Abstract:
The present invention provides an in situ plasma reducing process to reduce oxides or other contaminants, using a compound of nitrogen and hydrogen, typically ammonia, at relatively low temperatures prior to depositing a subsequent layer thereon. The adhesion characteristics of the layers are improved and oxygen presence is reduced compared to the typical physical sputter cleaning process of an oxide layer. This process may be particularly useful for the complex requirements of a dual damascene structure, especially with copper applications.
Abstract:
Pin-to-pin electro-static-discharge (ESD) protection is provided for a bus-switch transistor that is connected to I/O pins at its source and drain. A p-type substrate is normally pumped below ground by a substrate bias generator when power is applied. However, during a pin-to-pin ESD test, power and ground are floating. A gate node is pulled high through a coupling capacitor by the ESD pulse. The gate node turns on a shunting transistor to couple the ESD pulse to the floating ground bus. The gate node also turns on a shorting transistor that connects the floating ground bus to the floating substrate. A resistor drains the coupling capacitor to the substrate, rather than to ground. Current is injected into the substrate by the resistor. The snapback voltage is lowered by substrate-triggering.
Abstract:
A method for depositing a silicon oxycarbide hard mask on a low k dielectric layer is provided. Substrates containing a silicon oxycarbide hard mask on a low k dielectric layer are also disclosed. The silicon oxycarbide hard mask may be formed by a processing gas comprising a siloxane.
Abstract:
A common mode logic (CML) circuit having an improved bias circuit and an active MOS load operating exclusively in the triode region to provide improved performance characteristics including a high speed of operation. The bias circuit of the CML circuit comprises a pair of MOS transistors, one of which has an aspect ratio (W.sub.P /L.sub.P) and the other of which has an aspect ratio (W.sub.P /L.sub.P)/n, wherein 1
Abstract:
In one aspect, a method of manufacturing a protective textile may include steps of (a) twisting a first yarn with a tungsten filament; and (b) using a second yarn to cover the yarn-tungsten product generated in step (a). The yarn generated in step (b) is further twisted with an elastic spandex. In one embodiment, the first yarn is selected from a group of Nylon, Polyethylene Terephthalate (PET), cotton yarn, bamboo fiber and Tencel. In another embodiment, a Polyethylene (PE) fiber is the second yarn, and the third yarn may include Nylon, PET or PE. The protective textile is advantageous because it is light, thin, soft and highly cut resistant. Also, it has great electrical conductivity and chemical stability, and it is not easy to deform after washing.
Abstract:
The invention provides a method of increasing a deacetylated activity of SIRT6 by contacting SIRT6 with an agent that binds SIRT6 and reduces the Km of SIRT6 for a substrate, thereby increasing the deacetylase activity of SIRT6. The invention also provides compounds of the formulas (II) and (III).
Abstract:
A functional TFE copolymer fine powder is described, wherein the TFE copolymer is a polymer of TFE and at least one functional comonomer, and wherein the TFE copolymer has functional groups that are pendant to the polymer chain. The functional TFE copolymer fine powder resin is paste extrudable and expandable. Methods for making the functional TFE copolymer are also described. The expanded functional TFE copolymer material may be post-reacted after expansion.
Abstract:
High purity perfluoroelastomer composites and processes for producing the same are provided. High purity composites may be formed from compositions comprising a crosslinkable fluoroelastomer terpolymer of TFE, PAVE, and CNVE, and functionalized PTFE, which may be crosslinked to form crosslinked composites having low metal content and low compression set. Emulsion mixtures for forming the high purity composites are also provided.
Abstract:
The invention is concerned with the strains of B. coagulans for lactic acid production and the related methods, in which the carbon sources are pentose or hexose or the agricultural or industrial wastes containing pentose or hexose or a mixture of both. According to the invention, the highest amount of L-lactic acid produced from glucose is 173 g/L, the optical purity is over 99%, the yield is up to 0.98, and the productivity is up to 2.4 g/L per hour. The highest amount of L-lactic acid produced from xylose is 195 g/L, the optical purity is over 99%, the yield is up to 0.98, and the productivity is up to 2.7 g/L per hour. The highest amount of L-lactic acid produced from reducing sugars in xylitol byproducts is 106 g/L, the optical purity is over 99%, and the productivity is up to 2.08 g/L per hour. The B. coagulans strains XZL4 (DSM No. 23183) and XZL9 (DSM No. 23184) of the invention can directly utilize various reducing sugars in xylitol byproducts to produce high amounts of L-lactic acid, which improves the production efficiency at low costs, and the strains are, thus, appropriate for industrial productions.