Abstract: A method for inspection includes irradiating a sample using an X-ray beam, which is focused so as to define a spot on a surface of the sample. At least one of the sample and the X-ray beam is shifted so as to scan the spot along a scan path that crosses a feature on the surface. Respective intensities of X-ray fluorescence emitted from the sample responsively to the X-ray beam are measured at a plurality of locations along the scan path, at which the spot has different, respective degrees of overlap with the feature. The intensities measured at the plurality of the locations are processed in order to compute an adjusted value of the emitted X-ray fluorescence over the scan path. A thickness of the feature is estimated based on the adjusted value.

Abstract translation: 一种检查方法包括：使用聚焦的X射线束照射样品，以便在样品的表面上限定斑点。 样本和X射线束中的至少一个被移动，以沿着与表面上的特征交叉的扫描路径扫描斑点。 在沿着扫描路径的多个位置处测量从样品响应于X射线束发射的X射线荧光的相应强度，其中斑点与特征具有不同的重叠程度。 处理在多个位置处测量的强度，以便计算扫描路径上发射的X射线荧光的调整值。 基于调整值估计特征的厚度。

公开(公告)号：US20090074141A1

公开(公告)日：2009-03-19

申请号：US12232259

申请日：2008-09-12

Applicant: Isaac Mazor ,  Alex Dikopoltsev ,  Boris Yokhin ,  Dileep Agnihotri ,  Tzachi Rafaeli ,  Alex Tokar ,  David Berman ,  Moshe Beylin

Inventor： Isaac Mazor ,  Alex Dikopoltsev ,  Boris Yokhin ,  Dileep Agnihotri ,  Tzachi Rafaeli ,  Alex Tokar ,  David Berman ,  Moshe Beylin

IPC: G01N23/201 ,  H01L21/02 ,  B05C11/00

CPC classification number: G01N23/201 ,  G01N2223/052

Abstract: A computer-implemented method for inspection of a sample includes defining a plurality of locations on a surface of the sample, irradiating the surface at each of the locations with a beam of X-rays, and measuring an angular distribution of the X-rays that are emitted from the surface responsively to the beam, so as to produce a respective plurality of X-ray spectra. The X-ray spectra are analyzed to produce respective figures-of-merit indicative of a measurement quality of the X-ray spectra at the respective locations. One or more locations are selected out of the plurality of locations responsively to the figures-of-merit, and a property of the sample is estimated using the X-ray spectra measured at the selected locations.

Abstract translation: 用于检查样品的计算机实现的方法包括在样品的表面上限定多个位置，用X射线照射每个位置处的表面，并测量X射线的角度分布， 响应于光束从表面发射，以产生相应的多个X射线光谱。 分析X射线光谱以产生各自的相应的品质指数，表示在各个位置处的X射线光谱的测量质量。 响应于品质因数从多个位置中选择一个或多个位置，并且使用在所选择的位置处测量的X射线光谱来估计样品的性质。

公开(公告)号：US20080159475A1

公开(公告)日：2008-07-03

申请号：US12003215

申请日：2007-12-20

Applicant: Isaac Mazor ,  David Berman ,  Boris Yokhin ,  Alexander Tokar

Inventor： Isaac Mazor ,  David Berman ,  Boris Yokhin ,  Alexander Tokar

IPC: G01N23/223

CPC classification number: G01N23/223 ,  G01N2223/076

Abstract: A method for inspection includes irradiating a sample using an X-ray beam, which is focused so as to define a spot on a surface of the sample. At least one of the sample and the X-ray beam is shifted so as to scan the spot along a scan path that crosses a feature on the surface. Respective intensities of X-ray fluorescence emitted from the sample responsively to the X-ray beam are measured at a plurality of locations along the scan path, at which the spot has different, respective degrees of overlap with the feature. The intensities measured at the plurality of the locations are processed in order to compute an adjusted value of the emitted X-ray fluorescence over the scan path. A thickness of the feature is estimated based on the adjusted value.

Abstract translation: 一种检查方法包括：使用聚焦的X射线束照射样品，以便在样品的表面上限定斑点。 样本和X射线束中的至少一个被移动，以沿着与表面上的特征交叉的扫描路径扫描斑点。 在沿着扫描路径的多个位置处测量从样品响应于X射线束发射的X射线荧光的相应强度，其中斑点与特征具有不同的重叠程度。 处理在多个位置处测量的强度，以便计算扫描路径上发射的X射线荧光的调整值。 基于调整值估计特征的厚度。