公开(公告)号：US20120050703A1

公开(公告)日：2012-03-01

申请号：US13214470

申请日：2011-08-22

Applicant: Michael Layh ,  Udo Dinger

Inventor： Michael Layh ,  Udo Dinger

IPC: G03F7/20 ,  G02B7/192 ,  G03B27/70 ,  G21K5/00

CPC classification number: G21K1/06 ,  G03F7/70175 ,  G03F7/70891 ,  G21K2201/065 ,  G21K2201/067

Abstract: An EUV collector for collecting and transmitting radiation from an EUV radiation source includes at least one collector mirror for reflecting an emission of the EUV radiation source, which is rotationally symmetric with respect to a central axis. The EUV collector also includes a cooling device for cooling the at least one collector mirror. The cooling device has at least one cooling element, which has a course with respect to the collector mirror, in each case, such that the projection of the course into a plane perpendicular to the central axis has a main direction, which encloses an angle of at most 20° with respect to a predetermined preferred direction. The collector transmits improved quality radiation to illuminate an object field.

Abstract translation: 用于收集和发射来自EUV辐射源的辐射的EUV收集器包括至少一个收集器反射镜，用于反射相对于中心轴旋转对称的EUV辐射源的发射。 EUV收集器还包括用于冷却至少一个收集器反射镜的冷却装置。 冷却装置具有至少一个冷却元件，该冷却元件在每种情况下具有相对于收集器反射镜的过程，使得该过程的投影垂直于中心轴线的平面具有主方向，该主方向包围 相对于预定的优选方向为至多20°。 收集器传输改进的质量辐射以照亮物体场。

公开(公告)号：US07910900B2

公开(公告)日：2011-03-22

申请号：US11781010

申请日：2007-07-20

Applicant: Ralf Stuetzle ,  Udo Dinger

Inventor： Ralf Stuetzle ,  Udo Dinger

IPC: A61N5/06

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G02B2207/123 ,  G03F7/70166

Abstract: Collectors with mirror shells arranged inside each other, illumination systems equipped with such collectors, projection exposure apparatuses equipped with such illumination systems, methods of manufacturing microelectronic components with such projection exposure apparatuses, and related systems, components and methods are disclosed.

Abstract translation: 公开了具有彼此布置的具有镜壳的收集器，配备有这种收集器的照明系统，配备有这种照明系统的投影曝光装置，具有这种投影曝光装置的微电子部件的制造方法以及相关系统，部件和方法。

公开(公告)号：US20110063598A1

公开(公告)日：2011-03-17

申请号：US12915785

申请日：2010-10-29

Applicant: Damian Fiolka ,  Berndt Warm ,  Christian Steigerwald ,  Martin Endres ,  Ralf Stuetzle ,  Jens Ossmann ,  Ralf Scharnweber ,  Markus Hauf ,  Udo Dinger ,  Severin Waldis ,  Marc Kirch ,  Joachim Hartjes

Inventor： Damian Fiolka ,  Berndt Warm ,  Christian Steigerwald ,  Martin Endres ,  Ralf Stuetzle ,  Jens Ossmann ,  Ralf Scharnweber ,  Markus Hauf ,  Udo Dinger ,  Severin Waldis ,  Marc Kirch ,  Joachim Hartjes

IPC: G03B27/72

CPC classification number: G03F7/70191 ,  G03F7/70083

Abstract: An illumination optics for EUV microlithography guides an illumination light bundle from a radiation source to an object field with an extension ratio between a longer field dimension and a shorter field dimension, where the ratio is considerably greater than 1. A field facet mirror has a plurality of field facets that set defined illumination conditions in the object field. A following optics downstream of the field facet mirror transmits the illumination light into the object field. The following optics includes a pupil facet mirror with a plurality of pupil facets. The field facets are in each case individually allocated to the pupil facets so that portions of the illumination light bundle impinging upon in each case one of the field facets are guided on to the object field via the associated pupil facet. The field facet mirror not only includes a plurality of basic illumination field facets which provide a basic illumination of the object field via associated basic illumination pupil facets, but also includes a plurality of correction illumination field facets which provide for a correction of the illumination of the object field via associated correction illumination pupil facets. The result is an illumination optics which allows unwanted variations of illumination parameters, for instance an illumination intensity distribution or an illumination angle distribution, to be corrected across the object field.

