公开(公告)号：US20180335705A1

公开(公告)日：2018-11-22

申请号：US15776995

申请日：2016-11-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans BUTLER ,  Johannes Petrus Martinus Bernardus VERMEULEN ,  Engelbertus Antonius Fransiscus VAN DER PASCH

IPC: G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70716 ,  G03F7/70758 ,  G03F7/70766 ,  G03F7/709

Abstract: A positioning device comprising an object table and a positioning module configured to position the object table. The positioning module comprises a first positioning module member configured to hold the object table, a second positioning module member configured to support the first positioning module member, and a support frame configured to support the second positioning module member. The positioning module also includes one or more actuators, a position measurement system configured to measure a position of the object table, and a control unit configured to control a position of the object table based on the measured position of the object table. The control unit is further configured to control a vertical position of the second position module member so as to maintain a top surface of the second positioning module member substantially parallel to a bottom surface of the first positioning module member.

公开(公告)号：US20170199469A1

公开(公告)日：2017-07-13

申请号：US15324264

申请日：2015-07-10

Applicant: ASML Netherlands B.V.

Inventor： Johannes Adrianus Antonius Theodorus DAMS ,  Dirk Hendrikus Marinus ENGELEN ,  Peter Michel Silvester Maria HEIJMANS ,  Simon Bernardus Cornelis Maria MARTENS ,  Hans BUTLER ,  Antonius Franciscus Johannes DE GROOT

IPC: G03F7/20 ,  H02K41/03 ,  H02K11/30 ,  H02K11/21 ,  H02K15/06

CPC classification number: G03F7/70758 ,  H02K11/21 ,  H02K11/30 ,  H02K15/06 ,  H02K41/031 ,  H02K2201/18

Abstract: An actuator includes coil assemblies arranged in an array, wherein each coil assembly defines a core chamber having a core chamber height; and at least one magnetic member that extends partly along the core chamber height of the core chamber of a corresponding at least one coil assembly, wherein the at least one magnetic member is made of a magnetic material. A shape of the at least one magnetic member, a size of the at least one magnetic member, a position of the at least one magnetic member and/or the magnetic material of the at least one magnetic member may be selected so as to control one or more parameters of the actuator.

公开(公告)号：US20170199468A1

公开(公告)日：2017-07-13

申请号：US15314440

申请日：2015-05-01

Applicant: ASML Netherlands B.V.

Inventor： Hans BUTLER ,  Wilhelmus Henricus Theodorus Maria AANGENENT ,  Nic Jasper DIRKX ,  Ramidin Izair KAMIDI ,  Wilhelmus Franciscus Johannes SIMONS

IPC: G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70725 ,  G03F7/70775 ,  G03F9/7088 ,  G03F9/7092

Abstract: An object positioning system including a movable object, an actuator system and a control system. The moveable object is moveable relative to a reference. The actuator system is configured to apply a force to the object at a force application location on the object in order to move the moveable object relative to the reference. The control system is configured to position a point of interest of the object relative to the reference. The control system is configured to drive the actuator system based on a parameter representing a spatial relationship between the force application location and the point of interest. The parameter is dependent on a further parameter representing a position of the object relative to the reference.

公开(公告)号：US20170131642A1

公开(公告)日：2017-05-11

申请号：US15316036

申请日：2015-05-13

Applicant: ASML Netherlands B.V.

Inventor： Johannes Jacobus Matheus BASELMANS ,  Hans BUTLER ,  Christiaan Alexander HOOGENDAM ,  Sander KERSSEMAKERS ,  Bart SMEETS ,  Robertus Nicodemus Jacobus VAN BALLEGOIJ ,  Hubertus Petrus Leonardus Henrica VAN BUSSEL

IPC: G03F7/20

CPC classification number: G03F7/70258 ,  G03F7/70066 ,  G03F7/70141 ,  G03F7/70641

Abstract: A method of modifying a lithographic apparatus comprising an illumination system for providing a radiation beam, a support structure for supporting a patterning device to impart the radiation beam with a pattern in its cross-section, a first lens for projecting the radiation beam at the patterning device with a first magnification, a substrate table for holding a substrate, and a first projection system for projecting the patterned radiation beam at a target portion of the substrate with a second magnification. The first lens and the first projection system together provide a third magnification. The method comprises reducing by a first factor the first magnification to provide a second lens for projecting the radiation beam with a fourth magnification; and increasing by the first factor the second magnification to provide a second projection system for projecting the patterned radiation beam at the target portion of the substrate with a fifth magnification.

公开(公告)号：US20160334718A1

公开(公告)日：2016-11-17

申请号：US15109427

申请日：2014-12-18

Applicant: ASML Netherlands B.V.

Inventor： Hans BUTLER ,  Cornelius Adrianus Lambertus DE HOON ,  INgmar August KERP ,  Pieter Johannes Gertrudis MEIJERS ,  Jeroen Pieter STARREVELD ,  Derk TEN HOOPEN ,  Martinus VAN DUIJNHOVEN ,  Edward HAGE ,  Evert Hendrik Jan DRAAIJER ,  Wesley OOMS

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  F16F15/0232 ,  G03F7/70733 ,  G03F7/70833 ,  G03F7/709

Abstract: A support device configured to support a first part relative to a second part, minimizing the transfer of vibration between the two parts, includes a supporting system configured to use gas under pressure to provide a support force between the first and second parts; a gas chamber connected to the supporting system and configured to contain the gas under pressure and provide the gas under pressure to the supporting system; and a section of acoustic damping material, arranged at a location within the gas chamber so as to separate a first gas containing region and a second gas containing region within the gas chamber, wherein the section of acoustic damping material has a first side and a second side, wherein the first gas containing region is on the first side and the second gas containing region is on the second side.

