公开(公告)号：US09007559B2

公开(公告)日：2015-04-14

申请号：US13214470

申请日：2011-08-22

Applicant: Michael Layh ,  Udo Dinger

Inventor： Michael Layh ,  Udo Dinger

IPC: G03B27/52 ,  G03B27/54 ,  G21K1/06 ,  G03F7/20

CPC classification number: G21K1/06 ,  G03F7/70175 ,  G03F7/70891 ,  G21K2201/065 ,  G21K2201/067

Abstract: An EUV collector for collecting and transmitting radiation from an EUV radiation source includes at least one collector mirror for reflecting an emission of the EUV radiation source, which is rotationally symmetric with respect to a central axis. The EUV collector also includes a cooling device for cooling the at least one collector mirror. The cooling device has at least one cooling element, which has a course with respect to the collector mirror, in each case, such that the projection of the course into a plane perpendicular to the central axis has a main direction, which encloses an angle of at most 20° with respect to a predetermined preferred direction. The collector transmits improved quality radiation to illuminate an object field.

Abstract translation: 用于收集和发射来自EUV辐射源的辐射的EUV收集器包括至少一个收集器反射镜，用于反射相对于中心轴旋转对称的EUV辐射源的发射。 EUV收集器还包括用于冷却至少一个收集器反射镜的冷却装置。 冷却装置具有至少一个冷却元件，该冷却元件在每种情况下具有相对于收集器反射镜的过程，使得该过程的投影垂直于中心轴线的平面具有主方向，该主方向包围 相对于预定的优选方向为至多20°。 收集器传输改进的质量辐射以照亮物体场。

公开(公告)号：US20120050703A1

公开(公告)日：2012-03-01

申请号：US13214470

申请日：2011-08-22

Applicant: Michael Layh ,  Udo Dinger

Inventor： Michael Layh ,  Udo Dinger

IPC: G03F7/20 ,  G02B7/192 ,  G03B27/70 ,  G21K5/00

CPC classification number: G21K1/06 ,  G03F7/70175 ,  G03F7/70891 ,  G21K2201/065 ,  G21K2201/067

Abstract: An EUV collector for collecting and transmitting radiation from an EUV radiation source includes at least one collector mirror for reflecting an emission of the EUV radiation source, which is rotationally symmetric with respect to a central axis. The EUV collector also includes a cooling device for cooling the at least one collector mirror. The cooling device has at least one cooling element, which has a course with respect to the collector mirror, in each case, such that the projection of the course into a plane perpendicular to the central axis has a main direction, which encloses an angle of at most 20° with respect to a predetermined preferred direction. The collector transmits improved quality radiation to illuminate an object field.

Abstract translation: 用于收集和发射来自EUV辐射源的辐射的EUV收集器包括至少一个收集器反射镜，用于反射相对于中心轴旋转对称的EUV辐射源的发射。 EUV收集器还包括用于冷却至少一个收集器反射镜的冷却装置。 冷却装置具有至少一个冷却元件，该冷却元件在每种情况下具有相对于收集器反射镜的过程，使得该过程的投影垂直于中心轴线的平面具有主方向，该主方向包围 相对于预定的优选方向为至多20°。 收集器传输改进的质量辐射以照亮物体场。

公开(公告)号：US09310692B2

公开(公告)日：2016-04-12

申请号：US12916882

申请日：2010-11-01

Applicant: Ralf Stuetzle ,  Martin Endres ,  Jens Ossmann ,  Michael Layh

Inventor： Ralf Stuetzle ,  Martin Endres ,  Jens Ossmann ,  Michael Layh

IPC: G03B27/52 ,  G03F7/20

CPC classification number: G03F7/70191 ,  G03F7/70066 ,  G03F7/70083 ,  G03F7/70558

Abstract: A component for setting a scan-integrated illumination energy in an object plane of a microlithography projection exposure apparatus is disclosed. The component includes a plurality of diaphragms which are arranged alongside one another with respect to a direction perpendicular to the scan movement and which differ in their form and the position of which can be altered approximately in the scan direction so that a portion of the illumination energy can be vignetted by at least one diaphragm. The form of the individual diaphragm is specifically adapted to the form of the illumination in a diaphragm plane in which the component is arranged. This has the effect that at least parts of the delimiting edges of two diaphragms always differ in the case of an arbitrary displacement of the diaphragms.