Abstract translation: 用于EUV微光刻的照明光学器件将照射光束从辐射源引导到物场，其具有在较大场尺寸和较短场尺寸之间的延伸比，其中该比率远大于1.场分面镜具有多个 的场面在场景中设置定义的照明条件。 在场面反射镜下游的以下光学器件将照明光透射到物体场中。 以下光学器件包括具有多个光瞳面的光瞳小面镜。 场分面在每种情况下分别被分配给光瞳面，使得在各种情况下照射的照明光束的一部分通过相关联的光瞳小面被引导到物场。 场面镜不仅包括多个基本照明场面，它们通过相关联的基本照明光瞳面提供物场的基本照明，而且还包括多个校正照明场面，其提供对照射的照明的校正 通过相关联的校正照明光瞳面进行物体场。 结果是照明光学元件允许在整个对象场校正照明参数的不期望的变化，例如照明强度分布或照明角度分布。

公开(公告)号：US20110014799A1

公开(公告)日：2011-01-20

申请号：US12887139

申请日：2010-09-21

Applicant: Udo Dinger ,  Markus Hauf

Inventor： Udo Dinger ,  Markus Hauf

IPC: H01L21/26 ,  H05G2/00

CPC classification number: G03F7/702 ,  G03F7/70008 ,  G03F7/70058 ,  G03F7/70108

Abstract: A projection illumination installation for EUV microlithography includes an EUV synchrotron light source for producing EUV used light. An object field is illuminated with the used light using illumination optics. The object field is mapped into an image field using projection optics. A scanning device is used to illuminate the object field by deflecting the used light in sync with a projection illumination period. The result is a projection illumination installation in which the output power from an EUV synchrotron light source can be used as efficiently as possible for EUV projection illumination.

Abstract translation: 用于EUV微光刻的投影照明装置包括用于产生EUV使用光的EUV同步加速器光源。 使用照明光学器件的被使用的光照亮物体场。 使用投影光学将物体场映射到图像场中。 扫描装置用于通过与投影照明周期同步地偏转所使用的光来照亮对象场。 结果是投影照明设备，其中EUV同步加速器光源的输出功率可以尽可能高效地用于EUV投影照明。

公开(公告)号：US20110001948A1

公开(公告)日：2011-01-06

申请号：US12871979

申请日：2010-08-31

Applicant: Udo Dinger

Inventor： Udo Dinger

IPC: G03B27/54 ,  G03F7/20 ,  G03B27/70

CPC classification number: G03F7/70175 ,  G02B3/0056 ,  G03F7/70108 ,  G21K1/06 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067

Abstract: An illumination system for a microlithography projection exposure apparatus generally includes an optical element formed of a plurality of facet elements. The facet elements are arranged such that, for each facet element, a proportion of the side surfaces of the facet element is at a certain distance from the side surfaces of all the other facet elements. This gives rise to interspaces between the facet elements which are not used optically. The interspaces can be used for simpler mounting of the facet elements or for fitting mechanical components, such as actuators. A collector is used to efficiently illuminate such an optical element. The collector includes a plurality of segments that are in part non-continuous. Alternatively, however, continuous segments with a bend are also possible.

