公开(公告)号：US07230964B2

公开(公告)日：2007-06-12

申请号：US10425361

申请日：2003-04-29

Applicant: Plash P. Das ,  R. Kyle Webb ,  Marco Giovanardi ,  Gregory Francis ,  Huckleberry B. Dorn ,  Kyle P. Erlandsen ,  John W. Nelson ,  Richard L. Sandstrom ,  Alexander I. Ershov

Inventor： Plash P. Das ,  R. Kyle Webb ,  Marco Giovanardi ,  Gregory Francis ,  Huckleberry B. Dorn ,  Kyle P. Erlandsen ,  John W. Nelson ,  Richard L. Sandstrom ,  Alexander I. Ershov

IPC: H01S3/22 ,  G21G5/00

CPC classification number: G03F7/7055 ,  G02B26/0816 ,  G02B27/0972 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70058 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/036 ,  H01S3/041 ,  H01S3/0971 ,  H01S3/136 ,  H01S3/137 ,  H01S3/225 ,  H01S3/2333 ,  H01S3/2366

Abstract: The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source with a beam delivery to a production line machine. The system includes an enclosed and purged beam path with beam pointing control for delivery the laser beam to a desired location such as the entrance port of the production line machine. Preferred embodiments include equipment for beam attenuation, equipment for automatic feedback beam alignment and equipment for accurate optics module positioning at installation and during maintenance. In preferred embodiments, the production line machine is a lithography machine and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality. A pulse stretcher more than doubles the output pulse length resulting in a reduction in pulse power (mJ/ns) as compared to prior art laser systems. This preferred embodiment is capable of providing illumination at a lithography system wafer plane which is approximately constant throughout the operating life of the lithography system, despite substantial degradation of optical components.

Abstract translation: 本发明提供了一种向生产线机器输送光束的模块化高重复率紫外线气体放电激光光源。 该系统包括具有光束指向控制的封闭和清除的光束路径，用于将激光束传送到期望的位置，例如生产线机器的入口。 优选实施例包括用于光束衰减的设备，用于自动反馈光束对准的设备和用于在安装和维护期间精确的光学模块定位的设备。 在优选实施例中，生产线机器是光刻机，并且提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。 该MOPA系统能够以大大提高的光束质量将输出脉冲能量大约增加到相当的单室激光器系统的两倍。 与现有技术的激光系统相比，脉冲放大器使输出脉冲长度加倍，导致脉冲功率（mJ / ns）的降低。 该优选实施例能够在光刻系统晶片平面处提供照明，其在光刻系统的整个使用寿命期间大致恒定，尽管光学部件的实质性劣化。

公开(公告)号：US06899707B2

公开(公告)日：2005-05-31

申请号：US09896429

申请日：2001-06-29

Applicant: Gordon Scott Scholler ,  R. Kyle Webb

Inventor： Gordon Scott Scholler ,  R. Kyle Webb

IPC: A61B18/20 ,  A61B17/30 ,  A61F9/007 ,  A61F9/008 ,  A61F9/009 ,  A61F9/01 ,  A61B18/18

CPC classification number: A61F9/009 ,  A61B2017/306 ,  A61F9/008 ,  A61F2009/00846

Abstract: An improved applanation lens and method for use in an interface between a patient's eye and a surgical laser system does not discolor or lose light transmittance when subjected to gamma radiation. The improved applanation lens has an applanation surface configured to contact the eye upon application of a pressure. The lens is formed of high purity silicon dioxide (SiO2) with purity great enough to resist discoloration upon prolonged irradiation by high-energy radiation such as UV, x-rays, gamma rays or neutrons, and is preferably a fused silica.

Abstract translation: 用于患者眼睛和手术激光系统之间的界面的改进的压平透镜和方法在经受伽马辐射时不会变色或失去透光性。 改进的压平透镜具有配置成在施加压力时与眼睛接触的压平表面。 透镜由纯度足够高的高纯度二氧化硅（SiO 2）形成，以在通过诸如UV，X射线，γ射线或中子的高能量辐射的长时间照射下抵抗变色，并且是 优选熔融二氧化硅。

公开(公告)号：US06188709B1

公开(公告)日：2001-02-13

申请号：US09198081

申请日：1998-11-23

Applicant: R. Kyle Webb

Inventor： R. Kyle Webb

IPC: H01S322

CPC classification number: H01S3/02 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70358 ,  G03F7/70558 ,  G03F7/70575 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/0812 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/1055 ,  H01S3/134 ,  H01S3/1392 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H03K3/57 ,  H03K17/80

Abstract: A support bar member for supporting an electrode member of a pulsed laser system is described. The support bar member includes an aerodynamic nose configured to reduce an aerodynamic load applied against a blower assembly of the laser system by the support bar member. The nose provides an aerodynamic cut-off region on the support bar member such that, when the blower assembly is operating, the blower assembly does not vibrate significantly.

Abstract translation: 描述了用于支撑脉冲激光系统的电极部件的支撑杆部件。 支撑杆构件包括空气动力学鼻部，其构造成减小由支撑杆构件施加到激光系统的鼓风机组件的空气动力学负载。 鼻子在支撑杆构件上提供气动切断区域，使得当鼓风机组件工作时，鼓风机组件不会显着振动。

公开(公告)号：US6144686A

公开(公告)日：2000-11-07

申请号：US400026

申请日：1999-09-21

Applicant: Thomas Hofmann ,  James K. Howey ,  Robert A. Shannon ,  Richard C. Ujazdowski ,  Tom A. Watson ,  R. Kyle Webb

Inventor： Thomas Hofmann ,  James K. Howey ,  Robert A. Shannon ,  Richard C. Ujazdowski ,  Tom A. Watson ,  R. Kyle Webb

IPC: F16F15/10 ,  G03F7/20 ,  H01S3/036 ,  H01S3/223 ,  H01S3/225 ,  H01S3/22

CPC classification number: G03F7/708 ,  H01S3/036 ,  H01S3/225

Abstract: A tangential fan and cutoff assembly for recirculating a lasing gas mixture has blade members, which vary in circumferential position stepwise from end to end, and/or a tapered anode assembly. The number of blade members can be constant or variable between ends. The circumferential position of blade members can shift monotonically or reversibly between ends. Blade members are stiffened by optimally selecting the number and placement of hub members to control the natural vibration frequency of the fan. Methods of forming tangential fans include casting, and machining from a solid block. Monolithic structures can be joined, typically by electron-beam welding. Casting, welding, and machining processes introduce no additional contaminants. Tangential fans produced have mechanical rigidity, accurate tolerances, and low contaminant concentrations. Blade members can be formed into air foil shapes.