Abstract translation: 公开了一种用于在微光刻投影曝光装置的物平面中设置扫描集成照明能量的部件。 该部件包括多个隔膜，它们相对于垂直于扫描移动的方向彼此并排布置，并且其形状不同，其位置可以在扫描方向上大致改变，使得照射能量的一部分 可以由至少一个隔膜取消。 单个隔膜的形式特别适用于其中布置有该部件的隔膜平面中的照明形式。 这具有以下效果：在隔膜的任意位移的情况下，两个隔膜的至少一部分限界边缘总是不同。

公开(公告)号：US09013684B2

公开(公告)日：2015-04-21

申请号：US13556408

申请日：2012-07-24

Applicant: Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Andras G. Major ,  Manfred Maul ,  Johannes Eisenmenger ,  Damian Fiolka ,  Jan Horn ,  Markus Deguenther ,  Florian Bach ,  Michael Patra ,  Johannes Wangler ,  Michael Layh

Inventor： Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Andras G. Major ,  Manfred Maul ,  Johannes Eisenmenger ,  Damian Fiolka ,  Jan Horn ,  Markus Deguenther ,  Florian Bach ,  Michael Patra ,  Johannes Wangler ,  Michael Layh

IPC: G03F7/20 ,  G02B26/08 ,  G01M11/00 ,  G01N21/55

CPC classification number: G03F7/70258 ,  G01B11/002 ,  G01B11/272 ,  G01M11/30 ,  G01N21/55 ,  G02B26/0833 ,  G03F7/70058 ,  G03F7/70116 ,  G03F7/70133 ,  G03F7/702 ,  G03F7/70291 ,  G03F7/70516 ,  G03F7/7085 ,  G05B13/048 ,  Y10S359/904

Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.

Abstract translation: 微光刻照明系统包括单独驱动的元件以可变地照亮系统的光瞳表面。 每个元件基于施加到元件的控制信号偏离入射光束。 该系统还包括提供测量信号的仪器，以及基于模型的状态估计器，被配置为基于测量信号为每个元件计算估计状态向量。 估计状态向量表示由元件引起的光束的偏差; 和偏差的时间导数。 照明系统还包括调节器，其被配置为针对每个元件接收：a）估计的状态矢量; 和b）目标值：i）由偏差元素引起的光束的偏差; 和ii）偏差的时间导数。

公开(公告)号：US09007563B2

公开(公告)日：2015-04-14

申请号：US12711059

申请日：2010-02-23

Applicant: Markus Deguenther ,  Michael Layh

Inventor： Markus Deguenther ,  Michael Layh

IPC: G03B27/54 ,  G03F7/20

CPC classification number: G03F7/702 ,  G03F7/70116

Abstract: An illumination system for illuminating a mask in a scanning microlithographic projection exposure apparatus has an objective with an object plane, at least one pupil surface and an image plane in which a mask can be arranged. A beam deflection array of reflective or transparent beam deflection elements is provided, where each beam deflection element is adapted to deflect an impinging light ray by a deflection angle that is variable in response to a control signal. The beam deflection elements are arranged in or in close proximity to the object plane of the objective.

Abstract translation: 用于在扫描微光刻投影曝光装置中照射掩模的照明系统具有物镜，其具有物平面，至少一个瞳孔表面和可以布置掩模的图像平面。 提供反射或透明光束偏转元件的光束偏转阵列，其中每个光束偏转元件适于使入射光线偏转响应于控制信号而变化的偏转角。 光束偏转元件布置在物镜的物平面中或紧邻物镜的物平面。

公开(公告)号：US20130176546A1

公开(公告)日：2013-07-11

申请号：US13784027

申请日：2013-03-04

Applicant: Michael Layh ,  Damian Fiolka

Inventor： Michael Layh ,  Damian Fiolka

IPC: F21V9/10 ,  G03F7/20

CPC classification number: F21V9/40 ,  G03F7/70083 ,  G03F7/70158 ,  G03F7/70191 ,  G03F7/70833 ,  G03F7/70891

Abstract: An illumination optical unit illuminates an object field using radiation with a first wavelength. The illumination optical unit includes a filter element for suppressing radiation with a second wavelength. The filter element includes at least one component with an obscuring action. As a result of the obscuring action, during operation of the illumination optical unit there is at least one region of reduced intensity of radiation with the first wavelength on a first optical element, arranged downstream of the filter element in the light direction, of the illumination optical unit. The filter element can assume a multiplicity of positions, which lead to different regions of reduced intensity. For each point on an optical used surface of the first optical element, there is at least one position such that the point does not lie in a region of reduced intensity.