Abstract translation: 用于微光刻投影曝光装置的照明系统通常包括由多个小面元件形成的光学元件。 小面元件布置成使得对于每个小面元件，小面元件的侧表面的一部分与所有其它小面元件的侧表面相距一定距离。 这导致在光学不使用的小面元件之间的间隙。 间隙可以用于更简单地安装小面元件或用于装配机械部件，例如致动器。 使用收集器来有效地照亮这样的光学元件。 收集器包括部分非连续的多个段。 但是，也可以是具有弯曲部的连续部分。

公开(公告)号：US07557902B2

公开(公告)日：2009-07-07

申请号：US10577163

申请日：2003-09-27

Applicant: Udo Dinger ,  Frank Eisert ,  Stefan Koehler ,  Andreas Ochse ,  Johannes Zellner ,  Martin Lowisch ,  Timo Laufer

Inventor： Udo Dinger ,  Frank Eisert ,  Stefan Koehler ,  Andreas Ochse ,  Johannes Zellner ,  Martin Lowisch ,  Timo Laufer

IPC: G03B27/54 ,  G06K7/10

CPC classification number: G03F7/70958 ,  B82Y10/00 ,  G02B1/00 ,  G02B5/0891 ,  G02B7/181 ,  G03F7/70891 ,  G21K1/062 ,  G21K2201/065

Abstract: A projection objective 1 for short wavelengths, in particular for wavelengths λ

Abstract translation: 用于短波长的投影物镜1，特别是波长λ<157nm的投影物镜1设有多个相对于光轴5精确定位的镜子[M1，M2，M3，M4，M5和M6]。 镜子[M1，M2，M3，M4，M5和M6]具有多层涂层。 提供了至少两种不同的镜材料，其热膨胀系数的上升与热膨胀系数的过零区域中的温度的函数不同，特别是大小的符号。

公开(公告)号：US07481543B1

公开(公告)日：2009-01-27

申请号：US11523396

申请日：2006-09-18

Applicant: Udo Dinger ,  Frank Eisert ,  Siegfried Stacklies ,  Martin Weiser ,  Guenther Seitz

Inventor： Udo Dinger ,  Frank Eisert ,  Siegfried Stacklies ,  Martin Weiser ,  Guenther Seitz

IPC: G02B5/10

CPC classification number: B24B13/06 ,  B24B51/00

Abstract: A mirror for use in a projection exposure apparatus is described. The mirror has a main surface extending beyond an outline of an optical surface of the main surface. The optical surface has a roughness of less than 1 nm rms, and the outline of the optical surface includes a portion where the main surface extends beyond the optical surface by less than 0.2 mm. Manufacturing the mirror may involve polishing the optical surface in regions of the main surface extending beyond the optical surface and removing material of the substrate carrying a portion of the surface extending beyond the optical surface.

Abstract translation: 描述了用于投影曝光装置的反射镜。 反射镜具有延伸超过主表面的光学表面轮廓的主表面。 光学表面具有小于1nm的粗糙度，并且光学表面的轮廓包括主表面延伸超过光学表面小于0.2mm的部分。 制造反射镜可以包括在主表面延伸超过光学表面的区域中抛光光学表面，并去除承载延伸超过光学表面的表面的一部分的基板的材料。

公开(公告)号：US07456408B2

公开(公告)日：2008-11-25

申请号：US12009984

申请日：2008-01-23

Applicant: Hans-Juergen Mann ,  Wolfgang Singer ,  Joerg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger ,  Martin Antoni ,  Wilhelm Ulrich

Inventor： Hans-Juergen Mann ,  Wolfgang Singer ,  Joerg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger ,  Martin Antoni ,  Wilhelm Ulrich

IPC: G02B27/14 ,  G02B5/30 ,  G02B17/00

CPC classification number: B82Y10/00 ,  G02B13/143 ,  G02B17/0657 ,  G02B17/0663 ,  G03F7/70066 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70191 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G21K1/06 ,  G21K5/00 ,  G21K5/04 ,  G21K2201/061

Abstract: There is provided an illumination system for microlithography. The illumination system includes an optical element having a plurality of field raster elements, a plane in which a field is illuminated, and a grazing incidence mirror situated in a light path from the optical element to the plane, after the optical element. The illumination system has no other grazing incidence mirror in the light path, after the optical element and before the plane.