Abstract translation: 支撑装置，被配置为相对于第二部分支撑第一部分，最小化两个部分之间的振动传递，包括构造成在压力下使用气体以在第一和第二部分之间提供支撑力的支撑系统; 连接到支撑系统并被配置为容纳处于压力下的气体并将气体提供给支撑系统的气体室; 以及一部分声阻尼材料，其布置在所述气体室内的位置处，以分离所述气体室内的第一气体容纳区域和第二气体容纳区域，其中所述声学阻尼材料部分具有第一侧面和第二侧面 其中所述第一气体容纳区域在所述第一侧上且所述第二气体容纳区域位于所述第二侧。

公开(公告)号：US20240313684A1

公开(公告)日：2024-09-19

申请号：US18577062

申请日：2022-06-30

Applicant: ASML Netherlands B.V.

Inventor： Hans BUTLER

IPC: H02P25/064 ,  G03F7/00 ,  H02P23/00

CPC classification number: H02P25/064 ,  G03F7/70516 ,  G03F7/70725 ,  G03F7/70758 ,  G03F7/70775 ,  H02P23/0022

Abstract: The invention provides a method of determining a motor-dependent commutation model for an electromagnetic motor, whereby the electromagnetic motor comprises a first member comprising a coil array comprising at least M coils, and a second member comprising a magnet array configured to generate a spatially alternating magnetic field, whereby the first member and the second member are configured to displace relative to each other in N degrees of freedom, N

公开(公告)号：US20240312756A1

公开(公告)日：2024-09-19

申请号：US18674282

申请日：2024-05-24

Applicant: ASML Netherlands B.V.

Inventor： Jasper Hendrik GRASMAN ,  Niels Johannes Maria BOSCH ,  Patrick Peter Hubert Helena PHILIPS ,  Peter Paul HEMPENIUS ,  Joan SANS MERCADER ,  Gerardus Wilhelmus SARS ,  Hans BUTLER ,  Willem Henk URBANUS

IPC: H01J37/20

CPC classification number: H01J37/20 ,  H01J2237/20235

Abstract: Disclosed herein is a platform for a charged particle apparatus, the platform comprising: a base frame; a chamber arranged to comprise a substrate; a metrology frame arranged to support a charged particle beam generator for irradiating a substrate in the chamber with a charged particle beam; and a bellow arranged between the metrology frame and the chamber; wherein: the chamber is rigidly connected to the base frame; the bellow comprises a flexible material such that the metrology frame is substantially isolated from any vibrations that are generated in the chamber; and the bellow is air tight so that a substantial vacuum may be established in the chamber.

公开(公告)号：US20240071713A1

公开(公告)日：2024-02-29

申请号：US18270707

申请日：2021-12-09

Applicant: ASML Netherlands B.V.

Inventor： Niels Johannes Maria BOSCH ,  Xu WANG ,  Peter Paul HEMPENIUS ,  Yongqiang WANG ,  Hans BUTLER ,  Youjin WANG ,  Jasper Hendrik GRASMAN ,  Jianzi SUI ,  Tianming CHEN ,  Aimin WU

IPC: H01J37/20

CPC classification number: H01J37/20 ,  H01J37/28 ,  H01J2237/20235

Abstract: There is provided a charged particle apparatus comprising: a particle beam generator, optics, a first and a second positioning device, both configured for positioning the substrate relative to the particle beam generator along its optical axis, and a controller configured for switching between a first operational mode and a second operational mode. The apparatus is configured, when operating in the first operational mode, for irradiating the substrate by the particle beam at a first landing energy of the particle beam and, when operating in the second operational mode, for irradiating the substrate at a second, different landing energy. When operating in the first operational mode, the second positioning device is configured to position the substrate relative to the particle beam generator at a first focus position of the particle beam and in the second operational mode, to position the substrate at a second, different focus position.

公开(公告)号：US20220326627A1

公开(公告)日：2022-10-13

申请号：US17608760

申请日：2020-05-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans BUTLER ,  Bas JANSEN

IPC: G03F7/20 ,  H02N2/02 ,  H02N2/06

Abstract: An actuator assembly including a first piezo actuator and a second piezo actuator. The piezo actuator has a correction unit configured to determine an output voltage difference representing a difference between a voltage at the output terminal of the first piezo actuator and a voltage at the output terminal of the second piezo actuator, and a first power correction for correcting the first power signal and/or a second power correction for correcting the second power signal, based on the output voltage difference.

公开(公告)号：US20220197155A1

公开(公告)日：2022-06-23

申请号：US17603812

申请日：2020-03-25

Applicant: ASML NETHERLANDS B.V.

Inventor： Sander Jeroen HERMANUSSEN ,  Johannes Petrus Martinus Bernardus VERMEULEN ,  Hans BUTLER ,  Bas JANSEN ,  Michael Marinus Anna STEUR

IPC: G03F7/20 ,  H01L21/687

Abstract: An object table configured to hold an object on a holding surface, the object table including: a main body; a plurality of burls extending from the main body, end surfaces of the burls defining the holding surface; an actuator assembly; and a further actuator assembly, wherein the actuator assembly is configured to deform the main body to generate a long stroke out-of-plane deformation of the holding surface based on shape information of the object that is to be held and the further actuator assembly is configured to generate a short stroke out-of-plane deformation of the holding surface.