Abstract translation: 照明光学单元使用具有第一波长的辐射来照亮物体场。 照明光学单元包括用于抑制具有第二波长的辐射的滤光元件。 过滤元件包括具有模糊动作的至少一个部件。 作为遮蔽动作的结果，在照明光学单元的操作期间，存在至少一个区域，其中第一波长的辐射强度在第一光学元件上沿着光线方向布置在滤光元件的下游 光学单元。 滤波器元件可以呈现多个位置，这导致不同的强度降低的区域。 对于第一光学元件的光学使用表面上的每个点，存在至少一个位置，使得该点不位于强度降低的区域中。

公开(公告)号：US20100039629A1

公开(公告)日：2010-02-18

申请号：US12506364

申请日：2009-07-21

Applicant: Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Andras G. Major ,  Manfred Maul ,  Johannes Eisenmenger ,  Damian Fiolka ,  Jan Horn ,  Markus Deguenther ,  Florian Bach ,  Michael Patra ,  Johannes Wangler ,  Michael Layh

Inventor： Stefan Xalter ,  Yim-Bun Patrick Kwan ,  Andras G. Major ,  Manfred Maul ,  Johannes Eisenmenger ,  Damian Fiolka ,  Jan Horn ,  Markus Deguenther ,  Florian Bach ,  Michael Patra ,  Johannes Wangler ,  Michael Layh

IPC: G03B27/54

CPC classification number: G03F7/70258 ,  G01B11/002 ,  G01B11/272 ,  G01M11/30 ,  G01N21/55 ,  G02B26/0833 ,  G03F7/70058 ,  G03F7/70116 ,  G03F7/70133 ,  G03F7/702 ,  G03F7/70291 ,  G03F7/70516 ,  G03F7/7085 ,  G05B13/048 ,  Y10S359/904

Abstract: An illumination system of a microlithographic projection exposure apparatus has a pupil surface and an essentially flat arrangement of desirably individually drivable beam deviating elements for variable illumination of the pupil surface. Each beam deviating element allows deviation of a projection light beam incident on it to be achieved as a function of a control signal applied to the beam deviating element. A measurement illumination instrument directs a measurement light beam, independent of the projection light beams, onto a beam deviating element. A detector instrument records the measurement light beam after deviation by the beam deviating element. An evaluation unit determines the deviation of the projection light beam from measurement signals provided by the detector instrument.

Abstract translation: 微光刻投影曝光装置的照明系统具有瞳孔表面和基本上平坦的布置，其具有期望地单独驱动的光束偏离元件，用于可变照明瞳孔表面。 每个光束偏离元件允许作为施加到光束偏离元件的控制信号的函数来实现入射到其上的投影光束的偏移。 测量照明仪器将独立于投影光束的测量光束引导到光束偏离元件上。 检测仪器在光束偏离元件偏离后记录测量光束。 评估单元确定投影光束与由检测器仪器提供的测量信号的偏差。

公开(公告)号：US20090262324A1

公开(公告)日：2009-10-22

申请号：US12464730

申请日：2009-05-12

Applicant: Michael Patra ,  Markus Deguenther ,  Michael Layh ,  Johannes Wangler ,  Manfred Maul

Inventor： Michael Patra ,  Markus Deguenther ,  Michael Layh ,  Johannes Wangler ,  Manfred Maul

IPC: G03B27/80

CPC classification number: G03F7/7085 ,  G03F7/70116

Abstract: A microlithographic projection exposure apparatus (1) comprises an illumination system (4) with an illumination optics (5) for illuminating an illumination field in a reticle plane (6). The illumination optics (5) further includes a light distribution device (12a) which comprises a light deflection array (12) of separate elements and an optical assembly (21, 23 to 26) which converts the light intensity distribution defined by the light distribution device (12a) in a first plane (19) of the illumination optics (5) into an illumination angle distribution in the reticle plane (6). Downstream of an output coupling device (17), which is arranged in the light path between the light deflection array (12) and the reticle plane (6), a space and time resolving detection device (30) is exposed to outcoupled illumination light (31) in such a way that the detection device (30) detects a light intensity distribution corresponding to the light intensity distribution in the first plane (19). The detection device (30) allows the influence of separate elements or groups of separate elements on the light intensity distribution in the first plane (19) to be determined, particularly by varying said separate elements or groups of separate elements over time. The result is an illumination optics in which the function of the light deflection array is performed during normal operation.