公开(公告)号：US07443948B2

公开(公告)日：2008-10-28

申请号：US11345880

申请日：2006-02-02

Applicant: Jörg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger ,  Wolfgang Singer ,  Martin Antoni ,  Joachim Wietzorrek ,  Joachim Hainz

Inventor： Jörg Schultz ,  Johannes Wangler ,  Karl-Heinz Schuster ,  Udo Dinger ,  Wolfgang Singer ,  Martin Antoni ,  Joachim Wietzorrek ,  Joachim Hainz

IPC: G21K5/04

CPC classification number: G02B3/0043 ,  B82Y10/00 ,  G02B3/0062 ,  G02B17/0657 ,  G03F7/70075 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G03F7/708 ,  G21K1/06 ,  G21K1/062

Abstract: There is provided an illumination system. the illumination system includes (a) a source of light having a wavelength of less than or equal to 193 nm, and (b) an optical element in a path of the light, having a first raster element, a second raster element, a third raster element and a fourth raster element situated thereon. The second raster element is adjacent to the first raster element, and located a first distance from the first raster element. The fourth raster element is adjacent to the third raster element, and located a second distance from the third raster element. The second distance is different from the first distance.

Abstract translation: 提供照明系统。 所述照明系统包括（a）具有小于或等于193nm的波长的光源，以及（b）光的路径中的光学元件，具有第一光栅元件，第二光栅元件，第三光栅元件 栅格元素和位于其上的第四光栅元素。 第二光栅元素与第一光栅元素相邻，并且与第一光栅元素位于第一距离。 第四光栅元素与第三光栅元素相邻，并且与第三光栅元素相距第二距离。 第二距离与第一距离不同。

公开(公告)号：US20080099935A1

公开(公告)日：2008-05-01

申请号：US11667029

申请日：2005-11-08

Applicant: Wilhelm Egle ,  Udo Dinger ,  Axel Matthes

Inventor： Wilhelm Egle ,  Udo Dinger ,  Axel Matthes

IPC: B29D11/00

CPC classification number: G03F7/70166 ,  C03B23/0252 ,  C03B23/0357 ,  G03F7/70175 ,  G03F7/70958 ,  G21K1/06 ,  G21K2201/067

Abstract: A method of making a high-precision optical surface which may be used either as a Wolter-type segment in an X-ray mirror system or in a collector of a EUVL system or as a spherical, aspherical, or free form normal or grazing incidence mirror in an EUVL system is prepared by sagging a thin flat glass sheet onto a masterpiece, in particular a mandrel, made from a temperature-resistant material, such as an alumina based ceramic or a keatite glass ceramic. The glass sheet is polished to the desired surface roughness (14), is positioned to an upper surface of the masterpiece (16), and is heated (18) to effect sagging onto the upper surface of the masterpiece for generating a shaped body. Thereafter, the shaped body is cooled and removed from the masterpiece, is mounted within a holder (22), is inspected for deviations from the specification (24) preferably using interferometric measurements, and is corrected for defects (26), preferably using ion beam figuring.

Abstract translation: 制造高精度光学表面的方法，其可以用作X射线镜系统中的Wolter型片段或EUVL系统的收集器中，或者用作球形，非球面或游离形式的正常或掠入射 EUVL系统中的镜子是通过将薄平板玻璃片放在由诸如氧化铝基陶瓷或酮钙玻璃陶瓷的耐温材料制成的杰作（特别是心轴）上制备的。 玻璃板被抛光到所需的表面粗糙度（14），被定位在杰作（16）的上表面上，并且被加热（18）以在下降到用于产生成形体的杰作的上表面上。 此后，成形体被冷却并从杰作中移除，安装在保持器（22）内，优选地使用干涉测量来检查与规格（24）的偏差，并且对缺陷进行校正（26），优选使用离子束 想法