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    ACOUSTIC SENSOR AND FABRICATION METHOD THEREOF
    23.
    发明申请
    ACOUSTIC SENSOR AND FABRICATION METHOD THEREOF 有权
    声学传感器及其制造方法

    公开(公告)号：US20130100779A1

    公开(公告)日：2013-04-25

    申请号：US13557108

    申请日：2012-07-24

    Applicant: Jae Woo LEE ,  Chang Han Je ,  Woo Seok Yang ,  Jong Dae Kim

    Inventor： Jae Woo LEE ,  Chang Han Je ,  Woo Seok Yang ,  Jong Dae Kim

    IPC: H04R17/00 ,  H04R31/00

    CPC classification number: H04R19/005 ,  H01L2224/48091 ,  H01L2224/48137 ,  H01L2924/15151 ,  H04R19/04 ,  H04R31/00 ,  Y10T29/49005 ,  H01L2924/00014

    Abstract: A method for fabricating an acoustic sensor according to an exemplary embodiment of the present disclosure includes: forming an acoustic sensor unit by forming a lower electrode on an upper portion of a substrate, forming etching holes on the lower electrode, forming a sacrifice layer on an upper portion of the lower electrode, and coupling a diaphragm to an upper portion of the sacrifice layer; coupling a lower portion of the substrate of the acoustic sensor unit to a printed circuit board on which a sound pressure input hole is formed so as to expose the lower portion of the substrate of the acoustic sensor unit to the outside through the sound pressure input hole; attaching a cover covering the acoustic sensor unit on the printed circuit board; etching the substrate of the acoustic sensor unit to form an acoustic chamber; and removing the sacrifice layer.

    Abstract translation: 根据本公开的示例性实施例的用于制造声学传感器的方法包括：通过在基板的上部形成下电极来形成声传感器单元，在下电极上形成蚀刻孔，在其上形成牺牲层 下部电极的上部，并且将隔膜连接到牺牲层的上部; 将声学传感器单元的基板的下部耦合到其上形成有声压输入孔的印刷电路板，以便通过声压输入孔将声学传感器单元的基板的下部暴露于外部 ; 将覆盖所述声学传感器单元的盖附着在所述印刷电路板上; 蚀刻声学传感器单元的基板以形成声学室; 并去除牺牲层。

    PLASMA DEVICE
    24.
    发明申请
    PLASMA DEVICE 审中-公开
    等离子体装置

    公开(公告)号：US20120285622A1

    公开(公告)日：2012-11-15

    申请号：US13419287

    申请日：2012-03-13

    Applicant: Ji Man LIM ,  Jae-Woo Lee ,  Jun Seo ,  Dae Young Han

    Inventor： Ji Man LIM ,  Jae-Woo Lee ,  Jun Seo ,  Dae Young Han

    IPC: H01L21/3065

    CPC classification number: H01J37/32091 ,  H01J37/32633

    Abstract: A plasma device includes: a reaction chamber; an upper electrode positioned upward in the reaction chamber; a lower electrode facing the upper electrode; a baffle plate enclosing the lower electrode and including a plurality of cutouts formed at the edge thereof, wherein a boundary line of the cutout is connected to a boundary line of the baffle plate, thereby forming a recess portion at the edge of the baffle plate. The cutouts of the baffle plate change the flow of the reactive gas in the chamber, helping achieve a more uniform etch.

    Abstract translation: 等离子体装置包括：反应室; 位于反应室中的上电极; 面向上电极的下电极; 封闭所述下电极并且在其边缘处形成有多个切口的挡板，其中所述切口的边界线连接到所述挡板的边界线，从而在所述挡板的边缘处形成凹部。 挡板的切口改变了腔室中反应气体的流动，有助于实现更均匀的蚀刻。

    LIQUID CRYSTAL DISPLAY DEVICE
    25.
    发明申请
    LIQUID CRYSTAL DISPLAY DEVICE 有权
    液晶显示装置

    公开(公告)号：US20120268679A1

    公开(公告)日：2012-10-25

    申请号：US13540229

    申请日：2012-07-02

    Applicant: Hong Sung SONG ,  Sai Chang Yun ,  Sang Chang Yun ,  Jae Woo Lee

    Inventor： Hong Sung SONG ,  Sai Chang Yun ,  Sang Chang Yun ,  Jae Woo Lee

    IPC: G02F1/136

    CPC classification number: G02F1/1362 ,  G02F2001/136218 ,  G09G2320/0209

    Abstract: A liquid crystal display panel capable of reducing a capacitance of a parasitic capacitor between a data line and a pixel electrode. The liquid crystal display panel comprises: a thin film transistor at a crossing of a gate line and a data line, liquid crystal cells including a pixel electrode connected to the thin film transistor; first shield patterns in the liquid crystal cells, each shield pattern being parallel to the data line without overlapping the data line, wherein the shield patterns are insulated from and overlap with an outer portion of the pixel electrode; and a common line arrayed to connect the shield patterns for each the liquid crystal cell.