Abstract translation: 微光刻投影曝光装置（1）包括具有用于照亮标线板平面（6）中的照明场的照明光学器件（5）的照明系统（4）。 照明光学器件（5）还包括配光装置（12a），其包括分离元件的光偏转阵列（12）和光学组件（21,23至26），该光学组件（21,23至26）将由光分配装置 （5）的第一平面（19）中的光线（12a）成为所述掩模版平面（6）中的照明角度分布。 布置在光偏转阵列（12）和光罩平面（6）之间的光路中的输出耦合装置（17）的下游，空间和时间分辨检测装置（30）暴露于外耦合照明光 31），使得检测装置（30）检测对应于第一平面（19）中的光强度分布的光强度分布。 检测装置（30）允许确定分离的元件或单独元件组对第一平面（19）中的光强度分布的影响，特别是通过随时间改变所述单独元件或单独元件组。 结果是在正常操作期间执行光偏转阵列的功能的照明光学器件。

公开(公告)号：US10114293B2

公开(公告)日：2018-10-30

申请号：US13587077

申请日：2012-08-16

Applicant: Heiko Feldmann ,  Erik Matthias Sohmen ,  Joachim Stuehler ,  Oswald Gromer ,  Ulrich Mueller ,  Michael Layh ,  Markus Schwab

Inventor： Heiko Feldmann ,  Erik Matthias Sohmen ,  Joachim Stuehler ,  Oswald Gromer ,  Ulrich Mueller ,  Michael Layh ,  Markus Schwab

IPC: G03F7/20 ,  G01N21/956 ,  G03F1/84

Abstract: An illumination system and a projection objective of a mask inspection apparatus are provided. During operation of the mask inspection apparatus, the illumination system illuminates a mask with an illumination bundle of rays having a centroid ray that has a direction dependent on the location of the incidence of the illumination bundle of rays on the mask.

公开(公告)号：US09176390B2

公开(公告)日：2015-11-03

申请号：US13421024

申请日：2012-03-15

Applicant: Michael Layh ,  Markus Deguenther

Inventor： Michael Layh ,  Markus Deguenther

IPC: G03B27/68 ,  G03B27/52 ,  G03B27/72 ,  G03B27/32 ,  G03F7/20 ,  G03B27/54

CPC classification number: G03F7/70075 ,  G03F7/70083 ,  G03F7/70191 ,  G03F7/702

Abstract: A method includes moving a correction device into a neutral position; subsequently ascertaining, for a given arrangement of imaging light channels in the illumination optical unit of the projection exposure apparatus, intensity distributions of at least some of the individual imaging light partial beams along a transverse coordinate transverse to a displacement direction of an object to be imaged; subsequently ascertaining, in dependence on the transverse coordinate, an actual variation of actual values of structure image sizes of object structures in an image field, onto which the object is imaged; and subsequently specifying a predetermined variation of the structure image sizes over the transverse coordinate and displacing correction elements of the correction device, starting from the neutral position, such that the actual variation matches the predetermined variation within a tolerance bandwidth. The method can provide improved imaging results as compared to known uniformity adjustment.

Abstract translation: 一种方法包括将校正装置移动到中立位置; 随后确定对于投影曝光装置的照明光学单元中的成像光通道的给定布置，沿着与待成像对象的位移方向横向的横向坐标的至少一些单独成像光部分光束的强度分布 ; 随后根据横坐标确定对象被成像的图像场中的对象结构的结构图像尺寸的实际值的实际变化; 并且随后从中性位置开始指定校正装置的横向坐标和位移校正元件上的结构图像尺寸的预定变化，使得实际变化与公差带宽内的预定变化相匹配。 与已知的均匀度调整相比，该方法可以提供改善的成像结果。