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公开(公告)号：US11553582B2
公开(公告)日：2023-01-10
申请号：US16840714
申请日：2020-04-06
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Daniel John William Brown , Alexander Anthony Schafgans , Palash Parijat Das
Abstract: An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.
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公开(公告)号：US20180063935A1
公开(公告)日：2018-03-01
申请号：US15790576
申请日：2017-10-23
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Daniel John William Brown , Alexander Anthony Schafgans , Palash Parijat Das
CPC classification number: H05G2/008 , H01S3/0064 , H01S3/2232 , H01S3/2308 , H01S3/2391 , H05G2/003
Abstract: An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.
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公开(公告)号：US20170099721A1
公开(公告)日：2017-04-06
申请号：US14970402
申请日：2015-12-15
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Daniel John William Brown , Alexander Anthony Schafgans , Palash Parijat Das
IPC: H05G2/00
CPC classification number: H05G2/008 , H01S3/0064 , H01S3/2232 , H01S3/2308 , H01S3/2391 , H05G2/003
Abstract: An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.
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公开(公告)号：US20160165709A1
公开(公告)日：2016-06-09
申请号：US14562237
申请日：2014-12-05
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Daniel John William Brown , Daniel J. Golich , Michael Kats , John T. Stewart , Rostislav Rokitski
IPC: H05G2/00
CPC classification number: H05G2/008 , H01S3/005 , H01S3/0064 , H01S3/0085 , H01S3/2232 , H01S3/2316 , H01S3/2383 , H05G2/003 , H05G2/005 , H05G2/006
Abstract: A method and apparatus for protecting the seed laser a laser produced plasma (LPP) extreme ultraviolet (EUV) light system are disclosed. An isolation stage positioned on an optical path diverts light reflected from further components in the LPP EUV light system from reaching the seed laser. The isolation stage comprises two AOMs that are separated by a delay line. The AOMs, when open, direct light onto the optical path and, when closed, direct light away from the optical path. The delay introduced by the delay line is determined so that the opening and the closing of the AOMs can be timed to direct a forward-moving pulse onto the optical path and to divert reflected light at other times. The isolation stage can be positioned between gain elements to prevent amplified reflected light from reaching the seed laser and other potentially harmful effects.
Abstract translation: 公开了一种用于保护激光产生等离子体（LPP）极紫外（EUV）光系统的种子激光器的方法和装置。 位于光路上的隔离级将从LPP EUV光系统中的其它部件反射的光转移到种子激光器。 隔离级包括由延迟线分开的两个AOM。 AOM在打开时将光线引导到光路上，并且在关闭时将光引导离开光路。 确定由延迟线引入的延迟，使得可以定时将AOM的打开和关闭定时以将向前移动的脉冲引导到光路上并在其它时间转移反射光。 隔离级可以位于增益元件之间，以防止放大的反射光到达种子激光器和其他潜在的有害影响。
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公开(公告)号：US09232624B2
公开(公告)日：2016-01-05
申请号：US14817408
申请日：2015-08-04
Applicant: ASML Netherlands B.V.
Inventor： Robert J. Rafac , Yezheng Tao
CPC classification number: H05G2/008 , G03F7/70033 , G21K5/00 , H05G2/005
Abstract: Techniques for generating EUV light include directing a first pulse of radiation toward a target material droplet to form a modified droplet, the first pulse of radiation having an energy sufficient to alter a shape of the target material droplet; directing a second pulse of radiation toward the modified droplet to form an absorption material, the second pulse of radiation having an energy sufficient to change a property of the modified droplet, the property being related to absorption of radiation; and directing an amplified light beam toward the absorption material, the amplified light beam having an energy sufficient to convert at least a portion of the absorption material into extreme ultraviolet (EUV) light.
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Patent Agency Ranking
公开(公告)号：US20150342016A1
公开(公告)日：2015-11-26
申请号：US14817408
申请日：2015-08-04
Applicant: ASML Netherlands B.V.