    Abstract translation: 一种能够降低数据线和像素电极之间的寄生电容的电容的液晶显示面板。 液晶显示面板包括：在栅极线和数据线的交叉处的薄膜晶体管，包括连接到薄膜晶体管的像素电极的液晶单元; 液晶单元中的第一屏蔽图案，每个屏蔽图案平行于数据线而不与数据线重叠，其中屏蔽图案与像素电极的外部部分绝缘并与其重叠; 以及用于连接每个液晶单元的屏蔽图案的公共线。

    Photosensitive molecular compound and photoresist composition including the same
    26.
    发明授权
    Photosensitive molecular compound and photoresist composition including the same 失效
    光敏分子化合物和包含其的光致抗蚀剂组合物

    公开(公告)号：US08124311B2

    公开(公告)日：2012-02-28

    申请号：US12361833

    申请日：2009-01-29

    Applicant: Jung-Youl Lee ,  Jeong-Sik Kim ,  Eu-Jean Jang ,  Jae-Woo Lee ,  Jae-Hyun Kim

    Inventor： Jung-Youl Lee ,  Jeong-Sik Kim ,  Eu-Jean Jang ,  Jae-Woo Lee ,  Jae-Hyun Kim

    IPC: G03F7/039 ,  G03F7/20 ,  G03F7/30 ,  G03F7/38

    CPC classification number: C07C251/68 ,  C07C2601/14 ,  C07C2603/74 ,  C07C2603/92 ,  C07D209/48 ,  C07D209/86 ,  C07D221/14 ,  G03F7/0045 ,  G03F7/039

    Abstract: Disclosed are a photosensitive compound containing oxime group which is directly decomposed by exposure to light, which is a molecular resist whose size is smaller than conventional polymer for photoresist, and a photoresist composition including the same. The photosensitive molecular compound has a structure represented by a following formula. In Formula, R1 is hydrogen atom or methyl group (CH3); Ra and Rb each is independently alkyl group of 1-6 carbon atoms, alkylcarbonyl group of 2-7 carbon atoms, aryl group of 6-10 carbon atoms or arylcarbonyl group of 7-11 carbon atoms, and Ra and Rb form one group as an united body, alkyl or cycloalkyl group of 1-20 carbon atoms or arylalkyl group of 7-20 carbon atoms which are doubly bonded to nitrogen atom.

    Abstract translation: 公开了含有肟基的感光性化合物，其通过暴露于光直接分解，其是尺寸小于用于光致抗蚀剂的常规聚合物的分子抗蚀剂，以及包含其的光致抗蚀剂组合物。 光敏分子化合物具有由下式表示的结构。 在式中，R 1是氢原子或甲基（CH 3）; Ra和Rb各自独立地为1-6个碳原子的烷基，2-7个碳原子的烷基羰基，6-10个碳原子的芳基或7-11个碳原子的芳基羰基，Ra和Rb形成一个基团 1〜20个碳原子的烷基或环烷基或7-20个碳原子的芳基烷基与氮原子双键结合。

    Photo-sensitive compound and photoresist composition including the same
    29.
    发明授权
    Photo-sensitive compound and photoresist composition including the same 失效
    光敏化合物和包含其的光致抗蚀剂组合物

    公开(公告)号：US07695893B2

    公开(公告)日：2010-04-13

    申请号：US12134840

    申请日：2008-06-06

    Applicant: Jae-Woo Lee ,  Jung-Youl Lee ,  Jeong-Sik Kim ,  Eu-Jean Jang ,  Jae-Hyun Kim

    Inventor： Jae-Woo Lee ,  Jung-Youl Lee ,  Jeong-Sik Kim ,  Eu-Jean Jang ,  Jae-Hyun Kim

    IPC: G03F7/038 ,  G03F7/20 ,  G03F7/30

    CPC classification number: C07C69/42 ,  C07C69/76 ,  G03F7/0382

    Abstract: Disclosed are a photo-sensitive compound and a photoresist composition containing the same, for forming ultra-fine photoresist patterns. The photo-sensitive compound is resented by following Formula 1, wherein x is an integer of 1 to 5, y is an integer of 2 to 6, R is a C2˜C20 hydrocarbon group. The photoresist composition comprises 1˜85 weight % of a photo-sensitive compound represented by following Formula 1, 1˜55 weight % of a compound which reacts with a hydroxyl group (—OH) of the compound represented by Formula 1 to combine with the photo-sensitive compound represented by Formula 1; 1˜15 weight % of a photo-acid generator; and 12˜97 weight % of an organic solvent.

    Abstract translation: 公开了用于形成超细光致抗蚀剂图案的光敏化合物和含有该光敏化合物的光致抗蚀剂组合物。 光敏化合物通过下式1反应，其中x为1〜5的整数，y为2〜6的整数，R为C2〜C20烃基。 光致抗蚀剂组合物包含1〜85重量％的由下式1表示的感光性化合物，1〜55重量％的与式1表示的化合物的羟基（-OH）反应的化合物与 由式1表示的光敏化合物; 1〜15重量％的光酸发生剂; 和12〜97重量％的有机溶剂。

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