Inventor： Robert J. Rafac , Yezheng Tao
CPC classification number: H05G2/008 , G03F7/70033 , G21K5/00 , H05G2/005
Abstract: Techniques for generating EUV light include directing a first pulse of radiation toward a target material droplet to form a modified droplet, the first pulse of radiation having an energy sufficient to alter a shape of the target material droplet; directing a second pulse of radiation toward the modified droplet to form an absorption material, the second pulse of radiation having an energy sufficient to change a property of the modified droplet, the property being related to absorption of radiation; and directing an amplified light beam toward the absorption material, the amplified light beam having an energy sufficient to convert at least a portion of the absorption material into extreme ultraviolet (EUV) light.
Abstract translation: 用于产生EUV光的技术包括将第一辐射脉冲引导到目标材料液滴以形成修改的液滴，所述第一辐射脉冲具有足以改变目标材料液滴形状的能量; 将第二脉冲的辐射引向修饰的液滴以形成吸收材料，第二脉冲的辐射具有足以改变改性液滴的性质的能量，该性质与辐射的吸收有关; 并且将放大的光束引向吸收材料，放大的光束具有足以将吸收材料的至少一部分转化成极紫外（EUV）光的能量。
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公开(公告)号：US20150250045A1
公开(公告)日：2015-09-03
申请号：US14194027
申请日：2014-02-28
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Daniel J.W. Brown , Alexander Schafgans , Michael David Caudill , Daniel J. Golich , Richard L. Sandstrom , Yoshiho Amada
CPC classification number: H05G2/008 , H01S3/1003 , H01S3/1301 , H01S3/1305 , H05G2/003
Abstract: A system for an extreme ultraviolet (EUV) light source includes an optical amplifier including a gain medium positioned on a beam path, the optical amplifier configured to receive a light beam at an input and to emit an output light beam for an EUV light source at an output; a feedback system that measures a property of the output light beam and produces a feedback signal based on the measured property; and an adaptive optic positioned in the beam path and configured to receive the feedback signal and to adjust a property of the output light beam in response to the feedback signal.
Abstract translation: 一种用于极紫外（EUV）光源的系统包括光放大器，其包括位于光束路径上的增益介质，所述光放大器被配置为在输入处接收光束并且向EUV光源发射输出光束 输出 反馈系统，其测量输出光束的性质并基于测量的属性产生反馈信号; 以及位于所述光束路径中并被配置为接收所述反馈信号并响应于所述反馈信号调整所述输出光束的特性的自适应光学器件。
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公开(公告)号：US08866110B2
公开(公告)日：2014-10-21
申请号：US14199261
申请日：2014-03-06
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Robert Jay Rafac , Igor V. Fomenkov , Daniel J. W. Brown
IPC: H05G2/00
Abstract: Techniques are described that enhance power from an extreme ultraviolet light source with feedback from a target material that has been modified prior to entering a target location into a spatially-extended target distribution or expanded target. The feedback from the spatially-extended target distribution provides a nonresonant optical cavity because the geometry of the path over which feedback occurs, such as the round-trip length and direction, can change in time, or the shape of the spatially-extended target distribution may not provide a smooth enough reflectance. However, it may be possible that the feedback from the spatially-extended target distribution provides a resonant and coherent optical cavity if the geometric and physical constraints noted above are overcome. In any case, the feedback can be generated using spontaneously emitted light that is produced from a non-oscillator gain medium.
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公开(公告)号：US10064261B2
公开(公告)日：2018-08-28
申请号：US15790408
申请日：2017-10-23
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , John Tom Stewart, IV , Jordan Jur , Daniel Brown , Alexander A. Schafgans , Jason M. Arcand , Andrew LaForge
IPC: H05G2/00
Abstract: An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.
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公开(公告)号：US20180124906A1
公开(公告)日：2018-05-03
申请号：US15790408
申请日：2017-10-23
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , John Tom Stewart, IV , Jordan Jur , Daniel Brown
IPC: H05G2/00
Abstract: An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.
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